MICROWAVE PERMEABILITY SPECTRA OF SPUTTERED Fe-Co-B SOFT MAGNETIC THIN FILMS

Permeability characteristics of sputtered soft magnetic Fe40Co40B20 thin films are investigated in the range of O. 5 to 5 GHz by a shortened microstrip transmission line perturbation method. Excellent microwave permeability is achieved at 0.4 Pa argon pressure： fr is 3.32 GHz, the real and imaginary part of permeability at 0.5 GHz are 104 and 61, respectively. In addition, the thickness effect on permeability is also studied. The minimum damping can be achieved at the thinnest film. Different sources contributed to in-plane anisotropy are discussed briefly. The deviation between the peak frequency of the imaginary part and the zero-crossing frequency of the real part of permeability is also presented.

Deposition and Magnetic Properties of Fe_3O_4/Fe/Fe_3O_4 Tri-layer Films

The Fe_3O_4/Fe/Fe_3O_4 (MIM) tri-layer films (200 nm/12-93 nm/200 um) were prepared on Si(100) by DC-magnetron reactive-sputtering followed by air- or vacuum-annealing at 280-400℃ for 1.5 h, respectively. Magnetic properties and phases under different sandwich and annealing conditions were studied. In MIM structure, the incorporation of the interlayer iron does increase the magnetization measured under 8 kOe (M_8K), but reduce coercivity (H_c). The H_c of asdeposited films decreases from 354 Oe to 74 Oe; while M_8K increases from 254 to 392 emu/cc. By annealing in air, the whole MIM tri-layer film becomes γ-F_e2O_3, H_c is about 550 O_e and M_8K is around 250 emu/cc. The coercivity mechanism of as-deposited and annealed MIM trilayer films belongs to domain-wall pinning type. δM plots show that when the interlayer Fe thickness is 12 um, the Fe and Fe_3O_4 layers are decoupled in the as-deposited and annealed states; while it is coupled in the as deposited state when the Fe thickness increases to 23 um. Vacuum annealing of the MIM films leads to increase in both coercivity and magnetization, and to enhance the exchange coupling between layers.

Magnetic properties and structure of Ni_80Fe_20/Ni_48Fe_12Cr_40 bilayer films deposited on SiO_2/Si(100) by electron beam evaporation

Ni80Fe20/Ni48Fe12Cr40 bilayer films and Ni80Fe20 monolayer films were deposited at room temperature on SiO2/Si（100） substrates by electron beam evaporation. The influence of the thickness of the Ni48Fe12Cr40 underlayer on the structure, magnetization, and magnetoresistance of the Ni80Fe20/Ni48Fe12Cr40 bilayer film was investigated. The thickness of the Ni48Fe12Cr40 layer varied from about 1 nm to 18 nm while the Ni80Fe20 layer thickness was fixed at 45 nm. For the as-deposited bilayer films the introducing of the Ni48Fe12Cr40 underlayer promotes both the （111） texture and grain growth in the Ni80Fe20 layer. The Ni48Fe12Cr40 underlayer has no significant influence on the magnetic moment of the Ni80Fe20/Ni48Fe12Cr40 bilayer film. However, the coercivity of the bilayer film changes with the thickness of the Ni48Fe12Cr40 undedayer. The optimum thickness of the Ni48Fe12Cr40 underlayer for improving the anisotropic magnetoresistance effect of the Ni80Fe20/Ni48Fe12Cr40 bilayer film is about 5 nm. With a decrease in temperature from 300 K to 81 K, the anisotropic magnetoresistance ratio of the Ni80Fe20 （45 nm）/Ni48Fe12Cr40 （5 nm） bilayer film increases linearly from 2.1% to 4.8% compared with that of the Ni80Fe20 monolayer film from 1.7% to 4.0%.

Optical and Magnetic Properties of Fe_2O_3/SiO_2 Nano-composite Films

Fe2O3/SiO2 nano-composite films were prepared by sol-gel technique combining heat treatment in the range of 100-900 ℃. The particle size was observed by FE-SEM. Optical properties of the films were investigated by UV-visible spectra. Structural and magnetic characteristics were investigated through FT-IR and VSM. The transparency of the Fe2O3/SiO2 nano-composite films decreased with the content of the Fe2O3. Water and organic solvent in the films were evaporated with heat treatment, so the transparency of the films was enhanced under high temperature. It is also found that the saturation magnetization （Ms） of the films increases with the temperature. As the content of the Fe2O3 increases, when the content of the Fe2O3 is around 30wt%, the Ms of the films has a maximum value.

EFFECTS OF TREATMENT TEMPERATURE ON THE MICROSTRUCTURE AND MAGNETIC PROPERTIES OF Fe-N THIN FILMS

Fe-N thin films were fabricated on both 100Si and NaCl substrates by RF magnetron sputtering under low nitrogen partial pressure. The microstructure and magnetic properties of Fe-N thin films were investigated with the increase of the substrate temperature （Ts） and the annealing temperature （Ta）. It is more difficult for nitrogen atoms to enter the Fe lattice under higher Ts above 150℃. The phase evolution is visible at higher Ta above 200℃. The phase transformation of α＇＇-Fe16N2 occurred at 400℃. The change of crystal size with Ta was clearly visible from bright and dark field images. The clear high-resolution electron microscope （HREM） images of 110α, 111γ＇, 112α＇＇, and 200α＇＇ phases were observed. The interplanar distances from TEM （transmission electron microscope） and HREM match the calculated values very well. From the results of the vibrating sample magnetometer （VSM）, the good magnetic properties of Fe-N films were obtained at 150℃ of Ts and 200℃ of Ta, respectively.

Effect of Post Annealing on the Microstructure and Magnetic Properties of NdFeB/α-Fe/NdFeB Thin Films

A series of nanocomposite thin films, composed of Nd2Fe14B and α-Fe, has been prepared by DC-magnetron sputtering combined ion beam sputtering onto Si (100) substrates. The effects of post annealing on the microstructure and magnetic properties of [NdFeB/α-Fe/NdFeB]-type thin films have been investigated. The X-ray diffraction (XRD) study showed that annealing of the films for 30 min at temperatures 550, 600, 650, 700 ℃ resulted in the appearance of diffraction peaks, characteristic for Nd2Fe14B tetragonal structure, α-Fe and Nd2O3 phases. The investigation using the Vibrating Sample Magnetometer (VSM) with a maximum applied field of 2 T indicated that with the increase of the annealing temperature, the magnetic properties of the multilayer films were improved and reached peak value at 650 ℃ (Hci=41.72 kA·m-1, Mr/Ms=0.4, (BH)max=30.35 kJ·m-3), after which the magnetic properties were decreased greatly. Along with the increase of the thickness of α-Fe layer from Tα-Fe>16 nm, the coercivity Hci, saturation magnetization Ms, and remanence ratio Mr/Ms all declined. As the Atomic Force Microscope (AFM) indicated, after being annealed at 650 ℃ for 30 min, the sample was showed fine surface morphology with grain size 60 nm≤dα-Fe≤80 nm and 100 nm≤dNdFeB≤150 nm.

Influence of modulated structure on magnetic properties of NdFeB/Co multilayer thin films

The Nd Fe B/Co multilayer films were prepared by magnetron sputtering. After that, the samples were annealed at 600 ℃ for 20 min. The surface morphology, phase structures and magnetic properties of Mo（50 nm）/[Nd Fe B（100 nm）/Co（y）]×10/Mo（50 nm） thin films were researched by AFM, XRD and VSM, respectively. The results show that the films show stronger perpendicular magnetic anisotropy. When the thickness of Co layers is 10 nm, the coercivity Hc⊥ is the maximum, 295 k A/m. However, for y=10-20, the reduced remanence M/Ms of films has increased. When the thickness of Co layers is 20-30 nm, the Nd Fe B/Co multilayer films obtained more superior magnetic properties with M/Ms =0.95.

Structure and Magnetic Properties of the γ’-Fe4N Films on Cu Underlayers

The γ＇-Fe4N films on Cu underlayers are deposited on the glass and Si substrates by dc magnetron reactive sputtering. The effects of Cu underlayer on the structure, morphology and magnetic properties of the γ＇-Fe4N films are studied. The single-phase γ＇-Fe4N films with Cu underlayers on the glass substrate are obtained, while the mixture of Fe and γ＇-Fe4N is observed on the Si substrate. In comparison with the films without Cu underlayers, the grains of the films with Cu underlayers exhibit a non-uniform size distribution and give rise to a rougher surface. The magnetic measurements indicate that the γ＇-Fe4N films show a good soft ferromagnetic behavior. The enhanced coercivity in the films with Cu underlayers is observed due to the deterioration of the crystallographic structure as well as the rougher surface.

Magnetic Properties of NiCuZn Ferrite Thin Films Prepared by the Sol-gel Method

Ni0.4Cu0.2Zn0.4Fe2O4 thin films were fabricated on Si substrates by using the sol-gel method and rapid thermal annealing （RTA）, and their magnetic properties and crystalline structures were investigated. The samples calcined at and above 600 ℃ have a single-phase spinel structure and the average grain size of the sample calcined at 600 ℃ is about 20 nm. The initial permeability μi, saturation magnetization M and coercivity H of the samples increase with the increasing calcination temperature. The sample calcined at 600 ℃ exhibits an excellent soft magnetic performance, which has μi=33.97 （10 MHz）, Hc=15.62 Oe and Ms=228.877 emu/cm^3. Low-temperature annealing can enhance the magnetic properties of the samples. The work shows that using the sol-gel method in conjunction with RTA is a promising way to fabricate integrated thin-film devices.

Structure and magnetic properties of columnar Fe-N thin films deposited by direct current magnetron sputtering

Columnar Fe-N thin films with thickness ranging from 30 to 150 nm were deposited by direct current magnetron sputtering using an Ar/N2 gas mixture(V(N2)/V(N2+Ar)=5%) on corning glass substrates. The structure,surface morphology and magnetic properties were investigated using X-ray diffractometry(XRD),scanning electron microscopy,atomic force microscopy,transmission electron microscopy(TEM) and superconducting quantum interference magnetometry. XRD investigation shows that Fe-N films exhibit amorphous-like structures; however,TEM measurements indicate the synthesis of mixture phases of α-Fe+ζ-Fe2N+ε-Fe3N in these films. The magnetic anisotropy and coercivity of Fe-N thin films exhibit strong dependence on the film growth behavior and surface morphology. With increasing the height of Fe-N films with column structures,the coercivity increases from 7.96 kA/m to 22.28 kA/m in the direction parallel to the film surface. In perpendicular direction the coercivity only increases slightly from 39.79 kA/m to 43.77 kA/m. However,the values of anisotropy field increase from 0.79×106 to 1.44×106 A/m,which is mainly attributed to the shape anisotropy of elongated columns due to the fact that the difference of magneto-crystalline anisotropy among these Fe-N films is small. The saturation magnetizations of Fe-N films vary with increasing film thickness from 23.5 to 85.1 A·m2/kg.

Structure and Magnetic Properties of Fe-N Films Prepared by Dual Ion Beam Sputtering

Fe-N films were prepared on Si substrate by dual ion beam sputtering (DIBS). It is found that the crystal structure of the films varies from α-Fe, to ε-Fe2-3N, ε-Fe2-3N +γ-Fe4N, and finally γ'-Fe4N with the increase in substrate temperature (TS). The magnetic properties of the films were investigated by a vibrating sample magnetometer (VSM). The structure of the films is insensitive to the ratios of N2/Ar in main ion source(MIS), and is mainly influenced by the substrate temperature (Ts).

PREPARATION OF NANO-CRYSTALLINE Fe-Cu THIN FILMS AND THEIR MAGNETIC PROPERTIES

Fe-Cu thin films of 0.2 mum in thickness with different Cu contents wereprepared by using r.f. magnetron sputtering onto glass substrate. The effect of sputteringparameters, including Ar gas pressure and input rf power, on the structure and magnetic propertieswas investigated. It was found that when the power is lower than 70W, the structure of the filmsremained single bcc-Fe phase with Cu solubility of up to 50at. percent. TEM observations for thebcc-Fe phase showed that the grain size was in the nanometer range of less than 20nm. The coercivityof Fe- Cu films was largely affected by not only Ar gas pressure but also rf power, and reachedabout 2.5Oe in the pressure of 0.67-6.67Pa and in the power of less than 100W. In addition,saturation magnetization, with Cu content less than 60at. percent, was about proportional to thecontent of bcc-Fe. When Cu content was at 60at. percent, however, saturation magnetization was muchsmaller than its calculation value.

Reduction of Coercivity of Fe-N Soft Magnetic Film by Heat Treatment

200 nm thick Fe-N magnetic thin films were deposited on glass substrates by RF sputtering. The as-deposited films have high saturation magnetization but their coercivity is also higher than what is needed Therefore it is very important to reduce coercivity. The samples were vacuum annealed at 250℃ under 12000 A/m magnetic field. When the N content was in the range of 5-7 at. pct, the thin films consisted of α' +α' after heat treatment and had excellent soft magnetic properties of 4πMs=2.4 T, HC <80 A/m. However, the thickness of a recording head was 2μm, and Hc increased as thickness increased. In order to reduce the Hc, the sputtering power was raised from 200 W to 1000 W to reduce the grain size. 2μm Fe-N thin films were vacuum annealed under the same condition, when the N content was in the range of 5.9-8.5 at. pct, the thin films kept its excellent magnetic properties of 4πMs=2.2 T, HC <80 A/m. The properties of the films meet the need of a recording head material used in the dual-element GMR/inductive heads.

Effect of magnetic field on segregation behavior of α-Fe particles in Cu-Fe thin film prepared by magnetron sputtering

The segregation behavior of α-Fe particles in Cu-Fe film prepared by magnetron sputtering was studied by X-ray scattering and X-ray diffraction. The results show that the roughness of the film surface increases with the sputtering time increasing. The as-sputtered films are super saturation solid solution of Cu-Fe. After annealing at 500℃, α-Fe particle can be segregated from the Cu matrix. The orientations α-Fe particles in the annealed film without magnetic field are random. But the clear texture of α-Fe particles in the annealed film with magnetic field is formed, and the 〈001〉 direction of α-Fe particles tends to be parallel to the magnetic field direction.

Tunable in-plane spin orientation in Fe/Si(557) film by step-induced competing magnetic anisotropies

the spin-reorientation transition from out-of-plane to in-plane in Fe/Si film is widely reported, the tuning of in-plane spin orientation is not yet well developed. Here, we report the thickness-, temperature- and Cu-adsorptioninduced in-plane spin-reorientation transition processes in Fe/Si （557） film, which can be attributed to the coexistence of two competing step-induced uniaxial magnetic anisotropies, i.e., surface magnetic anisotropy with magnetization easy axis perpendicular to the step and volume magnetic anisotropy with magnetization easy axis parallel to the step. For Fe film thickness smaller than 32 monolayer （ML）, the magnitudes of two effects under various temperatures are extracted from the thickness dependence of uniaxial magnetic anisotropy. For Fe film thickness larger than 32 ML, the deviation of experimental results from fitting results is understood by the strain-relief-induced reduction of volume magnetic anisotropy. Additionally, the surface and volume magnetic anisotropies are both greatly reduced after covering Cu capping layer on Fe/Si （557） film while no significant influence of NaC1 capping layer on step-induced magnetic anisotropies is observed. The experimental results reported here provide various practical methods for manipulating in-plane spin orientation of Fe/Si films and improve the understanding of step-induced magnetic anisotropies.

Synthesis and Characterization of Air-Stable Elemental Fe Thin Films by Chemical Vapor Deposition of Fe₃(CO)₁₂

New magnetic air-stable nanogranular Fe thin films of 10 ± 1.2 nm thickness were prepared onto silicon wafers at 150℃ under inert atmosphere by controlled Chemical Vapor Deposition (CVD) of triiron dodecacarbonyl (Fe3(CO)12). These thin films, composed of sintered elemental Fe nanoparticles of 4.1 ± 0.7 nm diameter, are protected from air oxidation by a very thin carbon layer. The saturation magnetization of these thin Fe coatings was found to be close to that of bulk iron. The electrical resistivity behavior of the ferromagnetic thin films is similar to that of a semiconductor. In the present manuscript, these Fe thin coatings on Si wafers have been used as a catalyst for synthesizing crystalline carbon nanotubes (CNTs), by CVD using ethylene as a carbon precursor.

316L不锈钢血管内支架表面Fe/Pd磁性膜的制备与生物学效应(英文)

以医用316L不锈钢血管支架为基体,采用电弧离子镀技术在其表面制备Fe/Pd磁性薄膜。通过激光扫描共焦显微镜、数字磁通磁场测量仪分析薄膜的表面形貌、表面粗糙度及表面磁性膜支架的磁性能,并通过动物体内实验研究Fe/Pd磁性膜支架的生物学效应。结果表明:Fe/Pd磁性膜支架表面光滑,并具有良好的生物学效应,显著地促进了血管内皮再生,同时有效地抑制了血管内膜过度增生和血管壁的炎症反应。

医用316L不锈钢支架表面沉积(Fe/Pd)_n薄膜的研究

采用真空电弧离子镀技术,在医用316L不锈钢支架上沉积近等原子比的(Fe/Pd)n多层膜。用X射线衍射、扫描电镜、电子能谱研究(Fe/Pd)n多层膜的晶体结构、形貌和成分,分析相的转变。用CTCC-1数字磁通磁场测量仪测量样品的磁性。结果表明:医用316L不锈钢支架表面磁性膜的最佳结构为"Pd/Fe/Pd",经扩散热处理后,(Fe/Pd)n薄膜从fcc结构转变为fct结构,薄膜均匀、致密、结合强度良好,有效磁场强度可达5×10-4T以上,有效磁性可维持6个月。

钛表面沉积Fe-Pd磁性薄膜的研究

采用电弧离子镀设备,以高纯Fe靶和Pd靶为原料,在TA1工业纯钛表面先后沉积Fe,Pd2层单金属薄膜。对样品分别进行700℃~1100℃,保温0.5h^3h的真空退火处理,使Fe膜和Pd膜之间形成扩散层,制备FePd磁性膜。重点研究了Fe,Pd及钛衬底之间的互扩散机制,膜层结构,薄膜的相组成。结果表明:在700℃,0.5h处理后FePd薄膜的合金化较好;在900℃,1h处理后虽有FePd相形成,但基体中的Ti已经扩散至表面;温度高于900℃且保温时间长于1h处理,不利于FePd膜的形成。

316L不锈钢表面沉积Pd／Fe磁性薄膜的研究

采用真空电弧离子镀技术在316L不锈钢表面沉积Pd／Fe薄膜，通过XRD衍射、SEM电镜及EDS分析了薄膜的组织结构、磁性能及电化学行为。结果显示：沉积态Pd／Fe薄膜经过500℃×15min真空扩散热处理后，薄膜由无序的fcc结构相转变成具有铁磁性的L10型fct结构的有序Pd／Fe舍金相，表面光滑均匀且致密，结合强度高，充磁后表面剩磁值达到12Gs，并且提高了材料的耐腐蚀性能。