The Effect of Uncaria gambir on Optical Properties and Thermal Stability of CNF/PVA Biocomposite Films

Cellulose-based film has gained popularity as an alternative to synthetic polymers due to its outstanding properties.Among all types of cellulose materials available,cellulose nanofiber(CNF)has great potential to be utilized in a diverse range of applications,including as a film material.In this study,CNF biocomposite film was prepared by using polyvinyl alcohol(PVA)as a matrix and Uncaria gambir extract as a filler.This study aims to investigate the effect of Uncaria gambir extract on the optical properties and thermal stability of the produced film.The formation of the CNF biocomposite films was confirmed using Fourier Transform Infrared Spectroscopy,their transmittance characteristics were measured using UV-Vis spectroscopy and a transmittance meter,while their reflectance was determined using a reflectance meter.The results revealed that the addition of Uncaria gambir extract to the CNF biocomposite film improved its UV-shielding properties,as indicated by the lower percentage of transmittance in the visible region,10%–70%.In addition,its reflectance increased to 10.6%compared to the CNF film without the addition of Uncaria gambir extract.Furthermore,the thermal stability of the CNF biocomposite film with the addition of Uncaria gambir extract improved to around 400℃–500℃.In conclusion,the results showed that CNF biocomposite film prepared by adding Uncaria gambir extract can be a promising candidate for optical and thermal management materials.

Electrical and nonlinear optical properties of TGZO transparent conducting films deposited by magnetron sputtering

Thin transparent oxide conducting films(TCOFs)of titanium and gallium substituted zinc oxide(TGZO)were fabricated via radio frequency(RF)magnetron sputtering technique.The effects of RF power on electrical,linear and nonlinear optical characteristics were investigated by Hall tester,Ultraviolet(UV)-visible spectrophotometer and optical characterization method.The results indicate that RF power significantly influences the electrical and optical properties of the deposited films.As RF power raises,the resistivity and Urbach energy fall initially and then rise,while the figure of merit,mean visible transmittance and optical bandgap show the reverse variation trend.At RF power of 190 W,the TGZO sample exhibits the highest electro-optical properties,with the maximum figure of merit(1.14×10^(4)Ω^(-1)∙cm^(-1)),mean visible transmittance(86.9%)and optical bandgap(3.50 eV),the minimum resistivity(6.26×10^(-4)Ω∙cm)and Urbach energy(174.23 meV).In addition,the optical constants of the deposited films were determined by the optical spectrum fitting method,and the RF power dependence of nonlinear optical properties was studied.It is observed that all the thin films exhibit normal dispersion characteristics in the visible region,and the nonlinear optical parameters are greatly affected by the RF power in the ultraviolet region.

Tuning of Optical Properties via Annealing of Bismuth Ferrite (BiFeO3) Thin Films

In this study we are reporting annealing induced optical properties of bismuth ferrite (BiFeO3) thin films deposited on glass substrate via spin coating at 5000 rpm. The structural, optical and surface morphology of BiFeO3 (BFO) thin films have been studied via X-ray diffraction (XRD), Fourier transform infrared (FT-IR), Optical absorption (UV-Vis) and Photoluminescence (PL) spectroscopy. XRD spectra confirm annealing induced phase formation of BiFeO3 possessing a rhombohedral R3c structure. The films are dense and without cracks, although the presence of porosity in BFO/glass was observed. Moreover, optical absorption spectra indicate annealing induced effect on the energy band structure in comparison to pristine BiFeO3. It is observed that annealing effect shows an intense shift in the UV-Vis spectra as diffuse absorption together with the variation in the optical band gap. The evaluated optical band gap values are approximately equal to the bulk band gap value of BiFeO3.

DDI METHOD FOR MEASURING OPTICAL CONSTANTS OF THIN FILMS

By double beam and double wave interferomatric (DDI) method, the optical constants of thin films, i.e. refractive index, extinction coefficient and thickness may be determined in infrared (3.39 μm) and in visible (0.633 μm) wavelengths in the same optical path with a tunable double wave He Ne laser designed by ourselves. The measuring principle and the device are describod.

Effect of annealing treatment on the structural, optical, and electrical properties of Al-doped ZnO thin films

Highly conductive and transparent Al-doped ZnO （AZO） thin films were prepared from a zinc target containing Al （1.5 wt.%） by direct current （DC） and radio frequency （RF） reactive magnetron sputtering. The structural, optical, and electrical properties of AZO films as-deposited and submitted to annealing treatment （at 300 and 400℃, respectively） were characterized using various techniques. The experimental results show that the properties of AZO thin films can be further improved by annealing treatment. The crystallinity of ZnO films improves after annealing treatment. The transmittances of the AZO thin films prepared by DC and RF reactive magnetron sputtering are up to 80% and 85% in the visible region, respectively. The electrical resistivity of AZO thin films prepared by DC reactive magnetron sputtering can be as low as 8.06 x 10-4 Ωcm after annealing treatment. It was also found that AZO thin films prepared by RF reactive magnetron sputtering have better structural and optical properties than that prepared by DC reactive magnetron sputtering.

Influence of oxygen gas content on the structural and optical properties of ZnO thin films deposited by RF magnetron sputtering at room temperature

Zinc oxide （ZnO） thin films were deposited on sapphire （0001） substrates at room temperature by radiofrequency （RF） magnetron sputtering at oxygen gas contents of 0%, 25%, 50% and 75%, respectively. The influence of oxygen gas content on the structural and optical properties of ZnO thin films was studied by a surface profile measuring system, X-ray diffraction analysis, atomic force microscopy, and UV spectro- photometry. It is found that the size of ZnO crystalline grains increases first and then decreases with the increase of oxygen gas content, and the maximum grain size locates at the 25% oxygen gas content. The crystalline quality and average optical transmittance （〉90%） in the visi- ble-light region of the ZnO film prepared at an oxygen gas content of 25% are better than those of ZnO films at the other contents. The obtained results can be attributed to the resputtefing by energetic oxygen anions in the growing process.

Optical and magnetic properties of porous anodic alumina films embedded with Co nanowires

A simple method to tune the optical properties of porous anodic alumina （PAA） films embedded with Co nanowires （PAA@Co nanocomposite films） is reported in this paper. The films exhibit vivid structural colors and magnetic properties. The optical properties of the films can be effectively tuned by adjusting the thickness of the PAA template. The deposition of Co nanowires greatly increases the color saturation of the PAA films. The theoretical results of the changes in structural color according to the Bragg-Snell formula are consistent with the experimental results. PAA@Co films can be used in many areas, including decoration, display, and multifunctional anti-counterfeiting applications.

Optical and Electrical Properties of ZnO/CdO Composite Thin Films Prepared by Pulse Laser Deposition

ZnO/CdO composite films with different CdO contents are obtained by pulse laser deposition technique. The structural, optical and electrical properties of the composite [liras are investigated by x-ray diffraction, photolu- minescence and electrical resistivity measurements, respectively. The results show that the UV emission is at a constant peak position in the photoluminescence spectra. Meanwhile, their electrical resistivity decreases to very low level approaching to the value of the CdO film, which can be explained by the Matthiessen composite rule for resistivity. The peculiarity of low resistivity and high transnlittance in the visible region enables these Rims suitable for optoelectronic device fabrication.

Thickness dependence of the optical constants of oxidized copper thin films based on ellipsometry and transmittance

Thin oxidized copper films in various thickness values are deposited onto quartz glass substrates by electron beam evaporation. The ellipsometry parameters and transmittance in a wavelength range of 300 nm-1000 nm are collected by a spectroscopic ellipsometer and a spectrophotometer respectively. The effective thickness and optical constants, i.e., refractive index n and extinction coefficient k, are accurately determined by using newly developed ellipsometry combined with transmittance iteration method. It is found that the effective thickness determined by this method is close to the physical thickness and has obvious difference from the mass thickness for very thin film due to variable density of film. Furthermore, the thickness dependence of optical constants of thin oxidized Cu films is analyzed.

Effects of dopant content on optical and electrical properties of In_2O_3: W transparent conductive films

The In 2 O 3 : W (IWO) films with different W content were deposited on glass substrate using direct current sputtering method. The structure, surface morphology, and optical and electrical properties were investigated. Results showed that both the carrier concentration and carrier mobility were increased with the doping of W. The IWO film with the lowest resistivity of 1.0×10 3 cm, highest carrier mobilityof 43.7 cm 2 V 1 s 1 and carrier concentration of 1.4×10 20 cm 3 was obtained at the content of 2.8 wt.%. The average optical transmittance from 300 nm to 900 nm reached 87.6%.

Preparation and optical characteristics of ZnO films by chelating sol-gel method

The effect of different annealing temperatures on the structure, morphology,and optical properties of ZnO thin films prepared by the chelating sol-gel method was investigated.Zinc-oxide thin films were coated on quartz glass substrates by dip coating. Zinc nitrate, absoluteethanol, and citric acid were used as precursor, solvent, and chelating agent, respectively. Theresults show that ZnO films derived from zinc-citrate have lower crystallization temperature (below400℃), and that the crystal structure is wurtzite. The films, treated over 500℃, consist ofnano-particles and show to be porous at 600℃. The particle size of the film increases with theincrease of the annealing temperature. The largest particle size is 60 nm at 600℃. The opticaltransmittances related to the annealing temperatures become 90% higher in the visible range. Thefilm shows a starting absorption at 380 nm, and the optical band-gap of the thin film (fired at500℃) is 3.25 eV and close to the intrinsic band-gap of ZnO (3.2 eV).

Microstructure and optical properties of sprayed γ-CuI thin films for CuInS_2 solar cells

γ-CuI thin films were prepared by a spraying method using acetonitrile as a solvent,CuI and iodine as reagents.The influences of substrate temperature on the structure,topography,and optical properties of CuI films were investigated.Scanning electron microscope（SEM） photos revealed that the shape and grain size of CuI grains were related to substrate temperature.X-ray diffraction results showed that substrate temperature affected the crystalline quality of CuI films.When the substrate temperature was 110°C,CuI thin films showed γ-phase zinkblende structure with（111） preferred orientation.The dimension of the globular CuI crystallite was approximately 35 nm,the energy band gap was 2.97 eV,the maximum transmittance was 87.3% in the part of the visible region,and the open circuit voltage was close to 380 mV.This opened a route for a cadmium-free buffer layer for CuInS2 solar cells.

Effects of Annealing Temperature on Structural and Optical Properties of ZnO Thin Films

The effects of annealing temperature on the structural and optical properties of ZnO films grown on Si （100） substrates by sol-gel spin-coating are investigated. The structural and optical properties are characterized by x-ray diffraction, scanning electron microscopy and photoluminescence spectra. X-ray diffraction analysis shows the crystal quality of ZnO films becomes better after annealing at high temperature. The grain size increases with the temperature increasing. It is found that the tensile stress in the plane of ZnO films first increases and then decreases with the annealing temperature increasing, reaching the maximum value of 1.8 GPa at 700℃. PL spectra of ZnO films annealed at various temperatures consists of a near band edge emission around 380 nm and visible emissions due to the electronic defects, which are related to deep level emissions, such as oxide antisite （OZn）, interstitial oxygen （Oi）, interstitial zinc （Zni） and zinc vacancy （VZn^-）, which are generated during annealing process. The evolution of defects is analyzed by PL spectra based on the energy of the electronic transitions.

Er^(3+) Doped BaTiO_3 Optical-Waveguide Thin Films Elaborated by Sol-Gel Method

Erbium doped BaTiO 3 optical-waveguide films on Pyrex substrate was elaborated successfully through sol-gel method. BaTiO 3 is well crystallized when the film is annealed at 650 ℃ in air circumstance. The so-prepared films with 13 layers have comparatively lower refractive index than bulk BaTiO 3, and it can support two TM and TE modes. Photoluminescence and up-conversion luminescence spectra proved the successful doping of rare earth ions.

Microstructure and optical absorption properties of Au/NiO thin films

Au nanoparticles dispersed NiO composite films were prepared by a chemical solution method.The phase structure,microstructure,surface chemical state,and optical absorption properties of the films were characterized by X-ray diffraction,transmission electron microscopy,X-ray photoelectron spectroscopy,and Uv-vis spectrometer.The results indicate that Au particles with the average diameters of 35-42 nm are approximately spherical and disperse in the NiO matrix.The optical absorption peaks due to the surface plasmon resonance of Au particles shift to the shorter wavelength and intensify with the increase of Au content.The bandwidth narrows when the Au content increases from 8.4wt% to 45.2wt%,but widens by further increasing the Au content from 45.2wt% to 60.5wt%.The band gap Eg increases with the increase of Au contents from 8.4wt% to 45.2wt%,but decreases by further increasing the Au content.

Structures and optical properties of tungsten oxide thin films deposited by magnetron sputtering of WO_3 bulk:Effects of annealing temperatures

Tungsten oxide thin films were deposited on glass substrates by the magnetron sputtering of WO3 bulk at room temperature. The deposited films were annealed at different temperatures in air. The structural measurements indicate that the films annealed below 300℃ were amorphous, while the films annealed at 400 ℃ were mixed crystalline with hexagonal and triclinic phases of WO3. It was observed that the crystallization of the annealed films becomes more and more distinct with an increase in the annealing temperature. At 400 ℃, nanorod-like structures were observed on the film surface when the annealing time was increased from 60 min to 180 min. The presence of W=O stretching, W-O-W stretching, W-O-W bending and various lattice vibration modes were observed in Raman measurements. The optical absorption behaviors of the films in the range of 450-800 nm are very different with changing annealing temperatures from the room temperature to 400 ℃. After annealing at 400 ℃, the film becomes almost transparent. Increasing annealing time at 400 ℃ can lead to a small blue shift of the optical gap of the film.

Enhanced Optical Absorption of Amorphous Silicon Films by Ag Nanostructures

The optical absorption of amorphous silicon （α-Si） films is enhanced by silver （Ag） nanostructures deposited on the films. The reflection at the long wavelength side of localized plasmon polaritons （LPPs） resonance originated from Ag nanostructures is significantly decreased, i.e. the optical absorption is enhanced. The results show that the average reflection value of the amorphous silicon films in the wavelength range of 900-1200 nm could be decreased by 11.4%. Moreover, the reduction of the reflection is found to be mainly dependent on the size of the Ag nanostructures, which is related to the island sizes, i.e. the LPP＇s resonance peak position.

Optical properties of hexagonal boron nitride thin films deposited by radio frequency bias magnetron sputtering

The optical properties of hexagonal boron nitride （h-BN） thin films were studied in this paper. The films were characterized by Fourier transform infrared spectroscopy, UV-visible transmittance and reflection spectra, h-BN thin films with a wide optical band gap Eg （5.86 eV for the as-deposited film and 5.97 eV for the annealed film） approaching h-BN single crystal were successfully prepared by radio frequency （RF） bias magnetron sputtering and post-deposition annealing at 970 K. The optical absorption behaviour of h-BN films accords with the typical optical absorption characteristics of amorphous materials when fitting is made by the Urbach tail model. The annealed film shows satisfactory structure stability. However, high temperature still has a significant effect on the optical absorption properties, refractive index n, and optical conductivity σ of h-BN thin films. The blue-shift of the optical absorption edge and the increase of Eg probably result from stress relaxation in the film under high temperatures. In addition, it is found that the refractive index clearly exhibits different trends in the visible and ultraviolet regions. Previous calculational results of optical conductivity of h-BN films are confirmed in our experimental results.

Influences of grain size and microstructure on optical properties of microcrystalline diamond films

Microcrystalline diamond(MCD)films with different grain sizes ranging from 160 nm to 2200 nm are prepared by using a hot filament chemical vapor deposition(HFCVD)system,and the influences of grain size and structural features on optical properties are investigated.The results show that the film with grain size in a range of 160 nm–310 nm exhibits a higher refractive index in a range of(2.77–2.92).With grain size increasing to 620±300 nm,the refractive index shows a value between 2.39 and 2.47,approaching to that of natural diamond(2.37–2.55),and a lower extinction coefficient value between 0.08 and 0.77.When the grain size increases to 2200 nm,the value of refractive index increases to a value between 2.66 and 2.81,and the extinction coefficient increases to a value in a range of 0.22–1.28.Visible Raman spectroscopy measurements show that all samples have distinct diamond peaks located in a range of 1331 cm-1–1333 cm-1,the content of diamond phase increases gradually as grain size increases,and the amount of trans-polyacetylene(TPA)content decreases.Meanwhile,the sp2 carbon clusters content and its full-width-at-half-maximum(FWHM)value are significantly reduced in MCD film with a grain size of 620 nm,which is beneficial to the improvement of the optical properties of the films.

The effects of post-thermal annealing on the optical parameters of indium-doped ZnO thin films

Indium-doped ZnO thin films are deposited on quartz glass slides by RF magnetron sputtering at ambient temperature. The as-deposited films are annealed at different temperatures from 400℃ to 800 ℃ in air for 1 h. Transmittance spectra are used to determine the optical parameters and the thicknesses of the films before and after annealing using a nonlinear programming method, and the effects of the annealing temperatures on the optical parameters and the thickness are investigated. The optical band gap is determined from the absorption coefficient. The calculated results show that the film thickness and optical parameters both increase first and then decrease with increasing annealing temperature from 400℃ to 800℃. The band gap of the as-deposited ZnO：In thin film is 3.28 eV, and it decreases to 3.17 eV after annealing at 400℃. Then the band gap increases from 3.17 eV to 3.23 eV with increasing annealing temperature from 400℃ to 800℃.