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Investigation of HNO_3 Chemincally Oxidized Porous Silicon
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《Chinese Chemical Letters》 SCIE CAS CSCD 1996年第11期1037-1038,共2页
The stability of the photoluminescence (PS) has evidently improvedby HNO3 chemical oxidation The PL intensity and peak wavelength of PS were changed with theHNO3 of HNO3 concentration and oxidation time. Being diff... The stability of the photoluminescence (PS) has evidently improvedby HNO3 chemical oxidation The PL intensity and peak wavelength of PS were changed with theHNO3 of HNO3 concentration and oxidation time. Being different from other oxidation time. Being different from other oxidized ways, the PSoxidized by HNO3 remains remains sensitive to adsorbates. FTTR spectroscopic data suggest that these phenomena are attributed to the presence of HSi(SiaO30a)(a≤3)layer on PS surface. 展开更多
关键词 Investigation of HNO3 Chemincally oxidized porous silicon
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Fabrication of Silicon Condenser Microphone Using Oxidized Porous Silicon as Sacrificial Layer
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作者 宁瑾 刘忠立 +1 位作者 刘焕章 葛永才 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2003年第5期449-453,共5页
A new technique to fabricate silicon condenser microphone is presented.The technique is based on the use of oxidized porous silicon as sacrificial layer for the air gap and the heavy p+-doping silicon of approximately... A new technique to fabricate silicon condenser microphone is presented.The technique is based on the use of oxidized porous silicon as sacrificial layer for the air gap and the heavy p+-doping silicon of approximately 15μm thickness for the stiff backplate.The measured sensitivity of the microphone fabricated with this technique is in the range from -45dB(5.6mV/Pa) to -55dB(1.78mV/Pa) under the frequency from 500Hz to 10kHz,and shows a gradual increase at higher frequency.The cut-off frequency is above 20kHz. 展开更多
关键词 silicon condenser microphone oxidized porous silicon sacrificial layer
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Properties of fluorescence based on the immobilization of graphene oxide quantum dots in nanostructured porous silicon films
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作者 蕾何 贾振红 周骏 《Chinese Optics Letters》 SCIE EI CAS CSCD 2016年第4期42-45,共4页
The fluorescence of graphene oxide quantum dots (GOQDs) that are infiltrated into porous silicon (PSi) is investigated. By dropping activated GOQDs solution onto silanized PSi samples, GOQDs are successfully in- f... The fluorescence of graphene oxide quantum dots (GOQDs) that are infiltrated into porous silicon (PSi) is investigated. By dropping activated GOQDs solution onto silanized PSi samples, GOQDs are successfully in- filtrated into a PSi device. The results indicate that the intensity of the fluorescence of the GOQD-inflltrated multilayer with a high reflection band located at its fluorescence spectra scope is approximately double that of the single layer sample. This indicates that the multilayer GOQD-infiltrated PSi substrate is a suitable material for the preparation of sensitive photoluminescence biosensors. 展开更多
关键词 QDs Properties of fluorescence based on the immobilization of graphene oxide quantum dots in nanostructured porous silicon films
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