On investigating the soda-lime shot blasting of AZ31 alloy:Effects on surface roughness,material removal rate,corrosion resistance,and bioactivity

In the present study,a novel method of surface finish improvement is proposed using shot blasting of soda lime(SBSL)beads on the Mg-AZ31 alloy.The effect of the soda blasting process parameters,such as blast pressure,stand-off distance,and blast duration,have been studied in-response of material removal rate(MRR)and surface roughness(SR)and corresponding statistical models have been obtained.The multi-objective optimization has also been performed to obtain parameters for maximum MRR and minimum SR.The corrosion behavior of the treated specimens has been performed to study their in-vitro biodegradability in simulated body fluid(SBF)for 1,3,7,10,15,and 21 days.The wettability study of the SBSL treated samples has been investigated using sessile drop methodology.Further,cell adhesion test has also been performed to study the biocompatibility characteristics of the SBSL treated samples using Huh7 liver cell lines.Based on obtained quantitative data as well as scanning electron microscopy analysis of treated samples,the SBSL treatment of the AZ31 alloy has been found highly useful in producing biocompatibility surfaces along with desirable morphological features.

Effect of mechanical anisotropy on material removal rate and surface quality during polishing CdZnTe wafers

The mechanical characters of CdZnTe crystal were investigated by nanoscratch tests, and the effects of mechanical anisotropy on the material removal rate and surface quality were studied by polishing tests. There is a peak of frictional coefficient at the early stage of scratch, and increasing the vertical force will result in the increase of peak value correspondingly. The fluctuation phenomenon of frictional coefficient is generated at high vertical force. The lateral forces show the apparent twofold and threefold symmetries on （110） and （111） planes, respectively. To obtain high surface quality, low polishing pressure and hard direction （〈 T10 〉 directions on （110） plane and 〈 112 〉 directions on （111） plane） should be selected, and to achieve high material removal rate, high polishing pressure and soft direction （〈001〉 directions on （110） plane and 〈 121 〉 directions on （111） plane） should be selected.

Removal Rate of Phosphorus by Different Constructed Wetland Substrates

[ Objective] The study aimed to discuss the removal rate of phosphorus by different constructed wetland substrates. [ Methed] Based on static experiments, we analyzed the removal rate and characteristics of phosphorus by different constructed wetland substrates like steel slag, cin- der slag, shale, boiler slag, soil and gravel. [ Result~ The maximum adsorption of phosphorus by various substrates showed as follows, steel slag 〉 cinder slag 〉 shale 〉 boiler slag 〉 soil 〉 gravel. When the initial concentration of phosphorus was 5 mg/L, the removal rate of phosphorus by the steel slag, cinder slag, shale, boiler slag, soil and gravel was 99.76%, 85.8%, 71.2%, 63.0%, 46.8% and 11.7% respectively. It is suggested that shale and boiler slag can be used as the substrate of subsurface-flow constructed wetlands; cinder slag can be chosen as a renewable sub- strate for intensifying phosphorus removal; steel slag could be used at the end of subsurface-flow constructed wetlands for treating TP in outflows. [Concluslon] The research could provide theoretical references for choosing a suitable substrate for constructed wetlands to remove phosphorus in future.

Novel model of material removal rate on ultrasonic-assisted chemical mechanical polishing for sapphire

Ultrasonic-assisted chemical mechanical polishing(UA-CMP)can greatly improve the sapphire material removal and surface quality,but its polishing mechanism is still unclear.This paper proposed a novel model of material removal rate(MRR)to explore the mechanism of sapphire UA-CMP.It contains two modes,namely two-body wear and abrasive-impact.Furthermore,the atomic force microscopy(AFM)in-situ study,computational fluid dynamics(CFD)simulation,and polishing experiments were conducted to verify the model and reveal the polishing mechanism.In the AFM in-situ studies,the tip scratched the reaction layer on the sapphire surface.The pit with a 0.22 nm depth is the evidence of two-body wear.The CFD simulation showed that abrasives could be driven by the ultrasonic vibration to impact the sapphire surface at high frequencies.The maximum total velocity and the air volume fraction(AVF)in the central area increased from 0.26 to 0.55 m/s and 20%to 49%,respectively,with the rising amplitudes of 1–3μm.However,the maximum total velocity rose slightly from 0.33 to 0.42 m/s,and the AVF was nearly unchanged under 40–80 r/min.It indicated that the ultrasonic energy has great effects on the abrasive-impact mode.The UA-CMP experimental results exhibited that there was 63.7%improvement in MRR when the polishing velocities rose from 40 to 80 r/min.The roughness of the polished sapphire surface was R_(a)=0.07 nm.It identified that the higher speed achieved greater MRR mainly through the two-body wear mode.This study is beneficial to further understanding the UA-CMP mechanism and promoting the development of UA-CMP technology.

Material removal rate of 6H-SiC crystal substrate CMP using an alumina(Al_2O_3) abrasive

The influences of the polishing slurry composition,such as the pH value,the abrasive size and its concentration,the dispersant and the oxidants,the rotational velocity of the polishing platen and the carrier and the polishing pressure,on the material removal rate of SiC crystal substrate（0001） Si and a（0001） C surface have been studied based on the alumina abrasive in chemical mechanical polishing（CMP）.The results proposed by our research here will provide a reference for developing the slurry,optimizing the process parameters,and investigating the material removal mechanism in the CMP of SiC crystal substrate.

Material removal rate in chemical-mechanical polishing of wafers based on particle trajectories

Distribution forms of abrasives in the chemical mechanical polishing（CMP） process are analyzed based on experimental results.Then the relationships between the wafer,the abrasive and the polishing pad are analyzed based on kinematics and contact mechanics.According to the track length of abrasives on the wafer surface,the relationships between the material removal rate and the polishing velocity are obtained.The analysis results are in accord with the experimental results.The conclusion provides a theoretical guide for further understanding the material removal mechanism of wafers in CMP.

Effects of the reciprocating parameters of the carrier on material removal rate and non-uniformity in CMP

Based on the Preston equation, the mathematical model of the material removal rate （MRR）, aiming at a line-orbit chemical mechanical polisher, is established. The MRR and the material removal non-uniformity （MRNU） are numerically calculated by MATLAB, and the effects of the reciprocating parameters on the MRR and the MRNU are discussed. It is shown that the smaller the inclination angle and the larger the amplitude, the higher the MRR and the lower the MRNU. The reciprocating speed of the carrier plays a minor role to improve the MRR and decrease the MRNU. The results provide a guide for the design of a polisher and the determination of a process in line-orbit chemical mechanical polishing.

The optimization of FA/O barrier slurry with respect to removal rate selectivity on patterned Cu wafers

Because the polishing of different materials is required in barrier chemical mechanical planariza- tion （CMP） processes, the development of a kind of barrier slurry with improved removal rate selectivity for Cu/barrier/TEOS would reduce erosion and dishing defects on patterned Cu wafers. In this study, we developed a new benzotriazole-free barrier slurry named FA/O barrier slurry, containing 20 mL/L of the chelating agent FA/O, 5 mL/L surfactant, and a 1：5 concentration of abrasive particles. By controlling the polishing slurry ingredients, the removal rate of different materials could be controlled. For process integration considerations, the effect of the FA/O barrier slurry on the dielectric layer of the patterned Cu wafer was investigated. After CMP processing by the FA/O barrier slurry, the characteristics of the dielectric material were tested. The results showed that the dielectric characteristics met demands for industrial production. The current leakage was of pA scale. The resistance and capacitance were 2.4 k and 2.3 pF, respectively. The dishing and erosion defects were both below 30 nm in size. CMP-processed wafers using this barrier slurry could meet industrial production demands.

Influence of pH on short-cut denitrifying phosphorus removal

Through a series of experiments using denitrifying phosphorus-accumulating sludge in sequencing batch reactors （SBRs）, the variations of the intracellular polymers during the anaerobic phosphorus release process at different pH values were compared, the probable reasons for different performances of phosphorus removal were examined, and system operations in a typical cycle were investigated. The results show that the phosphorus removal rate was positively correlated with pH values in a range of 6.5-8.5. When the pH value was 8.0, the anaerobic phosphorus release rate and anoxic phosphorus uptake rate of the activated sludge were 20.95 mg/（g, h） and 23.29 mg/（g, h）, respectively; the mass fraction of poly-13-hydroxybutyrate （PHB） increased to 62.87 mg/g under anaerobic conditions; the mass fraction of polyphosphate was 92.67 mg/g under anoxic conditions; and the effluent concentration of total phosphorus （TP） was 1.47 mg/L. With the increase of pH, the mass fraction of acetic acid and PHB also increased, and the absorption rate of acetic acid was equal to the disintegration rate of polyphosphate. When the pH value was above 8.0, biological phosphorus removal was achieved by chemical phosphorus precipitation, and the phosphorus removal rate decreased.

Application of subsurface wastewater infiltration system to on-site treatment of domestic sewage under high hydraulic loading rate

In order to enhance the hydraulic loading rate （HLR） of a subsurface wastewater infiltration system （SWIS） used in treating domestic sewage, the intermittent operation mode was employed in the SWIS. The results show that the intermittent operation mode contributes to the improvement of the HLR and the pollutant removal rate. When the wetting-drying ratio （RwD） was 1.0, the pollutant removal rate increased by （13.6 ± 0.3）% for NH3-N, （20.7 ± 1.1）% for TN, （18.6± 0.4）% for TP, （12.2 ± 0.5）% for BOD, （10.1 ± 0.3）% for COD, and （36.2 ± 1.2）% for SS, compared with pollutant removal rates under the continuous operation mode. The pollutant removal rate declined with the increase of the HLR. The effluent quality met The Reuse of Urban Recycling Water - Water Quality Standard for Scenic Environment Use （GB/T 18921-2002） even when the HLR was as high as 10 cm/d. Hydraulic conductivity, oxidation reduction potential （ORP）, the quantity of nitrifying bacteria, and the pollutant removal rate of NH3-N increased with the decrease of the RWD. For the pollutant removal rates of TP, BOD, and COD, there were no significant difference （p 〈 0.05） under different RwDS. The suggested RWD was 1.0. Relative contribution of the pretreatment and SWlS to the pollutant removal was examined, and more than 80% removal of NH3-N, TN, TP, COD, and BOD occurred in the SWIS.

Study on the Removal of Ammonia Nitrogen from Wastewater Using Microwave Coupled with Active Carbon

[ Objective] The study aimed to discuss the feasibility and optimal conditions of removing ammonia nitrogen by using microwave coupled with active carbon. [ Method ] In the study, a novel process, microwave radiation coupled with active carbon, was applied to remove ammonia nitro- gen from wastewater, and the influences of solution pH, air conditions, active carbon usage, microwave power and time on the removal effect of ammonia nitrogen were studied. [ Result] Microwave coupled with active carbon can remove ammonia nitrogen efficiently, and pumping air into the wastewater can also increase the removal rate of ammonia nitrogen to a certain extent. Higher pH, intensive microwave power and longer treating time could also increase the removal rate of ammonia nitrogen using microwave radiation coupled with active carbon, whereas the usage of active carbon contributed a small impact. It was proved that microwave coupled with active carbon was an effective method for the removal of ammonia ni- trogen from wastewater. Meanwhile, the orthogonal experiment results showed that the removal rate of ammonia nitrogen reached 92.5% under the optimal conditions, that is, the usage of active carbon was 0.5 g, pH = 11, microwave radiation power was 850 W, and microwave action time was 4 minutes. [ Conclusion] The research provided a new method to remove ammonia nitrogen from wastewater, namely microwave coupled with ac- tive carbon.

Ammonium Removal from Ammonium Rich Solution by Bio Char

When biochar made from waste pallet was added to treated livestock wastewater, the total nitrogen and ammonium ion concentrations decreased, with removal rates over 10 days of about 60% and 30%, respectively. Bacteria were isolated with high ammonium removal ability and they were identified based on their 16S rRNA gene sequences. Anaerobic denitrifying Cronobacter spp. was isolated from the biochar used for water purification. When each strain was cultured in a liquid medium containing ammonium sulfate (initial ammonium concentration 30 mg/L), the highest ammonium removal rates were 83.8% - 96.5%. Organic acids were more effective than carbohydrates as sole carbon sources for nitrogen removal from wastewater. The absorbance at 660 nm increased with nitrogen removal, indicating that cells proliferated, so it was presumed that ammonium was taken up by assimilation.

Treatment of Shrimp Effluent by Integrated Culture of Bivalves and Macroalgae

[Objectives]To provide a theoretical basis for constructing the best species suitable for local shrimp-bivalves-algae IMTA through the screening of different bivalves and the determination of seaweed density.[Methods]The preliminary studies of different kind of bivalves and macroalgae(Gracilaria lichevoides)used for the purification of shrimp effluent were described.Through the screening of benthic bivalves,the best ratio of integrated culture of bivalves and algae was determined.[Results]Both bivalves and macroalgae had certain purification effects on aquaculture wastewater,but the effects significantly differed from species and breeding density.The removal rate of nutrient declined from Potamocorbula laevis,Sinonovacula constricta,Tegillarca granosa.The mixotrophic culture of 8 ind/L P.laevis and 120 g G.lichevoides had the highest efficiency of purification and removal rates of nutrient:NH4-N:90.67%,TP:86.18%,TN:72.66%,NO3-N:51.85%,respectively.There was a significant difference between the blank control group and the other three groups(P<0.01).The 8 ind/L+120 g group was significantly higher than the 4 ind/L+120 g group(P<0.05)in TP removal rate.Additionally,the difference between four groups was significant in the removal rate of NH4-N and TN(P<0.05),but 2 ind/L+120 g group and 8 ind/L+120 g group in the removal rate of NO3-N had no significant difference(P>0.05).[Conclusions]This research provides a reference for the use of filterable shellfish and large seaweed to treat aquaculture wastewater,and also provides the theoretical basis for constructing the local multi-level breeding structure.

Powder mixed electrochemical discharge process for micro machining of C103 niobium alloy

This work demonstrates the viability of the powder-mixed micro-electrochemical discharge machining(PMECDM) process to fabricate micro-holes on C103 niobium-based alloy for high temperature applications.Three processes are involved simultaneously i.e.spark erosion,chemical etching,and abrasive grinding for removal of material while the classical electrochemical discharge machining process involves double actions i.e.spark erosion,and chemical etching.The powder-mixed electrolyte process resulted in rapid material removal along with a better surface finish as compared to the classical microelectrochemical discharge machining(MECDM).Further,the results are optimized through a multiobjective optimization approach and study of the surface topography of the hole wall surface obtained at optimized parameters.In the selected range of experimental parameters,PMECDM shows a higher material removal rate(MRR) and lower surface roughness(R_(a))(MRR:2.8 mg/min and R_(a) of 0.61 μm) as compared to the MECDM process(MRR:2.01 mg/min and corresponding Raof 1.11 μm).A detailed analysis of the results is presented in this paper.

Progress in Preparation Technology of Porous Ceramics for High Temperature Dust Filtration

With the rapid industrialization and urbanization,the demand for air quality management is more and more urgent.High temperature dust filtration is one important environmental management technology.Porous ceramics are used as filter materials in the field of high-temperature dust filtration because of their unique advantages such as high filtration efficiency,as well as high temperature stability,particle loss resistance,corrosion resistance and durability.This paper mainly introduced several common preparation techniques of porous ceramics,including the traditional organic foam impregnation method,foaming method,in-situ combustion method,pore-forming method and other new methods such as the template method,gel injection molding method,freeze-drying method,multi-component co-precipitation method and hydrogel method.The principle,advantages and disadvantages of these preparation technologies and their research status were described.The application of these technologies in the field of high temperature dust filtration was briefly reviewed.Finally,the application prospect of the porous ceramics in the field of high temperature dust filtration was prospected.

Mechanisms of granular activated carbon anaerobic fluidized-bed process for treating phenols wastewater

Granular activated carbon (GAC) anaerobic fluidized bed reactor was applied to treating phenols wastewater. When influent phenol concentration was 1000 mg/L, volume loadings of phenol and COD Cr were 0 39 kg/(m 3·d) and 0 98 kg/(m 3·d), their removal rates were 99 9% and 96 4% respectively. From analyzing above results, the main mechanisms of the process are that through fluidizing GAC, its adsorption is combined with biodegradation, both activities are brought into full play, and phenol in wastewater is effectively decomposed. Meanwhile problems concerning gas liquid separation and medium plugging are well solved.

Optimization of Polishing Parameters with Taguchi Method for LBO Crystal in CMP

Chemical mechanical polishing （CMP） was used to polish Lithium triborate （LiB3O5 or LBO） crystal. Taguchi method was applied for optimization of the polishing parameters. Material removal rate （MRR） and surface roughness are considered as criteria for the optimization. The polishing pressure, the abrasive concentration and the table velocity are important parameters which influence MRR and surface roughness in CMP of LBO crystal. Experiment results indicate that for MRR the polishing pressure is the most significant polishing parameter followed by table velocity; while for the surface roughness, the abrasive concentration is the most important one. For high MRR in CMP of LBO ctystal the optimal conditions are： pressure 620 g/cm^2, concentration 5.0 wt pct, and velocity 60 r/min, respectively. For the best surface roughness the optimal conditions are： pressure 416 g/cm^2, concentration 5.0 wt pct, and velocity 40 r/min, respectively. The contributions of individual parameters for MRR and surface roughness were obtained.

Improving energy utilization efficiency of electrical discharge milling in titanium alloys machining

Electrical discharge milling(ED-milling) can be a good choice for titanium alloys machining and it was proven that its machining efficiency can be improved to compete with mechanical cutting. In order to improve energy utilization efficiency of ED-milling process, unstable arc discharge and stable arc discharge combined with normal discharge were implemented for material removal by adjusting servo control strategy. The influence of electrode rotating speed and dielectric flushing pressure on machining performance was investigated by experiments. It was found that the rotating of electrode could move the position of discharge plasma channel, and high pressure flushing could wash melted debris out the discharge gap effectively. Both electrode rotating motion and high pressure flushing are contributed to the improvement of machining efficiency.

Analysis of the Rotary Ultrasonic Machining Mechanism

Ultrasonic machining (USM) is considered as an effective method for machining hard and brittle materials such as glass, engineering ceramics, semiconductors, diamonds, metal composites and so on. However, the low material removal rate due to using abrasive slurry limits further application of USM. Rotary ultrasonic machining (rotary USM) superimposes rotational movement on the tool head that vibrates at ultrasonic frequency (20 kHz) simultaneously. The tool is made of mild steel coated or bonded with diamond abrasive. Therefore, abrasive slurry is abandoned and coolant is used to carry debris out of working area. Compared with USM, rotary USM can obtain much higher material removal rate, deep holes, and fine precision, which leads to its further application. Combined with CNC technology, rotary USM can be used to conduct contour machining of hard and brittle materials. In this paper, the movement of abrasive particles in tool tip of rotary ultrasonic machining is analyzed. The impacting and grinding of abrasive in tool tip to machined surface are considered as main factors to material removal rate. The process of crack forming and growing in one loading and unloading cycle can be described as following stages: a) When abrasive particle acts the pressure on work-piece, the macro cracks in periphery of contact area are exerted increasing tensile stress. b) As the tensile stress increase to the critical of material tension, the one of cracks in periphery of contact area begins to propagate around contact area and develop beneath the surface to certain depth. c) Indentation area varies with increasing of load, the circle crack around contact area steadily or dynamical propagates towards inside of work-piece. d) As tensile stress in crack increases to critical of crack steady failure, circle crack suddenly becomes conic crack. e) Further increase load, the crack continues to grow while contact area is surrounded by conic cracks. f) During unloading, conic crack begins to close, some of cracks continue their extension towards the surface and forms a circle groove. The mathematical model for material removal rate shows that the factors affecting on material removal rate are static load, grid and concentration of abrasive, mechanical properties of machined materials, rotational speed of tool and feed speed of work-piece.

Restoration of Eutrophic Water Using Nymphaea tetragona Georgi

[ Objective] The study aimed to explore the approaches of utilizing Nymphaea tetragona Georgi by doing research on removing nitrogen and phosphorus from sewage using N. tetragona Georgi. [Method] With N. tetragona Georgi as the research object, a comparative analysis on the content of total nitrogen （TN） and total phosphorus （TP） was carded out after N. tetragona Georgi was planted in sewage. TN content was deter- mined by alkaline potassium persulfate digestion -UV spectrophotometric method （GB11894 -89）, and TP content was measured by using ammo- nium molybdate spectrophotometric method （GBl1893 -89）. [ Result] The removal rate of TN and TP reached 12.31% and 8.64% respectively under natural conditions after N. tetragona Georgi was cultivate in the sewage for 13 days. Afterward, the removal rate has no significant change. [ Conclusion] N. tetragona Georgi can purify sewage to some degree, and the removal efficiency of TN was higher than that of TP.