期刊文献+
共找到1篇文章
< 1 >
每页显示 20 50 100
The effects of ultrasound frequency and power on the activation energy in Si-KOH reaction system
1
作者 Qing-Bin Jiao Bayanheshig +2 位作者 Xin Tan Ji-Wei Zhu Jian-Xiang Gao 《Chinese Chemical Letters》 SCIE CAS CSCD 2014年第4期617-620,共4页
The activation energy is the minimum amount of energy required to initiate a reaction. It is one of the important indexes for appraising a reaction. The chemical reaction rate is closely related to the value of activa... The activation energy is the minimum amount of energy required to initiate a reaction. It is one of the important indexes for appraising a reaction. The chemical reaction rate is closely related to the value of activation energy, and reducing activation energy is propitious to promoting a chemical reaction. In the present paper, the relationship between the activation energy in Si-KOH reaction system and the ultrasound frequency and power has been discussed for the first time. The range of ultrasound frequency and power is 40-100kHz (interval by 20kHz) and 10-50W (interval by 10W), respectively. The experimental clata indicate that the activation energy decreases with the increasing ultrasound power. Comparing with the activation energy without ultrasound irradiation, the results in our paper indicate that ultrasound irradiation could reduce the activation energy in Si-KOH reaction system and increase the reaction rate. 展开更多
关键词 Si-KOH etching rate ultrasonic irradiation Activation energy
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部