TiN/TiAlN multilayer coatings were prepared by arc ion plating with separate targets. In order to decrease the unfavorable macroparticles, a straight magnetized filter was used for the low melting aluminium target. Th...TiN/TiAlN multilayer coatings were prepared by arc ion plating with separate targets. In order to decrease the unfavorable macroparticles, a straight magnetized filter was used for the low melting aluminium target. The results show that the output plasmas of titanium target without filter and aluminium target with filter reach the substrate with the same order of magnitude. Meanwhile, the number of macropartieles in TiN/TiAlN multilayer coatings deposited with separate targets is only 1/10-1/3 of that deposited with alloy target reported in literature. Al atom addition may lead to the decrease of peak at （200） lattice plane and strengthening of peak at （111） and （220） lattice planes. The measured hardness of TiN/TiAlN multilayer coatings accords with the mixture principle and the maximum hardness is HV2495. The adhesion strength reaches 75 N.展开更多
采用多弧离子镀技术选取钛靶电流分别为60A、70A、80A和基体偏压分别为-240V、-300V、-360V在高速钢基体上制备Ti N/Ti Al N多层薄膜。使用划痕仪、显微硬度计、摩擦磨损试验机和马弗炉对膜层的膜基结合力、显微硬度、摩擦磨损性能和热...采用多弧离子镀技术选取钛靶电流分别为60A、70A、80A和基体偏压分别为-240V、-300V、-360V在高速钢基体上制备Ti N/Ti Al N多层薄膜。使用划痕仪、显微硬度计、摩擦磨损试验机和马弗炉对膜层的膜基结合力、显微硬度、摩擦磨损性能和热震性能进行检测。结果表明:在钛靶电流为70A和基体偏压为-240V时膜基结合力最高,同时显微硬度也较高;在基体偏压为-300V的条件下,钛靶电流为70A时的摩擦系数最小,其耐磨性能良好;基体偏压为-240V时的抗热震性能良好。展开更多
合金材料因具有良好的机械性能、可铸造性能、价格适中等优点,在金属修复体及牙科切削工具中应用广泛。然而口腔复杂生理环境对合金材料的耐腐蚀性、机械性能和生物性能提出了更高的要求。硬质薄膜Ti N尤其是Ti Al N作为新兴的合金表面...合金材料因具有良好的机械性能、可铸造性能、价格适中等优点,在金属修复体及牙科切削工具中应用广泛。然而口腔复杂生理环境对合金材料的耐腐蚀性、机械性能和生物性能提出了更高的要求。硬质薄膜Ti N尤其是Ti Al N作为新兴的合金表面处理方法之一,在提高牙科合金机械和生物性能方面有积极作用。本文旨在对牙科合金细胞毒性、合金表面涂镀硬质薄膜的机械及生物性能做一综述。展开更多
Plasma-activated electron beam-physical vapor deposition（EB-PVD）was used for depositing nitride multilayer coatings in this work.Different from the conventional coating methods,the multilayers were obtained by manip...Plasma-activated electron beam-physical vapor deposition（EB-PVD）was used for depositing nitride multilayer coatings in this work.Different from the conventional coating methods,the multilayers were obtained by manipulating electron beam（EB）to jump between two different evaporation sources alternately with variable frequencies（jumping beam technology）.The plasma activation was generated by a hollow cathode plasma unit.The deposition process was demonstrated by means of tailoring TiN/TiAlN multilayers with different modulation periods（M1：26.5 nm,M2：80.0 nm,M3：6.0 nm,M4：4.0 nm）.The microstructure and hardness of the multilayer coatings were comparatively studied with TiN and TiAlN singlelayer coatings.The columnar structure of the coatings（TiN,TiAlN,M1,M2）is replaced by a glassy-like microstructure when the modulation period decreases to less than 10 nm（M3,M4）.Simultaneously,superlattice growth occurs.With the decrease of modulation period,both the hardness and the plastic deformation resistance（H^3/E^2,H-hardness and E-elastic modulus）increase.M4coating exhibits the maximum hardness of（49.6±2.7）GPa and the maximum plastic deformation resistance of^0.74 GPa.展开更多
基金Projects (50773015, 10775036) supported by the National Natural Science Foundation of China
文摘TiN/TiAlN multilayer coatings were prepared by arc ion plating with separate targets. In order to decrease the unfavorable macroparticles, a straight magnetized filter was used for the low melting aluminium target. The results show that the output plasmas of titanium target without filter and aluminium target with filter reach the substrate with the same order of magnitude. Meanwhile, the number of macropartieles in TiN/TiAlN multilayer coatings deposited with separate targets is only 1/10-1/3 of that deposited with alloy target reported in literature. Al atom addition may lead to the decrease of peak at （200） lattice plane and strengthening of peak at （111） and （220） lattice planes. The measured hardness of TiN/TiAlN multilayer coatings accords with the mixture principle and the maximum hardness is HV2495. The adhesion strength reaches 75 N.
文摘采用多弧离子镀技术选取钛靶电流分别为60A、70A、80A和基体偏压分别为-240V、-300V、-360V在高速钢基体上制备Ti N/Ti Al N多层薄膜。使用划痕仪、显微硬度计、摩擦磨损试验机和马弗炉对膜层的膜基结合力、显微硬度、摩擦磨损性能和热震性能进行检测。结果表明:在钛靶电流为70A和基体偏压为-240V时膜基结合力最高,同时显微硬度也较高;在基体偏压为-300V的条件下,钛靶电流为70A时的摩擦系数最小,其耐磨性能良好;基体偏压为-240V时的抗热震性能良好。
文摘合金材料因具有良好的机械性能、可铸造性能、价格适中等优点,在金属修复体及牙科切削工具中应用广泛。然而口腔复杂生理环境对合金材料的耐腐蚀性、机械性能和生物性能提出了更高的要求。硬质薄膜Ti N尤其是Ti Al N作为新兴的合金表面处理方法之一,在提高牙科合金机械和生物性能方面有积极作用。本文旨在对牙科合金细胞毒性、合金表面涂镀硬质薄膜的机械及生物性能做一综述。
基金financially supported by the National Natural Science Foundations of China(Nos.51201005 and 51231001)
文摘Plasma-activated electron beam-physical vapor deposition（EB-PVD）was used for depositing nitride multilayer coatings in this work.Different from the conventional coating methods,the multilayers were obtained by manipulating electron beam（EB）to jump between two different evaporation sources alternately with variable frequencies（jumping beam technology）.The plasma activation was generated by a hollow cathode plasma unit.The deposition process was demonstrated by means of tailoring TiN/TiAlN multilayers with different modulation periods（M1：26.5 nm,M2：80.0 nm,M3：6.0 nm,M4：4.0 nm）.The microstructure and hardness of the multilayer coatings were comparatively studied with TiN and TiAlN singlelayer coatings.The columnar structure of the coatings（TiN,TiAlN,M1,M2）is replaced by a glassy-like microstructure when the modulation period decreases to less than 10 nm（M3,M4）.Simultaneously,superlattice growth occurs.With the decrease of modulation period,both the hardness and the plastic deformation resistance（H^3/E^2,H-hardness and E-elastic modulus）increase.M4coating exhibits the maximum hardness of（49.6±2.7）GPa and the maximum plastic deformation resistance of^0.74 GPa.
