A dual-route optical emission spectroscopy diagnostic with wide spectral range and high wavelength resolution on HL-2A tokamak

A dual-route optical emission spectroscopy(D-OES)diagnostic is newly developed to monitor the optical emission from the X-point plasma region on the HL-2 A tokamak.This diagnostic is composed of an imaging system,a beam-splitting system for dual-route measurements,fiber bundles,a spectrometer system,and a control and acquisition system.One route is used to obtain wide-spectral-range spectra,and the other route is used to acquire high-wavelengthresolution line shapes.The spectral resolution of the wide-range spectrometers is 0.8 nm with a coverage of 800 nm(@200-1000 nm).The spectral resolution of the high-resolution spectrometer is 0.01 nm with a coverage of 6 nm(@200-660 nm).The spatial resolution of each route of D-OES is about 4 cm with 11 channels.The temporal resolution is 16 ms at maximum in the single-channel mode.Wide-range spectra(containing Balmer series and a Fulcher band)and highly resolved Ha line shapes are obtained by D-OES in the hydrogen glow discharge in the lab.D-OES measurements are carried out in the high-density deuterium experiments of HL-2A.The electron density n_(e)and deuterium temperature T_(D) in the X-point multifaceted asymmetric radiation from the edge(MARFE)region are derived simultaneously by fitting the measured D_(a) shape.The density n_(e)is observed to increase from~8.7×10^(18)m^(-3)to~7.8×10^(19)m^(-3),and the temperature T_(D)drops from~14.4 eV to~2.3 eV after the onset of MARFE in the discharge#38260.

Non-invasive optical characterization and estimation of Zn porosity in gas tungsten arc welding of Fe–Al joints using CR model and OES measurements

In this study,we employed a non-invasive approach based on the collisional radiative(CR)model and optical emission spectroscopy(OES)measurements for the characterization of gas tungsten arc welding(GTAW)discharge and quantification of Zn-induced porosity during the GTAW process of Fe–Al joints.The OES measurements were recorded as a function of weld current,welding speed,and input waveform.The OES measurements revealed significant line emissions from Zn-I in 460–640 nm and Ar-I in 680–800 nm wavelength ranges in all experimental settings.The OES coupled CR model approach for Zn-I line emission enabled the simultaneous determination of both essential discharge parameters i.e.electron temperature and electron density.Further,these predictions were used to estimate the Zn-induced porosity using OES-actinometry on Zn-I emission lines using Ar as actinometer gas.The OES-actinometry results were in good agreement with porosity data derived from an independent approach,i.e.x-ray radiography images.The current study shows that OES-based techniques can provide an efficient route for real-time monitoring of weld quality and estimate porosity during the GTAW process of dissimilar metal joints.

Plasma diagnostics by optical emission spectroscopy on manganese ore in conjunction with XRD, XRF and SEM-EDS

Manganese(Mn) is an important industrial mineral.Information about the chemical and phase constitution along with the concentration of impurities presented in Mn ore is compulsory in assessing its suitability for different applications.We performed the qualitative and quantitative analysis of low-grade Mn ore(LGMO) using laser-induced breakdown spectroscopy(LIBS) in conjunction with x-ray diffraction(XRD), x-ray fluorescence(XRF) and scanning electron microscopy(SEM) coupled with energy dispersive x-ray electron spectroscopy(EDS).The optical emission spectra of the LGMO sample displayed the presence of Mn, Si, Ca, Fe, Al, Mg,V, Ti, Sr, Ni, Na, Ba and Li.The plasma parameters, electron temperature and number density were estimated using the Boltzmann plot and Stark broadening line profile methods and were found to be 7500 K±750 K and 8.18±0.8×1017 cm-3, respectively.Quantitative analysis was performed using the calibration-free LIBS(CF-LIBS) method and its outcome along with XRD, XRF and SEM-EDS data showed almost analogous elemental composition, while the LIBS method gave acceptably precise elemental analysis by detecting the low atomic number element Li besides V and Sr.The results obtained using LIBS for the LGMO exhibited its ability as a powerful analytical tool and XRF, XRD and SEM-EDS as complementary methods for the compositional analysis of complex low-grade mineral ore.

Study of spatial and temporal evolution of Ar and F atoms in SF6/Ar microsecond pulsed discharge by optical emission spectroscopy

The study of sulfur hexafluoride(SF6) discharge is vital for its application in gas-insulated equipment. Direct current partial discharge(PD) may cause SF6 decomposition, and the decomposed products of SF6, such as F atoms, play a dominant role in the breakdown of insulation systems. In this study, the PD caused by metal protrusion defects is simulated by a needle-plate electrode using pulsed high voltage in SF6/Ar mixtures. The spatial and temporal characteristics of SF6/Ar plasma are analyzed by measuring the emission spectra of F and Ar atoms, which are important for understanding the characteristics of PD. The spatial resolved results show that both F and Ar atom spectral intensities increase first from the plate anode to the needle and then decrease under the conditions of a background pressure of400 Pa, peak voltage of-1000 V, frequency of 2 kHz, pulse width of 60 μs, and electrode gap of 5-9 mm. However, the distribution characteristics of F and Ar are significantly different. The temporal distribution results show that the spectral intensity of Ar decreasesfirst and then increases slowly, while the spectral intensity of F increases slowly for the duration of the pulsed discharge at the electrode gap of 5 mm and the pulse width of40-80 μs.

Langmuir Probe and Optical Emission Spectroscopy Studies of Low-Pressure Gas Mixture of CO_2 and N_2

Optical emission spectroscopy was used to study a gas mixture glow discharge of CO2 and N2 at a total pressure of 1.2 Torr, a power of 100 W and a flow of 16.5 L/min. The emission bands were measured in the wavelength range of 200 nm to 900 nm. The principal species observed were O2^＋ （A^2П→ X^2П）, CO^＋ （A^2П→X^2∑）, N2^＋ （B^2∑u＋ → X^2∑g^＋）, CO2^＋ （A^2∏ → X^2∏）, N2（C^3∏u → B^3∏g）, O2（b^1∑g^＋→ X^3∑g^-）, and CO （a^r3∑→a^3∏）. The behavior of the band intensities as a function of the N2 percentage is consistent with recent Monte Carlo simulations. The electron temperature and ion density were determined by a double Langmuir probe. The electron temperature was found in the range of 1.55 eV to 2.93 eV, and the electron concentration in the order of 10^10 cm^-3. The electron temperature and ion density at pure N2 and pure CO2 agree with previous measurements.

A comparison among optical emission spectroscopic methods of determining electron temperature in low pressure argon plasmas

In this article, four kinds of optical emission spectroscopic methods of determining electron temperature are used to investigate the relationship between electron temperature and pressure in the cylindrical plasmas of dc glow discharges at low pressures in laboratory by measuring the relative intensities of ArI lines at various pressures. These methods are developed respectively on the basis of the Fermi-Dirac model, corona model, and two kinds of electron collision cross section models according to the kinetic analysis. Their theoretical bases and the conditions to which they are applicable are reviewed, and their calculation results and fitting errors are compared with each other. The investigation has indicated that the electron temperatures obtained by the four methods become consistent with each other when the pressure increases in the low pressure argon plasmas.

Measurement of electron density and electron temperature of a cascaded arc plasma using laser Thomson scattering compared to an optical emission spectroscopic approach

As advanced linear plasma sources, cascaded arc plasma devices have been used to generate steady plasma with high electron density, high particle flux and low electron temperature. To measure electron density and electron temperature of the plasma device accurately, a laser Thomson scattering（LTS） system, which is generally recognized as the most precise plasma diagnostic method, has been established in our lab in Dalian University of Technology. The electron density has been measured successfully in the region of 4.5？×10^19m^-3 to7.1？×10^20m^-3 and electron temperature in the region of 0.18 eV to 0.58 eV. For comparison,an optical emission spectroscopy（OES） system was established as well. The results showed that the electron excitation temperature（configuration temperature） measured by OES is significantly higher than the electron temperature（kinetic electron temperature） measured by LTS by up to 40% in the given discharge conditions. The results indicate that the cascaded arc plasma is recombining plasma and it is not in local thermodynamic equilibrium（LTE）. This leads to significant error using OES when characterizing the electron temperature in a non-LTE plasma.

Investigation on plasma characteristics in a laser ablation pulsed plasma thruster by optical emission spectroscopy

In order to further improve the propulsion performance of pulsed plasma thrusters for space micro propulsion,a novel laser ablation pulsed plasma thruster is proposed,which separated the laser ablation and electromagnetic acceleration.Optical emission spectroscopy is utilized to investigate the plasma characteristics in the thruster.The spectral lines at different times,positions and discharge intensities are experimentally recorded,and the plasma characteristics in the discharge channel are concluded through analyzing the variation of spectral lines.With the discharge energy of 24 J,laser energy of 0.6 J and the use of aluminum propellant,the specific impulse and thrust efficiency reach 6808 s and 70.6%,respectively.

Novel infrared differential optical absorption spectroscopy remote sensing system to measure carbon dioxide emission

A CO_2 infrared remote sensing system based on the algorithm of weighting function modified differential optical absorption spectroscopy(WFM-DOAS) is developed for measuring CO_2 emissions from pollution sources. The system is composed of a spectrometer with band from 900 nm to 1700 nm, a telescope with a field of view of 1.12?, a silica optical fiber, an automatic position adjuster, and the data acquisition and processing module. The performance is discussed,including the electronic noise of the charge-coupled device(CCD), the spectral shift, and detection limits. The resolution of the spectrometer is 0.4 nm, the detection limit is 8.5 × 10^(20)molecules·cm^(-2), and the relative retrieval error is < 1.5%.On May 26, 2018, a field experiment was performed to measure CO_2 emissions from the Feng-tai power plant, and a twodimensional distribution of CO_2 from the plume was obtained. The retrieved differential slant column densities(dSCDs)of CO_2 are around 2 × 10^(21) molecules·cm^(-2) in the unpolluted areas, 5.5 × 10^(21)molecules·cm^(-2) in the plume locations most strongly affected by local CO_2 emissions, and the fitting error is less than 2 × 10^(20)molecules·cm^(-2), which proves that the infrared remote sensing system has the characteristics of fast response and high precision, suitable for measuring CO_2 emission from the sources.

Optical Emission Spectroscopic Measurement of Hydroxyl Radicals in Air Discharge with Atomized Water

Effects of discharge mode, voltage applied, size of the nozzle discharge electrode and flow rate of water on the generation of hydroxyl radical were investigated in air discharge with atomized water, by using optical emission spectroscopy （OES）. Water was injected into the discharge region through the discharge nozzle electrode, and a large amount of fine water drops, formed and distributed in the discharge region, corona discharge was more effective to generate were observed. It was found that negative DC the hydroxyl radicals in comparison to positive DC corona discharge or negative pulsed discharge. A larger outer diameter of the nozzle electrode or a stronger electric field is beneficial for hydroxyl-radical generation. Moreover, there is a critical value in the flow rate of atomized water against the discharge voltage. Below this critical value, hydroxyl-radical generation increases with the increase in flow rate of the water, while above this value, it decreases. In addition, it is observed that OES from the discharge is mainly in the ultraviolet domain. The results are helpful in the study of the mechanism and application of plasma in pollution-control in either air or water.

Time-Resolved Optical Emission Spectroscopy Diagnosis of CO_2 Laser-Produced SnO_2 Plasma

The spectral emission and plasma parameters of SnO2 plasmas have been investigated. A planar ceramic SnO2 target was irradiated by a CO2 laser with a full width at half maximmn of 80 ns. The temporal behavior of the specific emission lines from the SnO2 plasma was characterized. The intensities of Sn I and Sn Ⅱ lines first increased, and then decreased with the delay time. The results also showed a faster decay of Sn I atoms than that of Sn II ionic species. The temporal evolutions of the SnO2 plasma parameters （electron temperature and density） were deduced. The measured temperature and density of SnO2 plasma are 4.38 eV to 0.5 eV and 11.38×1017 cm 3 to 1.1×1017^ cm-3, for delay times between 0.1 μs and 2.2 #s. We also investigated the effect of the laser pulse energy on Sn02 plasma.

Determination of Non-Maxwellian Electron Energy Distributions in Low-Pressure Plasmas by Using the Optical Emission Spectroscopy and a Collisional-Radiative Model

A Maxwellian electron energy distribution function （EEDF） is often assumed when using the optical emission line-ratio method to determine the electron temperature in low- temperature plasmas. However, in many cases, non-Maxwellian EEDFs can be formed due to the non-local electron heating or the inelastic-collisional energy loss processes. In this work, with a collisional-radiative model, we propose an approach to obtain the non-Maxwellian EEDF with a ＇two-temperature structure＇ from the emission line-ratios of Paschen 2p levels of argon and kryp- ton atoms. For applications of this approach in reactive gas （CF4, O2, etc） discharges that contain argon and krypton, recommendations of some specific emission line-ratios are provided, according to their sensitivities to the EEDF variation. The kinetic processes of the relevant excited atoms are also discussed in detail.

Characteristics of Laser Produced Plasmas Obtained by Fast ICCD Photography, Schlieren Photography and Optical Emission Spectroscopy

Pulsed laser produced plasmas(LPP)are important for industrial applications and fundamental researches,and their complex,multi-physical and cross-chemical processes need to be investigated more comprehensively.In this work,images of the luminous plasma,the spatial density distribution,and the plasma parameters are experimentally investigated by using fast ICCD photography,schlieren photography,and optical emission spectroscopy.Plasmas are produced by a 1 064 nm,15 ns Nd:YAG laser.Free expanding and splitting phenomena are observed in vacuum(at the pressure of about 1×10 3Pa)and air(at the pressure of 20 Pa)using fast photography,respectively.Meanwhile,shock waves formed in the atmospheric laser produced plasma are visualized by schlieren photography.The formation of shock waves is interpreted with the Sedov-Taylor theory,and an averaged expansion velocity about 375 m/s of the shock waves is estimated during 200～1 000 ns.Atmospheric air is found to have significant confinement effects on the plasma expansions compared to that in vacuum or low pressure ambient.Based on the optical emission spectroscopy,after 1 000 ns,at 0.6 mm above the target,the plasma temperature is about 7 800 K and the electron number density is approximately 0.64×1016cm-3.

Optical emission spectroscopy study on deposition process of microcrystalline silicon

This paper reports that the optical emission spectroscopy （OES） is used to monitor the plasma during the deposition process of hydrogenated microcrystalline silicon films in a very high frequency plasma enhanced chemical vapour deposition system. The OES intensities （Sill^＊, H^＊ and H^＊β） are investigated by varying the deposition parameters. The result shows that the discharge power, silane concentrations and substrate temperature affect the OES intensities. When the discharge power at silane concentration of 4% increases, the OES intensities increase first and then are constant, the intensities increase with the discharge power monotonously at silane concentration of 6%. The SiH^＊ intensity increases with silane concentration, while the intensities of H^＊α and H^＊β increase first and then decrease. When the substrate temperature increases, the SiH^＊ intensity decreases and the intensities of H^＊α and H^＊β are constant. The correlation between the intensity ratio of IH^＊α/ISiH^＊ and the crystalline volume fraction （Xc） of films is confirmed.

Optical Emission Spectroscopic Studies of ICP Ar Plasma

The ion line of 434.8 nm and atom line of 419.8 nm of Ar plasma produced by an inductively coupled plasma （ICP） were measured by optical emission spectroscopy and the influences from the working gas pressure, radio-frequency （RF） power and different positions in the discharge chamber on the line intensities were investigated in this study. It was found that the intensity of Ar atom line increased firstly and then saturated with the increase of the pressure. The line intensity of Ar^＋, on the other hand, reached a maximum value and then decreased along with the pressure. The intensity of the line in an RF discharge also demonstrated a jumping mode and a hysteresis phenomenon with the RF power. When the RF power increased to 400 W, the discharge jumped from the E-mode to the H-mode where the line intensity of Ar atom demonstrated a sudden increase, while the intensity of Ar^＋ ion only changed slightly. If the RF power decreased from a high value, e.g., 1000 W, the discharge would jump from the H-mode back to the E-mode at a power of 300 W. At this time the intensities of Ar and Ar^＋ lines would also decrease sharply. It was also noticed in this paper that the intensity of the ion line depended on the detective location in the chamber, namely at the bottom of the chamber the line was more intense than that in the middle of the chamber, but less intense than at the top, which is considered to be related to the capacitance coupling ability of the ICP plasma in different discharge areas.

Diagnostics of Parameters by Optical Emission Spectroscopy and Langmuir Probe in Mixtures (SiH_4/C_2H_4/Ar) Radio-Frequency Discharge

Optical emission spectroscopy and Langmuir Probe diagnostics were incorporated into the experiment, in which dust particles were formed in-situ by using reactive mixture gases （SiHa/C2H4/Ar） in a radio-frequency （RF） discharge plasma. The excitation temperature was first calculated by combining several optical emission spectra of argon lines and using a Boltzmann distribution to fit the experimental data, then the excitation temperature as functions of both gas pressure and RF power in SiH4/C2Ha/Ar discharges for different discharge conditions were obtained. Correspondingly, based on the measurement of the electron temperature by a Langmuir probe, the excitation temperature was compared with the electron temperature, and some discussions were presented. Finally the emission intensities of spectral lines of Si 390.6 ran, Si2＋ 380.6 nm and C＋ 426.7 nm were measured and presented as functions of pressure, RF power and flow rate of SiH4/C2H4.

Optical Emission Spectroscopic Study During the Evaporation of Aluminium in the Thermal Plasma Reactor

The oxidation of aluminium was studied using optical emission spectroscopy （OES） during the evaporation of aluminium in traces of oxygen in a thermal plasma reactor. The ratio of the measured line intensities of Al-O with that of Al follows the exact trend as of that obtained from the corresponding line intensities in X-ray diffraction spectra of the synthesized samples. In this paper the inherent capacity of emission spectroscopy in evaluating the growth processes under plasma induced reactions is presented.

Characteristics of C_2 Radical in CHF_3 and CF_4 Electron Cyclotron Resonance Plasmas Studied by Optical Emission Spectroscopy

The characteristics of CHF3 and CF4 electron cyclotron resonance (ECR) plasma have been studied by optical emission spectroscopy (OES) and Langmuir probe. It is found that C2 radical is one of main compositions in both of the two plasmas. We investigated the relative concentration of C2 radical as a function of F (H) radical and ion density. The formation mechanism of C2 radical is analyzed.

Preliminary results of optical emission spectroscopy by line ratio method in the RF negative ion source at ASIPP

Optical emission spectroscopy(OES)using the trace rare gases of Ar and Xe have been carried out in a radio frequency(RF)driven negative ion source at Institute of Plasma Physics,Chinese Academy of Science(ASIPP),in order to determine the electron temperature and density of the hydrogen plasma.The line-ratio methods based on population models are applied to describe the radiation process of the excited state particles and establish their relations with the plasma parameters.The spectral lines from the argon and xenon excited state atoms with the wavelength of 750.4 and 828.0 nm are used to calculate the electron temperature based on the corona model.The argon ions emission lines with the wavelength of 480 and 488 nm are selected to calculate the electron density based on the collisional radiative model.OES has given the preliminary results of the electron temperature and density by varying the discharge gas pressure and RF power.According to the experimental results,the typical plasma parameters isTe2≈2-4 eV and ne≈1 x 1017-8 x 1017 m^-3 in front of plasma grid.

Analysis of optical emission spectroscopy data during silicon etching in SF_(6)/O_(2)/Ar plasma

Silicon etching is an essential process in various applications,and a major challenge for etching process is anisotropic high aspect ratio etching characteristics.The etch profile is determined by the plasma parameters and process parameters.In this study,the plasma state with each process parameters were analyzed through the optical emission spectroscopy(OES)plasma diagnostic sensor by both chemical and physical approaches.Electron temperature and electron density were additionally acquired using the corona model with OES data that provides chemical species information,and the etch profile was evaluated through scanning electron microscope measurement data.The results include changes in profile with gas ratio,bias power,and pressure.We figure out that factors like ion energy and ion angular distribution as well as chemical reaction affect the anisotropic profile.