Time-resolved Microwave Conductivity Studies on the Chemical Treatment of the Nanocrystalline Porous TiO2 Films

Effect of Ti(iso-C3H7O)4 treatment on the photoinduced charge carrier kinetics of nanocrystalline porous TiO2 films is studied by time-resolved microwave conductivity measurements. Analysis of the transient photoconductivity decays indicates that Ti(iso-C3H7O)4 treatment leads to an increased concentration of photogenerated charge carriers and a fast interfacial transfer rate of holes via the surface modification of the freshly growing TiO2 nanocrystallites.

Nanostructure Study of TiO2 Films Prepared by Dip Coating Process

The microstructure properties of the sol-gel derived TiO2 films were studied by the atomic force microscopy (AFM). The films were prepared by dip coating process. The optical properties of the films were explained on the basis of the microstructure of the films.

Photocatalytic Property of TiO2 Films Deposited by Pulsed DC Magnetron Sputtering

TiO2 thin films were prepared by DC magnetron sputtering with the oxygen flow rate higher than the threshold. The film deposited for 5 h was of anatase phase with a preferred orientation along the <220> direction, but the films deposited for 2 and 3 h were amorphous. The transmittance and photocatalytic activity of the TiO2 films increased constantly with increasing film thickness. When the annealing temperature was lower than 700℃, only anatase grew in the TiO2 film. TiO2 phase changed from anatase to rutile when the annealing temperature was above 800℃. The photocatalytic activity decreased with increasing annealing temperature.

Enhanced Photoelectric Property of Mo-C Codoped TiO2 Films Deposited by RF Magnetron Cosputtering

Mo-C codoped TiO2 films were prepared by RF magnetron cosputtering. Ultraviolet-visible spectroscopy, atomic force microscopy, X-ray photoelectron spectroscopy, energy dispersive X-ray Analysis and X-Ray Diffraction were used to study the influences of codoping on energy gap, surface morphology, valence states of elements, ions content and crystal structure, respectively. The concentration of photogenerated carriers was measured by studying photocurrent density, while catalytic property was evaluated by observing degradation rate of methylene blue under visible light. A Mo-doped TiO2 film, whose content of Mo had been optimized in advance, was prepared and later used for subsequent comparisons with codoped samples. The result indicates that Mo-C codoping could curtail the energy gap and shift the absorption edge toward visible range. Under the illumination of visible light, codoped TiO2 films give rise to stronger photocurrent due to smaller band gaps. It is also found that Mo, C codoping results in a porous surface, whose area declines gradually with increasing carbon content. Carbon and Molybdenum doses were delicately optimized. Under the illumination of visible light, sample doped with 9.78at% carbon and 0.36at% Mo presents the strongest photocurrent which is about 8 times larger than undoped TiO2 films, and about 6 times larger than samples doped with Mo only.

Preparation of TiO2 and SiC Films from Their Precursors Using Electrospraying

Titanium dioxide(TiO2) films were prepared by cone - jet mode electrospraying a titanium ethoxideprecursor solution onto a silicon substrate.The effects of spraying time,substrate temperature and aging on thesurface morphology of the films prepared were studied.Thin films obtained after spraying for 600 s were aged atroom temperature to form a porous TiO2 network with pores in the size range of 100 - 500 nm.Thicker filmswere prepared by spraying for 3 000 s,but these cracked on drying although it can be concluded that films pre-pared using a higher substrate temperature were denser.By this method,SiC coating was also prepared on anAl2O3 substrate using polysilane as a precursor.The result implies the potential of an industrial production ofdye sensitized solar cells by electrospraying technique.

Inverted organic solar cells with solvothermal synthesized vanadium-doped TiO2 thin films as efficient electron transport layer

We investigated the effects of using different thicknesses of pure and vanadium-doped thin films of TiO2 as the electron transport layer in the inverted configuration of organic photovoltaic cells based on poly（3-hexylthiophene） P3HT：[6-6] phenyl-（6） butyric acid methyl ester（PCBM）. 1% vanadium-doped TiO2nanoparticles were synthesized via the solvothermal method. Crystalline structure, morphology, and optical properties of pure and vanadium-doped TiO2 thin films were studied by different techniques such as x-ray diffraction, scanning electron microscopy, transmittance electron microscopy, and UV–visible transmission spectrum. The doctor blade method which is compatible with roll-2-roll printing was used for deposition of pure and vanadium-doped TiO2 thin films with thicknesses of 30 nm and 60 nm. The final results revealed that the best thickness of TiO2 thin films for our fabricated cells was 30 nm. The cell with vanadium-doped TiO2 thin film showed slightly higher power conversion efficiency and great Jsc of 10.7 mA/cm^2 compared with its pure counterpart. In the cells using 60 nm pure and vanadium-doped TiO2 layers, the cell using the doped layer showed much higher efficiency. It is remarkable that the external quantum efficiency of vanadium-doped TiO2 thin film was better in all wavelengths.

TiO2-Loaded WO3 Composite Films for Enhancement of Photocurrent Density

Titanium dioxide （TiO2） loaded tungsten trioxide （WO3） composite films are prepared by an E-beam vapor system. Associated with the existence of a heterojunction at the interface of TiO2 and WO3, the prepared TiO2-WO3 composite film shows enhanced photocurrent density, four times than the pure WO3 film illuminated under xenon lamp, and higher incident-photon-to-current conversion e^ciency. By varying the initial TiO2 film thickness, such composite structures could be optimized to obtain the highest photocurrent density. We believe that thin TiO2 films improve the light response and increase the surface roughness of WO3 films. Furthermore, the existence of the heterojunction results in the e^cient charge carriers＇ separation, transfer process, and a lower recombination of electron-hole pairs, which is beneficial for the enhancement of photocurrent density.

Doped-TiO_2 Photocatalysts and Synthesis Methods to Prepare TiO_2 Films

TiO2 is a promising photocatalyst. However, the low photocatalytic efficiency calls for the modification of TiO2. Metal- and nonmetal-doping of TiO2 have been proved to be effective ways to enhance photocatalytic properties. This review provides a deep insight into the understanding of the metal- and nonmetal-doped TiO2 photocatalysts. This article begins with the introduction of the crystal structures of TiO2 and applications of TiO2 materials. We then reviewed the doped-TiO2 system in two categories： （1） metal-doped TiO2 photocatalysts system, and （2） nonmetal-doped TiO2 photocatalysts system. Both experimental results and theoretical analyses are elaborated in this section. In the following part, for the advantages of TiO2 thin films over particles, various preparation methods to obtain TiO2 thin films are briefly discussed. Finally, this review ends with a concise conclusion and outlook of new trends in the development of TiO2-based photocatalysts.

Preparation and Enhanced Daylight-Induced Photo-Catalytic Activity of Transparent C-Doped TiO_2 Thin Films

The transparent C-doped TiO2 nanostructure films were fabricated on the silicate glass substrates by sol-gel spin-coated method. The as-prepared films were characterized by X-ray diffraction （XRD）, scanning electron microscopy （SEM）, UV-visible absorption spectra （UV-vis） and X-ray photoelectron spectroscopy （XPS）. The photocatalytic activity was evaluated via the photocatalytic oxidation of methylene blue in aqueous under daylight irradiation at room temperature. The results show that the daylight-induced photocatalytic activities of the as-prepared films are improved by the C-doping. The calcination temperatures significantly affect the morphology, microstructure and photocatalytic activity of the as-prepared samples. At 723 K, the C-doped TiO2 films exhibit the highest photocatalytic activity due to the synergetic effects of good crystallization, appropriate oxygen vacancies and strong absorption in the near UV and visible-light region.

Preparation,structure and ferromagnetic properties of the nanocrystalline Ti_(1-x)Mn_xO_2 thin films grown by radio frequency magnetron co-sputtering

This paper reported that the Mn-doped TiO2 films were prepared by radio frequency （RF） magnetron cosputtering. X-ray diffraction measurements indicate that the samples are easy to form the futile structure, and the sizes of the crystal grains grow big and big as the Mn concentration increases. X-ray photoemlssion spectroscopy measurements and high resolution transmission electron microscope photographs confirm that the manganese ions have been effectively doped into the TiO2 crystal when the Mn concentration is lower than 21%. The magnetic property measurements show that the Ti1-xMnxO2 （x = 0.21） films are ferromagnetic at room temperature, and the saturation magnetization, coercivity, and saturation field are 16.0 emu/cm^3, 167.5 × 80 A/m and 3740 × 80 A/m at room temperature, respectively. The room-temperature ferromagnetism of the films can be attributed to the new futile Ti1-xMnxO2 structure formed by the substitution of Mn^4＋ for Ti^4＋ into the TiO2 crystal .lattice, and could be explained by O vacancy （Vo）-enhanced ferromagnetism model.

Influence of Annealing Temperature on the Properties of TiO_2 Films Annealed by ex situ and in situ TEM

TiO2 thin films were deposited on quartz substrates by DC reactive magnetron sputtering of a pure Ti target in Ar/O2 plasma at room temperature. The TiO2 films were annealed at different temperatures ranging from 300 to 800 ℃ in a tube furnace under flowing oxygen gas for half an hour each. The effect of annealing temperatures on the structure, optical properties, and morphologies were presented and discussed by using X-ray diffraction, optical absorption spectrura, and atomic force microscope. The films show the presence of diffraction peaks from the （101）, （004）, （200） and （105） lattice planes of the anatase TiO2 lattice. The direct band gap of the annealed films decreases with the increase of annealing temperature. While, the roughness of the films increases with the increases of annealing temperature, and some significant roughness changes of the TiO2 film surfaces were observed after the annealing temperature reached 800 ℃. Moreover, the influences of annealing on the microstructures of the TiO2 film were investigated also by in situ observation in transmission electron microscope.

Atomic Force Microscopy Studies on the Chemical Treatment of Nanocrystalline Porous TiO_2 Films

AFM has been utilized to study the surface topography and the local conductivity of nanocrystalline TiO2 films. Improving the local conductivity by Ti(iso-C3H7O)4 treatment is characterized by quantitative analysis of the simultaneous current image. The mechanism of Ti(iso C3H7O)4 treatment is discussed.

Effects of Substrate Temperature on Properties of Transparent Conductive Ta-Doped TiO_2 Films Deposited by Radio-Frequency Magnetron Sputtering

Ta-doped titanium dioxide films are deposited on fused quartz substrates using the rf magnetron sputtering technique at different substrate temperatures. After post-annealing at 550℃ in a vacuum, all the films are crystallized into the polycrystalline anatase TiO2 structure. The effects of substrate temperature from room temperature up to 350℃ on the structure, morphology, and photoelectric properties of Ta-doped titanium dioxide films are analyzed. The average transmittance in the visible region（400-800 nm） of all films is more than 73%.The resistivity decreases firstly and then increases moderately with the increasing substrate temperature. The polycrystalline film deposited at 150℃ exhibits a lowest resistivity of 7.7 × 10^-4Ω·cm with the highest carrier density of 1.1×10^21 cm^-3 and the Hall mobility of 7.4 cm^2·V^-1s^-1.

Influences of working pressure on properties for TiO_2 films deposited by DC pulse magnetron sputtering

TiO2 films were deposited at room temperature by DC pulse magnetron sputtering system.The crystalline structures,morphological features and photocatalytic activity of TiO2 films were systematically investigated by X-ray diffraction（XRD）,atomic force microscopy（AFM） and ultraviolet spectrophotometer,respectively.The results indicated that working pressure was the key deposition parameter in？uencing the TiO2 film phase composition at room temperature,which directly affected its photocatalytic activity.With increasing working pressure,the target self-bias decreases monotonously.Therefore,low temperature TiO2 phase（anatase） could be deposited with high working pressure.The anatase TiO2 films deposited with 1.4 Pa working pressure displayed the highest photocatalytic activity by the decomposition of Methyl Orange solution,which the degradation rate reached the maximum（35%） after irradiation by ultraviolet light for 1 h.

Low-temperature Preparation of Photocatalytic TiO_2 Thin Films on Polymer Substrates by Direct Deposition from Anatase Sol

Anatase TiO2 sol was synthesized under mild conditions （75℃ and ambient pressure） by hydrolysis of titaniumn-butoxide in abundant acidic aqueous solution and subsequent reflux to enhance crystallization. At room temperature and in ambient atmosphere, crystalline TiO2 thin films were deposited on polymethylmethacrylate （PMMA）, SiO2-coated PMMA and SiO2-coated silicone rubber substrates from the as-prepared TiO2 sol by a dip-coating process. SiO2 layers prior to TiO2 thin films on polymer substrates could not only protect the substrates from the photocatalytic decomposition of the TiO2 thin films but also enhance the adhesion of the TiO2 thin films to the substrates. Field-emission type scanning electron microscope （FE-SEM） investigations revealed that the average particle sizes of the nanoparticles composing the TiO2 thin films were about 35-47 nm. The TiO2 thin films exhibited high photocatalytic activities in the degradation of reactive brilliant red dye X-3B in aqueous solution under aerated conditions. The preparation process of photocatalytic TiO2 thin films on the polymer substrates was quite simple and a low temperature route.

Formation of TiO2 Modified Film on Carbon Steel

A new technique for preparing TiO2 modified film on carbon steel was accomplished by electroless plating and sol-gel composite process. The artificial neural network was applied to optimize the preparing condition of TiO2 modified film. The optimized condition for forming TiO2 modified film on carbon steel was that NiP plating for 50 min, dip-coating times as 4, heat treatment time for 2 h, and the molar ratio of complexing agent and Ti(OC4HZ9)4 kept 1.5:1. The results showed that TiO2 modified film have good corrosion resistance. The result conformed that it is feasible to design the preparing conditions of TiO2 modified film by artificial neural network.

STUDY ON PHOTOCATALYTIC MECHANISM OF SOL-GEL-DERIVED Pb-DOPED TiO_2 THIN FILMS

Pb-doped TiO2 photocatalytic thin films were prepared on a soda-lime glass substrate via sol-gel method using TiO2 sol solution containing lead and characterized by X-ray photoelectron spectroscopy (XPS). The results showed that besides oxides of Ti(IV) there is a certain amount of oxides of To(?) and Ti(?) and Pb exists in the forms of PbTiO3 and PbO. The photocatalytic activity of the Pb-doped TiO2 films was evaluated by the photocatalytic decolorization of aqueous methyl orange and photocatalytic mechanism mas also analyzed.

PREPARATION OF TiO_2 THIN FILMS BY MOCVD METHOD

Preparation of TiO2 thin films by MOCVD method is presented in this paper. A MOCVD system has been designed and built. A wide range of processing conditions are investigated to deposit TiO2 films on Si wafers starting from metal-organic precursor tetrabutyl titanate. Activation energy of the film formation （E） is obtained to be 23.6 kJ/mol. Structure of films is pure anatase when deposit temperatures are low, rutile forms at 700℃. The films also exhibit preferred crystallographic orientations which strongly depend on deposit conditions. Refractive index increases with increasing of film thickness and decreasing of deposit temperature.

Tuning Effect of N_2 on Atmospheric-Pressure Cold Plasma CVD of TiO_2 Photocatalytic Films

To deposit TiO2 films through plasma CVD, the partial pressure ratio of O2 to TIC14 should be greater than the stoichiometric ratio （PO2/PTiCl4 〉 1）. However, this may lead to the formation of powder instead of film on the substrate when using volume dielectric barrier discharge （volume-DBD） at atmospheric pressure. In this study, by adding N2 into the working gas Ar, TiO2 photocatalytic films were successfully fabricated in the presence of excess O2 （PO2/PTiC14 = 2.6） by using a wire-to-plate atmospheric-pressure volume-DBD. The tuning effect of N2 on the deposition of TiO2 film was studied in detail. The results showed that by increasing the N2 content, the deposition rate and particle size of the TiO2 film were reduced, and its photocatalytic activity was enhanced. The tuning mechanism of N2 is further discussed.