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Modification of Nano-α-Al2O3 and Its Influence on the Surface Properties of Waterborne Polyurethane Resin Composite Passivation Films
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作者 Jiankang Fu Changshuai Ma +2 位作者 Yameng Zhu Jing Yuan Qianfeng Zhang 《Journal of Materials Science and Chemical Engineering》 2024年第5期29-48,共20页
Silane coupling agent KH560 was used to modify the surface of nano-α-Al<sub>2</sub>O<sub>3</sub> in ethanol-aqueous solution with different proportions. The particle size of nano-α-Al<sub&... Silane coupling agent KH560 was used to modify the surface of nano-α-Al<sub>2</sub>O<sub>3</sub> in ethanol-aqueous solution with different proportions. The particle size of nano-α-Al<sub>2</sub>O<sub>3</sub> was determined by nano-particle size analyzer, and the effects of nano-α-Al<sub>2</sub>O<sub>3</sub> content, ethanol-aqueous solution ratio and KH560 dosage on the dispersion and particle size of nano-α-Al<sub>2</sub>O<sub>3</sub> were investigated. The material structure before and after modification was determined by Fourier transform infrared spectroscopy (FTIR). Aqueous polyurethane resin and inorganic components are combined with modified nano-α-Al<sub>2</sub>O<sub>3</sub> dispersion to form chromium-free passivation solution. The solution is coated on the galvanized sheet, the adhesion and surface hardness are tested, the bonding strength of the coating and the surface hardness of the substrate are discussed. The corrosion resistance and surface morphology of the matrix were investigated by electrochemical test, neutral salt spray test and scanning electron microscope test. The chromium-free passivation film formed after the modification of nano-α-Al<sub>2</sub>O<sub>3</sub> increases the surface hardness of galvanized sheet by about 85%. The corrosion resistance of the film is better than that of a single polyurethane film. The results show that the surface hardness and corrosion resistance of polyurethane resin composite passivation film are significantly improved by the introduction of nano-α-Al<sub>2</sub>O<sub>3</sub>. 展开更多
关键词 Micro-Nano α-al2o3 Waterborne Polyurethane Resin Particle Size Surface Hardness Corrosion Resistance
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Al掺杂对β-Ga_(2)O_(3)薄膜光学性质的影响研究
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作者 钟琼丽 王绪 +1 位作者 马奎 杨发顺 《人工晶体学报》 CAS 北大核心 2024年第8期1352-1360,共9页
近年来,半导体器件向着高散热性、高击穿场强和低能耗的方向发展,因此超宽禁带半导体材料β-Ga_(2)O_(3)具有广阔的应用前景,而有效掺杂是实现β-Ga_(2)O_(3)器件的基础。实验采用磁控溅射法制备Ga_(2)O_(3)/Al/Ga_(2)O_(3)/Al/Ga_(2)O_... 近年来,半导体器件向着高散热性、高击穿场强和低能耗的方向发展,因此超宽禁带半导体材料β-Ga_(2)O_(3)具有广阔的应用前景,而有效掺杂是实现β-Ga_(2)O_(3)器件的基础。实验采用磁控溅射法制备Ga_(2)O_(3)/Al/Ga_(2)O_(3)/Al/Ga_(2)O_(3)复合结构,经高温退火使Al原子热扩散进入薄膜中,形成Al掺杂的β-Ga_(2)O_(3)薄膜。采用激光区熔法使薄膜区域熔化再结晶,进一步提升掺杂质量。对Al掺杂β-Ga_(2)O_(3)薄膜的晶体性质、杂质含量及光学性质进行了测试表征。结果表明:Al掺杂不改变β-Ga_(2)O_(3)薄膜的晶体结构;随着Al层溅射时间延长,掺杂含量逐渐增加;当Al溅射时间为5和10 s时,薄膜紫外吸收率分别为40%和50%;随着Al溅射时间的增加,Al掺杂β-Ga_(2)O_(3)薄膜紫外区域光吸收率逐渐增强,Al溅射时间为300 s时,β-Ga_(2)O_(3)薄膜的光吸收率接近90%;低浓度的Al掺杂会导致β-Ga_(2)O_(3)薄膜的禁带宽度变窄。 展开更多
关键词 β-Ga_(2)o_(3)薄膜 al掺杂 磁控溅射 Ga_(2)o_(3)/al/Ga_(2)o_(3)/al/Ga_(2)o_(3)复合结构 光吸收 光学带隙
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纳米TiO_(2)对NH_(3)-H_(2)O-LiBr工质降膜吸收性能的影响
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作者 李彦军 金正浩 李舒宏 《制冷技术》 2024年第1期16-23,共8页
为了探讨纳米TiO_(2)对三元NH_(3)-H_(2)O-LiBr工质降膜吸收的影响,本文利用数值分析建立了三元工作流体薄膜吸收的连续方程、能量方程和组分质量平衡方程,采用Matlab软件进行编程和计算纳米流体的降膜吸收性能,将其与实验数据进行对比... 为了探讨纳米TiO_(2)对三元NH_(3)-H_(2)O-LiBr工质降膜吸收的影响,本文利用数值分析建立了三元工作流体薄膜吸收的连续方程、能量方程和组分质量平衡方程,采用Matlab软件进行编程和计算纳米流体的降膜吸收性能,将其与实验数据进行对比验证,并进一步分析了纳米TiO_(2)质量分数、初始氨浓度、初始温度、冷却水进口温度、吸收压力和下降薄膜管长度对薄膜吸收性能的影响。研究表明:添加纳米TiO_(2)可以增强降膜吸收的传质速率,主要原因为液膜中氨的扩散系数增加。当纳米TiO_(2)质量分数从0%增加到0.1%、0.3%和0.5%时,扩散系数分别增加了3.44倍、6.42倍和11.76倍。此外,增加初始氨浓度、降低初始温度、提高冷却水进口温度或降低吸收压力都可以提高最终溶液的饱和度。 展开更多
关键词 降膜 吸收 纳米Tio_(2) NH_(3)-H_(2)o-LiBr 模拟研究
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Enhancing the thermal conductivity of polymer-assisted deposited Al_2O_3 film by nitrogen doping 被引量:2
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作者 黄江 张胤 +3 位作者 潘泰松 曾波 胡国华 林媛 《Chinese Physics B》 SCIE EI CAS CSCD 2012年第12期372-376,共5页
Polymer-assisted deposition technique has been used to deposit Al2O3 and N-doped Al2O3 (AION) thin films on Si(100) substrates. The chemical compositions, crystallinity, and thermal conductivity of the as-grown fi... Polymer-assisted deposition technique has been used to deposit Al2O3 and N-doped Al2O3 (AION) thin films on Si(100) substrates. The chemical compositions, crystallinity, and thermal conductivity of the as-grown films have been characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), and 3-omega method, respectively. Amorphous and polycrystalline Al2O3 and AlON thin films have been formed at 700 ℃ and 1000 ℃. The thermal conductivity results indicated that the effect of nitrogen doping on the thermal conductivity is determined by the competition of the increase of Al-N bonding and the suppression of crystallinity. A 67% enhancement in thermal conductivity has been achieved for the samples grown at 700 ℃, demonstrating that the nitrogen doping is an effective way to improve the thermal performance of polymer-assisted-deposited Al2O3 thin films at a relatively low growth temperature. 展开更多
关键词 nitrogen-doped al2o3 thin film thermal conductivity polymer-assisted deposition
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High Jc Epitaxial Superconducting YBa_2Cu_3O_(7-x) Thin Films
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作者 Chen Lanfeng Zhou Li Wang Chaoqun General Research Institute of Non-ferrous Metals.Beijing,China Li Lin Zhao Bairu Zhang Yinzi Qiu Xianggang Institute of Physics,Academia Sinica,Beijing.China Pang Shijing Beijing Laboratory of Vacuum Physics,China Kou Yuanheng Department of Physics.Peking University,Beijing,China 《Rare Metals》 SCIE EI CAS CSCD 1990年第1期66-67,共2页
Excellent epitaxial growth of supercon-ducting YBaCuOthin films have beenrealized on(100)SrTiOand(100)ZrOsubstrates by a planar rf or DC-magnetronsputtering apparatus with UHV system.Thequality of growth and the epita... Excellent epitaxial growth of supercon-ducting YBaCuOthin films have beenrealized on(100)SrTiOand(100)ZrOsubstrates by a planar rf or DC-magnetronsputtering apparatus with UHV system.Thequality of growth and the epitaxial orientationof the film strongly depended on substratetemperature,the substrate orientation and ox-ygen partial pressure.The films exhibitedsuperconducting onset at 92K and zero resist-ance at 90K with critical current density of 展开更多
关键词 YBCo HIGH Thin films High Jc Epitaxial Superconducting YBa2Cu3o Cu
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KH550修饰Al_2O_3及其对PI/Al_2O_3薄膜性能的影响
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作者 刘立柱 李园园 +2 位作者 翁凌 丁军 崔巍魏 《功能材料》 EI CAS CSCD 北大核心 2014年第23期23126-23130,共5页
通过调整KH550的含量对Al2O3粉体表面进行改性,并用红外光谱(FT-IR)和X射线衍射(XRD)对改性后的粉体进行表征,表征结果显示KH550成功的键合到Al2O3粉体表面。然后分别使用Al2O3以及改性Al2O3制备了一系列无机粉体含量为16%(质量分数)的P... 通过调整KH550的含量对Al2O3粉体表面进行改性,并用红外光谱(FT-IR)和X射线衍射(XRD)对改性后的粉体进行表征,表征结果显示KH550成功的键合到Al2O3粉体表面。然后分别使用Al2O3以及改性Al2O3制备了一系列无机粉体含量为16%(质量分数)的PI复合薄膜,通过扫描电子显微镜(SEM)对复合薄膜的断面微观形貌进行表征,并对复合薄膜的力学性能和击穿场强进行测试。测试结果显示KH550的含量对无机粉体分散情况有较大影响。当KH550含量为2%(质量分数)时,PI/KH550-Al2O3复合薄膜的拉伸强度和断裂伸长率最优,分别为130 MPa,12%,与PI/Al2O3薄膜相比,拉伸强度和断裂伸长率分别提高了22.8%,44.5%,击穿场强与其相近。 展开更多
关键词 pi KH550 al2o3 复合薄膜 力学性能
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直流辉光放电质谱法测定高纯α-Al 2 O 3颗粒中16种杂质元素 被引量:1
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作者 谭秀珍 李江霖 +2 位作者 李瑶 邓育宁 朱刘 《中国无机分析化学》 CAS 北大核心 2023年第7期755-760,共6页
采用高纯Ga作为辅助电极,通过考察取样量、放电参数对基体信号强度、信号稳定性、基体和Ga的信号比值的影响,建立了直流辉光放电质谱法(dc-GDMS)测定高纯α-Al_(2)O_(3)颗粒中的Li、Be、Na、Mg等16种杂质元素含量的分析方法。当选取3颗2... 采用高纯Ga作为辅助电极,通过考察取样量、放电参数对基体信号强度、信号稳定性、基体和Ga的信号比值的影响,建立了直流辉光放电质谱法(dc-GDMS)测定高纯α-Al_(2)O_(3)颗粒中的Li、Be、Na、Mg等16种杂质元素含量的分析方法。当选取3颗2 mm左右大小的α-Al_(2)O_(3)颗粒用Ga包裹,在1.6 mA/950 V的放电参数下,基体27 Al信号稳定,强度为3.2×10^(8) cps,Al、Ga的信号比约为1∶270。采用实验方法对α-Al_(2)O_(3)颗粒独立测定5次,相对标准偏差均在30%以内。为了验证Ga对α-Al_(2)O_(3)颗粒测定结果的影响,分别采用电感耦合等离子体发射光谱法(ICP-OES)和dc-GDMS法对易于消解的γ-Al_(2)O_(3)粉进行测定。对于dc-GDMS法,选择压在Ga上的γ-Al_(2)O_(3)粉直径约为4~5 mm,在同样的放电参数下,27 Al的信号强度为3.0×10^(9) cps,Al、Ga的信号比约为1∶29。γ-Al_(2)O_(3)粉的GDMS测定结果和ICP-OES基本一致。采用Ga作辅助电极测定α-Al_(2)O_(3)颗粒和γ-Al_(2)O_(3)粉的检出限均可达ng/g。 展开更多
关键词 直流辉光放电质谱仪(dc-GDMS) 高纯Ga 高纯α-al 2 o 3颗粒 杂质元素
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氮掺杂碳改性Ni/Al2O3催化剂的甲烷干重整反应性能研究
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作者 任永旺 王一泽 +2 位作者 常飞祥 俞择修 魏勤洪 《低碳化学与化工》 CAS 北大核心 2023年第3期49-55,共7页
在甲烷干重整反应(DRM)中,常规浸渍法制备的Ni/Al2O3催化剂常因过多积炭导致催化剂失活,因此研究如何提高Ni/Al2O3催化剂的抗积炭能力具有重要意义。通过浸渍法和高温碳化法制备的氮掺杂碳表面修饰的Ni/Al2O3催化剂Ni/Al2O3@NC-3和Ni/Al... 在甲烷干重整反应(DRM)中,常规浸渍法制备的Ni/Al2O3催化剂常因过多积炭导致催化剂失活,因此研究如何提高Ni/Al2O3催化剂的抗积炭能力具有重要意义。通过浸渍法和高温碳化法制备的氮掺杂碳表面修饰的Ni/Al2O3催化剂Ni/Al2O3@NC-3和Ni/Al2O3@NC-5(3和5分别代表多巴胺聚合时间为3 h和5 h)在DRM中表现出了较强的抗积炭性能。使用X射线衍射(XRD)、拉曼(Raman)光谱、X射线光电子能谱(XPS)、热重(TG)和扫描电镜(SEM)等表征手段对催化剂的结构和电性质进行了分析,并探讨了氮掺杂碳的引入对催化剂稳定性和抗积炭性能的影响。XPS结果表明,Ni/Al2O3@NC-3和Ni/Al2O3@NC-5催化剂中金属Ni与氮掺杂碳发生了电子相互作用,形成了催化惰性的Ni+物种,由此减缓了CH_(4)的裂解速率,进而有效地减少了积炭的产生。在经8 h活性测试后,Ni/Al2O3@NC-3催化剂的CH_(4)转化率和CO_(2)转化率分别维持在52.2%和62.3%,且反应后Ni/Al2O3@NC-3催化剂的积炭量仅为7%(质量分数,下同),远远低于Ni/Al2O3催化剂的积炭量(25%)。 展开更多
关键词 甲烷重整 NI/al2o3催化剂 氮掺杂碳 抗积炭性能
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纳米Al_2O_3/PI三层复合薄膜的制备与表征
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作者 巩桂芬 徐阿文 +2 位作者 张亮 张帆 李泽 《江苏大学学报(自然科学版)》 EI CAS 北大核心 2019年第3期360-365,共6页
以3,3′,4,4′-二苯酮四甲酸二酐(BTDA)和4,4′-二氨基二苯醚(ODA)为缩聚单体,利用高压静电纺丝技术制备出纳米Al_2O_3/PAA(聚酰胺酸)复合薄膜.以均苯四甲酸二酐(PMDA)和4,4′-二氨基二苯醚(ODA)为原料制备出聚酰胺酸铺膜胶液,在电纺膜... 以3,3′,4,4′-二苯酮四甲酸二酐(BTDA)和4,4′-二氨基二苯醚(ODA)为缩聚单体,利用高压静电纺丝技术制备出纳米Al_2O_3/PAA(聚酰胺酸)复合薄膜.以均苯四甲酸二酐(PMDA)和4,4′-二氨基二苯醚(ODA)为原料制备出聚酰胺酸铺膜胶液,在电纺膜的两侧进行流延成膜,并热亚胺化处理.对复合薄膜进行化学组成、微观形貌、耐电晕性能、力学性能和热学性能测试分析.结果表明:复合薄膜的亚胺化较完全,纳米Al_2O_3均匀地分散在聚酰亚胺基体中,在纳米氧化铝掺杂量为6%时综合性能最佳,耐电晕老化时间为12.3 h,是未掺杂纳米氧化铝三层复合薄膜的3倍以上,拉伸强度达到最大值(174 MPa),同时断裂伸长率达到21%.纳米Al_2O_3的加入使得复合薄膜的热稳定性有所提高,起始热分解温度从578.7℃提高到591.3℃. 展开更多
关键词 聚酰亚胺 薄膜 纳米al2o3 静电纺丝 无纺布
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高温扩散工艺制备带隙可调的β-(Al_(x)Ga_(1-x))_(2)O_(3)薄膜
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作者 谭黎 张俊 +3 位作者 张敏 赵荣力 邓朝勇 崔瑞瑞 《人工晶体学报》 CAS 北大核心 2023年第2期281-288,共8页
β-(Al_(x)Ga_(1-x))_(2)O_(3)因其优异的抗击穿及带隙可调节性在现代功率器件及深紫外光电探测等领域展现出巨大的应用前景,然而传统直接生长工艺的复杂性和难度限制了其进一步的发展。因此,本文采用较为简单的高温扩散工艺在c面蓝宝... β-(Al_(x)Ga_(1-x))_(2)O_(3)因其优异的抗击穿及带隙可调节性在现代功率器件及深紫外光电探测等领域展现出巨大的应用前景,然而传统直接生长工艺的复杂性和难度限制了其进一步的发展。因此,本文采用较为简单的高温扩散工艺在c面蓝宝石衬底上成功制备了β-(Al_(x)Ga_(1-x))_(2)O_(3)纳米薄膜。利用X射线衍射、原子力显微镜、扫描电子显微镜和紫外-可见分光光度计对其进行了表征。由于高温下蓝宝石衬底中的Al原子向Ga_(2)O_(3)层扩散,β-Ga_(2)O_(3)薄膜将转变为Al、Ga原子比例不同的β-(Al_(x)Ga_(1-x))_(2)O_(3)薄膜。实验结果显示:当退火温度从1 010℃增加到1 250℃时,薄膜中Al的平均含量从0.033增加到0.371;当退火温度从950℃增加到1 250℃时,薄膜的厚度从186 nm增加到297 nm,粗糙度从2.31 nm增加到15.10 nm;当退火温度从950℃增加到1 190℃时,薄膜的带隙从4.79 eV增加至5.96 eV。结果表明高温扩散工艺能够有效调节β-(Al_(x)Ga_(1-x))_(2)O_(3)薄膜的光学带隙,为β-(Al_(x)Ga_(1-x))_(2)O_(3)基新型光电子器件提供了实验基础。 展开更多
关键词 β-(al_(x)Ga_(1-x))_(2)o_(3) Ga_(2)o_(3) al掺杂 半导体薄膜 高温扩散 可调带隙 磁控溅射
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微量SiO_2对PI/Al_2O_3复合薄膜性能的影响 被引量:3
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作者 李园园 刘立柱 +3 位作者 翁凌 石慧 金镇镐 王诚 《功能材料》 EI CAS CSCD 北大核心 2014年第13期13122-13125,13130,共5页
通过固定纳米氧化铝(Al2O3)的含量,改变纳米氧化硅(SiO2)的含量,制备一系列纳米SiO2含量不同的聚酰亚胺(PI)/Al2O3/SiO2复合薄膜。采用扫描电子显微镜(SEM)和红外光谱(FT-IR)对复合薄膜的微观形貌和分子结构进行表征,结果表明纳米颗粒... 通过固定纳米氧化铝(Al2O3)的含量,改变纳米氧化硅(SiO2)的含量,制备一系列纳米SiO2含量不同的聚酰亚胺(PI)/Al2O3/SiO2复合薄膜。采用扫描电子显微镜(SEM)和红外光谱(FT-IR)对复合薄膜的微观形貌和分子结构进行表征,结果表明纳米颗粒在PI基体中均匀分散,而且纳米颗粒的加入既不影响PI的分子结构又对聚酰胺酸的热亚胺化无影响。同时测试了薄膜的力学性能、击穿场强和耐电晕时间。结果表明,当纳米SiO2质量分数为0.5%时,复合薄膜的击穿场强和耐电晕时间分别为211.15 kV/mm、378 min,均优于纳米SiO2质量分数分别为0,0.1%,0.3%和0.7%的薄膜,并且其力学性能也较优异。 展开更多
关键词 聚酰亚胺 纳米al2o3 纳米SIo2 复合薄膜 耐电晕时间
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Investigation of Sprayed Lu2O3 Thin Films Using XPS
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作者 Towhid Adnan Chowdhury 《Advances in Materials Physics and Chemistry》 2023年第11期197-205,共9页
Spray pyrolysis method was used to deposit Lutetium Oxide (Lu<sub>2</sub>O<sub>3</sub>) thin films using lutetium (III) chloride as source material and water as oxidizer. Annealing was carried ... Spray pyrolysis method was used to deposit Lutetium Oxide (Lu<sub>2</sub>O<sub>3</sub>) thin films using lutetium (III) chloride as source material and water as oxidizer. Annealing was carried out in argon atmosphere at 450°C for 60 minutes of the films. To investigate the composition and stoichiometry of sprayed as-deposited and annealed Lu<sub>2</sub>O<sub>3</sub> thin films, depth profile studies using X-ray photoelectron spectroscopy (XPS) was done. Nearly stoichiometric was observed for both annealed and as-deposited films in inner and surface layers. 展开更多
关键词 Lu2o3 Depth Profiling X-Ray Photoelectron Spectroscopy Thin films
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XPS Depth Profile Study of Sprayed Ga2O3 Thin Films
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作者 Towhid Adnan Chowdhury 《Engineering(科研)》 2023年第8期459-466,共8页
Ga<sub>2</sub>O<sub>3</sub> thin films were fabricated by spray pyrolysis method using gallium acetylacetonate as source material and water as oxidizer. The films were annealed at 450°C fo... Ga<sub>2</sub>O<sub>3</sub> thin films were fabricated by spray pyrolysis method using gallium acetylacetonate as source material and water as oxidizer. The films were annealed at 450°C for 60 minutes in argon atmosphere. X-ray photoelectron spectroscopy (XPS) depth profile studies were carried out to analyze the stoichiometry and composition of sprayed as-deposited and annealed Ga<sub>2</sub>O<sub>3</sub> thin films. Surface layers and the inner layers of as-deposited and annealed films were found nearly stoichiometric. 展开更多
关键词 Ga2o3 Thin films x-Ray Photoelectron Spectroscopy Depth Profiling
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Chemical-looping gasification of biomass in a 10 kW_(th) interconnected fluidized bed reactor using Fe_2O_3/Al_2O_3 oxygen carrier 被引量:9
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作者 HUSEYIN Sozen WEI Guo-qiang +2 位作者 LI Hai-bin HE Fang HUANG Zhen 《燃料化学学报》 EI CAS CSCD 北大核心 2014年第8期922-931,共10页
Abstract:The aim of this research is to design and operate a 10 kW hot chemical-looping gasification(CLG)unit using Fe2O3/Al2O3as an oxygen carrier and saw dust as a fuel.The effect of the operation temperature on gas... Abstract:The aim of this research is to design and operate a 10 kW hot chemical-looping gasification(CLG)unit using Fe2O3/Al2O3as an oxygen carrier and saw dust as a fuel.The effect of the operation temperature on gas composition in the air reactor and the fuel reactor,and the carbon conversion of biomass to CO2and CO in the fuel reactor have been experimentally studied.A total60 h run has been obtained with the same batch of oxygen carrier of iron oxide supported with alumina.The results show that CO and H2concentrations are increased with increasing temperature in the fuel reactor.It is also found that with increasing fuel reactor temperature,both the amount of residual char in the fuel reactor and CO2concentration of the exit gas from the air reactor are degreased.Carbon conversion rate and gasification efficiency are increased by increasing temperature and H2production at 870℃reaches the highest rate.Scanning electron microscopy(SEM),X-ray diffraction(XRD)and BET-surface area tests have been used to characterize fresh and reacted oxygen carrier particles.The results display that the oxygen carrier activity is not declined and the specific surface area of the oxygen carrier particles is not decreased significantly. 展开更多
关键词 chemical-looping gasification hot model BIoMASS Fe2o3/al2o3 dual circulating fluidized bed
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Effect of Al_2O_3 Binder on the Precipitated Iron-Based Catalysts for Fischer-Tropsch Synthesis 被引量:6
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作者 Hai-Jun Wan Bao-Shan Wu +4 位作者 Xia An Ting-Zhen Li Zhi-Chao Tao Hong-Wei Xiang Yong-Wang Li 《Journal of Natural Gas Chemistry》 EI CAS CSCD 2007年第2期130-138,共9页
A series of iron-based Fischer-Tropsch synthesis (FTS) catalysts incorporated with Al2O3 binder were prepared by the combination of co-precipitation and spray drying technology. The catalyst samples were characteriz... A series of iron-based Fischer-Tropsch synthesis (FTS) catalysts incorporated with Al2O3 binder were prepared by the combination of co-precipitation and spray drying technology. The catalyst samples were characterized by using N2 physical adsorption, temperature-programmed reduction/desorption (TPR/TPD) and MSssbauer effect spectroscopy (MES) methods. The characterization results indicated that the BET surface area increases with increasing Al2O3 content and passes through a maximum at the Al2O3/Fe ratio of 10/100 (weight basis). After the point, it decreases with further increase in Al2O3 content. The incorporation of Al2O3 binder was found to weaken the surface basicity and suppress the reduction and carburization of iron-based catalysts probably due to the strong K-Al2O3 and Fe-Al2O3 interactions. Furthermore, the H2 adsorption ability of the catalysts is enhanced with increasing Al2O3 content. The FTS performances of the catalysts were tested in a slurry-phase continuously stirred tank reactor (CSTR) under the reaction conditions of 260 ℃, 1.5 MPa, 1000 h^-1 and molar ratio of H2/CO 0.67 for 200 h. The results showed that the addition of small amounts of Al2O3 affects the activity of iron-based catalysts to a little extent. However, with further increase of Al2O3 content, the FTS activity and water gas shift reaction (WGS) activity are decreased severely. The addition of appropriate Al2O3 do not affect the product selectivity, but the catalysts incorporated with large amounts of Al2O3 have higher selectivity for light hydrocarbons and lower selectivity for heavy hydrocarbons. 展开更多
关键词 Fischer-Tropsch synthesis iron-based catalyst al2o3 binder Fe-al2o3 interaction
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Effects of dopant content on optical and electrical properties of In_2O_3: W transparent conductive films 被引量:3
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作者 Zhang, Yuanpeng Li, Yuan +3 位作者 Li, Chunzhi Wang, Wenwen Zhang, Junying Wang, Rongming 《Rare Metals》 SCIE EI CAS CSCD 2012年第2期168-171,共4页
关键词 In 2 o 3 : W thin film doping content DC magnetron sputtering optical and electrical properties
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Synthesis of free-standing Ga_2O_3 films for flexible devices by water etching of Sr_3Al_2O_6 sacrificial layers 被引量:1
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作者 王霞 吴真平 +5 位作者 崔尉 支钰崧 李志鹏 李培刚 郭道友 唐为华 《Chinese Physics B》 SCIE EI CAS CSCD 2019年第1期166-170,共5页
Flexible electronic devices have attracted much attention due to their practical and commercial value. Integration of thin films with soft substrate is an effective way to fabricate flexible electronic devices. Ga_2O_... Flexible electronic devices have attracted much attention due to their practical and commercial value. Integration of thin films with soft substrate is an effective way to fabricate flexible electronic devices. Ga_2O_3 thin films deposited directly on soft substrates would be amorphous mostly. However, the thickness of the thin film obtained by mechanical exfoliation method is difficult to control and the edge of the film is fragile and easy to be damaged. In this work, we fabricated free-standing Ga_2O_3 thin films using the water-soluble perovskite Sr_3Al_2O_6 as a sacrificial buffer layer. The obtained Ga_2O_3 thin films were polycrystalline. The thickness and dimension of the films were controllable. A flexible Ga_2O_3solar-blind UV photodetector was fabricated by transferring the free-standing Ga_2O_3 film on a flexible polyethylene terephthalate substrate. The results displayed that the photoelectric performances of the flexible Ga_2O_3 photodetector were not sensitive to bending of the device. The free-standing Ga_2O_3 thin films synthesized through the method described here can be transferred to any substrates or integrated with other thin films to fabricate electronic devices. 展开更多
关键词 FREE-STANDING GA2o3 thin film CRYSTalLINE Sr3al2o6 FLEXIBLE PHoToDETECToR
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Growth of β-Ga_2O_3 Films on Sapphire by Hydride Vapor Phase Epitaxy 被引量:2
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作者 熊泽宁 修向前 +7 位作者 李悦文 华雪梅 谢自力 陈鹏 刘斌 韩平 张荣 郑有炓 《Chinese Physics Letters》 SCIE CAS CSCD 2018年第5期141-143,共3页
Two-inch Ga_2O_3 films with(ˉ201)-orientation are grown on c-sapphire at 850–1050°C by hydride vapor phase epitaxy. High-resolution x-ray diffraction shows that pure β-Ga_2O_3 with a smooth surface has a hig... Two-inch Ga_2O_3 films with(ˉ201)-orientation are grown on c-sapphire at 850–1050°C by hydride vapor phase epitaxy. High-resolution x-ray diffraction shows that pure β-Ga_2O_3 with a smooth surface has a higher crystal quality, and the Raman spectra reveal a very small residual strain in β-Ga_2O_3 grown by hydride vapor phase epitaxy compared with bulk single crystal. The optical transmittance is higher than 80% in the visible and near-UV regions, and the optical bandgap energy is calculated to be 4.9 e V. 展开更多
关键词 Growth of Ga2o3 films on Sapphire by Hydride Vapor Phase Epitaxy XRD
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Effect of Al_2O_3 Buffer Layers on the Properties of Sputtered VO_2 Thin Films 被引量:1
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作者 Dainan Zhang Tianlong Wen +2 位作者 Ying Xiong Donghong Qiu Qiye Wen 《Nano-Micro Letters》 SCIE EI CAS 2017年第3期52-59,共8页
VO_2 thin films were grown on silicon substrates using Al_2O_3 thin films as the buffer layers. Compared with direct deposition on silicon, VO_2 thin films deposited on Al_2O_3 buffer layers experience a significant i... VO_2 thin films were grown on silicon substrates using Al_2O_3 thin films as the buffer layers. Compared with direct deposition on silicon, VO_2 thin films deposited on Al_2O_3 buffer layers experience a significant improvement in their microstructures and physical properties. By optimizing the growth conditions, the resistance of VO_2 thin films can change by four orders of magnitude with a reduced thermal hysteresis of 4 °C at the phase transition temperature. The electrically driven phase transformation was measured in Pt/Si/Al_2O_3/VO_2/Au heterostructures. The introduction of a buffer layer reduces the leakage current and Joule heating during electrically driven phase transitions. The C–V measurement result indicates that the phase transformation of VO_2 thin films can be induced by an electrical field. 展开更多
关键词 al2o3 Buffer layers Atomic layer deposition Vo2 thin films HETERoSTRUCTURE
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EIS Characterization of Sealed Anodic Oxide Films on Titanium Alloy Ti-10V-2Fe-3Al 被引量:1
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作者 刘建华 WU Liang +3 位作者 YU Mei LI Songmei WU Guolong ZHANG You 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2016年第3期599-605,共7页
Anodic oxide films grown on titanium alloy Ti-10V-2Fe-3Al in the solution of sodium tartrate, then sealed in boiling deionised water and calcium acetate solution were observed by using field emission scanning electron... Anodic oxide films grown on titanium alloy Ti-10V-2Fe-3Al in the solution of sodium tartrate, then sealed in boiling deionised water and calcium acetate solution were observed by using field emission scanning electron microscopy (FE-SEM), and were chemically analysed by using energy dispersive spectroscopy (EDS). Corrosion behaviour was investigated in a 3.5% sodium chloride solution, using electrochemical impedance spectroscopy (EIS). The morphology of the anodic oxide films was dependent on the sealing processes. The surface sealed in calcium acetate solution presented a more homogeneous and smooth structure compared with that sealed in boiling deionised water. The corrosion resistance of the oxide films sealed in calcium acetate solution was better than that sealed in boiling deionised water. 展开更多
关键词 EIS anodic oxide films sealed calcium acetate TI-10V-2FE-3al
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