A method of QWI （ quantum well intermixing） realizing through plasma-enhanced chemical vapordepositiom （PECVD） SiO2 film following ion implantation was investigated. PECVD 200 mn SiO2 film after 160 keV phosphorus...A method of QWI （ quantum well intermixing） realizing through plasma-enhanced chemical vapordepositiom （PECVD） SiO2 film following ion implantation was investigated. PECVD 200 mn SiO2 film after 160 keV phosphorus（P） ion implantation was performed to induce InP-based multiple-quantum-well （MQW） laser structural intermixing, annealing process was carried out at 780 ℃ for 30 seconds under N2 flue, the blue shift ofphotoluminescenee （PL） peak related to implanted dose ： 1 × 10^11, 1 × 10^12, 1×10^13 ,3 × 10^13 , 7× 10^13 ion/ cm^2 is 22 nm, 65 nm, 104 nm, 109 nm, 101 nm, respectively. Under the same conditions, by comparing the blue shift of PL peak with P ion implantation only, slight differentiation between the two methods was observed, and results reveal that the defects in the implanting layers generated by ion implantation are much more than those in SiO2 film. So, the blue shift results mainly from ion implantation. However, SiO2 film also may promote the quantum well intermixing.展开更多
Silicon-based planar neuroprobes are composed of silicon substrate,conducting layer,and insulation layers of SiO 2 or SiN membrane.The insulation layer is very important because it affects many key parameters of neupr...Silicon-based planar neuroprobes are composed of silicon substrate,conducting layer,and insulation layers of SiO 2 or SiN membrane.The insulation layer is very important because it affects many key parameters of neuprobes,like impedance,SNR(signal noise ratio),reliability,etc.Monolayer membrane of SiO 2 or SiN are not good choices for insulation layer,since defects and residual stress in these layers can induce bad passivation.In this paper a composite insulation structure is studied,with thermal SiO 2 as the lower insulation layer and with multilayer membrane composed of PECVD SiO 2 and SiN as the upper insulation layer.This structure not only solves the problem of residual stress but also ensures a good probe passivation.So it's a good choice for insulation layer of neuroprobes.展开更多
基金Funded bythe National Natural Science Foundation of China(No.60276013)
文摘A method of QWI （ quantum well intermixing） realizing through plasma-enhanced chemical vapordepositiom （PECVD） SiO2 film following ion implantation was investigated. PECVD 200 mn SiO2 film after 160 keV phosphorus（P） ion implantation was performed to induce InP-based multiple-quantum-well （MQW） laser structural intermixing, annealing process was carried out at 780 ℃ for 30 seconds under N2 flue, the blue shift ofphotoluminescenee （PL） peak related to implanted dose ： 1 × 10^11, 1 × 10^12, 1×10^13 ,3 × 10^13 , 7× 10^13 ion/ cm^2 is 22 nm, 65 nm, 104 nm, 109 nm, 101 nm, respectively. Under the same conditions, by comparing the blue shift of PL peak with P ion implantation only, slight differentiation between the two methods was observed, and results reveal that the defects in the implanting layers generated by ion implantation are much more than those in SiO2 film. So, the blue shift results mainly from ion implantation. However, SiO2 film also may promote the quantum well intermixing.
文摘Silicon-based planar neuroprobes are composed of silicon substrate,conducting layer,and insulation layers of SiO 2 or SiN membrane.The insulation layer is very important because it affects many key parameters of neuprobes,like impedance,SNR(signal noise ratio),reliability,etc.Monolayer membrane of SiO 2 or SiN are not good choices for insulation layer,since defects and residual stress in these layers can induce bad passivation.In this paper a composite insulation structure is studied,with thermal SiO 2 as the lower insulation layer and with multilayer membrane composed of PECVD SiO 2 and SiN as the upper insulation layer.This structure not only solves the problem of residual stress but also ensures a good probe passivation.So it's a good choice for insulation layer of neuroprobes.
