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Analysis on Vapour Field for the Drought Causes in Beijing,Tianjin and Hebei Districts in Recent Years 被引量:5
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作者 杨文霞 李宏宇 +1 位作者 李宗涛 房彬 《Agricultural Science & Technology》 CAS 2010年第1期117-121,共5页
The monthly variation,temporal-spatial distribution,transportation characteristics of vapour field at middle and lower atmosphere and their effects on drought in Beijing,Tianjin and Hebei districts were studied,which ... The monthly variation,temporal-spatial distribution,transportation characteristics of vapour field at middle and lower atmosphere and their effects on drought in Beijing,Tianjin and Hebei districts were studied,which have a guiding significance on predicting climate and arranging agricultural production in the district. 展开更多
关键词 BEIJING Tianjin and Hebei district DROUGHT vapour field
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Electron field emission characteristics of nano-catkin carbon films deposited by electron cyclotron resonance microwave plasma chemical vapour deposition 被引量:2
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作者 顾广瑞 吴宝嘉 +1 位作者 金哲 Ito Toshimichi 《Chinese Physics B》 SCIE EI CAS CSCD 2008年第2期716-720,共5页
This paper reported that the nano-catkin carbon films were prepared on Si substrates by means of electron cyclotron resonance microwave plasma chemical vapour deposition in a hydrogen and methane mixture. The surface ... This paper reported that the nano-catkin carbon films were prepared on Si substrates by means of electron cyclotron resonance microwave plasma chemical vapour deposition in a hydrogen and methane mixture. The surface morphology and the structure of the fabricated films were characterized by using scanning electron microscopes and Raman spectroscopy, respectively. The stable field emission properties with a low threshold field of 5V/μm corresponding to a current density of about 1μA/cm^2 and a current density of 3.2mA/cm^2 at an electric field of 10V/μm were obtained from the carbon film deposited at CH4 concentration of 8%. The mechanism that the threshold field decreased with the increase of the CH4 concentration and the high emission current appeared at the high CH4 concentration was explained by using the Fowler-Nordheim theory. 展开更多
关键词 field emission carbon films nano-catkin microwave plasma chemical vapour deposition
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Field emission characteristics of nano-sheet carbon films deposited by quartz-tube microwave plasma chemical vapour deposition 被引量:1
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作者 顾广瑞 金哲 Ito Toshimichi 《Chinese Physics B》 SCIE EI CAS CSCD 2008年第4期1467-1471,共5页
Nano-sheet carbon films are prepared on Si wafers by means of quartz-tube microwave plasma chemical vapour deposition (MPCVD) in a gas mixture of hydrogen and methane. The structure of the fabricated films is invest... Nano-sheet carbon films are prepared on Si wafers by means of quartz-tube microwave plasma chemical vapour deposition (MPCVD) in a gas mixture of hydrogen and methane. The structure of the fabricated films is investigated by using field emission scanning electron microscope (FESEM) and Raman spectroscopy. These nano^carbon films are possessed of good field emission (FE) characteristics with a low threshold field of 2.6 V/μm and a high current density of 12.6 mA/cm^2 at an electric field of 9 V/μm. As the FE currents tend to be saturated in a high E region, no simple Fowler-Nordheim (F-N) model is applicable. A modified F N model considering statistic effects of FE tip structures and a space-charge-limited-current (SCLC) effect is applied successfully to explaining the FE data observed at low and high electric fields, respectively. 展开更多
关键词 field emission carbon films nano-sheet microwave plasma chemical vapour deposition
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Field emissions of graphene films deposited on different substrates by CVD system 被引量:1
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作者 王小平 刘晓菲 +5 位作者 刘欣欣 王丽军 杨灿 井龙伟 李松坤 潘秀芳 《Chinese Physics B》 SCIE EI CAS CSCD 2012年第12期499-502,共4页
Graphene films are deposited on copper (Cu) and aluminum (Al) substrates, respectively, by using a microwave plasma chemical vapour deposition technique. Furthermore, these graphene films are characterized by a fi... Graphene films are deposited on copper (Cu) and aluminum (Al) substrates, respectively, by using a microwave plasma chemical vapour deposition technique. Furthermore, these graphene films are characterized by a field emission type scanning electron microscope (FE-SEM), Raman spectra, and field emission (FE) I-V measurements. It is found that the surface morphologies of the films deposited on Cu and Al substrates are different: the field emission property of graphene film deposited on the Cu substrate is better than that on the Al substrate, and the lowest turn-on field of 2.4 V/p-m is obtained for graphene film deposited on the Cu substrate. The macroscopic areas of the graphene samples are all above 400 mm2. 展开更多
关键词 GRAPHENE chemical vapour deposition field emission
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Controlled growth and field emission of vertically aligned A1N nanostructures with different morphologies 被引量:4
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作者 刘飞 苏赞加 +5 位作者 梁炜杰 莫富尧 李力 邓少芝 陈军 许宁生 《Chinese Physics B》 SCIE EI CAS CSCD 2009年第5期2016-2023,共8页
The controllable growth of three different morphologies of AlN nanostructures (nanorod, nanotip and nanocrater) arrays are successfully realized by using chemical vapour deposition (CVD) technology. All three nano... The controllable growth of three different morphologies of AlN nanostructures (nanorod, nanotip and nanocrater) arrays are successfully realized by using chemical vapour deposition (CVD) technology. All three nanostructures are of single crystal h-AlN with a growth orientation of [001]. Their growth is attributed to the vapour-liquid-solid (VLS) mechanism. To investigate the factors affecting field emission (FE) properties of AlN nanostructures, we compare their FE behaviours in several aspects. Experimental results show that AIN nanocrater arrays possess the best FE properties, such as a threshold field of 7.2 V/μm and an emission current fluctuation lower than 4%. Moreover, the three AlN nanostructures all have good field emission properties compared with a number of other excellent cathode nanomaterials, which suggests that they are future promising FE nanomaterials. 展开更多
关键词 ALN field emission (FE) vapour-liquid-solid (VLS) chemical vapour deposition (CVD)
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Synthesis and Field Emission Properties of Carbon Nanowire-Single Walled Carbon Nanotube Networks Hybrid Films
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作者 Lijun Wang Linghong Liu +3 位作者 Xiaoping Wang Ying Yu Junwei Wen Jian Li 《World Journal of Engineering and Technology》 2015年第3期97-104,共8页
Carbon nanowire (CNW)-singlewalled carbon nanotube (SWCNT) networks hybrid films with a large area (~400 mm2) are grown on molybdenum (Mo) layers by microwave plasma chemical vapour deposition system. The Mo layers, w... Carbon nanowire (CNW)-singlewalled carbon nanotube (SWCNT) networks hybrid films with a large area (~400 mm2) are grown on molybdenum (Mo) layers by microwave plasma chemical vapour deposition system. The Mo layers, which were deposited on Al2O3 ceramic substrates through electron beam evaporation deposition, were pretreated by a laser-grooving (LG) technology. Furthermore, the surface morphology, micro-structure and field emission properties of these samples are characterized by scanning electron microscope, Raman spectra, and field emission I - V measurements. ACNW-SWCNT networks hybrid film was formed in the surface of Mo layer, but the laser etched area (linear pits array area) the distribution of the CNW-SWCNT networks density is lower than the un-etched area CNW-SWCNT networks distribution density. The diameter of the CNWs and SWCNTs, respectively in the 8 - 15 nm and 0.9 - 1.5 nm range, and the length of CNW-SWCNTs ranges from 1 μm to 4 μm. The growth mechanisms of the films were discussed. Effects of LG pretreatment on surface morphologies and microstructure of the hybrid films were investigated. The field electron emission experimental results shown that the ture on field as low as 1.6 V/μm, and a current density of 0.15 mA/cm2 at an electric field of 4.3 V/μm was obtained. 展开更多
关键词 CARBON NANOWIRE Singlewalled CARBON NANOTUBE Chemical vapour DEPOSITION field Emission
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Enhanced field emission characteristics of thin-Au-coated nano-sheet carbon films 被引量:2
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作者 顾广瑞 伊藤利道 《Chinese Physics B》 SCIE EI CAS CSCD 2009年第10期4547-4551,共5页
This paper reports that the nano-sheet carbon films (NSCFs) were fabricated on Si wafer chips with hydrogen- methane gas mixture by means of quartz-tube-type microwave plasma chemical vapour deposition (MWPCVD). I... This paper reports that the nano-sheet carbon films (NSCFs) were fabricated on Si wafer chips with hydrogen- methane gas mixture by means of quartz-tube-type microwave plasma chemical vapour deposition (MWPCVD). In order to further improve the field emission (FE) characteristics, a 5-nm Au film was prepared on the samples by using electron beam evaporation. The FE properties were obviously improved due to depositing Au thin film on NSCFs. The FE current density at a macroscopic electric field, E, of 9 V/μm was increased from 12.4 mA/cm2 to 27.2 mA/cm2 and the threshold field was decreased from 2.6 V/μm to 2.0 V/μm for Au-coated carbon films. A modified F-N model considering statistic effects of FE tip structures in the low E region and a space-chavge-limited-current effect in the high E region were applied successfully to explain the FE data of the Au-coated NSCF. 展开更多
关键词 nano-sheet carbon films field emission microwave plasma chemical vapour deposition space-charge-limited-current
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Synthesis of ZnO films with a special texture and enhanced field emission properties
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作者 王小平 王子 +1 位作者 王丽军 梅翠玉 《Chinese Physics B》 SCIE EI CAS CSCD 2011年第10期325-328,共4页
ZnO films with special textures ave fabricated on Mo-coated Al2O3 ceramic substrates by the catalyst-free electron beam evaporation method, and the as-deposited films are treated by hydrogen plasma. It is found that t... ZnO films with special textures ave fabricated on Mo-coated Al2O3 ceramic substrates by the catalyst-free electron beam evaporation method, and the as-deposited films are treated by hydrogen plasma. It is found that the surface morphologies of the films are changed significantly after hydrogen plasma treatment and that the films consist of vertically standing and intersecting nanosheets. A lower turn-on field of 1.2 V/μm and an enhanced current density -0.11 mA/cm2 at 2.47 V/μm are achieved. The low threshold field and the high emission current density are attributed primarily to the unique shape and smaller resistivity of the ZnO nanosheet films. 展开更多
关键词 nano-ZnO thin films hydrogen plasma treatment field electron emission microwaveplasma chemical vapour deposition
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京津冀近年干旱成因的水汽场分析 被引量:8
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作者 杨文霞 李宏宇 +1 位作者 李宗涛 房彬 《安徽农业科学》 CAS 北大核心 2010年第6期3051-3054,共4页
分析了中低层大气空中水汽场的逐月变化、时空分布及输送特征以及对京津冀地区近年干旱的影响,对开展该地区气候预测和安排农业生产具有一定指导意义。
关键词 京津冀地区 干旱 水汽场
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长江流域旱涝典型年大气水汽输送 被引量:11
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作者 高国栋 翟盘茂 《水科学进展》 EI CAS CSCD 1993年第1期10-16,共7页
利用我国125个探空站一日两次自地面至100hpa共11个层次上的观测资料,对长江流域典型夏涝年(1980年)和夏旱年(1985年)我国大气中水汽总输送场、涡动输送场及散度场进行了计算分析。结果表明:当水汽总输送场从西北、西南和东南三支气流... 利用我国125个探空站一日两次自地面至100hpa共11个层次上的观测资料,对长江流域典型夏涝年(1980年)和夏旱年(1985年)我国大气中水汽总输送场、涡动输送场及散度场进行了计算分析。结果表明:当水汽总输送场从西北、西南和东南三支气流携带的水汽交汇于长江流域,且整个水汽输送场稳定持久,则在水汽辐合带附近导致大量降水,形成洪涝;反之,当三支气流微弱不稳定,不能形成水汽辐合带条件,则形成干旱。涡动输送亦反映出类似的特征。稳定且强盛的西南气流水汽输送是形成降水的主要条件和原因。 展开更多
关键词 干旱 洪涝 长江流域 大气 水气输送
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TVD格式在燃料蒸气云爆炸场数值模拟中的应用 被引量:4
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作者 彭金华 汤明钧 《计算物理》 CSCD 北大核心 1991年第4期407-412,共6页
本文采用了有限差分方法——TVD格式(Total Variation Diminishing,A.Harten,1983)对燃料蒸气云爆炸产生的二维轴对称爆炸场进行了数值模拟。爆炸波超压和运动轨迹的数值计算值与实验结果吻合得相当好。
关键词 爆炸场 数值模拟 TVD格式
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T_(63)L_(16)谱模式水汽初始场的处理和试验
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作者 季仲贞 王斌 《气候与环境研究》 CSCD 2000年第2期141-144,共4页
在T63L1 6谱模式中 ,初始输入的水汽场 ,经展谱后 ,垂直各层一般出现 2 %~8%的负水汽点。为了克服这一负水汽现象 ,我们采用了“逐步循环订正法”对初值进行了一些特别处理。经实例计算表明 ,其效果明显 ,不仅负水汽现象得以克服 。
关键词 水汽场 谱模式 初始场 水平分布 初值 订正 垂直 试验 循环 现象
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碳纳米管薄膜的制备及处理对场发射特性的影响
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作者 田时开 江天府 +1 位作者 杨兴华 曾葆青 《电子科技大学学报》 EI CAS CSCD 北大核心 2006年第6期936-938,共3页
采取直接在硅片上真空蒸镀NiCr合金作为催化剂,用化学气相沉积法制备了碳纳米管薄膜。并采用H2等离子体球处理碳纳米管薄膜,测试其场发射特性,并与未经处理的碳纳米管薄膜进行了比较,得到碳纳米管薄膜开启场强有所降低,为1~1.2V/μm。... 采取直接在硅片上真空蒸镀NiCr合金作为催化剂,用化学气相沉积法制备了碳纳米管薄膜。并采用H2等离子体球处理碳纳米管薄膜,测试其场发射特性,并与未经处理的碳纳米管薄膜进行了比较,得到碳纳米管薄膜开启场强有所降低,为1~1.2V/μm。对碳纳米管薄膜进行老炼处理,最大场发射电流由12.3μA提高到34μA。 展开更多
关键词 碳纳米管 场发射 化学气相沉积法 老炼
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化学气相沉积制备多壁碳纳米管反应器内流场的数值模拟 被引量:2
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作者 刘斌 《工业加热》 CAS 2019年第4期40-41,44,共3页
建立制备多壁碳纳米管CVD反应器的二维几何模型,将参与反应物的材料参数拟合为随温度变化的非线性多项式方程,采用计算流体力学软件对反应器内部的温度场及速度场进行模拟研究。研究结果表明:反应器内温度场及速度场分布并不均匀,在反... 建立制备多壁碳纳米管CVD反应器的二维几何模型,将参与反应物的材料参数拟合为随温度变化的非线性多项式方程,采用计算流体力学软件对反应器内部的温度场及速度场进行模拟研究。研究结果表明:反应器内温度场及速度场分布并不均匀,在反应器中部温度较为均匀温度基本维持在1 100 K左右,这样有助于多壁碳纳米管的合成,同时对于速度场的研究发现合理的控制气体进口速度有助于碳纳米管在均匀流场中稳定生长。 展开更多
关键词 化学气相沉积 多壁碳纳米管 流场 数值模拟
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微图形定向碳纳米管场发射阵列冷阴极的研究 被引量:12
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作者 陈长青 丁明清 +4 位作者 李兴辉 白国栋 张甫权 冯进军 邵文生 《真空科学与技术学报》 EI CAS CSCD 北大核心 2007年第5期363-366,共4页
本文介绍了一种微图形化碳纳米管场发射阵列冷阴极,每个图形的直径仅为1μm,构成一个发射单元。制作工艺如下:首先在硅(100)基片上沉积氮化钛缓冲层,然后采用曝光工艺获得直径为1μm的胶孔阵列,沉积催化剂铁,最后采用直流等离子体增强... 本文介绍了一种微图形化碳纳米管场发射阵列冷阴极,每个图形的直径仅为1μm,构成一个发射单元。制作工艺如下:首先在硅(100)基片上沉积氮化钛缓冲层,然后采用曝光工艺获得直径为1μm的胶孔阵列,沉积催化剂铁,最后采用直流等离子体增强化学气相沉积(DC-PECVD)生长直立的碳纳米管。并对17500个发射单元的阵列阴极进行了表面形貌表征及场发射特性测试。结果表明,碳纳米管阵列阴极的一致性较好;最低开启电场为1 V/μm;电场为17 V/μm时,测得的电流密度已达到90 mA/cm2;发射电流为550μA时,在2.5 h内的波动小于5.6%。 展开更多
关键词 微图形 定向碳纳米管 场发射阵列冷阴极 直流等离子体增强化学气相沉积
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影响广西的台风“榴莲” 被引量:6
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作者 黎惠金 覃昌柳 《气象》 CSCD 北大核心 2002年第7期42-45,50,共5页
对影响广西造成重大灾害的 0 1 0 3号台风“榴莲”进行了综合分析。结果表明 ,强大的正涡度和辐合上升运动区 ,对流层中低层的位势不稳定 ,西风急流和偏东急流的存在和维持 ,两个水汽源地的较强水汽输送等是广西台风大暴雨或特大暴雨产... 对影响广西造成重大灾害的 0 1 0 3号台风“榴莲”进行了综合分析。结果表明 ,强大的正涡度和辐合上升运动区 ,对流层中低层的位势不稳定 ,西风急流和偏东急流的存在和维持 ,两个水汽源地的较强水汽输送等是广西台风大暴雨或特大暴雨产生的必要条件。 0 1 0 3号台风始终沿着大气总能量高能轴线方向移动。大暴雨中心主要分布在台风中心的高能舌顶和不稳定能量舌尖附近区域内 。 展开更多
关键词 广西 台风 暴雨 动力场 水汽 能量场 西风急源 水汽输送
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铜尖表面石墨烯原位生长工艺及其场发射特性
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作者 田康 刘卫华 +2 位作者 李昕 魏仙琪 王小力 《西安交通大学学报》 EI CAS CSCD 北大核心 2015年第8期6-10,共5页
针对非高熔点金属针尖在场发射中表面原子易升华的问题,通过在亚微米量级的铜尖表面原位生长石墨烯来抑制铜原子升华,以提高其场发射稳定性能。首先利用三氯化铁溶液将铜丝进行腐蚀,得到亚微米量级别的高曲率铜尖,然后通过化学气相沉积... 针对非高熔点金属针尖在场发射中表面原子易升华的问题,通过在亚微米量级的铜尖表面原位生长石墨烯来抑制铜原子升华,以提高其场发射稳定性能。首先利用三氯化铁溶液将铜丝进行腐蚀,得到亚微米量级别的高曲率铜尖,然后通过化学气相沉积法在高曲率的铜尖表面原位生长获得了石墨烯,得到了一种新的冷阴极结构——铜尖/石墨烯结构。对覆盖石墨烯前后的铜尖进行场发射测试,结果发现,石墨烯的存在使铜尖的开启场强从4V/μm降低到2.5V/μm,并且提高了发射电流的稳定性。该研究结果对于在亚微米尺度铜表面生长石墨烯以及利用石墨烯改善金属针尖的场发射特性均有参考价值,为非高熔点金属制作场发射尖端提供了一种可能性。 展开更多
关键词 石墨烯 化学气相淀积 场发射
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CVD法生产6.5%Si钢的工艺及设备 被引量:8
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作者 王向成 《钢铁研究》 CAS 1992年第5期54-61,共8页
本文简要介绍了国外研制6.5%Si钢的历史及最新进展,着重对已有产品面市的日本NKK公司的CVD法的工艺技术及设备状况进行了综述。
关键词 化学气相沉积 磁场冷却 硅钢
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基于OVD制棒技术的芯棒与尾柄对接工艺对光纤性能的影响
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作者 秦钰 陈京京 +3 位作者 张彬 沈一春 钱宜刚 吴椿烽 《光通信技术》 2021年第8期58-62,共5页
为减少光纤参数波动超标,提升有效拉丝长度,基于外部气相沉积(OVD)法制棒技术研究了芯棒和尾柄的对接工艺及其与接口附近光纤参数的关系,阐述了利用自动数控车床进行芯棒和尾柄对接的工艺方法,理论分析了对接工艺对光纤性能影响的原理,... 为减少光纤参数波动超标,提升有效拉丝长度,基于外部气相沉积(OVD)法制棒技术研究了芯棒和尾柄的对接工艺及其与接口附近光纤参数的关系,阐述了利用自动数控车床进行芯棒和尾柄对接的工艺方法,理论分析了对接工艺对光纤性能影响的原理,并将不同对接工艺的芯棒进行拉丝对比实验。实验结果表明:使用该对接工艺的芯棒跳动值一次符合率可从90%提升至98%以上,确定了利于减小光纤模场直径波动的挤压程度DD0为1.2,且氢氧比2∶1.1是在不产生接口气泡前提下使光纤水峰性能最优的对接参数。 展开更多
关键词 外部气相沉积法 对接工艺 黏度 芯包同心度 模场直径 水峰
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Molecular Dynamics Simulation: Influence of External Electric Field on Bubble Interface in Air Flotation Process
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作者 WU Leichao HAN Yong +3 位作者 ZHANG Qianrui ZHU Lin ZHANG Chuanxin ZHAO Ruikuan 《Chemical Research in Chinese Universities》 SCIE CAS CSCD 2018年第6期939-944,共6页
Molecular dynamics(MD) simulation was performed to investigate the influence of external electric field on the vapottr-liquid interface of the bubble during the process of toluene separation by air flotation. The ph... Molecular dynamics(MD) simulation was performed to investigate the influence of external electric field on the vapottr-liquid interface of the bubble during the process of toluene separation by air flotation. The physico- chemical properties of vapour-liquid interface, surface tension, probability of a hydrogen bonding near the vapour- liquid interface and the viscosity of liquid phase caused by external electric field were analyzed. The results show that the angle between the water molecule dipole moment and the normal z axis in the vapour phase changes smaller when the external electric field is applied. The surface tension and the probability of hydrogen bonding near the vapour-liquid interface increase with the increase of electric field strength. And the viscosity also increases tinder an external electric field. The results confirm that the external electric field has a positive effect on the performance of bubbles in air flotation, which may provide useful guidance for the combination of electric field and air flotation technology. 展开更多
关键词 Molecular dynamics simulation vapour-liquid interface Air flotation Electric field TOLUENE
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