期刊文献+
共找到3篇文章
< 1 >
每页显示 20 50 100
Research for the orientation detection system using L-shape reticle
1
作者 Liu Guangcan Bai Tingzhu 《Journal of Systems Engineering and Electronics》 SCIE EI CSCD 2007年第1期49-53,共5页
The basic scheme of the orientation detection system using L-shape reticle is introduced. The dimension of the patterns on the reticle of the system in practical applications is designed and an analysis of the princip... The basic scheme of the orientation detection system using L-shape reticle is introduced. The dimension of the patterns on the reticle of the system in practical applications is designed and an analysis of the principle of abstracting the orientation information of the target and the effects and formation method of self-adapting tracking gate is presented. The research result shows that the orientation detection system using L-shape reticle has a good effect on space-filtering, the signals that the orientation detection system sends out are easy to be processed by computer, its self-adapting tracking gate has a strong anti-interference ability, and the whole system's searching and tracking performances are quite high. 展开更多
关键词 Orientation detection system L-shape reticle Self-adapting tracking gate
下载PDF
DTFab:A Digital Twin based Approach for Optimal Reticle Management in Semiconductor Photolithography
2
作者 Chandrasekhar Komaralingam Sivasubramanian Robert Dodge +5 位作者 Aditya Ramani David Bayba Mani Janakiram Eric Butcher Joseph Gonzales Giulia Pedrielli 《Journal of Systems Science and Systems Engineering》 SCIE EI CSCD 2023年第3期320-351,共32页
Photolithography is among the key phases in chip manufacturing.It is also among the most expensive with manufacturing equipment valued at the hundreds of millions of dollars.It is paramount that the process is ran eff... Photolithography is among the key phases in chip manufacturing.It is also among the most expensive with manufacturing equipment valued at the hundreds of millions of dollars.It is paramount that the process is ran efficiently,guaranteeing high resource utilization and low product cycle times.A key element in the operation of a photolithography system is the effective management of the reticles that are responsible for the imprinting of the circuit path on the wafers.Managing reticles means determining which are appropriate to mount on the very expensive scanners as a function of the product types being released to the system.Given the importance of the problem,several heuristic policies have been developed in the industry practice in an attempt to guarantee that the expensive tools are never idle.However,such policies have difficulties reacting to unforeseen events(e.g.,unplanned failures,unavailability of reticles).On the other hand,the technological advance of the semiconductor industry in sensing at system and process level should be harnessed to improve on these"expert policies".In this manuscript,we develop a system for the real time reticle management that not only is able to retrieve information from the real system,but also is able to embed commonly used policies to improve upon them.We develop a new digital twin for the photolithography process that efficiently and accurately predicts the system performance,thus allowing our system to make predictions for future behaviors as a function of possible decisions.Our results demonstrate the validity of the developed model,and the feasibility of the overall approach demonstrating a statistically significant improvement of performance as compared to the current policy. 展开更多
关键词 Semiconductor manufacturing reinforcement learning reticle management digital twin
原文传递
Laser Micro-Printing of Dye-Molecules on Polymeric Surfaces
3
作者 Wesley Sims Aschalew Kassu +1 位作者 Carlton Farley Anup Sharma 《Open Journal of Applied Sciences》 2016年第7期416-421,共6页
We describe a technique for micro-patterning and immobilization of dyes on polymer substrates using a low-power visible laser for dye-excitation. Deposits from an aqueous medium containing the dye can be attached at a... We describe a technique for micro-patterning and immobilization of dyes on polymer substrates using a low-power visible laser for dye-excitation. Deposits from an aqueous medium containing the dye can be attached at any desired spot on the substrate simply by exposing the area to laser light. The area of the laser beam can control the spot-size of immobilized dye, in the range of 10 - 100 microns. The immobilization technique is characterized by micro-printing numerals, alphabets and patterns on polybutadiene substrates with Rhodamine (Rh6G) dye. Adsorption of laser-excited dye molecules within the polymer appears to be the mechanism for laser-printing technique. 展开更多
关键词 Laser Micro-Printing Laser Immobilization of Molecules MICRO-PATTERNING reticle
下载PDF
上一页 1 下一页 到第
使用帮助 返回顶部