The periodic [Ti/TiB2]n （n=l, 2, 3） multilayered films were prepared on the substrate of AISI 316L stainless steel by magnetron sputtering to enhance the adhesion of TiB2 films based on the remarkable mechanical per...The periodic [Ti/TiB2]n （n=l, 2, 3） multilayered films were prepared on the substrate of AISI 316L stainless steel by magnetron sputtering to enhance the adhesion of TiB2 films based on the remarkable mechanical performance of layered films. The influence of periods on microstructure, adhesion and hardness of [Ti/TiB2]n multilayered films was studied. X-ray diffraction （XRD） analysis shows that the monolayer TiB2 films exhibit （001） preferred orientation, and the preferred orientation of [Ti/TiB2], multilayered films transfers from （001） to （100） with the increase of periods. The cross-sectional morphology of each film displays homogeneity by field emission scanning electron microscopy （FESEM）. The hardness of the films measured via nanoindention changes from 20 to 26 GPa with the increase of periods. These values of hardness are a bit lower than that of the monolayer TiB2 films which is up to 33 GPa. However, the [Ti/TiB2]n multilayered films present a considerably good adhesion, which reaches a maximum of 24 N, in comparison with the monolayer TiB2 films according to the experimental results.展开更多
Several nc-TiN/a-TiB2 thin films comprised of nanocrystalline (nc-) TiN and amor phous (a-) TiB2 phases were deposited on Si(100) at room temperature by reactive unbalanced dc magnetron sputtering, followed by vacuum ...Several nc-TiN/a-TiB2 thin films comprised of nanocrystalline (nc-) TiN and amor phous (a-) TiB2 phases were deposited on Si(100) at room temperature by reactive unbalanced dc magnetron sputtering, followed by vacuum annealed at 400, 600, 80 0 and 1000℃ for 1h, respectively. Effects of B content on microstructure, mecha nical behaviors and thermal microstructure stability have been investigated by X -ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS) and nanoindentation measurements. The results indicated that B addition greatly affected both microstructure and mechanical behavior of nc-Ti N/a-TiB2 thin films. With increasing B content the grain size decreased. A maxim um hardness value of about 33GPa was obtained at B content of about 19at.%. The improved mechanical properties of nc-TiN/a-TiB2 films with the addition of B int o TiN were attributed to their densified microstructure with development of fine grain size. Only addition of sufficient B could restrain grain growth during an nealing. High B content resulted in high microstructure stability. The crystalli zation of amorphous matrix occurred at about 800℃, forming TiB or TiB2 crystall ite, depending on B content. Before that no change in bonding configuration was found.展开更多
The TiB2 thin films were deposited on steel substrates using RF magnetron sputtering technique with the low normalized substrate temperature （0.1〈Ts/Tm〈0.2）. Microstructure of these films was obtained by field emi...The TiB2 thin films were deposited on steel substrates using RF magnetron sputtering technique with the low normalized substrate temperature （0.1〈Ts/Tm〈0.2）. Microstructure of these films was obtained by field emission scanning electron microscope （FESEM） and the grazing incidence X-ray diffraction （GIXRD） characterization, while the composition of films was obtained using Auger emission spectroscopy （AES） analysis. It was found that the TiB2 thin films were overstoichiometric with the B/Ti ratio at 2.33 and the diffusion of Ti and B atoms on the substrate surface was greatly improved at 350 ℃. Moreover, a new dense structure, named ＂equiaxed＂ grain structure was observed by FESEM at this substrate temperature, Combined with FESEM and AES analysis, it was suggested that the ＂equiaxed＂ grain structure was located in Zone 2 at the normalized substrate temperature as low as 0.18.展开更多
An apparatus was specifically developed for micro-friction and adhesion measurements. The force measurement range is 10-2000 μN with a horizontal speed of 10-400 μm/s. The apparatus was tested using a 0.7-mm diamete...An apparatus was specifically developed for micro-friction and adhesion measurements. The force measurement range is 10-2000 μN with a horizontal speed of 10-400 μm/s. The apparatus was tested using a 0.7-mm diameter steel ball as the upper specimen to measure the micro friction and adhesion behaviour of a Si （100） wafer and a TiB2 film. The effects of rest time, speed, and load were studied. The results show that the maximum static and sliding friction forces of both the Si （100） wafer and the TiB2 film increase with the load. At low speeds, the influence of speed on the friction force is significant. The adhesion forces of the Si （100） wafer and the TiB2 film increase with rest time, reaching stable values after about 3000 s. The TiB2 film has significantly less adhesion and micro friction forces than the Si （100） wafer.展开更多
基金Project(51175212)supported by the National Natural Science Foundation of China
文摘The periodic [Ti/TiB2]n （n=l, 2, 3） multilayered films were prepared on the substrate of AISI 316L stainless steel by magnetron sputtering to enhance the adhesion of TiB2 films based on the remarkable mechanical performance of layered films. The influence of periods on microstructure, adhesion and hardness of [Ti/TiB2]n multilayered films was studied. X-ray diffraction （XRD） analysis shows that the monolayer TiB2 films exhibit （001） preferred orientation, and the preferred orientation of [Ti/TiB2], multilayered films transfers from （001） to （100） with the increase of periods. The cross-sectional morphology of each film displays homogeneity by field emission scanning electron microscopy （FESEM）. The hardness of the films measured via nanoindention changes from 20 to 26 GPa with the increase of periods. These values of hardness are a bit lower than that of the monolayer TiB2 films which is up to 33 GPa. However, the [Ti/TiB2]n multilayered films present a considerably good adhesion, which reaches a maximum of 24 N, in comparison with the monolayer TiB2 films according to the experimental results.
文摘Several nc-TiN/a-TiB2 thin films comprised of nanocrystalline (nc-) TiN and amor phous (a-) TiB2 phases were deposited on Si(100) at room temperature by reactive unbalanced dc magnetron sputtering, followed by vacuum annealed at 400, 600, 80 0 and 1000℃ for 1h, respectively. Effects of B content on microstructure, mecha nical behaviors and thermal microstructure stability have been investigated by X -ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS) and nanoindentation measurements. The results indicated that B addition greatly affected both microstructure and mechanical behavior of nc-Ti N/a-TiB2 thin films. With increasing B content the grain size decreased. A maxim um hardness value of about 33GPa was obtained at B content of about 19at.%. The improved mechanical properties of nc-TiN/a-TiB2 films with the addition of B int o TiN were attributed to their densified microstructure with development of fine grain size. Only addition of sufficient B could restrain grain growth during an nealing. High B content resulted in high microstructure stability. The crystalli zation of amorphous matrix occurred at about 800℃, forming TiB or TiB2 crystall ite, depending on B content. Before that no change in bonding configuration was found.
基金the Scientific Research-special Funds of Dongguan City in Guangdong Province (No. 2003D1011)
文摘The TiB2 thin films were deposited on steel substrates using RF magnetron sputtering technique with the low normalized substrate temperature （0.1〈Ts/Tm〈0.2）. Microstructure of these films was obtained by field emission scanning electron microscope （FESEM） and the grazing incidence X-ray diffraction （GIXRD） characterization, while the composition of films was obtained using Auger emission spectroscopy （AES） analysis. It was found that the TiB2 thin films were overstoichiometric with the B/Ti ratio at 2.33 and the diffusion of Ti and B atoms on the substrate surface was greatly improved at 350 ℃. Moreover, a new dense structure, named ＂equiaxed＂ grain structure was observed by FESEM at this substrate temperature, Combined with FESEM and AES analysis, it was suggested that the ＂equiaxed＂ grain structure was located in Zone 2 at the normalized substrate temperature as low as 0.18.
基金the National Natural Science Foundation of China (No. 50475012)the National Key Basic Research and Devel-opment (973) Program (No. 2003CB716201)
文摘An apparatus was specifically developed for micro-friction and adhesion measurements. The force measurement range is 10-2000 μN with a horizontal speed of 10-400 μm/s. The apparatus was tested using a 0.7-mm diameter steel ball as the upper specimen to measure the micro friction and adhesion behaviour of a Si （100） wafer and a TiB2 film. The effects of rest time, speed, and load were studied. The results show that the maximum static and sliding friction forces of both the Si （100） wafer and the TiB2 film increase with the load. At low speeds, the influence of speed on the friction force is significant. The adhesion forces of the Si （100） wafer and the TiB2 film increase with rest time, reaching stable values after about 3000 s. The TiB2 film has significantly less adhesion and micro friction forces than the Si （100） wafer.
