Nano-composite films of Au particles in Teflon were obtained by thermal vacuum deposition. The obtained films were characterized by the different shapes and dimensions of the inclusion particles. Absorption spectra of...Nano-composite films of Au particles in Teflon were obtained by thermal vacuum deposition. The obtained films were characterized by the different shapes and dimensions of the inclusion particles. Absorption spectra of the films were measured in-situ. A model for the calculation of the optical properties of the nano-composite thin films with an inho-mogeneous distribution of the inclusions along the thickness of the film is proposed. Absorption properties of inclusions were analyzed by considering the local field interaction. The calculated absorption profiles are compared with the experimentally obtained absorption profiles. This comparison gives a possibility to draw conclusions about the concentration, shapes and shape distributions of the inclusion particles. For example, the films obtained by duration deposition are characterized by inclusions having the shape of prolate ellipsoids oriented normally to surface of the film.展开更多
Films formed with nanosized nickel particles on teflon surface were prepared by means of catalyst enhanced chemical vapor deposition （CECVD） with Ni（dmg）2, Ni（acac）2, Ni（hfac）2, Ni（TMHD）2, and Ni（cp）2 as p...Films formed with nanosized nickel particles on teflon surface were prepared by means of catalyst enhanced chemical vapor deposition （CECVD） with Ni（dmg）2, Ni（acac）2, Ni（hfac）2, Ni（TMHD）2, and Ni（cp）2 as precursors, and complexes Pd（hfac）2, PdC12 and Pd（η^3-2-methylallyl）acac as catalyst under cartier gas （H2）. The film growth rate depends on the precursors and substrate temperature. The chemical value, purity and surface morphology of the Ni particle films were characterized by X-ray photoelectron spectroscopy （XPS） and scanning electron microscopy （SEM）. The films obtained were shiny with silvery color, and consisted of grains with a particle size of 50-140 nm. The Ni was metallic of which the purity was about 90%-95% from XPS analysis. SEM micrograph showed that the film had good morphology.展开更多
Catalyst enhanced chemical vapor deposition of nickel film on high Tg polymers such as teflon(PTFE), polyimide(PI), and polysulfone(PS) was investigated by hot wall and cold wall CVD, in which Ni(dmg)_2, Ni(acac)_2, N...Catalyst enhanced chemical vapor deposition of nickel film on high Tg polymers such as teflon(PTFE), polyimide(PI), and polysulfone(PS) was investigated by hot wall and cold wall CVD, in which Ni(dmg)_2, Ni(acac)_2, Ni(hfac)_2, Ni(TMHD)_2, and Ni(cp)_2 are used as precursors, and palladium complexes are used as catalysts. The films obtained were shiny with silvery color. The Ni was metallic and the purity of Ni was about 92%-95% from XPS analysis. SEM micrographs show that the film had good morphology. The conductivity of the film was about 0.5-4 W·cm^(-1). Ni films had good adhesion with polyimide and polysulfone.展开更多
The organic thin-film field effect transistor was prepared through vacuum deposition by using teflon as dielectric material. Indium-tin-oxide acted as the source and drain electrodes. Copper phthalocyanine and teflon ...The organic thin-film field effect transistor was prepared through vacuum deposition by using teflon as dielectric material. Indium-tin-oxide acted as the source and drain electrodes. Copper phthalocyanine and teflon were used as the semiconductor layer and dielectric layer, respectively. The gate electrode was made of Ag. The channel length between the source and drain was 50μm. After preparing the source and drain electrodes by lithography, the copper phthalocyanine layer, teflon layer and Ag layer were prepared by vacuum deposition sequentially. The field effect electron mobility of the device reached 1.1×10-6 cm2/(V·s), and the on/off current ratio reached 500.展开更多
文摘Nano-composite films of Au particles in Teflon were obtained by thermal vacuum deposition. The obtained films were characterized by the different shapes and dimensions of the inclusion particles. Absorption spectra of the films were measured in-situ. A model for the calculation of the optical properties of the nano-composite thin films with an inho-mogeneous distribution of the inclusions along the thickness of the film is proposed. Absorption properties of inclusions were analyzed by considering the local field interaction. The calculated absorption profiles are compared with the experimentally obtained absorption profiles. This comparison gives a possibility to draw conclusions about the concentration, shapes and shape distributions of the inclusion particles. For example, the films obtained by duration deposition are characterized by inclusions having the shape of prolate ellipsoids oriented normally to surface of the film.
基金Supported by the National Natural Science Foundation ofChina (40172018, 20275011)
文摘Films formed with nanosized nickel particles on teflon surface were prepared by means of catalyst enhanced chemical vapor deposition （CECVD） with Ni（dmg）2, Ni（acac）2, Ni（hfac）2, Ni（TMHD）2, and Ni（cp）2 as precursors, and complexes Pd（hfac）2, PdC12 and Pd（η^3-2-methylallyl）acac as catalyst under cartier gas （H2）. The film growth rate depends on the precursors and substrate temperature. The chemical value, purity and surface morphology of the Ni particle films were characterized by X-ray photoelectron spectroscopy （XPS） and scanning electron microscopy （SEM）. The films obtained were shiny with silvery color, and consisted of grains with a particle size of 50-140 nm. The Ni was metallic of which the purity was about 90%-95% from XPS analysis. SEM micrograph showed that the film had good morphology.
基金Funded by the National Natural Science Foundation of China(51566005)
文摘Catalyst enhanced chemical vapor deposition of nickel film on high Tg polymers such as teflon(PTFE), polyimide(PI), and polysulfone(PS) was investigated by hot wall and cold wall CVD, in which Ni(dmg)_2, Ni(acac)_2, Ni(hfac)_2, Ni(TMHD)_2, and Ni(cp)_2 are used as precursors, and palladium complexes are used as catalysts. The films obtained were shiny with silvery color. The Ni was metallic and the purity of Ni was about 92%-95% from XPS analysis. SEM micrographs show that the film had good morphology. The conductivity of the film was about 0.5-4 W·cm^(-1). Ni films had good adhesion with polyimide and polysulfone.
文摘The organic thin-film field effect transistor was prepared through vacuum deposition by using teflon as dielectric material. Indium-tin-oxide acted as the source and drain electrodes. Copper phthalocyanine and teflon were used as the semiconductor layer and dielectric layer, respectively. The gate electrode was made of Ag. The channel length between the source and drain was 50μm. After preparing the source and drain electrodes by lithography, the copper phthalocyanine layer, teflon layer and Ag layer were prepared by vacuum deposition sequentially. The field effect electron mobility of the device reached 1.1×10-6 cm2/(V·s), and the on/off current ratio reached 500.
