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70-nanometer DRAM Process Technology Employing the CVD Method
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作者 赵建才 《当代外语研究》 2005年第2期19-20,共2页
随着物质生活水平的提高,人们对手机、个人电脑和家用电器的使用功能要求越来越高。为了满足人们的需求,采用高性能的动态随机存取存储器是提高电子产品性能的关键,因此韩国三星公司利用化学汽相沉淀法开发出70纳米级的动态随机存取存... 随着物质生活水平的提高,人们对手机、个人电脑和家用电器的使用功能要求越来越高。为了满足人们的需求,采用高性能的动态随机存取存储器是提高电子产品性能的关键,因此韩国三星公司利用化学汽相沉淀法开发出70纳米级的动态随机存取存储器加工技术。该技术克服了目前采用物理汽相沉淀法加工存储器所存在的缺陷,如晶片表面沉积物分布不均,同时该技术可节约20%的制造成本。 展开更多
关键词 沉淀法 nanometer DRAM Process Technology Employing the cvd method 动态随机存取存储器 cvd
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Characterization of silylated Ti-grafted HMS catalyst and its excellent epoxidation performance 被引量:1
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作者 Xue Feng Li Huan Xin Gao +5 位作者 Guo Jie Jin Lin Ding Lu Chen Hong Yun Yang Xin He Qing Ling Chen 《Chinese Chemical Letters》 SCIE CAS CSCD 2007年第5期591-594,共4页
Silylated Ti-grafted hexagonal mesoporous silica (HMS) catalyst was prepared by the chemical vapor deposition (CVD) using TIC14 as titanium source and hexamethyldisilazane (HMDSZ) as silylating agent. The sample... Silylated Ti-grafted hexagonal mesoporous silica (HMS) catalyst was prepared by the chemical vapor deposition (CVD) using TIC14 as titanium source and hexamethyldisilazane (HMDSZ) as silylating agent. The samples were characterized by XRD, N2- adsorption, PTIR, 29Si NMR, DR UV-vis, and evaluated by epoxidation of styrene, propylene, cyclohexene, and 1-hexene with cumene hydroperoxide (CLIP) as oxidant, respectively. It is revealed that the catalyst possesses typical mesoporous structure, high hydrophobicity and highly dispersed tetracoordinated titanium sites and hence exhibits excellent performance in epoxidation of olefins. 展开更多
关键词 Ti-grafted HMS SILYLATION the cvd method EPOXIDATION
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