Owing to the characteristics of arc ion plating(AIP) technique, the structure and composition of TiAlN films can be tailored by controlling of various parameters such as compositions of target materials, N2 partial pr...Owing to the characteristics of arc ion plating(AIP) technique, the structure and composition of TiAlN films can be tailored by controlling of various parameters such as compositions of target materials, N2 partial pressure, substrate bias and so on. In this study, several titanium aluminum nitride films were deposited on 1Cr11Ni2W2MoV steel for compressor blade of areo-engine under different d.c pulse bias voltage and nitrogen partial pressure. The effects of substrate pulse bias and nitrogen partial pressure on the deposition rate, droplet formation, microstruture and elemental component of the films were investigated.展开更多
The purpose of this study was to investigate the effects of Zr interlayer on the structure and mechanical properties of TiAlN films, which were deposited on the M2 high-speed steel substrates by means of plasma-enhanc...The purpose of this study was to investigate the effects of Zr interlayer on the structure and mechanical properties of TiAlN films, which were deposited on the M2 high-speed steel substrates by means of plasma-enhanced magnetron sputtering. The result shows that the crystal orientation of Zr/TiAlN films is similar to that of single-layered TiAlN films, but the difference is that AlN(111) of Zr/TiAlN films disappears completely. With respect to Zr interlayer, the texture coefficient of Zr/TiAlN films is approximately 1. Zr/TiAlN films exhibit a compact isometric structure, which is distinctly different from the columnar structure existing in the single-layered TiAlN films and Ti/TiAlN films. The hardness and H3/E*2 of Zr/TiAlN films are, respectively, enhanced to be 36.6 GPa and 0.147. With a few cracks emerging around the indention, the adhesion strength of TiAlN films is obviously advanced by adding Zr metal interlayer.展开更多
采用多弧离子镀在高速钢基底上沉积Ti Al N薄膜。利用扫描电镜(SEM)观测薄膜的表面形貌;用EDS分析薄膜表面的成分;用表面轮廓仪测试薄膜的厚度并结合沉积时间计算出沉积速率;用维氏硬度仪测量薄膜的硬度;用XRD表征薄膜的微观结构。结果...采用多弧离子镀在高速钢基底上沉积Ti Al N薄膜。利用扫描电镜(SEM)观测薄膜的表面形貌;用EDS分析薄膜表面的成分;用表面轮廓仪测试薄膜的厚度并结合沉积时间计算出沉积速率;用维氏硬度仪测量薄膜的硬度;用XRD表征薄膜的微观结构。结果表明,随着偏压峰值的增大,表面大颗粒逐渐减少,致密性逐渐变好,薄膜硬度也随之增加。沉积参数对薄膜成分有影响,偏压峰值对薄膜中Al含量有较明显的影响,而占空比则主要影响Ti含量。本文对实验结果进行了较详细的讨论和分析。展开更多
目的为进一步提高电弧离子镀TiAlN薄膜的摩擦磨损性能,研究添加元素Y对Cr Ni3MoVA钢表面电弧离子镀Ti Al N薄膜微观组织结构、硬度、弹性模量及摩擦磨损性能的影响。方法采用Ti-50Al和Ti-49Al-2Y合金靶,利用电弧离子镀技术在Cr Ni3MoVA...目的为进一步提高电弧离子镀TiAlN薄膜的摩擦磨损性能,研究添加元素Y对Cr Ni3MoVA钢表面电弧离子镀Ti Al N薄膜微观组织结构、硬度、弹性模量及摩擦磨损性能的影响。方法采用Ti-50Al和Ti-49Al-2Y合金靶,利用电弧离子镀技术在Cr Ni3MoVA钢表面制备两种氮化物薄膜,利用纳米压痕仪和摩擦磨损试验机分别测试了两种薄膜的硬度、弹性模量和摩擦系数,并用SEM、TEM、EDS、GIXRD分析了两种薄膜磨损前后的形貌、成分、相结构。结果添加Y降低了TiAlN薄膜的晶粒尺寸,使其由柱状晶结构转变为近似等轴晶结构。Ti Al YN薄膜的硬度较TiAlN薄膜提高了约25%,其弹性模量与TiAlN薄膜相近。与Si3N4对磨时,在加载载荷为20 N、往复行程为10 mm、往复速率为400 r/min的条件下,TiAlN薄膜的稳定摩擦系数为0.70~0.75,而TiAlYN薄膜的稳定摩擦系数为0.60~0.65,Ti Al YN薄膜的磨损率较Ti Al N薄膜的磨损率减小了约47%。Ti Al N薄膜与Ti Al YN薄膜的主要磨损机制均为刮擦磨损,TiAlN薄膜的失效机制主要是脆性裂纹导致的剥落。结论添加Y对Ti Al N薄膜具有明显的减摩耐磨作用,并提高了Ti Al N薄膜在摩擦磨损过程中的抗开裂和抗剥落性能。展开更多
文摘Owing to the characteristics of arc ion plating(AIP) technique, the structure and composition of TiAlN films can be tailored by controlling of various parameters such as compositions of target materials, N2 partial pressure, substrate bias and so on. In this study, several titanium aluminum nitride films were deposited on 1Cr11Ni2W2MoV steel for compressor blade of areo-engine under different d.c pulse bias voltage and nitrogen partial pressure. The effects of substrate pulse bias and nitrogen partial pressure on the deposition rate, droplet formation, microstruture and elemental component of the films were investigated.
基金financially supported by the Ministry of Industry and Information Technology of China(No.2012ZX04003011)the National Natural Science Foundation of China(No.51275323)
文摘The purpose of this study was to investigate the effects of Zr interlayer on the structure and mechanical properties of TiAlN films, which were deposited on the M2 high-speed steel substrates by means of plasma-enhanced magnetron sputtering. The result shows that the crystal orientation of Zr/TiAlN films is similar to that of single-layered TiAlN films, but the difference is that AlN(111) of Zr/TiAlN films disappears completely. With respect to Zr interlayer, the texture coefficient of Zr/TiAlN films is approximately 1. Zr/TiAlN films exhibit a compact isometric structure, which is distinctly different from the columnar structure existing in the single-layered TiAlN films and Ti/TiAlN films. The hardness and H3/E*2 of Zr/TiAlN films are, respectively, enhanced to be 36.6 GPa and 0.147. With a few cracks emerging around the indention, the adhesion strength of TiAlN films is obviously advanced by adding Zr metal interlayer.
文摘采用多弧离子镀在高速钢基底上沉积Ti Al N薄膜。利用扫描电镜(SEM)观测薄膜的表面形貌;用EDS分析薄膜表面的成分;用表面轮廓仪测试薄膜的厚度并结合沉积时间计算出沉积速率;用维氏硬度仪测量薄膜的硬度;用XRD表征薄膜的微观结构。结果表明,随着偏压峰值的增大,表面大颗粒逐渐减少,致密性逐渐变好,薄膜硬度也随之增加。沉积参数对薄膜成分有影响,偏压峰值对薄膜中Al含量有较明显的影响,而占空比则主要影响Ti含量。本文对实验结果进行了较详细的讨论和分析。
文摘目的为进一步提高电弧离子镀TiAlN薄膜的摩擦磨损性能,研究添加元素Y对Cr Ni3MoVA钢表面电弧离子镀Ti Al N薄膜微观组织结构、硬度、弹性模量及摩擦磨损性能的影响。方法采用Ti-50Al和Ti-49Al-2Y合金靶,利用电弧离子镀技术在Cr Ni3MoVA钢表面制备两种氮化物薄膜,利用纳米压痕仪和摩擦磨损试验机分别测试了两种薄膜的硬度、弹性模量和摩擦系数,并用SEM、TEM、EDS、GIXRD分析了两种薄膜磨损前后的形貌、成分、相结构。结果添加Y降低了TiAlN薄膜的晶粒尺寸,使其由柱状晶结构转变为近似等轴晶结构。Ti Al YN薄膜的硬度较TiAlN薄膜提高了约25%,其弹性模量与TiAlN薄膜相近。与Si3N4对磨时,在加载载荷为20 N、往复行程为10 mm、往复速率为400 r/min的条件下,TiAlN薄膜的稳定摩擦系数为0.70~0.75,而TiAlYN薄膜的稳定摩擦系数为0.60~0.65,Ti Al YN薄膜的磨损率较Ti Al N薄膜的磨损率减小了约47%。Ti Al N薄膜与Ti Al YN薄膜的主要磨损机制均为刮擦磨损,TiAlN薄膜的失效机制主要是脆性裂纹导致的剥落。结论添加Y对Ti Al N薄膜具有明显的减摩耐磨作用,并提高了Ti Al N薄膜在摩擦磨损过程中的抗开裂和抗剥落性能。
