The wolverine, Gulogulo, is an endangered species in China. This is the first report of the overall status of wolverines in China. The geographic distribution and population sizes of wolverines in the Greater Khingan ...The wolverine, Gulogulo, is an endangered species in China. This is the first report of the overall status of wolverines in China. The geographic distribution and population sizes of wolverines in the Greater Khingan and Altai Mountains were surveyed by line transect from1996–2000 and in 2011, respectively. We identified two geographically distinct groups in the Great Khingan Mountains, with a total population size of about 200 individuals throughout the region（approximately80,000 km^2）. Wolverines were also confirmed to be present in the Altai Mountains, where about 100 individuals occupied approximately 28,000 km^2 of mountain forest and tundra. Prey depletion and habitat loss, which are correlated with increasing human activities, are the main reasons for wolverine population declines in China.展开更多
A new industrial method has been developed to produce polydisperse spherical colloidal silica particles with a very broad particle size,ranging from 20-95 nm.The process uses a reactor in which the original seed solut...A new industrial method has been developed to produce polydisperse spherical colloidal silica particles with a very broad particle size,ranging from 20-95 nm.The process uses a reactor in which the original seed solution is heated to 100 ℃,and then active silicic acid and the seed solution are titrated to the reactor continuously with a constant rate.The original seeds and the titrated seeds in the reactor will go through different particle growth cycles to form different particle sizes.Both the particles＇ size distribution and morphology have been characterized by dynamic light scattering（DLS）and the focus ion beam（FIB） system.In addition,the as-prepared polydisperse colloidal silica particle in the application of sapphire wafer＇s chemical mechanical polishing（CMP） process has been tested.The material removal rate（MRR） of this kind of abrasive has been tested and verified to be much faster than traditional monodisperse silica particles.Finally,the mechanism of sapphire CMP process by this kind of polydisperse silica particles has been investigated to explore the reasons for the high polishing rate.展开更多
基金supported by the Rare and Endangered Species Investigation and Monitoring Project of the State Forestry Administration(41309408)the Heilongjiang Academy of Sciences Fund
文摘The wolverine, Gulogulo, is an endangered species in China. This is the first report of the overall status of wolverines in China. The geographic distribution and population sizes of wolverines in the Greater Khingan and Altai Mountains were surveyed by line transect from1996–2000 and in 2011, respectively. We identified two geographically distinct groups in the Great Khingan Mountains, with a total population size of about 200 individuals throughout the region（approximately80,000 km^2）. Wolverines were also confirmed to be present in the Altai Mountains, where about 100 individuals occupied approximately 28,000 km^2 of mountain forest and tundra. Prey depletion and habitat loss, which are correlated with increasing human activities, are the main reasons for wolverine population declines in China.
基金Project supported by the National Major Scientific and Technological Special Project during the Twelfth Five-year Plan Period of China(Grant No.2009ZX02030-1)the National Natural Science Foundation of China(Grant No.51205387)the Science and Technology Commission of Shanghai,China(Grant No. 11nm0500300),and the Science and Technology Commission of Shanghai,China(Grant No. 14XD1425300)
文摘A new industrial method has been developed to produce polydisperse spherical colloidal silica particles with a very broad particle size,ranging from 20-95 nm.The process uses a reactor in which the original seed solution is heated to 100 ℃,and then active silicic acid and the seed solution are titrated to the reactor continuously with a constant rate.The original seeds and the titrated seeds in the reactor will go through different particle growth cycles to form different particle sizes.Both the particles＇ size distribution and morphology have been characterized by dynamic light scattering（DLS）and the focus ion beam（FIB） system.In addition,the as-prepared polydisperse colloidal silica particle in the application of sapphire wafer＇s chemical mechanical polishing（CMP） process has been tested.The material removal rate（MRR） of this kind of abrasive has been tested and verified to be much faster than traditional monodisperse silica particles.Finally,the mechanism of sapphire CMP process by this kind of polydisperse silica particles has been investigated to explore the reasons for the high polishing rate.
