In this study, the influence of multiple interruptions with trimethylindium(TMIn)-treatment in InGaN/GaN multiple quantum wells(MQWs) on green light-emitting diode(LED) is investigated. A comparison of conventional LE...In this study, the influence of multiple interruptions with trimethylindium(TMIn)-treatment in InGaN/GaN multiple quantum wells(MQWs) on green light-emitting diode(LED) is investigated. A comparison of conventional LEDs with the one fabricated with our method shows that the latter has better optical properties. Photoluminescence(PL) full-width at half maximum(FWHM) is reduced, light output power is much higher and the blue shift of electroluminescence(EL) dominant wavelength becomes smaller with current increasing. These improvements should be attributed to the reduced interface roughness of MQW and more uniformity of indium distribution in MQWs by the interruptions with TMIn-treatment.展开更多
The influence of the growth temperature,TMIn/TEGa andⅤ/Ⅲratio on the V-defects of InGaN/GaN multi-quantum wells（MQWs） has been investigated and discussed.When the TMIn flow increases from 180 to 200 sccm,the densi...The influence of the growth temperature,TMIn/TEGa andⅤ/Ⅲratio on the V-defects of InGaN/GaN multi-quantum wells（MQWs） has been investigated and discussed.When the TMIn flow increases from 180 to 200 sccm,the density of V-defects increases from 2.72×10^（18） to 5.24×10^（18） cm^（-2）,and the V-defect width and depth increase too.The density also increases with the growth temperature.The densities are 2.05×10~8,2.72×10^（18） and 4.23×10~8 cm^（-2）,corresponding to a growth temperature of 748,753 and 758℃respectively.When the NH_3 flows are 5000,6600 and 8000 sccm,the densities of the V-defects of these samples are 6.34×10^（18）,2.72×10^（18） and 4.13×10^（18） cm^（-2）,respectively.A properⅤ/Ⅲratio is needed to achieve step flow growth mode.We get the best quality of InGaN/GaN MQWs at a growth temperature of 753℃TMIn flow at 180 sccm,NH_3 flow at 6600 sccm,a flatter surface and less V-defects density.The depths of these V-defects are from 10 to 30 nm,and the widths are from 100 to 200 nm.In order to suppress the influence of V-defects on reverse current and electro-static discharge of LEDs,it is essential to grow thicker p-GaN to fill the V-defects.展开更多
基金supported by the National Natural Science Foundation of China(Grant Nos.11204360 and 61210014)the Science and Technology Planning Projects of Guangdong Province,China(Grant Nos.2014B050505020,2015B010114007,and 2014B090904045)+2 种基金the Research Fund for the Doctoral Program of Higher Education of China(Grant No.20134407110008)the Guangzhou Municipal Science and Technology Project of Guangdong Province,China(Grant No.2016201604030027)the Zhongshan Science and Technology Project of Guangdong Province,China(Grant No.2013B3FC0003)
文摘In this study, the influence of multiple interruptions with trimethylindium(TMIn)-treatment in InGaN/GaN multiple quantum wells(MQWs) on green light-emitting diode(LED) is investigated. A comparison of conventional LEDs with the one fabricated with our method shows that the latter has better optical properties. Photoluminescence(PL) full-width at half maximum(FWHM) is reduced, light output power is much higher and the blue shift of electroluminescence(EL) dominant wavelength becomes smaller with current increasing. These improvements should be attributed to the reduced interface roughness of MQW and more uniformity of indium distribution in MQWs by the interruptions with TMIn-treatment.
基金Project supported by the National High Technology Research and Development Program of China(No.2008AA03A197)
文摘The influence of the growth temperature,TMIn/TEGa andⅤ/Ⅲratio on the V-defects of InGaN/GaN multi-quantum wells（MQWs） has been investigated and discussed.When the TMIn flow increases from 180 to 200 sccm,the density of V-defects increases from 2.72×10^（18） to 5.24×10^（18） cm^（-2）,and the V-defect width and depth increase too.The density also increases with the growth temperature.The densities are 2.05×10~8,2.72×10^（18） and 4.23×10~8 cm^（-2）,corresponding to a growth temperature of 748,753 and 758℃respectively.When the NH_3 flows are 5000,6600 and 8000 sccm,the densities of the V-defects of these samples are 6.34×10^（18）,2.72×10^（18） and 4.13×10^（18） cm^（-2）,respectively.A properⅤ/Ⅲratio is needed to achieve step flow growth mode.We get the best quality of InGaN/GaN MQWs at a growth temperature of 753℃TMIn flow at 180 sccm,NH_3 flow at 6600 sccm,a flatter surface and less V-defects density.The depths of these V-defects are from 10 to 30 nm,and the widths are from 100 to 200 nm.In order to suppress the influence of V-defects on reverse current and electro-static discharge of LEDs,it is essential to grow thicker p-GaN to fill the V-defects.
