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Sintering process as relevant parameter for Bi_2O_3 vaporization from ZnO-Bi_2O_3-based varistor ceramics 被引量:10
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作者 徐东 程晓农 +2 位作者 严学华 徐红星 施利毅 《中国有色金属学会会刊:英文版》 EI CSCD 2009年第6期1526-1532,共7页
The relationship between sintering process and vaporization of the Bi2O3 in ZnO-Bi2O3-based varistor ceramics was investigated.The phase and microstructure evolution during the sintering process were examined.The resu... The relationship between sintering process and vaporization of the Bi2O3 in ZnO-Bi2O3-based varistor ceramics was investigated.The phase and microstructure evolution during the sintering process were examined.The results show that the higher the sintering temperature or the longer the sintering time is,the more the Bi2O3 is volatilized.The heating rate has little effects on the Bi2O3 volatilized in ZnO-Bi2O3-based varistor ceramics.This is in accordance with the relative X-ray diffraction peak area ratio analysis.The results also show that the sintering temperature has the greatest impact on the vaporization of the Bi2O3,then followed by sintering time,and the effect of the heating rate is the minimum. 展开更多
关键词 烧结过程 压敏陶瓷 氧化锌 铋基 汽化 微观组织演变 烧结温度 烧结时间
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An Experimental Study of Surface Improvement in FDM Parts by Vapor Treatment Process
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作者 Mayank Prajapati Sandeep Rimza 《Journal of Mechanical Engineering Research》 2020年第1期12-20,共9页
Fused deposition modeling is one of the most adaptable additive production method as a result of the value-effectiveness and environment-friendly nature.However,FDM technique nevertheless possesses primary problems in... Fused deposition modeling is one of the most adaptable additive production method as a result of the value-effectiveness and environment-friendly nature.However,FDM technique nevertheless possesses primary problems in phrases of negative surface best due to including layer by using layer production method for the prototypes.It is acceptable to explore an efficient method for FDM elements to enhance the bad surface first-rate and dimensions precision.In the present research paper,an effort has been made to decorate the surface better and optimize the vital processing parameter of FDM based benchmark the use of vapor smoothing procedure(VSP).A comparative experimental take a look at has been completed by layout of experiments,Taguchi technique to analyse impact of input layout parameters at the floor finish of benchmark FDM parts.The outcomes of prevailing research display that VSP treatment improves the surface excellent of FDM components to micro stage with negligible dimensional variation.It is observed that improved floor excellent is observed in the 1,2,-Dichloroethane chemical at 90°component construct orientation,0.25 mm layer thickness,10%fill density and 90 sec Exposure times. 展开更多
关键词 FDM vapor chemical process Surface quality Design of experiment
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Theoretical Calculation of the Real Vapor Pressure of Al during ISM Processing of Ni-xAl (at.pct) (x=25-50) Alloy
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作者 Jingjie GUO,Guizhong LIU, Yanqing SU, Jun JIA and Hengzhi FUSchool of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, China 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2004年第2期189-192,共4页
A new model was established to calculate the real vapor pressure of Al in the molten Ni-xAl (at.pct) (x=25;0) alloy. The effects of the holding time, chamber pressure, mole fraction of Al and melting temperature o... A new model was established to calculate the real vapor pressure of Al in the molten Ni-xAl (at.pct) (x=25;0) alloy. The effects of the holding time, chamber pressure, mole fraction of Al and melting temperature on the real vapor pressure of Al in the vacuum chamber were analyzed. Because of the impeding effect of the real vapor pressure on the evaporation loss rate, within a short time (less than 10 s), the real vapor pressure tends to a constant value. When the chamber pressure is less than the saturated vapor pressure of Al, the real vapor pressure of Al is equal to the chamber pressure. While when the chamber pressure is higher than the saturated vapor pressure, the real vapor pressure of Al approaches to the saturated vapor pressure of Al of the same condition. 展开更多
关键词 Real vapor pressure Volatile elements ISM process Ni-Al alloy
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Change law of real vapor pressure of Al element in Ti-xAl (x=25~50) melt during ISM process
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作者 刘贵仲 苏彦庆 +3 位作者 郭景杰 丁宏升 贾均 傅恒志 《中国有色金属学会会刊:英文版》 CSCD 2002年第2期222-226,共5页
A new model was established to calculate the real vapor pressure of the Al element in the molten Ti x Al ( x = 25 ~ 50, mole fraction, %) alloy. The effects of the holding time, chamber pressure, mole fraction of Al ... A new model was established to calculate the real vapor pressure of the Al element in the molten Ti x Al ( x = 25 ~ 50, mole fraction, %) alloy. The effects of the holding time, chamber pressure, mole fraction of Al and melting temperature on the real vapor pressure of Al element in the vacuum chamber were analyzed. Because of the impeding effect of the real vapor pressure on the evaporation loss rate, within a short time (less than 10?s), the real vapor pressure tends to a constant value. When the chamber pressure is less than the saturated vapor pressure of the Al component, the real vapor pressure of Al is equal to the chamber pressure. While when the chamber pressure is larger than the saturated vapor pressure, the real vapor pressure is equal to the saturated vapor pressure of the Al element of the same condition. 展开更多
关键词 蒸汽压力 ISM处理 钛铝熔融 铝元素 真空熔融处理 钛合金
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不同制备工艺参数对PS-PVD-8YSZ涂层微结构及性能的影响
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作者 何箐 由晓明 +3 位作者 邹晗 张雨生 姜在龙 张云杰 《中国表面工程》 EI CAS CSCD 北大核心 2024年第4期192-205,共14页
作为新型热障涂层工艺制备技术,等离子物理气相沉积(PS-PVD)射流具有高能高速等特性,涂层沉积时存在扰流作用导致涂层微结构及性能的显著影响。为了减少圆柱体工装扰流作用,掌握工艺参数对涂层微结构的基本影响规律,采用平面工装系统研... 作为新型热障涂层工艺制备技术,等离子物理气相沉积(PS-PVD)射流具有高能高速等特性,涂层沉积时存在扰流作用导致涂层微结构及性能的显著影响。为了减少圆柱体工装扰流作用,掌握工艺参数对涂层微结构的基本影响规律,采用平面工装系统研究不同PS-PVD工艺参数下,如喷涂电流、送粉量、喷枪摆动及样品旋转参数等对涂层微结构的影响规律。研究结果表明:送粉量和喷枪-样品相对运动参数对涂层微结构影响较大,可快速实现涂层微结构的调控;喷涂电流的变化通过柱状晶尺寸和冷凝纳米颗粒含量等方面影响涂层微结构,涂层显微硬度随喷涂电流增大而降低;喷涂沉积距离的影响较小,喷涂距离增大使沉积效率和柱状晶发散生长程度降低,冷凝纳米颗粒含量提高,同时涂层显微硬度呈现先降低后升高的趋势。JL-11NP粉末表现出宽幅工艺范围内准柱状结构的获得能力,进一步掌握低沉积电流工艺条件下基于气-固-液三相复合沉积的影响规律。开展了低电流工艺参数条件下PS-PVD涂层的微结构调控及沉积机制研究,研究成果可为兼顾隔热和寿命、抗冲蚀的涂层性能结构优化及调控奠定良好基础。 展开更多
关键词 8YSZ涂层 等离子物理气相沉积 工艺参数 微结构 显微硬度
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蒸汽再压缩隔离壁蒸馏塔的非对称温度控制
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作者 李一林 黄克谨 +4 位作者 陈海胜 张亮 钱行 苑杨 王韶峰 《北京化工大学学报(自然科学版)》 CAS CSCD 北大核心 2024年第1期1-11,共11页
蒸汽再压缩热泵(VRHP)可以提升隔离壁蒸馏塔(DWDC)的稳态性能,但也加剧了被控变量间的相互耦合,给蒸汽再压缩隔离壁蒸馏塔(VRHP-DWDC)的平稳操作带来困难。针对分离中间组分(甲苯)绝对占优的苯/甲苯/二甲苯三元物系的VRHP-DWDC,通过非... 蒸汽再压缩热泵(VRHP)可以提升隔离壁蒸馏塔(DWDC)的稳态性能,但也加剧了被控变量间的相互耦合,给蒸汽再压缩隔离壁蒸馏塔(VRHP-DWDC)的平稳操作带来困难。针对分离中间组分(甲苯)绝对占优的苯/甲苯/二甲苯三元物系的VRHP-DWDC,通过非方相对增益矩阵对操纵与被控变量进行配对,并依据闭环响应分析给出了一种新颖的单温度分散控制系统。由于采用塔顶/侧线热泵压缩机分别控制侧线段/公共提馏段的灵敏板温度,不但加快了侧线产品的响应速度,而且降低了塔底产品的峰值偏差。鉴于高度内部耦合以及失真的温度与组分对应关系导致二者存在较大的稳态偏差,采用双温差结构进一步强化系统设计,由此给出了一种非对称温度控制系统,降低了系统内在非线性因素的影响,因而能够减小侧线和塔底产品的稳态偏差。闭环仿真结果显示了该非对称温度控制系统的优越性。研究表明,VRHP的引入虽然加重了VRHP-DWDC的内部耦合,但也提供了压缩机功率这一潜在操作变量,其较好的控制通道特性与双温差结构的有效应用能在一定程度上改善VRHP-DWDC的闭环操作。 展开更多
关键词 隔离壁蒸馏塔 过程强化 蒸汽再压缩热泵 温度控制 温差控制
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基于外部气相沉积的S+C+L波段低色散斜率大有效面积非零色散位移光纤的设计与制备
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作者 查健江 王元达 +3 位作者 何学荣 侯伟 王敬胜 文建湘 《光子学报》 EI CAS CSCD 北大核心 2024年第2期52-63,共12页
针对现有光纤无法满足宽带光密集波分复用系统传输和S+C+L波段粗波分复用的要求,设计了一种具有中心凹陷的三角形芯+环形的折射率剖面,利用外部气相沉积工艺制备了一种非零色散位移光纤,并通过调整第一芯层的相对折射率和第二芯层与第... 针对现有光纤无法满足宽带光密集波分复用系统传输和S+C+L波段粗波分复用的要求,设计了一种具有中心凹陷的三角形芯+环形的折射率剖面,利用外部气相沉积工艺制备了一种非零色散位移光纤,并通过调整第一芯层的相对折射率和第二芯层与第一芯层的半径比,探究了其对光纤衰减、色散斜率和有效面积等参数的影响。研究发现,当第一芯层的相对折射率逐渐增大且第二芯层与第一芯层半径比逐渐减小时,零色散波长和有效面积逐渐减小。当第一芯层的相对折射率在0.52%~0.53%,芯层半径比在2.6~2.7时,光纤的有效面积接近70μm^(2),零色散波长在1420 nm附近,在1550 nm波段的色散系数大于8 ps·nm^(-1)·km^(-1),色散斜率为0.059 ps·nm^(-2)·km^(-1),可以较好地抑制传输过程中光非线性效应,满足长途干线网与城域网的使用要求。 展开更多
关键词 光纤通信 非零色散位移光纤 外部气相沉积工艺 S+C+L波段 低色散斜率 大有效面积 波分复用
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双效机械蒸汽再压缩污水脱盐工艺流程仿真
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作者 王其玉 肖小龙 +1 位作者 王硕硕 白章 《实验技术与管理》 CAS 北大核心 2024年第2期172-179,共8页
该文基于Aspen Plus化工流程模拟软件,开展了基于双效机械蒸汽再压缩(MVR)的采出水脱盐工艺流程模拟仿真,以及系统运行热力特性分析。在设计工况下经过系统处理的污水净水分离率达到90.0%,污水整体资源化利用率可达86.7%,系统能效比和... 该文基于Aspen Plus化工流程模拟软件,开展了基于双效机械蒸汽再压缩(MVR)的采出水脱盐工艺流程模拟仿真,以及系统运行热力特性分析。在设计工况下经过系统处理的污水净水分离率达到90.0%,污水整体资源化利用率可达86.7%,系统能效比和污水处理比能耗分别为15.5和212.2 kJ/kg。结合系统变工况特性和运行参数敏感性分析可知,降低蒸发压力可提升污水资源回收量,减小压比将有利于提高系统能效、降低比能耗。通过MVR污水脱盐系统的仿真建模,探究了该工艺的能质转化特性,为优化含盐污水处理方案提供了参考。 展开更多
关键词 污水脱盐 机械蒸汽再压缩 流程仿真 热力特性
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8英寸晶圆低损耗厚氮化硅波导的工艺开发
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作者 丛庆宇 李赵一 +3 位作者 周敬杰 范作文 贾连希 胡挺 《光子学报》 EI CAS CSCD 北大核心 2024年第9期93-103,共11页
在8英寸晶圆上制备氮化硅膜厚度超过400 nm时,产生的拉伸应力会使薄膜产生裂纹,为此,采用大马士革工艺,通过低压化学气相沉积分两步沉积、抛光氮化硅薄膜,同时结合棋盘格结构,减小应力,降低薄膜出现裂纹的风险。使用此方法成功在8英寸... 在8英寸晶圆上制备氮化硅膜厚度超过400 nm时,产生的拉伸应力会使薄膜产生裂纹,为此,采用大马士革工艺,通过低压化学气相沉积分两步沉积、抛光氮化硅薄膜,同时结合棋盘格结构,减小应力,降低薄膜出现裂纹的风险。使用此方法成功在8英寸晶片上制造了截面尺寸为800 nm×0.8µm的氮化硅波导。两步沉积过后进行两次退火处理,可以进一步降低波导损耗,通过采用cut-back的方式测试波导传输损耗在1550 nm处为0.087 dB/cm,在1580 nm处为0.062 dB/cm。波导的弯曲损耗在半径为50µm时为0.0065 dB,在半径为80µm时仅为0.006 dB。 展开更多
关键词 光电子学 光波导 8英寸 氮化硅 低压化学气相沉积 工艺优化 低损耗
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浅析油品蒸发损耗及发展趋势
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作者 向松明 《化工设计通讯》 CAS 2024年第7期51-53,59,共4页
油品蒸发损耗不仅影响环境质量,还影响油品质量。除了该问题之外,蒸发损耗将促进汽油氧化,辛烷值减小,长时间运行对汽车发动机造成不利影响。此外,油品蒸发损耗还有一定的安全隐患,易造成局部火灾,并对人类和动植物也有毒害性。目前,国... 油品蒸发损耗不仅影响环境质量,还影响油品质量。除了该问题之外,蒸发损耗将促进汽油氧化,辛烷值减小,长时间运行对汽车发动机造成不利影响。此外,油品蒸发损耗还有一定的安全隐患,易造成局部火灾,并对人类和动植物也有毒害性。目前,国内外正结合油品蒸发损耗的相关因素,发掘降耗措施,比如对输送和储油设备的结构进行设计和改进,尽可能加大对烃蒸气的回收力度,并采取合适的方法来抑制油品蒸发损耗。 展开更多
关键词 油蒸气传质过程 油罐静止储存损耗 油罐动液面损耗
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摇摆运动下低流率蒸汽冷凝换热特性和气泡受力数值模拟
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作者 罗正航 李敬宇 +2 位作者 陈伟雄 种道彤 严俊杰 《化工学报》 EI CSCD 北大核心 2024年第8期2800-2811,共12页
蒸汽直接接触冷凝具有高效的传热传质性能,广泛应用于核能安全等领域。低质量流率蒸汽直接接触冷凝具有低频压力振荡,易引发设备共振。相比陆地稳定工况,海洋条件下摇摆运动可能加剧气液界面振荡,进一步影响设备的安全运行。为此,通过... 蒸汽直接接触冷凝具有高效的传热传质性能,广泛应用于核能安全等领域。低质量流率蒸汽直接接触冷凝具有低频压力振荡,易引发设备共振。相比陆地稳定工况,海洋条件下摇摆运动可能加剧气液界面振荡,进一步影响设备的安全运行。为此,通过数值模拟对摇摆条件下低流率蒸汽凝结过程进行研究,分析了摇摆条件下压力、换热特性和气泡受力的变化规律,结果表明压力和传热系数剧烈波动主要集中于气泡颈缩和脱离阶段,此时气泡受力也达到最大值,气泡主要受惯性力和凝结力作用。此外,对比静止工况和摇摆工况,发现摇摆条件下由气泡速度变化导致的惯性力部分增大,摇摆运动带来的附加摇摆速度强化了气液界面的换热性能,平均传热系数远高于静止工况。 展开更多
关键词 蒸汽直接接触冷凝 气泡受力 气液两相流 计算流体力学 传递过程 摇摆运动
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LNG储配站管道阀门冰堵问题研究
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作者 肖炜 《石化技术》 CAS 2024年第10期36-38,共3页
对于液化天然气(LNG)储配站来讲,如果管道阀门出现了冰堵,那么将会带来严重的后果。其不仅仅是会阻碍天然气的正常流动,还可能会导致设备故障,对整个站点的安全带来威胁。因此,及时有效地解决冰堵问题,对于确保LNG储配站的稳定供应、减... 对于液化天然气(LNG)储配站来讲,如果管道阀门出现了冰堵,那么将会带来严重的后果。其不仅仅是会阻碍天然气的正常流动,还可能会导致设备故障,对整个站点的安全带来威胁。因此,及时有效地解决冰堵问题,对于确保LNG储配站的稳定供应、减少运营成本具有重要意义。通过具体案例,就LNG储配站管道阀门冰堵问题进行了分析,并提出了解决措施。 展开更多
关键词 水蒸汽 工艺 LNG储配站 工艺流程 安全管理
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Remarkable carbon dioxide catalytic capture (CDCC) leading to solid-form carbon material via a new CVD integrated process (CVD-IP): An alternative route for CO_2 sequestration 被引量:5
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作者 Wei Chu Maofei Ran +4 位作者 Xu Zhang Ning Wang Yufei Wang Heping Xie Xiusong Zhao 《Journal of Energy Chemistry》 SCIE EI CAS CSCD 2013年第1期136-144,共9页
Through our newly-developed "chemical vapor deposition integrated process (ISVD-IP)'" using carbon OlOXlae (t..u2) as me raw matenal and only carbon source introduced, CO2 could be catalytically activated and c... Through our newly-developed "chemical vapor deposition integrated process (ISVD-IP)'" using carbon OlOXlae (t..u2) as me raw matenal and only carbon source introduced, CO2 could be catalytically activated and converted to a new solid-form product, i.e., carbon nanotubes (CO2-derived) at a quite high yield (the single-pass carbon yield in the solid-form carbon-product produced from CO2 catalytic capture and conversion was more than 30% at a single-pass carbon-base). For comparison, when only pure carbon dioxide was introduced using the conventional CVD method without integrated process, no solid-form carbon-material product could be formed. In the addition of saturated steam at room temperature in the feed for CVD, there were much more end-opening carbon nano-tubes produced, at a slightly higher carbon yield. These inspiring works opened a remarkable and alternative new approach for carbon dioxide catalytic capture to solid-form product, comparing with that of CO2 sequestration (CCS) or CO2 mineralization (solidification), etc. As a result, there was much less body volume and almost no greenhouse effect for this solid-form carbon-material than those of primitive carbon dioxide. 展开更多
关键词 carbon dioxide catalytic capture (CDCC) carbon nanotubes (CNTs) chemical vapor deposition integrated process (CVD-IP) solid-formcarbon material debating greenhouse gases (GHG) effects
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Vaporization behavior of lead from the FeO-CaO-SiO_2-Al_2O_3 slag system 被引量:3
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作者 Yanling Zhang Rui Zhang +1 位作者 Eiki Kasai Shiqi Li 《Journal of University of Science and Technology Beijing》 CSCD 2008年第6期671-677,共7页
Vaporization behavior (1163-1463 K) of lead in the slag system of FeO-CaO-SiO2-Al2O3 with CaC% was examined. A thermodynamic estimation with the principle of Gibbs free energy minimization showed that the major vapo... Vaporization behavior (1163-1463 K) of lead in the slag system of FeO-CaO-SiO2-Al2O3 with CaC% was examined. A thermodynamic estimation with the principle of Gibbs free energy minimization showed that the major vapor species from the sample of the FeO-CaO-SiO2-Al2O3 system+PbO+CaCl2 were metallic Pb, PbCl, PbCl2, and FeCl2, at the experimental temperature range. The experimental results show that the mole ratio of vaporized Cl in lead chlorides to vaporized Pb, simply expressed as Cl/Pb decreases with increasing temperature. The larger Cl/Pb means a larger ratio of gaseous PbCl2, since metallic Pb and PbCl vapors are formed in a similar reduction atmosphere. The evaporation is initially rapid and becomes steady after holding for 10 min. Gaseous PbCl2 is mainly formed during the heating period, and at the holding stage, it reacts with FeO to produce gaseous FeCl2 With regard to slag composition, FeO content and basicity significantly affect the evaporation of lead. High FeO content and high basicity promotes the formation of metallic Pb and PbCI, whereas, it prohibits PbCl2 evaporation. 展开更多
关键词 slag system smelting process vaporization behavior LEAD
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MVR技术回收聚酯装置工艺塔酯化蒸气余热探讨
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作者 史少君 刘常峰 姚同林 《合成纤维工业》 CAS 2024年第5期86-89,共4页
随着聚酯装置的大型化,装置工艺塔酯化蒸气余热资源的利用变得不可忽视。聚酯装置工艺塔酯化蒸气余热利用方式包括余热制冷、余热取热等,但存在余热利用率不高的问题。通过分析聚酯装置工艺塔酯化蒸气特点及现有余热利用方式,结合目前... 随着聚酯装置的大型化,装置工艺塔酯化蒸气余热资源的利用变得不可忽视。聚酯装置工艺塔酯化蒸气余热利用方式包括余热制冷、余热取热等,但存在余热利用率不高的问题。通过分析聚酯装置工艺塔酯化蒸气特点及现有余热利用方式,结合目前新型水蒸气压缩机的发展,重点讨论了利用机械蒸汽再压缩(MVR)技术回收工艺塔酯化蒸气余热的技术方案和优势,并与余热发电技术进行了对比。结果表明:聚酯装置工艺塔酯化蒸气具有温度低,压力低、允许压降小,组分沸点差大,冬夏两季热负荷差别大,腐蚀性较强等特点;对于大型聚酯装置,在兼顾聚酯装置冷量/热量需求的前提下,采用MVR技术将多余的余热资源转化成水蒸气既可实现酯化蒸气余热的回收,又可满足酯化蒸气在冬季与夏季时热负荷差距较大的工况,是一种比余热发电更加经济高效的利用方式。 展开更多
关键词 聚酯 工艺塔 酯化蒸气 余热回收 机械蒸汽再压缩技术
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碳化硅基器件碳膜保护层的制备与研究
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作者 孔令通 肖晓雨 +3 位作者 佘鹏程 黄也 龚俊 王建青 《电子工业专用设备》 2024年第2期27-32,67,共7页
碳膜沉积工艺是集成电路碳化硅器件制造过程中一道关键工艺,通过在碳化硅表面沉积碳膜,有效防止碳化硅器件在高温退火后的表面荒化,避免器件失效。通过磁控溅射法在碳化硅基底上制备碳膜,探索不同的参数对碳膜的影响,得到了表面光滑、... 碳膜沉积工艺是集成电路碳化硅器件制造过程中一道关键工艺,通过在碳化硅表面沉积碳膜,有效防止碳化硅器件在高温退火后的表面荒化,避免器件失效。通过磁控溅射法在碳化硅基底上制备碳膜,探索不同的参数对碳膜的影响,得到了表面光滑、均匀性小于2%的碳膜。通过表征,证实碳膜与碳化硅基底有很好的结合力,在实际生产中沉积的碳膜对碳化硅器件起到了保护作用,有效地保证了产品良率。 展开更多
关键词 碳化硅 集成电路 碳膜沉积工艺 磁控溅射法 物理气相沉积
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微束水蒸气等离子弧焊在空调铜管钎焊中的应用
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作者 李冉 曾申波 +2 位作者 梅乾龙 周玲 孟浩 《制冷与空调》 2024年第8期38-43,共6页
铜管是制冷设备的重要原材料,生产中通常采用气体火焰钎焊对铜管接头进行焊接。但传统的气体火焰钎焊存在诸多缺点,故引入微束水蒸气等离子弧焊工艺方法,探究其焊接铜管的可行性并确定出合适的焊接工艺参数。通过对5组不同规格的铜管接... 铜管是制冷设备的重要原材料,生产中通常采用气体火焰钎焊对铜管接头进行焊接。但传统的气体火焰钎焊存在诸多缺点,故引入微束水蒸气等离子弧焊工艺方法,探究其焊接铜管的可行性并确定出合适的焊接工艺参数。通过对5组不同规格的铜管接头在6个焊接电流档位下分别进行焊接试验,对试验样本焊后的外观和内部结构进行观察、分析、对比,验证了该方法相比于气体火焰钎焊方法的有效性,并获得了各类铜管接头合适的焊接电流档位。与气焊相比,使用微束水蒸气等离子弧焊工艺在合适的焊接工艺参数下进行焊接,具有较高的效率、稳定性、易用性和安全性,能够为空调铜管的焊接和维修提供一种新的工艺方法。 展开更多
关键词 水蒸气等离子弧焊接 铜管钎焊 焊接试验 焊接工艺参数
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Synthesis and Characterization of GaN Rods Prepared by Ammono-Chemical Vapor Deposition 被引量:1
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作者 Gregorio Guadalupe Carbajal Arízaga Karina Viridiana Chávez Hernández +3 位作者 Nicolás Cayetano Castro Manuel Herrera Zaldivar Rafael García Gutiérrez Oscar Edel Contreras López 《Advances in Chemical Engineering and Science》 2012年第2期292-299,共8页
GaN rods were deposited by chemical vapor deposition (CVD) onto sapphire (0 0 0 1) and amorphous quartz. The reactive Ga species in vapor the phase was formed with NH4Cl and gallium. The unidirectional growth was cata... GaN rods were deposited by chemical vapor deposition (CVD) onto sapphire (0 0 0 1) and amorphous quartz. The reactive Ga species in vapor the phase was formed with NH4Cl and gallium. The unidirectional growth was catalyzed with gold nanoparticles formed onto the substrate prior to the CVD reaction in order to induce a vapor-liquid-solid (VLS) mechanism. However, this method of synthesis seems to be influenced by other growth mechanisms which formed additional depositions of GaN with different morphology than the rods catalyzed by gold nanoparticles. The moieties of GaN that grew in the absence of gold formed branches in the rods or increased the lateral growth of rods resulting in larger diameters than the size of the gold particle that guided the growth. 展开更多
关键词 Crystal Morphology NANOSTRUCTURES Chemical vapor DEPOSITION processes SEMICONDUCTING III-V Material
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A Numerical Study of Densification Behavior of Silicon Carbide Matrix Composites in Isothermal Chemical Vapor Infiltration 被引量:2
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作者 GUAN Kang WU Jianqing CHENG Laifei 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2018年第6期1365-1371,共7页
We studied the characteristics of two-scale pore structure of preform in the deposition process and the mass transfer of reactant gas in dual-scale pores, and observed the physiochemical phenomenon associated with the... We studied the characteristics of two-scale pore structure of preform in the deposition process and the mass transfer of reactant gas in dual-scale pores, and observed the physiochemical phenomenon associated with the reaction. Thereby, we established mathematical models on two scales, respectively, preform and reactor. These models were used for the numerical simulation of the process of ceramic matrix composites densified by isothermal chemical vapor infiltration(ICVI). The models were used to carry out a systematic study on the influence of process conditions and the preform structure on the densification behaviors. The most important findings of our study are that the processing time could be reduced by about 50% without compromising the quality of the material, if the processing temperature is 950-1 000 ℃ for the first 70 hours and then raised to 1 100 ℃. 展开更多
关键词 isothermal chemical vapor infiltration ceramic matrix composites process parameters fiber preform structure densification behavior
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Synthesis and Growth Process: A Tetrapod-Like ZnO Nanostructure
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作者 皮振邦 苏小路 +3 位作者 田甜 裴芳 杨超 田熙科 《Journal of China University of Geosciences》 SCIE CSCD 2007年第2期148-152,共5页
Three kinds of tetrapod-like ZnO nanostructures have been synthesized simultaneously via pure Zn chemical vapor deposition on silicon wafers with (111) orientation (Si (111)) at 920 ℃. X-ray diffraction indicat... Three kinds of tetrapod-like ZnO nanostructures have been synthesized simultaneously via pure Zn chemical vapor deposition on silicon wafers with (111) orientation (Si (111)) at 920 ℃. X-ray diffraction indicates that the nanotetrapods are of wurtzite structure. The morphology and the microstructure of the nanotetrapods are investigated by the scanning electron microscopy. Selected area electron diffraction shows the growth direction, and energy dispersive X-ray spectroscopy reveals the atomic composition ratio of Zn/O. The growth process is briefly discussed. The optical property of the products was also recorded by means of photoluminescence spectroscopy. 展开更多
关键词 tetrapod-like ZnO chemical vapor deposition growth process
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