High-quality and nearly crack-free GaN epitaxial layer was obtained by inserting a single A1GaN interlayer between GaN epilayer and high-temperature AlN buffer layer on Si （111） substrate by metalorganic chemical va...High-quality and nearly crack-free GaN epitaxial layer was obtained by inserting a single A1GaN interlayer between GaN epilayer and high-temperature AlN buffer layer on Si （111） substrate by metalorganic chemical vapor deposition. This paper investigates the effect of AlCaN interlayer on the structural properties of the resulting CaN epilayer. It confirms from the optical microscopy and Raman scattering spectroscopy that the AIGaN interlayer has a remarkable effect on introducing relative compressive strain to the top GaN layer and preventing the formation of cracks. X-ray diffraction and transmission electron microscopy analysis reveal that a significant reduction in both screw and edge threading dislocations is achieved in GaN epilayer by the insertion of AlGaN interlayer. The process of threading dislocation reduction in both AlGaN interlayer and GaN epilayer is demonstrated.展开更多
The preparation of LiNbO 3 films on Si substrates was improved by adding CH 3CH 2OH solution containing a little water to the sol of LiNb(OC 2H 5) 6. The crystallization behavior of LiNbO 3 films on Si (111) substrate...The preparation of LiNbO 3 films on Si substrates was improved by adding CH 3CH 2OH solution containing a little water to the sol of LiNb(OC 2H 5) 6. The crystallization behavior of LiNbO 3 films on Si (111) substrates was studied and completely c axis oriented LiNbO 3 films were obtained. Such factors as the hydrogen termination of silicon surface, the RTP annealing process used, the unidirectional heat flow and the preheating temperature were taken into consideration while the crystallization of c axis oriented films was analysed. Surface morphologies of the films annealed in RTP and conventional furnaces were observed by means of AFM.展开更多
AlN/GaN superlattice buffer is inserted between GaN epitaxiai layer and Si substrate before epitaxiai growth of GaN layer. High-quality and crack-free GaN epitaxiai layers can be obtained by inserting AlN/GaN superlat...AlN/GaN superlattice buffer is inserted between GaN epitaxiai layer and Si substrate before epitaxiai growth of GaN layer. High-quality and crack-free GaN epitaxiai layers can be obtained by inserting AlN/GaN superlattice buffer layer. The influence of AlN/GaN superlattice buffer layer on the properties of GaN films are investigated in this paper. One of the important roles of the superlattice is to release tensile strain between Si substrate and epilayer. Raman spectra show a substantial decrease of in-plane tensile strain in GaN layers by using AlN/GaN superlattice buffer layer. Moreover, TEM cross-sectional images show that the densities of both screw and edge dislocations are significantly reduced. The GaN films grown on Si with the superlattice buffer also have better surface morphology and optical properties.展开更多
GaN films grown on(111)Si substrate with different lattice parameters of the AlN buffer layer by metal–organic chemical vapor deposition are studied.The stress states obtained by different test methods are compared a...GaN films grown on(111)Si substrate with different lattice parameters of the AlN buffer layer by metal–organic chemical vapor deposition are studied.The stress states obtained by different test methods are compared and it is found that the lattice parameter of the AlN buffer layer may have a significant effect on the stress state in the initial stage of subsequent GaN film growth.A larger compressive stress is beneficial to improved surface morphology and crystal quality of GaN film.The results of further orthogonal experiments show that an important factor affecting the lattice parameter is the growth rate of the AlN buffer layer.This work may be helpful for realizing simple GaN-on-Si structures and thus reducing the costs of growth processes.展开更多
Metalorganic chemical vapor deposition of a crack-free mirror-like surface of InGaN/GaN MQWs on Si(111)substrate is demonstrated,and an InGaN/GaN MQWs solar cell device is fabricated.Photo response measurement of the ...Metalorganic chemical vapor deposition of a crack-free mirror-like surface of InGaN/GaN MQWs on Si(111)substrate is demonstrated,and an InGaN/GaN MQWs solar cell device is fabricated.Photo response measurement of the solar cell devices shows that the fill factor FF=49.4%,open circuit voltage V_(oc)=0.32 V,and short circuit current J_(sc)=0.07 mA/cm^(2),under AM 1.5 G illumination.In order to analyze the influence of material quality on the performance of solar cells,XRD,SEM and Raman scattering experiments are carried out.It is found that insertion of a proper top AlN layer can effectively improve the material quality,and therefore enhance the photovoltaic performance of the fabricated device.展开更多
Hexagonal GaN films were prepared by nitriding Ga_2O_3 films with flowingammonia. Ga_2O_3 films were deposited on Ga-diffused Si (111) substrates by radio frequency (r.f.)magnetron sputtering. This paper have investig...Hexagonal GaN films were prepared by nitriding Ga_2O_3 films with flowingammonia. Ga_2O_3 films were deposited on Ga-diffused Si (111) substrates by radio frequency (r.f.)magnetron sputtering. This paper have investigated the change of structural properties of GaN filmsnitrided in NH_3 atmosphere at the temperatures of 850, 900, and 950 deg C for 15 min and nitridedat the temperature of 900 deg C for 10, 15, and 20 min, respectively. X-ray diffraction (XRD),scanning electron microscopy (SEM), transmission electron microscopy (TEM) and X-ray photoelectronspectroscopy (XPS) were used to analyze the structure, surface morphology and composition ofsynthesized samples. The results reveal that the as-grown films are polycrystalline GaN withhexagonal wurtzite structure and GaN films with the highest crystal quality can be obtained whennitrided at 900 deg C for 15 min.展开更多
In this work, we succeeded in the preparation of LiNb 1- x Ta x O 3 films on Si(111) substrates by means of sol gel process, and the usual sol gel process for the preparation of LiNbO 3 and LiTaO 3 films on Si substra...In this work, we succeeded in the preparation of LiNb 1- x Ta x O 3 films on Si(111) substrates by means of sol gel process, and the usual sol gel process for the preparation of LiNbO 3 and LiTaO 3 films on Si substrates was improved by adding a 33% aqueous solution of CH 3CH 2OH to the mixed sols of LiNb(OCH 2CH 3) 6 and LiTa(OCH 2CH 3) 6 . The crystallization behavior of LiNb 1- x Ta x O 3 films on Si(111) substrates has been studied. Highly c axis oriented LiNb 1- x Ta x O 3 films have been obtained within the tantalum composition range of \{0< x <0 33\}. Some factors such as the hydrogen termination of the silicon surface, the RTP annealing process that provides the unidirectional heat flow and the preheating temperature are discussed to analyze the crystallization of the c axis oriented films.展开更多
Crack free GaN films were grown on 1200×1200𝜈m^(2) patterned Si(111)substrates and 36 light emitting diodes(LEDs)were fabricated in each pattern unit.Spatial distribution of the tensile stress in the patt...Crack free GaN films were grown on 1200×1200𝜈m^(2) patterned Si(111)substrates and 36 light emitting diodes(LEDs)were fabricated in each pattern unit.Spatial distribution of the tensile stress in the pattern units and its influence on the LED performance are studied by micro-Raman and electroluminescence(EL).The Raman shift of the GaN𝐹E_(2) mode shows that the tensile stress is the maximum at the center,partially relaxed at the edge,and further relaxed at the corner.With the stress relaxation,the EL wavelength has a significant blue shift and the luminous intensity shows a great enhancement.展开更多
GaN films with different thicknesses of Al composition graded AlGaN buffer are grown on substrates of Si(111)by metal-organic chemical vapor deposition(MOCVD).The thicknesses of graded AlGaN buffer are fixed at 200 nm...GaN films with different thicknesses of Al composition graded AlGaN buffer are grown on substrates of Si(111)by metal-organic chemical vapor deposition(MOCVD).The thicknesses of graded AlGaN buffer are fixed at 200 nm,300 nm,and 450 nm,respectively.Optical microscopy,atomic force microscopy,x-ray diffraction,and Raman spectroscopy are employed to characterize these samples.We find that the thickness of the graded AlGaN buffer layer plays a key role on the following growth of GaN films.The optimized thickness of the graded AlGaN buffer layer is 300 nm.Under such conditions,the GaN epitaxial film is crack-free,and its dislocation density is the lowest.展开更多
A 2μm high quality crack-free GaN film was successfully grown on 2-inch Si(111)substrates by metal organic chemical vapor deposition with a high temperature AIN/graded-AlGaN multibuffer and an AIN/GaN superlattice in...A 2μm high quality crack-free GaN film was successfully grown on 2-inch Si(111)substrates by metal organic chemical vapor deposition with a high temperature AIN/graded-AlGaN multibuffer and an AIN/GaN superlattice interlayer.It is found that the structures,as well as the thicknesses of the multibuffer and interlayer,are crucial for the growth of a crack-free GaN epilayer.The GaN(0002)XRD FWHM of the crack-free sample is 479.8arcsec,indicating good crystal quality.An AlGaN/GaN heterostructure was grown and tested by Van der Pauw Hall measurement.The electron mobility of two-dimensional electron gas increases from 1928 cm^(2)/V.S to 12277cm^(2)/V s when the test-temperature decreases from room temperature to liquid nitrogen temperature.The electron mobility is comparable to that of AlGaN/GaN heterostructures grown on sapphire,and the largest value is obtained for an AlGaN/GaN/Si(111)heterostructure grown by metal organic chemical vapor deposition.展开更多
CaN films with an AlxGa1-xN/AlyGa1-xN superlattice （SL） buffer layer are grown on Si（111） substrates by metal-organic chemical vapor deposition （MOCVD）. The structure and strain properties of the samples are stu...CaN films with an AlxGa1-xN/AlyGa1-xN superlattice （SL） buffer layer are grown on Si（111） substrates by metal-organic chemical vapor deposition （MOCVD）. The structure and strain properties of the samples are studied by optical microscopy, Raman spectroscopy, x-ray diffractometry and atomic force microscopy. The results show that the strain status and crystalline quality of the CaN layers are strongly dependent on the difference of the Al composition between AlxCa1-xN barriers and AlyCa1-yN wells in the SLs. With a large Al composition difference, the CaN film tends to generate cracks on the surface due to the severe relaxation of the SLs. Otherwise, when using a small Al composition difference, the crystalline quality of the CaN layer degrades due to the poor function of the SLs in filtering dislocations. Under an optimized condition that the Al composition difference equals 0.1, the crack-free and compressive strained CaN film with an improved crystalline quality is achieved. Therefore, the AlxGa1-xN/AlyGal-yN SL buffer layer is a promising buffer structure for growing thick CaN films on Si substrates without crack generation.展开更多
基金Project supported by the National Natural Science Foundation of China (Grant Nos 60506001, 60476021, 60576003, 60776047 and 60836003)the National Basic Research Program of China (Grant No 2007CB936700)Project of Technological Research and Development of Hebei Province (Grant No 07215134)
文摘High-quality and nearly crack-free GaN epitaxial layer was obtained by inserting a single A1GaN interlayer between GaN epilayer and high-temperature AlN buffer layer on Si （111） substrate by metalorganic chemical vapor deposition. This paper investigates the effect of AlCaN interlayer on the structural properties of the resulting CaN epilayer. It confirms from the optical microscopy and Raman scattering spectroscopy that the AIGaN interlayer has a remarkable effect on introducing relative compressive strain to the top GaN layer and preventing the formation of cracks. X-ray diffraction and transmission electron microscopy analysis reveal that a significant reduction in both screw and edge threading dislocations is achieved in GaN epilayer by the insertion of AlGaN interlayer. The process of threading dislocation reduction in both AlGaN interlayer and GaN epilayer is demonstrated.
文摘The preparation of LiNbO 3 films on Si substrates was improved by adding CH 3CH 2OH solution containing a little water to the sol of LiNb(OC 2H 5) 6. The crystallization behavior of LiNbO 3 films on Si (111) substrates was studied and completely c axis oriented LiNbO 3 films were obtained. Such factors as the hydrogen termination of silicon surface, the RTP annealing process used, the unidirectional heat flow and the preheating temperature were taken into consideration while the crystallization of c axis oriented films was analysed. Surface morphologies of the films annealed in RTP and conventional furnaces were observed by means of AFM.
文摘AlN/GaN superlattice buffer is inserted between GaN epitaxiai layer and Si substrate before epitaxiai growth of GaN layer. High-quality and crack-free GaN epitaxiai layers can be obtained by inserting AlN/GaN superlattice buffer layer. The influence of AlN/GaN superlattice buffer layer on the properties of GaN films are investigated in this paper. One of the important roles of the superlattice is to release tensile strain between Si substrate and epilayer. Raman spectra show a substantial decrease of in-plane tensile strain in GaN layers by using AlN/GaN superlattice buffer layer. Moreover, TEM cross-sectional images show that the densities of both screw and edge dislocations are significantly reduced. The GaN films grown on Si with the superlattice buffer also have better surface morphology and optical properties.
基金supported by Beijing Municipal Science&Technology Commission,Administrative Commission of Zhongguancun Science Park(Grant Nos.Z211100007921022 and Z211100004821001)the National Natural Science Foundation of China(Grant Nos.62034008,62074142,62074140,61974162,61904172,61874175,62127807,and U21B2061)+3 种基金Key Research and Development Program of Jiangsu Province(Grant No.BE2021008-1)Beijing Nova Program(Grant No.202093)Strategic Priority Research Program of Chinese Academy of Sciences(Grant No.XDB43030101)Youth Innovation Promotion Association of Chinese Academy of Sciences(Grant No.2019115).
文摘GaN films grown on(111)Si substrate with different lattice parameters of the AlN buffer layer by metal–organic chemical vapor deposition are studied.The stress states obtained by different test methods are compared and it is found that the lattice parameter of the AlN buffer layer may have a significant effect on the stress state in the initial stage of subsequent GaN film growth.A larger compressive stress is beneficial to improved surface morphology and crystal quality of GaN film.The results of further orthogonal experiments show that an important factor affecting the lattice parameter is the growth rate of the AlN buffer layer.This work may be helpful for realizing simple GaN-on-Si structures and thus reducing the costs of growth processes.
基金Supported by the National Natural Sciences Foundation of China under Grant Nos 61076052 and 60906006the State Key Development Program for Basic Research of China under Grant No 2012CB619303the National High Technology Research and Development Program under Grant No 2011AA050514.
文摘Metalorganic chemical vapor deposition of a crack-free mirror-like surface of InGaN/GaN MQWs on Si(111)substrate is demonstrated,and an InGaN/GaN MQWs solar cell device is fabricated.Photo response measurement of the solar cell devices shows that the fill factor FF=49.4%,open circuit voltage V_(oc)=0.32 V,and short circuit current J_(sc)=0.07 mA/cm^(2),under AM 1.5 G illumination.In order to analyze the influence of material quality on the performance of solar cells,XRD,SEM and Raman scattering experiments are carried out.It is found that insertion of a proper top AlN layer can effectively improve the material quality,and therefore enhance the photovoltaic performance of the fabricated device.
基金This work was financially supported by the Science Research Foundation of Shandong Jiaotong University (No. Z200503) and the National Natural Science Foundation of China (No. 90301002).
文摘Hexagonal GaN films were prepared by nitriding Ga_2O_3 films with flowingammonia. Ga_2O_3 films were deposited on Ga-diffused Si (111) substrates by radio frequency (r.f.)magnetron sputtering. This paper have investigated the change of structural properties of GaN filmsnitrided in NH_3 atmosphere at the temperatures of 850, 900, and 950 deg C for 15 min and nitridedat the temperature of 900 deg C for 10, 15, and 20 min, respectively. X-ray diffraction (XRD),scanning electron microscopy (SEM), transmission electron microscopy (TEM) and X-ray photoelectronspectroscopy (XPS) were used to analyze the structure, surface morphology and composition ofsynthesized samples. The results reveal that the as-grown films are polycrystalline GaN withhexagonal wurtzite structure and GaN films with the highest crystal quality can be obtained whennitrided at 900 deg C for 15 min.
基金Supported by the National Natural Science Foundation of China(No.2 0 1710 15 )
文摘In this work, we succeeded in the preparation of LiNb 1- x Ta x O 3 films on Si(111) substrates by means of sol gel process, and the usual sol gel process for the preparation of LiNbO 3 and LiTaO 3 films on Si substrates was improved by adding a 33% aqueous solution of CH 3CH 2OH to the mixed sols of LiNb(OCH 2CH 3) 6 and LiTa(OCH 2CH 3) 6 . The crystallization behavior of LiNb 1- x Ta x O 3 films on Si(111) substrates has been studied. Highly c axis oriented LiNb 1- x Ta x O 3 films have been obtained within the tantalum composition range of \{0< x <0 33\}. Some factors such as the hydrogen termination of the silicon surface, the RTP annealing process that provides the unidirectional heat flow and the preheating temperature are discussed to analyze the crystallization of the c axis oriented films.
基金Supported by the National High-Technology Research and Development Program of China under Grant No 2011AA03A101the National Natural Science Foundation of China under Grant No 51072076the National Key Technology Research and Development Program of China under Grant No 2011BAE32B01.
文摘Crack free GaN films were grown on 1200×1200𝜈m^(2) patterned Si(111)substrates and 36 light emitting diodes(LEDs)were fabricated in each pattern unit.Spatial distribution of the tensile stress in the pattern units and its influence on the LED performance are studied by micro-Raman and electroluminescence(EL).The Raman shift of the GaN𝐹E_(2) mode shows that the tensile stress is the maximum at the center,partially relaxed at the edge,and further relaxed at the corner.With the stress relaxation,the EL wavelength has a significant blue shift and the luminous intensity shows a great enhancement.
基金Supported by the National High-Technology Research and Development Program of China under Grant Nos 2011AA03A112 and 2011AA03A106the National Natural Science Foundation of China under Grant Nos 60890192,50872146 and 60877006.
文摘GaN films with different thicknesses of Al composition graded AlGaN buffer are grown on substrates of Si(111)by metal-organic chemical vapor deposition(MOCVD).The thicknesses of graded AlGaN buffer are fixed at 200 nm,300 nm,and 450 nm,respectively.Optical microscopy,atomic force microscopy,x-ray diffraction,and Raman spectroscopy are employed to characterize these samples.We find that the thickness of the graded AlGaN buffer layer plays a key role on the following growth of GaN films.The optimized thickness of the graded AlGaN buffer layer is 300 nm.Under such conditions,the GaN epitaxial film is crack-free,and its dislocation density is the lowest.
基金Supported by the Knowledge Innovation Project of the Chinese Academy of Sciences under Grant Nos YYYJ-0701-02,ISCAS2008T01,ISCAS2009L01 and ISCAS2009L02the National Natural Science Foundation of China under Grant Nos 60890193 and 60906006the National Basic Research Program of China under Grant Nos 2006CB604905 and 2010CB327503.
文摘A 2μm high quality crack-free GaN film was successfully grown on 2-inch Si(111)substrates by metal organic chemical vapor deposition with a high temperature AIN/graded-AlGaN multibuffer and an AIN/GaN superlattice interlayer.It is found that the structures,as well as the thicknesses of the multibuffer and interlayer,are crucial for the growth of a crack-free GaN epilayer.The GaN(0002)XRD FWHM of the crack-free sample is 479.8arcsec,indicating good crystal quality.An AlGaN/GaN heterostructure was grown and tested by Van der Pauw Hall measurement.The electron mobility of two-dimensional electron gas increases from 1928 cm^(2)/V.S to 12277cm^(2)/V s when the test-temperature decreases from room temperature to liquid nitrogen temperature.The electron mobility is comparable to that of AlGaN/GaN heterostructures grown on sapphire,and the largest value is obtained for an AlGaN/GaN/Si(111)heterostructure grown by metal organic chemical vapor deposition.
基金Supported by the National Natural Science Foundation of China under Grant Nos 61076120 and 61106130the Natural Science Foundation and Scientific Support Plan of Jiangsu Province under Grant Nos BK2012516,BK20131072,and BE2012007
文摘CaN films with an AlxGa1-xN/AlyGa1-xN superlattice （SL） buffer layer are grown on Si（111） substrates by metal-organic chemical vapor deposition （MOCVD）. The structure and strain properties of the samples are studied by optical microscopy, Raman spectroscopy, x-ray diffractometry and atomic force microscopy. The results show that the strain status and crystalline quality of the CaN layers are strongly dependent on the difference of the Al composition between AlxCa1-xN barriers and AlyCa1-yN wells in the SLs. With a large Al composition difference, the CaN film tends to generate cracks on the surface due to the severe relaxation of the SLs. Otherwise, when using a small Al composition difference, the crystalline quality of the CaN layer degrades due to the poor function of the SLs in filtering dislocations. Under an optimized condition that the Al composition difference equals 0.1, the crack-free and compressive strained CaN film with an improved crystalline quality is achieved. Therefore, the AlxGa1-xN/AlyGal-yN SL buffer layer is a promising buffer structure for growing thick CaN films on Si substrates without crack generation.
