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AFM and XPS Study on the Surface and Interface States of CuPc and SiO_2 Films
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作者 陈金伙 王永顺 +2 位作者 朱海华 胡加兴 张福甲 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2006年第8期1360-1366,共7页
A CuPc/SiO2 sample is fabricated. Its morphology is characterized by atomic force microscopy, and the electron states are investigated by X-ray photoelectron spectroscopy. In order to investigate these spectra in deta... A CuPc/SiO2 sample is fabricated. Its morphology is characterized by atomic force microscopy, and the electron states are investigated by X-ray photoelectron spectroscopy. In order to investigate these spectra in detail, all of these spectra are normalized to the height of the most intense peak,and each component is fitted with a single Gaussian function. Analysis shows that the O element has great bearing on the electron states and that SiO2 layers produced by spurting technology are better than those produced by oxidation technology. 展开更多
关键词 CuPc/SiO2 X-ray photoelectron spectroscopy surface and interface analysis
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