Particle layers tend to build up on wails in many filtration and separation processes, calling for periodic removal in order to keep the apparatus running. Important factors are the adhesion of the layer on the substr...Particle layers tend to build up on wails in many filtration and separation processes, calling for periodic removal in order to keep the apparatus running. Important factors are the adhesion of the layer on the substrate and the cohesion of the particles in the layer. Models describing such layer detachment generally assume constant and homogeneous conditions for the forces acting on the layer. But in reality detachment is extremely non-stationary concerning place and time, primarily due to changing conditions of the detaching forces on the one hand and changes in the particle layer morphology on the other. This paper describes a model and a simulation based on this model considering such transient kinetic effects, for which some computing results are presented and discussed.展开更多
基金support by the German Science Foundation (DFG)in the project SCHM 810/27 is acknowledged
文摘Particle layers tend to build up on wails in many filtration and separation processes, calling for periodic removal in order to keep the apparatus running. Important factors are the adhesion of the layer on the substrate and the cohesion of the particles in the layer. Models describing such layer detachment generally assume constant and homogeneous conditions for the forces acting on the layer. But in reality detachment is extremely non-stationary concerning place and time, primarily due to changing conditions of the detaching forces on the one hand and changes in the particle layer morphology on the other. This paper describes a model and a simulation based on this model considering such transient kinetic effects, for which some computing results are presented and discussed.
