A reuse fabrication module using micro electroetching as a precision machining process with a new design of a slant-form tool to remove the defective indium-tin-oxide （ITO） nanostructure from the optical polyethylen...A reuse fabrication module using micro electroetching as a precision machining process with a new design of a slant-form tool to remove the defective indium-tin-oxide （ITO） nanostructure from the optical polyethyleneterephthalate （PET） surfaces of digital paper display is presented in current studies. The low yield of ITO thin film deposition is an important factor in optoelectronic semiconductor production. The adopted precision reuse process requires only a short period of time to remove the ITO nanostructure easily and cleanly, which is based on technical and economical considerations and is highly efficient. In the current experiment, a large inclined angle of the cathode and a small end radius of the anode take less time for the same amount of ITO removal. A higher feed rate of the optical PET diaphragm combines with enough electric power to drive fast micro electroetching. A small rotational diameter of the anode accompanied by a small width of the cathode corresponds to a higher removal rate for the ITO nanostructure. A pulsed direct current can improve the effect of dreg discharge and is advantageous to couple this current with the fast feed rate of the workpiece. This improvement is associated with an increase in current rating. High rotational speed of the slant-form tool can improve the effect of dregs discharge and is advantageous to associate with the fast feed rate of the workpiece （optical PET diaphragm）.展开更多
基金supported by the National Science Council, Contract Nos. 97-2410-H-152-016 and 99-2221-E-152-001
文摘A reuse fabrication module using micro electroetching as a precision machining process with a new design of a slant-form tool to remove the defective indium-tin-oxide （ITO） nanostructure from the optical polyethyleneterephthalate （PET） surfaces of digital paper display is presented in current studies. The low yield of ITO thin film deposition is an important factor in optoelectronic semiconductor production. The adopted precision reuse process requires only a short period of time to remove the ITO nanostructure easily and cleanly, which is based on technical and economical considerations and is highly efficient. In the current experiment, a large inclined angle of the cathode and a small end radius of the anode take less time for the same amount of ITO removal. A higher feed rate of the optical PET diaphragm combines with enough electric power to drive fast micro electroetching. A small rotational diameter of the anode accompanied by a small width of the cathode corresponds to a higher removal rate for the ITO nanostructure. A pulsed direct current can improve the effect of dreg discharge and is advantageous to couple this current with the fast feed rate of the workpiece. This improvement is associated with an increase in current rating. High rotational speed of the slant-form tool can improve the effect of dregs discharge and is advantageous to associate with the fast feed rate of the workpiece （optical PET diaphragm）.
