SiCN thin films and Cu/SiCN/Si structures were fabricated by magnetron sputtering. And some samples underwent the rapid thermal annealing(RTA) processing. The thin-film surface morphology, crystal structure and electr...SiCN thin films and Cu/SiCN/Si structures were fabricated by magnetron sputtering. And some samples underwent the rapid thermal annealing(RTA) processing. The thin-film surface morphology, crystal structure and electronic properties were characterized by atomic force microscopy(AFM), X-ray diffractometry(XRD), Fourier transform infrared transmission(FTIR) and four-point probe(FPP) analyses. The results reveal the formation of complex networks among the three elements, Si, C and N, and the existence of different chemical bonds in the SiCN films, such as Si—C, Si—N, C—N and C=N. The as-deposited SiCN thin films are amorphous in the Cu/SiCN/Si structures and have good thermal stability, and the SiCN thin films are still able to prevent the diffusion reaction between Cu and Si interface after RTA processing at 600 ℃ for 5 min.展开更多
The low-k carbon doped silica film has been modified by radio frequency helium plasma at 5 Pa pressure and 80 W power with subsequent XPS, FTIR and optical emission spec- troscopy analysis. XPS data indicate that heli...The low-k carbon doped silica film has been modified by radio frequency helium plasma at 5 Pa pressure and 80 W power with subsequent XPS, FTIR and optical emission spec- troscopy analysis. XPS data indicate that helium ions have broken Si-C bonds, leading to Si-C scission with C（1s） lost seriously. The Si（2p）, O（ls）, peak obviously shifted to higher binding en- ergies, indicating an increasingly oxidized Si（2p）. FTIR data also show that the silanol formation increased with longer exposure time up to a week. Contrarily, the CHa stretch, Si-C stretching bond and the ratio of the Si-O-Si cage and Si-O-Si network peak sharply decreased upon exposure to helium plasma. The OES result indicates that monovalent helium ions in plasma play a key role in damaging carbon doped silica film. So it can be concluded that the monovalent helium ions besides VUV photons can break the weak Si-C bonds to create Si dangling bonds and free methyl radicals, and the latter easily reacts with O_2 from the atmosphere to generate CO_2 and H_2O. The bonds change is due to the Si dangling bonds combining with H_2O, thereby, increasing the dielectric constant k value.展开更多
Co/SiO2 and zirconium promoted Co/Zr/SiO2 catalysts were prepared using dielectric-barrier discharge （DBD） plasma instead of the conventional thermal calcination method. Fischer-Tropseh Synthesis （FTS） performance...Co/SiO2 and zirconium promoted Co/Zr/SiO2 catalysts were prepared using dielectric-barrier discharge （DBD） plasma instead of the conventional thermal calcination method. Fischer-Tropseh Synthesis （FTS） performances of the catalyst were evaluated in a fixed bed reactor. The results indicated that the catalyst treated by DBD plasma shows the higher FTS activity and yield of heavy hydrocarbons as compared with that treated by the conventional thermal calcination method. Increase in CO conversion was unnoticeable on the Co/SiO2 catalyst, but significant on the Co/Zr/SiO2 catalyst, both prepared by DBD plasma. On the other hand, heavy hydrocarbon selectivity and chain growth probability （a value） were enhanced on all the catalysts prepared by the DBD plasma. In order to study the effect of the DBD plasma treatment on the FTS performance, the catalysts were characterized by N2-physisorption, H2-temperature programed reduction （H2-TPR）, H2-temperature- programmed desorption （H2-TPD） and oxygen titration, transmission electron microscope （TEM） and X-ray diffraction （XRD）. It was proved that, compared with the traditional calcination method, DBD plasma not only could shorten the precursor decomposition time, but also could achieve better cobalt dispersion, smaller Co304 cluster size and more uniform cobalt distribution. However, cobalt reducibility was hindered to some extent in the Co/SiO2 catalyst prepared by DBD plasma, while the zirconium additive prevented significantly the decrease in cobalt reducibility and increased cobalt dispersion as well as the FTS performance.展开更多
A silica-supported cobalt catalyst was prepared by hydrogen dielectric-barrier dis- charge （H2-DBD） plasma. Compared to thermal hydrogen reduction, H2-DBD plasma treatment can not only fully decompose the cobalt pre...A silica-supported cobalt catalyst was prepared by hydrogen dielectric-barrier dis- charge （H2-DBD） plasma. Compared to thermal hydrogen reduction, H2-DBD plasma treatment can not only fully decompose the cobalt precursor but also partially reduce the cobalt oxides at lower temperature and with less time. The effect of the discharge atmosphere on the property of the plasma-prepared catalyst and the Fischer-Tropsch synthesis activity was studied. The re- sults indicate that H2-DBD plasma treatment is a promising alternative for preparing Co/SiO2 catalysts from the viewpoint of energy savings and efficiency.展开更多
Two-dimension （2D） fused-silica fiber reinforced porous silicon nitride matrix composites were fabricated using slurry impregnation and cyclic infiltration with colloidal silica sol. The microstructure and fracture ...Two-dimension （2D） fused-silica fiber reinforced porous silicon nitride matrix composites were fabricated using slurry impregnation and cyclic infiltration with colloidal silica sol. The microstructure and fracture surface were characterized by SEM, the mechanical behavior was investigated by three-point bending test, and the dielectric constant was also measured by impedance analysis. The microstructure showed that the fiber and the matrix had a physical bonding, forming a clearance interface. The mechanical behavior suggested that the porous matrix acted as crack deflection, and the fracture surface had a lot of fiber pull-out. However, the interlaminar shear strength was not so good. The dielectric constant of the composites at room temperature was about 2.8-3.1. The relatively low dielectric constant and non-catastrophic failure indicated the potential application in the radome materials field. 2008 University of Science and Technology Beijing. All rights reserved.展开更多
基金Project(60371046) supported by the National Natural Science Foundation of ChinaProject(713-394201034) supported by the International Cooperant Foundation of Hunan Province, China
文摘SiCN thin films and Cu/SiCN/Si structures were fabricated by magnetron sputtering. And some samples underwent the rapid thermal annealing(RTA) processing. The thin-film surface morphology, crystal structure and electronic properties were characterized by atomic force microscopy(AFM), X-ray diffractometry(XRD), Fourier transform infrared transmission(FTIR) and four-point probe(FPP) analyses. The results reveal the formation of complex networks among the three elements, Si, C and N, and the existence of different chemical bonds in the SiCN films, such as Si—C, Si—N, C—N and C=N. The as-deposited SiCN thin films are amorphous in the Cu/SiCN/Si structures and have good thermal stability, and the SiCN thin films are still able to prevent the diffusion reaction between Cu and Si interface after RTA processing at 600 ℃ for 5 min.
基金supported by Shenyang Science and Technology Plan of China(No.F12028200)
文摘The low-k carbon doped silica film has been modified by radio frequency helium plasma at 5 Pa pressure and 80 W power with subsequent XPS, FTIR and optical emission spec- troscopy analysis. XPS data indicate that helium ions have broken Si-C bonds, leading to Si-C scission with C（1s） lost seriously. The Si（2p）, O（ls）, peak obviously shifted to higher binding en- ergies, indicating an increasingly oxidized Si（2p）. FTIR data also show that the silanol formation increased with longer exposure time up to a week. Contrarily, the CHa stretch, Si-C stretching bond and the ratio of the Si-O-Si cage and Si-O-Si network peak sharply decreased upon exposure to helium plasma. The OES result indicates that monovalent helium ions in plasma play a key role in damaging carbon doped silica film. So it can be concluded that the monovalent helium ions besides VUV photons can break the weak Si-C bonds to create Si dangling bonds and free methyl radicals, and the latter easily reacts with O_2 from the atmosphere to generate CO_2 and H_2O. The bonds change is due to the Si dangling bonds combining with H_2O, thereby, increasing the dielectric constant k value.
基金supported by the National Natural Science Foundation of China(No.21076151)
文摘Co/SiO2 and zirconium promoted Co/Zr/SiO2 catalysts were prepared using dielectric-barrier discharge （DBD） plasma instead of the conventional thermal calcination method. Fischer-Tropseh Synthesis （FTS） performances of the catalyst were evaluated in a fixed bed reactor. The results indicated that the catalyst treated by DBD plasma shows the higher FTS activity and yield of heavy hydrocarbons as compared with that treated by the conventional thermal calcination method. Increase in CO conversion was unnoticeable on the Co/SiO2 catalyst, but significant on the Co/Zr/SiO2 catalyst, both prepared by DBD plasma. On the other hand, heavy hydrocarbon selectivity and chain growth probability （a value） were enhanced on all the catalysts prepared by the DBD plasma. In order to study the effect of the DBD plasma treatment on the FTS performance, the catalysts were characterized by N2-physisorption, H2-temperature programed reduction （H2-TPR）, H2-temperature- programmed desorption （H2-TPD） and oxygen titration, transmission electron microscope （TEM） and X-ray diffraction （XRD）. It was proved that, compared with the traditional calcination method, DBD plasma not only could shorten the precursor decomposition time, but also could achieve better cobalt dispersion, smaller Co304 cluster size and more uniform cobalt distribution. However, cobalt reducibility was hindered to some extent in the Co/SiO2 catalyst prepared by DBD plasma, while the zirconium additive prevented significantly the decrease in cobalt reducibility and increased cobalt dispersion as well as the FTS performance.
基金supported by National Natural Science Foundation of China(No.21076151)
文摘A silica-supported cobalt catalyst was prepared by hydrogen dielectric-barrier dis- charge （H2-DBD） plasma. Compared to thermal hydrogen reduction, H2-DBD plasma treatment can not only fully decompose the cobalt precursor but also partially reduce the cobalt oxides at lower temperature and with less time. The effect of the discharge atmosphere on the property of the plasma-prepared catalyst and the Fischer-Tropsch synthesis activity was studied. The re- sults indicate that H2-DBD plasma treatment is a promising alternative for preparing Co/SiO2 catalysts from the viewpoint of energy savings and efficiency.
基金the National Natural Science Foundation of China(No.90405015)the National Young Elitist Foundation(No.50425208).
文摘Two-dimension （2D） fused-silica fiber reinforced porous silicon nitride matrix composites were fabricated using slurry impregnation and cyclic infiltration with colloidal silica sol. The microstructure and fracture surface were characterized by SEM, the mechanical behavior was investigated by three-point bending test, and the dielectric constant was also measured by impedance analysis. The microstructure showed that the fiber and the matrix had a physical bonding, forming a clearance interface. The mechanical behavior suggested that the porous matrix acted as crack deflection, and the fracture surface had a lot of fiber pull-out. However, the interlaminar shear strength was not so good. The dielectric constant of the composites at room temperature was about 2.8-3.1. The relatively low dielectric constant and non-catastrophic failure indicated the potential application in the radome materials field. 2008 University of Science and Technology Beijing. All rights reserved.
