Thermodynamic analysis of growth of ternary Ⅲ-Ⅴ semiconductor materials by molecular-beam epitaxy

Thermodynamic models for molecular-beam epitaxy（MBE） growth of ternary Ⅲ-Ⅴ semiconductor materials are proposed.These models are in agreement with our experimental materials InGaP/GaAs and InGaAs/InP,and reported GaAsP/GaAs and InAsP/InP in thermodynamic growth.The lattice strain energy △G and thermal decomposition sensitive to growth temperature are demonstrated in the models simultaneously.△G is the function of the alloy composition,which is affected by flux ratio and growth temperature directly.The calculation results reveal that flux ratio and growth temperature mainly influence the growth process.Thermodynamic model of quaternary InGaAsP/GaAs semiconductor material is discussed also.

Developing Suitable Sensitive Compound Semiconductor Materials Doped by Transition Metals for Occupational Thermoluminescence Dosimetry

The essential objective of radiation dosimetry is to develop suitable sensitive materials for different measurements in radiation fields. Our exploration is to find potentially suitable high gamma radiation dosimeters in the range from 0.5E4 to 1.5E4 Gy. Gamma rays source (60Co, 136 Gy/min) has been used. Many compound semiconductor materials were prepared and investigated. Thermoluminescence (TL) glow curve was analyzed into its component by analytical segregation program using computerized glow curve deconvolution (CGCD). Three zero dose readings for non-irradiated powders of the materials have been taken as lower limit of detection. The results indicated that some of the tested materials have exhibited TL linearly with respect to dose. In addition, dose response of these materials was found to be useful for high radiation dosimetry. Glow curve structures exhibited several peaks corresponding to the various energies of the emptied traps. Variation in the standard deviation for reusability cycles has been ten readout. The fading at ambient temperature was studied up to 60 days which reached a relative stability (~1.5% for all), 10 days after irradiation. A typical glow curve of CoPa which irradiated with 1.5E4 Gy was analyzed. Characterizations of tested materials indicated that crystals of ZnLa:Li, ZnLa:Cd, and ZnLa:Cr have stable and increasing thermoluminescent responses with high gamma radiation dose range. Special glow peaks can be used as estimators for absorbed doses as well as re-estimation for time elapsed exposures.

High-precision X-ray characterization for basic materials in modern high-end integrated circuit

Semiconductor materials exemplify humanity's unwavering pursuit of enhanced performance,efficiency,and functionality in electronic devices.From its early iterations to the advanced variants of today,this field has undergone an extraordinary evolution.As the reliability requirements of integrated circuits continue to increase,the industry is placing greater emphasis on the crystal qualities.Consequently,conducting a range of characterization tests on the crystals has become necessary.This paper will examine the correlation between crystal quality,device performance,and production yield,emphasizing the significance of crystal characterization tests and the important role of high-precision synchrotron radiation X-ray topography characterization in semiconductor analysis.Finally,we will cover the specific applications of synchrotron radiation characterization in the development of semiconductor materials.

Acoustoelectric effect in semiconductor materials and devices

This paper reviews the studies on acoustoelectric effect in extrinsic semiconductor materials used in various scientific and other measurements. A historical review of earlier findings is given with special reference to associated mechanisms. Acoustoelectric studies in solid state devioes require further attention and the work done in this area is also discussed.

Preparation of Single Crystals of Co_xZn_(1-x)S and Co_xZn_(1-x)Se—New Materials of Dilute Magnetic Semiconductors

In this paper, we report the growth of single crystals of Co_x Zn_(1-x)S and Co_x Zn_(1-x)Se (0<x<0.3) by the method of chemical transport, using iodine as a transport agent. The light green color of single crystal Co_xZn_(1-x)S as well as the light brown color of Co_xZn_(1-x)Se become deep with an increase in x. The compositions of the single crystals were nearly stoichiometric. The transfer rate decreases with an increase of the x value. The growth rate was related to the temperature difference. The large temperature difference speed up the growth rate, but the size of crystal obtained was small. In general, the optimal temperature difference was 15℃. From X-ray diffraction measurements, the structures of crystals Co_xZn_(1-x)S and Co_xZn_(1-x)Se (0<x<0.1) were identified to be zinc blende structure similar to that of ZnS and ZnSe.

Raman Scattering Spectrum Analysis of GaP andIts Luminous Materialsr

Abstract: The Raman scattering spectra of n- type GaP(doped S) single crystal and red and green luminous materials grown on the n - type GaP (doped S) single crys-tal substrate by liquid - phase epitaxy are analyed. The results show that the spectra of GaP single crystal and its luminous materials include not only the first - order longitudi-nal optical photons and transverse optical phonons Raman scattering peaks, but also the peaks of the bound excitons, bound electrons and bound holes.

Electroluminescent Excitation Mechanism of Erbium－activated Zinc Sulfide Semiconductor Thin Film Devices

The electroluminescunce (EL) transient characteristics of erbium-doped zinc sulfide thin film (TF) devices excited by short rectangular pulses are studied, the luminescence delay after de-exciting and the relaxation luminance peaks during decay are observed. A model description for energy transfer has been proposed. The experimental results can be theoretically explained with the computer curve fittings.

SiC大单晶的生长

Silicon carbide (SiC) single crystal,which hasn’t melting point at normal pressu r e and sublimates at temperature above 2000℃,is a wide bandgap semiconductor.Si lic on carbide has more than 200 kinds of polytype.Among these polytypes,3C SiC、6H SiC and 4H SiC are the most common ones,the band width of them are 2.4eV,3.0eV , an d 3.4eV,restpectively.For its high temperature tolerance and radiation resistanc e,silicon carbide semiconductor can be extensively used to fabricate the power d evi ces and electroluminescence devices operating at high power,high frequency and high radiation environments. The aim of this paper is to introduce our research results of the growth of larg e SiC single crystals by physical vapor transport method.The seed is SiC single crystal wafer with perfect (0001)Si face,which is chosen from the furnace growi ng the green abrasive material of SiC in industry.The source is green powder of SiC .The seed and the source are placed into the graphite crucible of a graphite res i stively heated vacuum furnace.The growth chamber is filled with the atmosphere o f pure araon.When the temperature of source rises to 2300℃,the crystal growth p ro ceeds.The rate of crystal growth is dependent on the growth temperature,the pres sure in furnace and the temperature gradient and distance between the seed and t h e source.Under the controlled growth conditions,the bulk SiC crystal with a diam eter of 40mm and a thickness of 15mm is obtained.The crystal appears to be n type electrical conductivity,the results of X ray Laue photography analysis indicat e that it is 6H SiC polytype.The defects of the crystal are also studied by many kinds of method.

GaN纳米固体的氨热合成及其特性研究

Wurtzite structure gallium nitride GaN,a direct bandgap semiconductor,is an ideal material for fabrication of blue/green light emitting diodes,laser diodes, and high powder Integrated Circuites.Up to now,small single crystals,powders and nanomaterials of GaN have successfully synthesized as well as applied films gro wn by MOCVD.In this report,another condensed state of GaN,nanocrystal assembled bulk,was synthesized and its spectra are investigated. Metal gallium or gallium alloys are used as starting materials and haloids used as catalyzer in ammonia.Buff transparent GaN bulks were obtained at 350—500℃.P owder X ray diffraction indicated that the bulks are wurtaite GaN single phase. HRTEM confirmed that the bulks are composed of nanoparticles with average size o f 12mm.The well crystallized particle shows clear diffraction spots.PL spectra of the material are similar to that of GaN singe crystals under the ultraviolet excitation,but blue shift is observed near gap band.Red shift occurs in Raman scattering comparing with single crystals.The materials have the broad potential in the future because it not only possesses of mechanical and optical characteri stics owned by single crystals but also holds the nano properties of the nanoma terials.

Fabrication of hexagonal gallium nitride films on silicon (111) substrates

Hexagonal gallium nitride films were successfully fabricated throughammoniating Ga_2O_3 films deposited on silicon (111) substrates by electrophoresis. The structure,composition, and surface morphology of the formed films were characterized by X-ray diffraction(XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), and transmissionelectron microscopy (TEM). The measurement results reveal that the polycrystalline GaN films withhexagonal wurtzite structure were successfully grown on the silicon (111) substrates. Preliminaryresults suggest that varying the ammoniating temperature has obvious effect on the quality of theGaN films formed with this method.

STM and STS investigations of Ce-doped TiO_2 nanoparticles

Ce-doped titanium oxide nanoparticles were investigated in the paper. The surface structures of undoped and Ce-doped TiO2 nanoparticles were observed by scanning tunneling microscopy （STM）. The experimental results of scanning tunneling spectroscopy （STS） show that the surface electronic structures of TiO2 nanoparticles are modified by introducing new electronic states in the surface band gap through cerium ion doping. The results are discussed in terms of the influence of doping concentration on the surface band gap of TiO2.

Recent advances in low-dimensional semiconductor nanomaterials and their applications in high-performance photodetectors

Low-dimensional(including two-dimensional[2D],one-dimensional[1D],and zero-dimensional[0D])semiconductor materials have great potential in electronic/optoelectronic applications due to their unique structure and characteristics.Many 2D(such as transition metal dichalcogenides and black phosphorus)and 1D(such as NWs)materials have demonstrated superior performance in field effect transistors,photodetectors(PDs),and some flexible devices.And in some hybrid structures of 0D materials and 1D or 2D materials,the modification of 1D and 2D devices by 0D materials is embodied.This type of hybrid heterostructure has a larger performance optimization compared with the original.In the application of PDs,the variety of lowdimensional materials and properties enable wide-spectrum detection from ultraviolet UV to infrared,which provide a potential option for PDs under various conditions.For flexible electronic devices,high performance and mechanical stability are two important features.Low-dimensional materials offer unparalleled advantages in flexible devices.In this review,we will focus on the various low-dimensional materials that have been extensively studied and their applications in the electronics/optoelectronic and flexible electronics.From the composition and lattice structure of materials(including alloys)to the construction of various devices and heterostructures,we will introduce their application and recent development under various conditions.These works can provide valuable guidance for the construction and application of more highperformance and multifunctional devices.

Preparation of ZAO powder and investigation on its infrared emissivity

According to the basic infrared stealth mechanism of low infrared emissivity powders,the ZAO powder materials were prepared by liquid coprecipitation method,and the starting materials were Zn( NO3) 6H2O and Al( NO3) 39H2O. The process parameters were obtained,and the relationship between technology parameters and infrared emissivity was investigated. The temperature of thermal treatment,crystal structure and surface micrograph of ZAO powder was analyzed by the help of TG-DTA,XRD and SEM. The infrared stealth performance of ZAO powder was studied by IR-2 emissivity spectroscopy. Results showed that the infrared emissivity was the lowest when pH was 8. 0,calcination temperature was 1100 ℃,calcination time was 2 h,and the Al2O3doping content was 3% ( mass percentage) . The crystal structure of doped ZAO powder was lead-zinc, and there exists distortion of crystal lattice in nanocrystalline ZnO. The average particle size was 10 μm. The lowest infrared emissivity reached to 0. 61 at between 8 μm and 14 μm. It means that the ZAO powders will be excellent infrared stealthy materials.

Sub-bandgap photocurrent response and carrier transport properties of undoped semi-insulating LEG GaAs as a composite

Undoped (ND) semi-insulating (SI) liquid encapsulated Czochralski (LEC) GaAscrystals were investigated by photocurrent and temperature-dependent Hall measurements. It isindicated that strong nonuniformities in the distributions of impurities and defects can occur forthe NDSILEC GaAs crystal grown under a condition with strong constitutional supercooling. In suchcase, the deep level that dominates Fermi level is spacial location dependent, and the GaAs crystalbecomes a composite consisting of a large number of elementary domains with differentconductivities. The sub-bandgap photocurrent response and the carrier transport properties for thiskind of composite are quite different from those for homogeneous NDSILEC GaAs.

Characterization and chemical surface texturization of bulk ZnTe crystals grown by temperature gradient solution growth

Using tellurium as a solvent, we grew ZnTe ingots of 30 mm in diameter and 70 mm in length by a temperature gradient solution growth method. Hall tests conducted at 300 K indicated that the as-grown ZnTe exhibits p-type conductivity, with a carrier concentration of approximately 10^14cm^-3, a mobility of approximately 300 cm^2·V·s^-1, and a resistivity of approximately 10^2 Ω·cm. A simple and effective method was proposed for chemical surface texturization of ZnTe using an HF：H2O2：H2O etchant. Textures with the sizes of approximately 1μm were produced on {100}, {110}, and { 111}zn surfaces after etching. The etchant is also very promising in crystal characterization because of its strong anisotropic character and Te-phase selectivity.

Effect of heat-treatment on the surface properties of gallium phosphide nanosolids by Raman spectroscopy

Raman spectra of gallium phosphide （GAP） nanosolids （unheated and heat-treated at 598 and 723 K, respectively） were investigated. It was observed that both the longitudinal optical mode （LO） and the transverse optical mode （TO） displayed an asymmetry on the low-wavenumber side. The scattering bands were fitted to a sum of four Lorentzians which were assigned to the LO mode, surface phonon mode, TO mode, and a combination of Ga-O-P symmetric bending and sum band formed from the X-point TA ＋ LA phonons, respectively. Analysis of the characteristic of surface phonon mode revealed that the surface phonon peak of the GaP nanosolids could be confirmed. In the infrared spectrum of the GaP nanoparticles, we observed the bands on account of symmetric stretching and bending of PO2, as well as stretching of Ga-O The Raman scattering intensity arising from the Ga-O-P linkages increased as increasing the heat-treatment temperature.

Effect of substrate temperature on microstructural and optical properties of ZnO films grown by pulsed laser deposition

ZnO thin films were deposited on n-Si （111） at various substrate temperatures by pulsed laser deposition （PLD）. X-ray diffraction （XRD）, photoluminescence （PL）, Fourier transform infrared spectrophotometer （FTIR）, and scanning electron microscopy （SEM） were used to analyze the structure, morphology, and optical property of the ZnO thin films. An optimal crystallized ZnO thin film was obtained at the substrate temperature of 600℃. A blue shift was found in PL spectra due to size confinement effect as the grain sizes decreased. The surfaces of the ZnO thin films were more planar and compact as the substrate temperature increased.

Mid-Temperature Synthesis of CeO_2-TiO_2 Complex Compound and Its XRD Structure Study

The CeTi 2O 6, which is formed above 1300 ℃ by ceramic method, was obtained at 700 ℃ using sol gel synthesis method. XRD analysis shows that there is 8% deficient of Ce in the structure. The chemical formula is Ce 0.92 Ti 2O 5.84 , which has a monoclinic structure with space group of C 2/ m . Its cell parameters are a =0.9811(8) nm, b =0.3726(3) nm, c =0.6831(6) nm, and β =118.84°. After being treated at 1300 ℃ for 3 h, the system keeps stable but the deficient disappears, while the chemical formula change to the normal CeTi 2O 6, and the cell parameters are a =0.9813(3) nm, b =0.3752(4) nm, c =0.6883(5) nm, β =119.05°. The key to synthesis the precursors of CeTi 2O 6 is that Ti 4+ and Ce 3+ ions must reach the atomistic distributing state and prevent the oxidation of Ce 3+ during sol gel process.

Comparing Crystalline Silicon Solar Cells with Thin Film

Photovoltaics are currently recognized as a top ranking technology among the new energies. Photovoltaics have the potential to eventually make a considerable contribution to the power generation capacity in the world, especially, in the industrialized countries. Good accomplishment has been obtained in the cost reduction of PV systems, for example in 1974, systems cost (100～150) $/W. In 1981, such systems cost less than (10～30) $/W, and now they cost less than 5 $/W. However, more R&D efforts are still necessary, to achieve large-scale cost-effective production of PV systems to make it competitive with diesel generation of electricity,although PV systems have proven to be competitive in rural and remote areas. In this paper, an overview on high efficiency solar cell technologies will be presented.

Formation of GaN Nanowires by Ammoniating Ga_2O_3 Films Deposited on Oxidized Al Layers on Si Substrate

Large quantities of gallium nitride(GaN) nanowires have been prepared via ammoniating the Ga2O3 films deposited on the oxidized aluminum layer at 950 ℃ in a quartz tube. The nanowires have been confirmed as crystalline wurtzite GaN by X-ray diffraction, X-ray photoelectron spectrometry scanning electron microscope and selected-area electron diffraction. Transmission electron microscope(TEM) and scanning electron microscopy(SEM) reveal that the nanowires are amorphous and irregular, with diameters ranging from 30 nm to 80 nm and lengths up to tens of microns. Selected-area electron diffraction indicates that the nanowire with the hexagonal wurtzite structure is the single crystalline. The growth mechanism is discussed briefly.