Optimal parameters for depositing Titanium nitride (TiN) thin films by DC reactive magnetron sputtering were determined. TiN thin films were deposited on Si (100) substrates by DC reactive magnetron sputtering, at dif...Optimal parameters for depositing Titanium nitride (TiN) thin films by DC reactive magnetron sputtering were determined. TiN thin films were deposited on Si (100) substrates by DC reactive magnetron sputtering, at different temperatures, different electrical current values, and different N2/Ar ratios. Structural characteristics of TiN thin films were measured by X-ray diffraction (XRD); surface morphology of the thin films was characterized using an atomic force microscope (AFM). The electric resistivity of the TiN films was measured by a four-point probe. In the result, temperature is 500 °C, electrical current value is 1.6 A, pure N2 is the reacting gas, TiN thin film has the preferred (200) orientation, resistance is small enough for its use as bottom electrodes.展开更多
Second-harmonic generation in Nd3＋ ：SBN crystal with needle-like ferroelectric with aperiodic domain structures is investigated. Two pairs of second harmonic （SH） waves appearing in lines are observed in unpoled ...Second-harmonic generation in Nd3＋ ：SBN crystal with needle-like ferroelectric with aperiodic domain structures is investigated. Two pairs of second harmonic （SH） waves appearing in lines are observed in unpoled Nd3＋ ：SBN crystals with aperiodic needle-like domains. A pair of SH waves emit from the exit face, whose intensities are angle-dependent. The angular dependence is corresponding to the spatial frequency spectrum of the aperiodic domain structure. Another pair of SH waves emit from both the side surfaces, which are mainly the scattered SH waves by needle-like domain walls and obey the theory of Rayleigh scattering.展开更多
基金Project supported by the National Natural Science Foundation of China (No. 60478039) and the Natural Science Foundation of Zheji-ang Province (No. X405002), China
文摘Optimal parameters for depositing Titanium nitride (TiN) thin films by DC reactive magnetron sputtering were determined. TiN thin films were deposited on Si (100) substrates by DC reactive magnetron sputtering, at different temperatures, different electrical current values, and different N2/Ar ratios. Structural characteristics of TiN thin films were measured by X-ray diffraction (XRD); surface morphology of the thin films was characterized using an atomic force microscope (AFM). The electric resistivity of the TiN films was measured by a four-point probe. In the result, temperature is 500 °C, electrical current value is 1.6 A, pure N2 is the reacting gas, TiN thin film has the preferred (200) orientation, resistance is small enough for its use as bottom electrodes.
基金National Natural Science Foundation of China under Grant No 61675101
文摘Second-harmonic generation in Nd3＋ ：SBN crystal with needle-like ferroelectric with aperiodic domain structures is investigated. Two pairs of second harmonic （SH） waves appearing in lines are observed in unpoled Nd3＋ ：SBN crystals with aperiodic needle-like domains. A pair of SH waves emit from the exit face, whose intensities are angle-dependent. The angular dependence is corresponding to the spatial frequency spectrum of the aperiodic domain structure. Another pair of SH waves emit from both the side surfaces, which are mainly the scattered SH waves by needle-like domain walls and obey the theory of Rayleigh scattering.
