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Preparation and mechanical properties of NiCoCrAlY/NiCr laminates by electron beam physical vapor deposition
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作者 韩杰才 李垚 +3 位作者 赫晓东 孟松鹤 曾岗 陈宏平 《中国有色金属学会会刊:英文版》 CSCD 2005年第S3期53-56,共4页
Laminates with alternating layers of NiCoCrAlY and NiCr were fabricated by using electron beam physical vapor deposition (EB-PVD) method. The influence of the substrate temperature on morphology of the laminates was i... Laminates with alternating layers of NiCoCrAlY and NiCr were fabricated by using electron beam physical vapor deposition (EB-PVD) method. The influence of the substrate temperature on morphology of the laminates was investigated. The results show that in order to produce NiCoCrAlY/NiCr laminates with lower porosity, higher substrate temperature is required. The mechanical properties of the as-deposited samples and heat-treated samples were examined using tensile tests. The stress-strain curve of the as-deposited laminate shows a typical characteristic of multilayered materials and the fracture behavior is improved by annealing the samples at high temperatures. The tensile strength of the samples annealed at 760℃ is 658.4MPa, and the elongation reaches 6.2%. 展开更多
关键词 NiCoCrAlY/NiCr LAMINATE electron beam physical vapor deposition (EB-pvd) TENSILE test SUBSTRATE temperature
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Characteristic Length of Metallic Nanorods under Physical Vapor Deposition
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作者 Kai Jun Bo-Jun Wang Hai-Yuan Chen 《Journal of Electronic Science and Technology》 CAS CSCD 2020年第4期350-357,共8页
By using physical vapor deposition(PVD)to grow metallic nanorods,the characteristic length is controllable,which can be identified by two different growth modes:Mode I and Mode II.In Mode I,the growth of metallic nano... By using physical vapor deposition(PVD)to grow metallic nanorods,the characteristic length is controllable,which can be identified by two different growth modes:Mode I and Mode II.In Mode I,the growth of metallic nanorods is dominated by the monolayer surface steps.Whereas in Mode II,the growth mechanism is mainly determined by the multilayer surface steps.In this work,we focused on the analysis of the physical process of Mode I,in which the adatoms diffuse on the monolayer surface at beginning,then diffuse down to the next monolayer surface,and finally result in the metallic nanorods growth.Based on the physical process,both the variations of the characteristic length and the numerical solutions were theoretically proposed.In addition,the twodimensional(2 D)lattice kinetic Monte Carlo simulations were employed to verify the theoretical derivation of the metallic nanorods growth.Our results pay a new way for modifying the performance of metallic nanorods-based applications and devices. 展开更多
关键词 Characteristic length metallic nanorods Monte Carlo physical vapor deposition(pvd)
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Kinetic Monte Carlo simulation of physical vapor deposition of thin Cu film
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作者 WANG Jun CHEN Chang-qi ZHU Wu 《中国有色金属学会会刊:英文版》 CSCD 2004年第z1期463-467,共5页
A two-dimensional Kinetic Monte Carlo method has been developed for simulating the physical vapor deposition of thin Cu films on Cu substrate. An improved embedded atom method was used to calculate the interatomic pot... A two-dimensional Kinetic Monte Carlo method has been developed for simulating the physical vapor deposition of thin Cu films on Cu substrate. An improved embedded atom method was used to calculate the interatomic potential and determine the diffusion barrier energy and residence time. Parameters, including incident angle,deposition rate and substrate temperature, were investigated and discussed in order to find their influences on the thin film morphology. 展开更多
关键词 physical vapor deposition KINETIC MONTE Carlo METHOD embedded ATOM METHOD THIN film growth simulation morphology
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Preparation of Ti-Al alloy sheet by electron beam physical vapor deposition
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作者 马李 赫晓东 孙跃 《中国有色金属学会会刊:英文版》 CSCD 2007年第A01期477-481,共5页
Ti-Al thin sheet with dimension of 450 mm×450 mm×0.2 mm was prepared by electron beam physical vapor deposition(EB-PVD) technology. The surface and cross-section pattern of as-deposited sample were studied b... Ti-Al thin sheet with dimension of 450 mm×450 mm×0.2 mm was prepared by electron beam physical vapor deposition(EB-PVD) technology. The surface and cross-section pattern of as-deposited sample were studied by SEM and AFM,and then the composition and phase were analysed by XRD and EPMA. Finally,the effect on deposit by re-evaporation of Al was explored by calculating the ratio of re-evaporating capacity with depositing capacity of Al on the substrate. The results indicate that the evaporation process with Nb addition into the molten pool makes it earlier to reach the steady-state. The existing equiaxed crystal and columnar crystal along the cross-sectional may be caused by the transformation latent heat released during the transition course of atoms from gaseous state to solid state. The effect on deposit by re-evaporation of Al can be neglected because the re-evaporating capacity of Al is far below that of the depositing capacity. 展开更多
关键词 电子束 物理性能
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Fabrication, microstructure and properties of electron beam-physical vapor deposited TiAl sheet and TiAl/Nb laminated composites
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作者 韩杰才 章德铭 +2 位作者 陈贵清 孟松鹤 张幸红 《中国有色金属学会会刊:英文版》 CSCD 2006年第B02期449-452,共4页
The TiAl-based alloys sheet with 150 mm×100 mm×0.4 mm and the TiAl/Nb laminated composites with 150 mm×100 mm×0.2 mm were fabricated by using electron beam-physical vapor deposition(EB-PVD) method,... The TiAl-based alloys sheet with 150 mm×100 mm×0.4 mm and the TiAl/Nb laminated composites with 150 mm×100 mm×0.2 mm were fabricated by using electron beam-physical vapor deposition(EB-PVD) method, respectively. The microstructure and properties of the sheet were investigated by AFM, SEM and EDS. The results show that the TiAl based alloys sheet has a good surface quality, and its microstructure is columnar crystal. The component of the alloys indicates a regular and periodical gradient change which leads to the spontaneous delamination along the normal direction of substrate. In the TiAl/Nb laminated composites alternating overlaid by TiAl of 24 layers and Nb of 23 layers, the interface of each layer evenly distributed throughout the cross-section is transparent, and the interlayer spacing is about 8μm. The component of TiAl layers also changes regularly along the normal direction of substrate, but no delamination phenomenon is found. The TiAl/Nb laminated composites have better ductility than the TiAl-based alloys sheet. 展开更多
关键词 电子束汽相淀积 钛铝基合金板 TiAl/Nb层压复合材料 制备 性质 显微结构
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不同制备工艺参数对PS-PVD-8YSZ涂层微结构及性能的影响
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作者 何箐 由晓明 +3 位作者 邹晗 张雨生 姜在龙 张云杰 《中国表面工程》 EI CAS CSCD 北大核心 2024年第4期192-205,共14页
作为新型热障涂层工艺制备技术,等离子物理气相沉积(PS-PVD)射流具有高能高速等特性,涂层沉积时存在扰流作用导致涂层微结构及性能的显著影响。为了减少圆柱体工装扰流作用,掌握工艺参数对涂层微结构的基本影响规律,采用平面工装系统研... 作为新型热障涂层工艺制备技术,等离子物理气相沉积(PS-PVD)射流具有高能高速等特性,涂层沉积时存在扰流作用导致涂层微结构及性能的显著影响。为了减少圆柱体工装扰流作用,掌握工艺参数对涂层微结构的基本影响规律,采用平面工装系统研究不同PS-PVD工艺参数下,如喷涂电流、送粉量、喷枪摆动及样品旋转参数等对涂层微结构的影响规律。研究结果表明:送粉量和喷枪-样品相对运动参数对涂层微结构影响较大,可快速实现涂层微结构的调控;喷涂电流的变化通过柱状晶尺寸和冷凝纳米颗粒含量等方面影响涂层微结构,涂层显微硬度随喷涂电流增大而降低;喷涂沉积距离的影响较小,喷涂距离增大使沉积效率和柱状晶发散生长程度降低,冷凝纳米颗粒含量提高,同时涂层显微硬度呈现先降低后升高的趋势。JL-11NP粉末表现出宽幅工艺范围内准柱状结构的获得能力,进一步掌握低沉积电流工艺条件下基于气-固-液三相复合沉积的影响规律。开展了低电流工艺参数条件下PS-PVD涂层的微结构调控及沉积机制研究,研究成果可为兼顾隔热和寿命、抗冲蚀的涂层性能结构优化及调控奠定良好基础。 展开更多
关键词 8YSZ涂层 等离子物理气相沉积 工艺参数 微结构 显微硬度
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Deposition of tungsten-titanium carbides on surface of diamond by reactive PVD 被引量:5
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作者 胡国荣 杨建红 +3 位作者 刘业翔 杨凯华 汤凤林 金继红 《中国有色金属学会会刊:英文版》 EI CSCD 1999年第4期838-841,共4页
The coatings of W-Ti carbides on the surface of diamond was obtained by using physical vapor deposition (PVD), during which WO3 powders pre-treated with hydrofluoric acid were reduced by titanium hydride in vacuum at ... The coatings of W-Ti carbides on the surface of diamond was obtained by using physical vapor deposition (PVD), during which WO3 powders pre-treated with hydrofluoric acid were reduced by titanium hydride in vacuum at 850 ℃. The resistance of diamond to corrosion at high-temperature was investigated. The formation of W-Ti carbides on the surface of diamond was verified by X-ray diffraction analysis, the interface state between diamond and matrix in metaLbase diamond composite was observed by scanning electron microscope. The results showed that the carbide coating is easy to be formed at low deposition temperature on the surface of diamond, while the resistance of diamond to corrosion at highutemperature and the strength of bonding between diarnond and metal matrix are effectively improved. 展开更多
关键词 DIAMOND physical vapor deposition (pvd) TUNGSTEN carbides TUNGSTEN
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A perspective of microplasma oxidation (MPO) and vapor deposition coatings in surface engineering of aluminum alloys 被引量:1
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作者 AWAD Samir Hamid 《Journal of Chongqing University》 CAS 2004年第2期4-11,共8页
Over the past years, great achievements have been made in the development of coating technologies for surface improvement of aluminum alloys. Despite these achievements, the role in the market strongly depends on the ... Over the past years, great achievements have been made in the development of coating technologies for surface improvement of aluminum alloys. Despite these achievements, the role in the market strongly depends on the ability of surface coating technology under technical and economic considerations to meet the increased demands for heavy tribological applications of aluminum alloys. Microplasma oxidation (MPO) technology has recently been studied as a novel and effective means to provide thick and hard ceramic coating with improved properties such as excellent load-bearing and wear resistance properties on aluminum alloys. The present work covers the evaluation of the performances of current single and duplex coatings combining MPO, physical vapor deposition (PVD), and plasma assisted chemical vapor deposition (PACVD) coatings on aluminum alloys. It suggests that the MPO coating is a promising candidate for design engineers to apply aluminum alloys to heavy load-bearing applications. The prospective future for the research on MPO coatings is introduced as well. 展开更多
关键词 aluminum alloys microplasma oxidation (MPO) duplex coating physical vapor deposition (pvd) plasma assisted chemical vapor deposition (PACVD)
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不同阴极材料对PS-PVD等离子射流的影响
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作者 姜在龙 何箐 +1 位作者 张雨生 赵乾 《表面技术》 EI CAS CSCD 北大核心 2024年第19期223-231,共9页
目的探究热阴极材料对先进等离子物理气相沉积(PS-PVD)射流的影响。方法分别采用铈钨、钍钨和镧钨材料制备大功率等离子喷枪阴极,在相同工艺条件下制备涂层,采用光学发射光谱仪(OES)检测无送粉和送粉状态下的等离子射流光谱强度,分别评... 目的探究热阴极材料对先进等离子物理气相沉积(PS-PVD)射流的影响。方法分别采用铈钨、钍钨和镧钨材料制备大功率等离子喷枪阴极,在相同工艺条件下制备涂层,采用光学发射光谱仪(OES)检测无送粉和送粉状态下的等离子射流光谱强度,分别评价射流的能量场分布及稳定性,通过扫描电子显微镜对涂层微观形貌进行观察和分析。结果在无送粉状态下,使用镧钨阴极时射流中的ArⅠ和HeⅠ特征峰强度在400~1000 mm之间最高,在1000 mm后显著降低;使用钍钨阴极时,轴向中心ArⅠ特征峰强度逐渐升至1000 mm处,之后缓慢下降,HeⅠ特征峰强度的下降速度较快;使用铈钨阴极时,从600~1200 mm,ArⅠ特征峰强度衰减得最缓慢,HeⅠ特征峰的强度逐渐提高;射流光谱强度波动幅度从大到小的顺序为铈钨、钍钨、镧钨;在送粉状态下,在强度峰值区域,钍钨阴极激发射流中不同元素的光谱强度最高,镧钨和铈钨阴极激发射流光谱强度接近,在射流轴线上方均为铈钨阴极的射流光谱强度最高;在高浓度气相区内,钍钨阴极所制备涂层以高气相比例沉积为主,枝晶生长发达,铈钨和镧钨阴极制备涂层柱间出现了较多的球形冷凝颗粒。结论镧钨阴极产生的射流在轴向400~1000 mm范围内的能量强度最高,射流稳定性最好,但在1000 mm之后存在较大的轴向和径向(HeⅠ)能量衰减,其最优喷涂距离应大于等于1000 mm;钍钨阴极产生的射流在轴向400~1000 mm区域内的能量强度和稳定性低于镧钨阴极,但大于1000 mm射流能量强度衰减的速度较慢;铈钨阴极产生的射流在轴向600~1200 mm之间的能量强度衰减最小,且轴向和径向均表现出宽域的能量和气相分布特征,但射流稳定性不足。 展开更多
关键词 等离子物理气相沉积 大功率等离子喷枪 阴极材料 等离子射流 光学发射光谱仪
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不同等离子气比例对PS-PVD射流及涂层结构影响研究
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作者 张云杰 邹晗 +2 位作者 由晓明 何箐 赵乾 《热喷涂技术》 2024年第2期55-64,共10页
等离子物理气相沉积(PS-PVD)一般采用高氦气流量和高喷枪输入功率的工艺,获得具备优异性能的柱状/准柱状结构热障涂层。研究了低氦气流量和低喷枪输入功率条件下,沉积位置对应等离子射流中心的能量变化规律,及对涂层微结构的影响。结果... 等离子物理气相沉积(PS-PVD)一般采用高氦气流量和高喷枪输入功率的工艺,获得具备优异性能的柱状/准柱状结构热障涂层。研究了低氦气流量和低喷枪输入功率条件下,沉积位置对应等离子射流中心的能量变化规律,及对涂层微结构的影响。结果表明:采用适配工艺优化的氧化锆粉体材料,在90 L/min等离子气总流量条件下,Ar/He体积比从1∶2调整至2∶1,氦气流量降低,均能获得准柱状结构涂层。Ar/He体积比1∶1条件下射流能量最高,此时He对等离子射流收束作用减弱,制备涂层的柱状晶厚度降低、柱状晶间冷凝颗粒增多,涂层沉积效率明显降低;总气流量120 L/min,Ar/He体积比2∶1,可获得液相沉积为主的致密涂层结构。结合各元素特征峰的光谱分析结果,ZrⅠ特征峰强度在Ar/He体积比1∶1条件下最高,之后随着Ar/He体积比降低,He对等离子射流气相的约束及对等离子射流的能量场的综合影响决定了涂层微结构特性。 展开更多
关键词 等离子物理气相沉积 等离子射流特性 光学发射光谱 气体比例 微结构
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Influence of Deposition Temperature on the Electrical and Electrochemical Properties of Carbon-Based Coatings for Metallic Bipolar Plates, Prepared by Cathodic Arc Evaporation
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作者 Maximilian Steinhorst Maurizio Giorgio +1 位作者 Teja Roch Christoph Leyens 《Advances in Materials Physics and Chemistry》 2022年第4期47-57,共11页
Cathodic arc evaporation is a well-established physical vapor deposition technique which is characterized by a high degree of ionization and high deposition rate. So far, this technique has been mainly used for the de... Cathodic arc evaporation is a well-established physical vapor deposition technique which is characterized by a high degree of ionization and high deposition rate. So far, this technique has been mainly used for the deposition of tribological coatings. In this study, anti-corrosive and electrical conductive carbon-based coatings with a metallic interlayer were prepared on stainless steel substrates as surface modification for metallic bipolar plates. Hereby, the influence of the deposition temperature during the deposition of the carbon top layer was investigated. Raman spectroscopy revealed differences in the microstructure at 200°C compared to 300°C and 100°C. Measurements of the interfacial contact resistance showed that the deposited coatings significantly improve the electrical conductivity. There are only minor differences between the different carbon top layers. The corrosion resistance of the coatings was studied via potentiodynamic polarization at room temperature and 80°C. Experiments showed that the coating with a carbon top layer deposited at 200°C, considerably reduces the current density and thus corrosion of the substrate is suppressed. 展开更多
关键词 Bipolar Plate CORROSION Interfacial Contact Resistance Carbon Thin Film physical vapor deposition
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PS-PVD制备YSZ热障涂层的CMAS腐蚀行为研究 被引量:1
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作者 严刚 刘伟 +4 位作者 罗俊辉 谷凯凯 李聪 杨丽 周益春 《航空制造技术》 CSCD 北大核心 2023年第17期57-63,共7页
热障涂层(TBCs)广泛应用于先进航空发动机热端部件,有效延长了发动机热端部件的服役寿命,成为先进航空发动机必不可少的热防护材料。但在服役过程中一些大气沉积物CMAS加热后变为熔融体吸附在热障涂层表面,并沿着孔隙和裂纹等缺陷渗透... 热障涂层(TBCs)广泛应用于先进航空发动机热端部件,有效延长了发动机热端部件的服役寿命,成为先进航空发动机必不可少的热防护材料。但在服役过程中一些大气沉积物CMAS加热后变为熔融体吸附在热障涂层表面,并沿着孔隙和裂纹等缺陷渗透至涂层内部,诱导涂层过早失效。采用等离子-物理气相沉积技术(PS-PVD)制备YSZ热障涂层,利用XRD、SEM等表征手段,对不同腐蚀时间的涂层物相成分、微观结构进行了表征。研究结果表明,YSZ涂层在1250℃下经过CMAS腐蚀后发生了相变;随着腐蚀时间的增加,CMAS沉积物会沿着热障涂层类柱状晶间隙渗透至内部,导致涂层结构出现疏松,并且在陶瓷层上部区域出现了类柱状晶断裂现象,涂层宏观表现为部分陶瓷层剥落;腐蚀8 h后陶瓷层部分区域出现了类柱状晶从粘结层上整体剥离;CMAS渗透深度随腐蚀时间的增加不断加大,在腐蚀3 h内其渗透速度相对较快,腐蚀3 h以后其渗透速度会相对变得缓慢。 展开更多
关键词 等离子喷涂-物理气相沉积(PS-pvd) 热障涂层(TBCs) CMAS腐蚀 渗透速度 失效行为
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Electrochemical evaluation of zinc and magnesium alloy coatings deposited on electrogalvanized steel by PVD 被引量:3
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作者 Myeong-Hoon LEE Yeon-Won KIM +2 位作者 Kyung-M in LIM Seung-Hyo LEE Kyung-Man MOON 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2013年第3期876-880,共5页
Zinc alloy coating attracted much attention due to its high anti-corrosive properties.Particularly,zinc alloy coatings containing magnesium was considered a promising metallic alloy due to a remarkable improvement of ... Zinc alloy coating attracted much attention due to its high anti-corrosive properties.Particularly,zinc alloy coatings containing magnesium was considered a promising metallic alloy due to a remarkable improvement of corrosion resistance.The proper magnesium content for Zn-Mg alloy coatings was studied.The samples were prepared using thermal evaporation method.The influence of Zn-Mg alloy coating on corrosion resistance was evaluated using immersion test,potentiodynamic test,and galvanic test in 3% NaCl solution at room temperature.The results show that the corrosion resistance of Zn-Mg alloy coatings is strongly dependent on magnesium content.Corrosion potential decreases with increasing magnesium content,whereas current density increases up to 15% magnesium content,and passivity region was found only in Zn-Mg coatings. 展开更多
关键词 magnesium ZINC corrosion resistance physical vapor deposition coating ELECTROCHEMISTRY
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PS-PVD热障涂层柱状结构沉积调控及表面改性 被引量:1
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作者 姚梦晨 黄璐 +1 位作者 刘梅军 杨冠军 《材料工程》 EI CAS CSCD 北大核心 2023年第7期50-60,共11页
等离子-物理气相沉积(PS-PVD)具有涂层多结构调控的特性,为高隔热、长寿命热障涂层的制备提供可能,是实现未来高性能航空发动机发展的关键技术之一。PS-PVD柱状结构涂层独特的微观结构使其兼具高隔热和热循环寿命长的双重优势,在航空发... 等离子-物理气相沉积(PS-PVD)具有涂层多结构调控的特性,为高隔热、长寿命热障涂层的制备提供可能,是实现未来高性能航空发动机发展的关键技术之一。PS-PVD柱状结构涂层独特的微观结构使其兼具高隔热和热循环寿命长的双重优势,在航空发动机热障涂层领域有着广阔的应用前景。但PS-PVD柱状结构涂层工艺调控是在大量的实验基础上实现的,缺少相关的理论研究,而且高孔隙率的柱状结构涂层面临的CaO-MgO-Al 2O 3-SiO 2(CMAS)腐蚀失效问题仍然限制着涂层的使用。本文从涂层结构特征入手,阐述了沉积单元相态对涂层结构的影响规律,揭示了柱状结构涂层的气相沉积机理。在此基础上分析了涂层结构的工艺影响,并基于涂层材料在射流内的相态转变,从理论层面阐明了工艺参数调控的本质。此外,分析了PS-PVD柱状结构涂层CMAS腐蚀失效机理,阐述了表面镀铝改性对涂层抗CMAS腐蚀性能的影响机制,并对PS-PVD涂层结构调控和性能提升以及PS-PVD技术在环境障涂层和功能薄膜等领域的应用进行了展望。 展开更多
关键词 等离子-物理气相沉积(PS-pvd) 沉积机理 结构调控 表面改性 CMAS腐蚀
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团聚粉末粒度对PS-PVD制备GYbZ热障涂层的性能影响
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作者 杨朔 毛杰 +3 位作者 邓子谦 胡方 邓春明 邓畅光 《表面技术》 EI CAS CSCD 北大核心 2023年第2期395-403,共9页
目的探究不同粒度的微米级团聚粉末对等离子喷涂–物理气相沉(PS-PVD)制备GYbZ热障涂层性能的影响。方法以微米团聚的(Gd_(0.9)Yb_(0.1))_(2)Zr_(2)O_(7)(GYbZ)粉末为原料,通过PS-PVD工艺在镍基高温合金表面用3种不同粒径团聚粉末制备G... 目的探究不同粒度的微米级团聚粉末对等离子喷涂–物理气相沉(PS-PVD)制备GYbZ热障涂层性能的影响。方法以微米团聚的(Gd_(0.9)Yb_(0.1))_(2)Zr_(2)O_(7)(GYbZ)粉末为原料,通过PS-PVD工艺在镍基高温合金表面用3种不同粒径团聚粉末制备GYbZ热障涂层。采用扫描电子显微镜(SEM)和X射线衍射(XRD)分析GYbZ热障涂层的微观结构及相组成,采用电子万能试验机测试涂层的结合强度,采用自动水淬机对涂层的抗热震性能进行测试。结果随着团聚粉末粒度的减小,团聚粉末的球形度会变低,且粉末的孔隙率逐渐变大,团聚粉末粒度越小,喷涂的气化率越高,涂层中未熔粒子越少,涂层羽–柱状结构越明显。D50=13μm的团聚粉末在喷涂时,因粉末粒度过小,以及流动性较差,送粉过程中部分粉末未能顺利地通过喷嘴到达等离子焰流的中心,涂层的沉积率会略微降低。GYbZ团聚粉末衍射图呈现出Gd_(2)Zr_(2)O_(7)与Yb_(2)O_(3)这2种相的堆叠,而GYbZ涂层衍射图呈现单一的缺陷萤石结构。同时随着团聚粉末粒度的减小,制备出相应涂层的力学性能和抗热震性能有着明显的提高。结论采用D50=13μm的团聚粉末制备的涂层具有完整的羽毛–柱状结构,且拥有最高的结合强度及最好的抗热震性能。 展开更多
关键词 粉末粒径 等离子喷涂–物理气相沉积 GYbZ 热障涂层
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PS-PVD热障涂层显微结构对耐侵蚀性能的影响研究 被引量:1
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作者 谢诗骏 曾卓见 +3 位作者 刘敏 邓子谦 胡永俊 赵泓旭 《热喷涂技术》 2023年第4期93-100,共8页
采用等离子喷涂物理气相沉积(PS-PVD)技术开展了热障涂层梯度结构调控研究,通过调整喷涂送粉速率,在底部、中间和顶部沉积阶段制备了五种不同的热障涂层,对热障涂层的显微组织、粗糙度、孔隙率、耐熔盐腐蚀和耐粒子冲蚀性能进行表征,阐... 采用等离子喷涂物理气相沉积(PS-PVD)技术开展了热障涂层梯度结构调控研究,通过调整喷涂送粉速率,在底部、中间和顶部沉积阶段制备了五种不同的热障涂层,对热障涂层的显微组织、粗糙度、孔隙率、耐熔盐腐蚀和耐粒子冲蚀性能进行表征,阐明了显微结构变化对热障涂层耐侵蚀性能的影响。研究表明:送粉速率的变化对PS-PVD热障涂层羽柱状结构的沉积有显著的影响,低送粉速率下,涂层底部结构比较致密,当送粉速率增大时,由于粉末颗粒在喷涂过程气化不充分,未熔粒子增加,羽柱状顶部结构趋向致密结构转变,涂层顶部孔隙率下降,表面粗糙度降低。送粉速率由底至顶梯度递增制备的涂层表现出较高的耐熔盐腐蚀性能和耐粒子冲蚀性能。 展开更多
关键词 热障涂层 等离子喷涂-物理气相沉积 羽柱状结构 耐熔盐侵蚀 耐粒子冲蚀性能
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火工药剂微装药技术现状及后续发展思考
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作者 王燕兰 张方 +4 位作者 张松 韩瑞山 卢飞朋 李少群 王早 《火工品》 CAS CSCD 北大核心 2024年第4期55-61,共7页
相比传统火工品,MEMS火工品的结构、尺寸及制造工艺发生了颠覆性变化,对火工药剂提出了低能输入、高能输出、小尺寸装药、小尺寸传播及与MEMS工艺相兼容等新要求。为了适应MEMS火工品的发展,原位叠氮化反应装药技术、增材制造装药技术... 相比传统火工品,MEMS火工品的结构、尺寸及制造工艺发生了颠覆性变化,对火工药剂提出了低能输入、高能输出、小尺寸装药、小尺寸传播及与MEMS工艺相兼容等新要求。为了适应MEMS火工品的发展,原位叠氮化反应装药技术、增材制造装药技术、物理气相沉积薄膜装药技术等微装药技术受到广泛关注和研究。本文介绍了适合于MEMS火工品的几种微装药技术的国内外研究现状,并提出了后续发展思路。 展开更多
关键词 微装药 原位叠氮化反应 增材制造 物理气相沉积
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Achieving highly uniform two-dimensional PbI2 flakes for photodetectors via space confined physical vapor deposition 被引量:11
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作者 Yaguang Wang Lin Gan +2 位作者 Junnian Chen Rui Yang Tianyou Zhai 《Science Bulletin》 SCIE EI CAS CSCD 2017年第24期1654-1662,共9页
Two-dimensional(2D) PbI_2 flakes have been attracting intensive attention as one potential candidate for the modern optoelectronics. However, suffered from the instability of kinetics-driven growth, the fabricated 2D ... Two-dimensional(2D) PbI_2 flakes have been attracting intensive attention as one potential candidate for the modern optoelectronics. However, suffered from the instability of kinetics-driven growth, the fabricated 2D PbI_2 flakes have a wide dimensional distribution even under the same conditions. Herein, a novel facile space confined physical vapor deposition(PVD) process is provided to synthesize uniform triangle PbI_2 flakes with high quality. The confined space provides a relatively stable growth environment that renders more control on the growth kinetics, leading to highly uniform triangle PbI_2 flakes with the average size of 5 mm and thickness of 17 nm. Moreover, as-fabricated PbI_2-based photodetectors show promising stable and flexible optoelectronic performances to 470 nm light, including high responsivity(0.72 AW^(-1)), large on/off ratio up to 900, fast photoresponse speed(rise time of 13.5 ms and decay time of 20 ms) and high detectivity(1.04×10^(10) Jones). The well-controllable growth of the uniform triangle PbI_2 flakes and the detailed exploration of their optoelectronic properties are particularly valuable for their further practical applications. 展开更多
关键词 Two-dimensional material PbI2 Space confined physical vapor deposition HOMOGENEITY Photodetector
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Plasma spray-physical vapor deposition toward advanced thermal barrier coatings:a review 被引量:11
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作者 Mei-Jun Liu Gao Zhang +5 位作者 Yan-Hong Lu Jia-Qi Han Guang-Rong Li Cheng-Xin Li Chang-Jiu Li Guan-Jun Yang 《Rare Metals》 SCIE EI CAS CSCD 2020年第5期479-497,共19页
Plasma spray–physical vapor deposition(PS–PVD)is a unique technology that enables highly tailorable functional films and coatings with various rare metal elements to be processed.This technology bridges the gap betw... Plasma spray–physical vapor deposition(PS–PVD)is a unique technology that enables highly tailorable functional films and coatings with various rare metal elements to be processed.This technology bridges the gap between conventional thermal spray and vapor deposition and provides a variety of coating microstructures composed of vapor,liquid,and solid deposition units.The PS–PVD technique serves a broad range of applications in the fields of thermal barrier coatings(TBCs),environmental barrier coatings(EBCs),oxygen permeable films,and electrode films.It also represents the development direction of high-performance TBC/EBC preparation technologies.With the PS–PVD technique,the composition of the deposition unit determines the microstructure of the coating and its performance.When coating materials are injected into a nozzle and transported into the plasma jet,the deposition unit generated by a coating material is affected by the plasma jet characteristics.However,there is no direct in situ measurement method of material transfer and deposition processes in the PS–PVD plasma jet,because of the extreme conditions of PS–PVD such as a low operating pressure of*100 Pa,temperatures of thousands of degrees,and a thin and high-velocity jet.Despite the difficulties,the transport and transformation behaviors of the deposition units were also researched by optical emission spectroscopy,observation of the coating microstructure and other methods.This paper reviews the progress of PS–PVD technologies considering the preparation of advanced thermal barrier coatings from the perspective of the transport and transformation behaviors of the deposition units.The development prospects of new high-performance TBCs using the PS–PVD technique are also discussed. 展开更多
关键词 Plasma spray–physical vapor deposition (PSpvd) deposition unit Cross-domain behavior deposition mechanism Thermal barrier coatings (TBCs)
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Thickness and component distributions of yttrium-titanium alloy films in electron-beam physical vapor deposition 被引量:3
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作者 LI ShuaiHui SHU YongHua FAN Jing 《Science China(Technological Sciences)》 SCIE EI CAS 2008年第9期1470-1482,共13页
Thickness and component distributions of large-area thin films are an issue of in-ternational concern in the field of material processing. The present work employs experiments and direct simulation Monte Carlo (DSMC) ... Thickness and component distributions of large-area thin films are an issue of in-ternational concern in the field of material processing. The present work employs experiments and direct simulation Monte Carlo (DSMC) method to investigate three-dimensional low-density, non-equilibrium jets of yttrium and titanium vapor atoms in an electron-beams physical vapor deposition (EBPVD) system furnished with two or three electron-beams, and obtains their deposition thickness and component distributions onto 4-inch and 6-inch mono-crystal silicon wafers. The DSMC results are found in excellent agreement with our measurements, such as evaporation rates of yttrium and titanium measured in-situ by quartz crystal reso-nators, deposited film thickness distribution measured by Rutherford backscat-tering spectrometer (RBS) and surface profilometer and deposited film molar ratio distribution measured by RBS and inductively coupled plasma atomic emission spectrometer (ICP-AES). This can be taken as an indication that a combination of DSMC method with elaborate measurements may be satisfactory for predicting and designing accurately the transport process of EBPVD at the atomic level. 展开更多
关键词 electron beam physical vapor deposition thin film thickness and species DISTRIBUTIONS vapor ATOM NON-EQUILIBRIUM transport
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