This paper reports that a double N layer （a-Si：H/μc-Si：H） is used to substitute the single microcrystalline silicon n layer （n-μc-Si：H） in n/p tunnel recombination junction between subcells in a-Si：H/μc-Si...This paper reports that a double N layer （a-Si：H/μc-Si：H） is used to substitute the single microcrystalline silicon n layer （n-μc-Si：H） in n/p tunnel recombination junction between subcells in a-Si：H/μc-Si：H tandem solar cells. The electrical transport and optical properties of these tunnel recombination junctions are investigated by current voltage measurement and transmission measurement. The new n/p tunnel recombination junction shows a better ohmic contact. In addition, the n/p interface is exposed to the air to examine the effect of oxidation on the tunnel recombination junction performance. The open circuit voltage and FF of a-Si：H/μc-Si：H tandem solar cell are all improved and the current leakage of the subcells can be effectively prevented efficiently when the new n/p junction is implemented as tunnel recombination junction.展开更多
We investigate the recombination mechanism in an a-Si/c-Si interface,and analyze the key factors that influence the interface passivation quality,such as Q_s,δ_p/δ_n and D_（it）.The polarity of the dielectric film ...We investigate the recombination mechanism in an a-Si/c-Si interface,and analyze the key factors that influence the interface passivation quality,such as Q_s,δ_p/δ_n and D_（it）.The polarity of the dielectric film is very important to the illustration level dependent passivation quality;when nδ_n = pδ_p and the defect level E_t equal to E_i（c-Si）,the defect states are the most effective recombination center,AFORS-HET simulation and analysis indicate that emitter doping and a-Si/c-Si band offset modulation are effective in depleting or accumulating one charged carrier.Interface states（D_（it）） severely deteriorate V_（oc） compared with J_（sc） for a-Si/c-Si HJ cell performance when D_（it） is over 1×10^（10） cm^（-2）·eV^（-1）.For a c-Si（P）/a-Si（P~＋） structure,φ_（BSF） in c-Si andφ_0 in a-Si have different performances in optimization contact resistance and c-Si（P）/a-Si（P~＋） interface recombination.展开更多
Microcrystalline silicon（μc-Si：H） solar cell with graded band gap microcrystalline silicon oxide（μc-SiOx：H） buffer layer is prepared by plasma enhanced chemical vapor deposition and exhibits improved performan...Microcrystalline silicon（μc-Si：H） solar cell with graded band gap microcrystalline silicon oxide（μc-SiOx：H） buffer layer is prepared by plasma enhanced chemical vapor deposition and exhibits improved performance compared with the cell without it. The buffer layer moderates the band gap mismatch by reducing the barrier of the p/i interface, which promotes the nucleation of the i-layer and effectively eliminates the incubation layer, and then enhances the collection efficiency of the cell in the short wavelength region of the spectrum. The p/i interface defect density also decreases from 2.2 × 10^12cm^-2to 5.0 × 10^11cm^-2. This graded buffer layer allows to simplify the deposition process for the μc-Si：H solar cell application.展开更多
The damage on the atomic bonding and electronic state in a SiO_x（1.4-2.3 nm）/c-Si（150 μm） interface has been investigated.This occurred in the process of depositing indium tin oxide（ITO） film onto the silicon s...The damage on the atomic bonding and electronic state in a SiO_x（1.4-2.3 nm）/c-Si（150 μm） interface has been investigated.This occurred in the process of depositing indium tin oxide（ITO） film onto the silicon substrate by magnetron sputtering.We observe that this damage is caused by energetic particles produced in the plasma（atoms,ions,and UV light）.The passivation quality and the variation on interface states of the SiO_x/c-Si system were mainly studied by using effective minority carrier lifetime（τ_（eff）） measurement as a potential evaluation.The results showed that the samples＇ τ_（eff）was reduced by more than 90%after ITO formation,declined from 107 μs to 5 μs.Following vacuum annealing at 200 ℃,the τ_（eff） can be restored to 30 μs.The components of Si to O bonding states at the SiO_x/c-Si interface were analyzed by x-ray photoelectron spectroscopy（XPS） coupled with depth profiling.The amorphous phase of the SiO_x layer and the ＂atomistic interleaving structure＂ at the SiO_x/c-Si interface was observed by a transmission electron microscope（TEM）.The chemical configuration of the Si-O fraction within the intermediate region is the main reason for inducing the variation of Si dangling bonds（or interface states） and effective minority carrier lifetime.After an appropriate annealing,the reduction of the Si dangling bonds between SiO_x and near the c-Si surface is helpful to improve the passivation effect.展开更多
SiNx/SiOx passivation and double side P-diffusion gettering treatment have been used for the fabrication of c-Si solar cells. The solar cells fabricated have high open circuit voltage and short circuit current after t...SiNx/SiOx passivation and double side P-diffusion gettering treatment have been used for the fabrication of c-Si solar cells. The solar cells fabricated have high open circuit voltage and short circuit current after the double P-diffusion treatment. In addition to better surface passivation effect, SiNx/SiOx layer has lower reflectivity in long wavelength range than conventional SiNx film. As a consequence, such solar cells exhibit higher conversion efficiency and better internal quantum efficiency, compared with conventional c-Si solar cells.展开更多
基金Project supported by the State Key Development Program for Basic Research of China (Grant Nos 2006CB202602 and2006CB202603)the National Natural Science Foundation of China (Grant No 60506003)
文摘This paper reports that a double N layer （a-Si：H/μc-Si：H） is used to substitute the single microcrystalline silicon n layer （n-μc-Si：H） in n/p tunnel recombination junction between subcells in a-Si：H/μc-Si：H tandem solar cells. The electrical transport and optical properties of these tunnel recombination junctions are investigated by current voltage measurement and transmission measurement. The new n/p tunnel recombination junction shows a better ohmic contact. In addition, the n/p interface is exposed to the air to examine the effect of oxidation on the tunnel recombination junction performance. The open circuit voltage and FF of a-Si：H/μc-Si：H tandem solar cell are all improved and the current leakage of the subcells can be effectively prevented efficiently when the new n/p junction is implemented as tunnel recombination junction.
基金Project supported by the International Joint Foundation of Shanghai Science & Technology Commission with Applied Material,China(No. 08520741400)the Talent Foundation of Shanghai Science & Technology Commission,China(No.08XD14022)
文摘We investigate the recombination mechanism in an a-Si/c-Si interface,and analyze the key factors that influence the interface passivation quality,such as Q_s,δ_p/δ_n and D_（it）.The polarity of the dielectric film is very important to the illustration level dependent passivation quality;when nδ_n = pδ_p and the defect level E_t equal to E_i（c-Si）,the defect states are the most effective recombination center,AFORS-HET simulation and analysis indicate that emitter doping and a-Si/c-Si band offset modulation are effective in depleting or accumulating one charged carrier.Interface states（D_（it）） severely deteriorate V_（oc） compared with J_（sc） for a-Si/c-Si HJ cell performance when D_（it） is over 1×10^（10） cm^（-2）·eV^（-1）.For a c-Si（P）/a-Si（P~＋） structure,φ_（BSF） in c-Si andφ_0 in a-Si have different performances in optimization contact resistance and c-Si（P）/a-Si（P~＋） interface recombination.
基金supported by the Key Basic Research Project of Hebei Province,China(Grant Nos.12963930D and 12963929D)the Natural Science Foundation of Hebei Province,China(Grant Nos.F2013201250 and E2012201059)the Science and Technology Research Projects of the Education Department of Hebei Province,China(Grant No.ZH2012030)
文摘Microcrystalline silicon（μc-Si：H） solar cell with graded band gap microcrystalline silicon oxide（μc-SiOx：H） buffer layer is prepared by plasma enhanced chemical vapor deposition and exhibits improved performance compared with the cell without it. The buffer layer moderates the band gap mismatch by reducing the barrier of the p/i interface, which promotes the nucleation of the i-layer and effectively eliminates the incubation layer, and then enhances the collection efficiency of the cell in the short wavelength region of the spectrum. The p/i interface defect density also decreases from 2.2 × 10^12cm^-2to 5.0 × 10^11cm^-2. This graded buffer layer allows to simplify the deposition process for the μc-Si：H solar cell application.
基金Project supported by the National Natural Science Foundation of China(Grant Nos.61274067,60876045,and 61674099)the Research and Development Foundation of SHU-SOENs PV Joint Laboratory,China(Grant No.SS-E0700601)
文摘The damage on the atomic bonding and electronic state in a SiO_x（1.4-2.3 nm）/c-Si（150 μm） interface has been investigated.This occurred in the process of depositing indium tin oxide（ITO） film onto the silicon substrate by magnetron sputtering.We observe that this damage is caused by energetic particles produced in the plasma（atoms,ions,and UV light）.The passivation quality and the variation on interface states of the SiO_x/c-Si system were mainly studied by using effective minority carrier lifetime（τ_（eff）） measurement as a potential evaluation.The results showed that the samples＇ τ_（eff）was reduced by more than 90%after ITO formation,declined from 107 μs to 5 μs.Following vacuum annealing at 200 ℃,the τ_（eff） can be restored to 30 μs.The components of Si to O bonding states at the SiO_x/c-Si interface were analyzed by x-ray photoelectron spectroscopy（XPS） coupled with depth profiling.The amorphous phase of the SiO_x layer and the ＂atomistic interleaving structure＂ at the SiO_x/c-Si interface was observed by a transmission electron microscope（TEM）.The chemical configuration of the Si-O fraction within the intermediate region is the main reason for inducing the variation of Si dangling bonds（or interface states） and effective minority carrier lifetime.After an appropriate annealing,the reduction of the Si dangling bonds between SiO_x and near the c-Si surface is helpful to improve the passivation effect.
基金Project supported by the National Natural Science Foundation of China(Nos.61474104,61504131)
文摘SiNx/SiOx passivation and double side P-diffusion gettering treatment have been used for the fabrication of c-Si solar cells. The solar cells fabricated have high open circuit voltage and short circuit current after the double P-diffusion treatment. In addition to better surface passivation effect, SiNx/SiOx layer has lower reflectivity in long wavelength range than conventional SiNx film. As a consequence, such solar cells exhibit higher conversion efficiency and better internal quantum efficiency, compared with conventional c-Si solar cells.
