A laser-produced plasma(LPP) source was built using liquid as target and a Nd:YAG laser as the irradiation laser, and the LPP source's radiation with ethanol and acetone target respectively was measured by an AXUV...A laser-produced plasma(LPP) source was built using liquid as target and a Nd:YAG laser as the irradiation laser, and the LPP source's radiation with ethanol and acetone target respectively was measured by an AXUV100 silicon photodiode combined with a McPHERSON model 247 grazing incidence monochromator of the resolution Δλ≤0.075 nm and the wavelength scanning interval 0.5 nm. Both ethanol and acetone target LPP source had EUV emission at 11～20 nm wavelength. The comparison between the spectra of the two kinds of target materials shows that all the two kinds of target source's spectra are the result of oxygen ions' transitions under current source's parameters, but the spectrum intensity from different target sources is different. The spectra intensity from the ethanol target is higher than that from the acetone target. In addition, the target liquid is forced into the vacuum chamber by the background pressure supported by the connected external high pressure gas, and the influence of the background pressure on the source's intensity is investigated.展开更多
The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits wi...The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography, optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. The good prospects of the EUV and soft X-rays for next generation lithography systems (λ=13.5 nm), microscopy in the “water window” (λ=2.3～4.4 nm), astronomy (λ=5～31 nm), spectroscopy, plasma diagnostics and EUV/soft X-ray laser research have led to considerable progress in the development of different multilayer optics. Since optical systems in the EUV/soft X-ray spectral region consist of several mirror elements a maximum reflectivity of each multilayer is essential for a high throughput. This paper covers recent results of the enhanced spectral behavior of Mo/Si, Cr/Sc and Sc/Si multilayer optics.展开更多
In EUV and X- ray regions, multilayer mirrors are the essential and necessary optics elements. The good prospects of the EUV and X- rays for next generation lithography system, microscopy in the “water windows”, ast...In EUV and X- ray regions, multilayer mirrors are the essential and necessary optics elements. The good prospects of the EUV and X- rays for next generation lithography system, microscopy in the “water windows”, astro- nomical telescope, spectroscopy, plasma diagnostics, and X- ray laser have impelled the development of multilayer optics. The paper introduces the recent results of the multilayer optics elements in Tongji University, including beam splitters, broadband/angular polarizers, supermirrors and high- reflectance mirrors. The product of reflectivity and transmissivity is above 4% for the Mo/Si multilayer beam splitter. Over the 15￣17 nm wavelength range, the s- re- flectivity of the non- periodic Mo/Si broadband multilayer polarizers is reasonably constant, as high as 36.6%, and the degree of polarization is more than 97.8%. At the fixed energy of 8 keV (Cu Kαline), the W/Si supermirror has the reflectivity of above 30% in the angle range of 0.4°￣0.85°, and a W/B4C supermirror has the reflectivity of about 20% in the angle range of 0.9°￣1.2°, and the reflectivity of W/C supermirror working in the grazing incident angle range of 0.9°￣1.2°is about 20%. The experimental results of some high- reflectance mirrors in our lab are also pre- sented, such as Mo/Si, Mo/Y, Cr/C, La/B4C, Si/C and Si/SiC. The reflectivity of Mo/Si multilayer is as high as 61.1% at wavelength of 13.4 nm.展开更多
观测光谱是研究天体的基础资料,对这些光谱的理解主要依靠理论模型。由于各模型依赖于众多的基本原子参数,且不同的模型对同一特定对象有不同的理解,所以对这些模型进行实验校准十分重要。电子束离子阱(electron beam ion trap,简称EBIT...观测光谱是研究天体的基础资料,对这些光谱的理解主要依靠理论模型。由于各模型依赖于众多的基本原子参数,且不同的模型对同一特定对象有不同的理解,所以对这些模型进行实验校准十分重要。电子束离子阱(electron beam ion trap,简称EBIT)能够产生与天体环境类似的等离子体环境,因此基于电子束离子阱的实验室光谱测量极大地促进了对天体X射线和极紫外辐射的研究。主要对以下内容进行介绍:卫星观测光谱和理论数值计算的现状及所面临的问题;基于电子束离子阱的类氖铁(Fe XVII)3C/3D重要诊断谱线比的最新研究进展;近年来实验室电子束离子阱对X射线和极紫外辐射的测量进展。最后,对现有的实验室光谱研究工作予以简要的展望。展开更多
表征EUV辐射通量的E10．7指数在越来越多的研究和应用中被用来代替传统的F10．7指数, X 射线对地球D层和E层的电离起着重要作用,但由于D层观测数据的不足和E层电离源的多样性,难以被用来考虑X射线对电离层的影响,火星电离层下层的电离...表征EUV辐射通量的E10．7指数在越来越多的研究和应用中被用来代替传统的F10．7指数, X 射线对地球D层和E层的电离起着重要作用,但由于D层观测数据的不足和E层电离源的多样性,难以被用来考虑X射线对电离层的影响,火星电离层下层的电离源几乎是单一的软X射线,这为研究X射线对电离层的作用提供了可能性．通过研究火星电离层下层的峰值电子浓度对E10．7的依赖关系,发现即便经过必要的修正,这种关系对不同的观测时段并不具备一致性．通过理论推导和数据分析,得到了一种特别用于描述太阳软X射线辐射通量的新指数,即Xs指数,用来替代E10．7指数．Xs指数在描述火星电离层下层对太阳辐射的依赖关系时,不同的观测时段有很好的一致性,表明Xs指数在表征太阳软X射线辐射强度方面比 E10．7指数更加合适。展开更多
In this paper we have reviewed our achievements in soft X-ray and extreme ultraviolet (EUV) optics. Up to now, the research system of soft X-ray and EUV optics has been established, including light sources, detectors,...In this paper we have reviewed our achievements in soft X-ray and extreme ultraviolet (EUV) optics. Up to now, the research system of soft X-ray and EUV optics has been established, including light sources, detectors, calibrations, optical testing and machining of super smooth mirrors, and fabrications of multilayer film mirrors. Based on our achievements, we have developed two types of solar space telescopes for the soft X-ray and EUV space solar observations. One is an EUV multilayer normal incident telescope array including 4 different operation wavelength telescopes. The operation wavelengths of the EUV telescope are 13.0, 17.1, 19.5 and 30.4 nm. The other is a complex space solar telescope, which is composed of an EUV multilayer normal incident telescope and a soft X-ray grazing incident telescope. The EUV multilayer normal incident telescope stands in the central part of the soft X-ray grazing incident telescope. The normal incident telescope and the grazing incident telescope have a common detector. The different operation wavelengths can be changed by rotating a filter wheel.展开更多
文摘A laser-produced plasma(LPP) source was built using liquid as target and a Nd:YAG laser as the irradiation laser, and the LPP source's radiation with ethanol and acetone target respectively was measured by an AXUV100 silicon photodiode combined with a McPHERSON model 247 grazing incidence monochromator of the resolution Δλ≤0.075 nm and the wavelength scanning interval 0.5 nm. Both ethanol and acetone target LPP source had EUV emission at 11～20 nm wavelength. The comparison between the spectra of the two kinds of target materials shows that all the two kinds of target source's spectra are the result of oxygen ions' transitions under current source's parameters, but the spectrum intensity from different target sources is different. The spectra intensity from the ethanol target is higher than that from the acetone target. In addition, the target liquid is forced into the vacuum chamber by the background pressure supported by the connected external high pressure gas, and the influence of the background pressure on the source's intensity is investigated.
文摘The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography, optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. The good prospects of the EUV and soft X-rays for next generation lithography systems (λ=13.5 nm), microscopy in the “water window” (λ=2.3～4.4 nm), astronomy (λ=5～31 nm), spectroscopy, plasma diagnostics and EUV/soft X-ray laser research have led to considerable progress in the development of different multilayer optics. Since optical systems in the EUV/soft X-ray spectral region consist of several mirror elements a maximum reflectivity of each multilayer is essential for a high throughput. This paper covers recent results of the enhanced spectral behavior of Mo/Si, Cr/Sc and Sc/Si multilayer optics.
基金the National Natural Science Foundation of China under the contract numbers 60178021,60378021 , 10435050 National High Technology Research and Development“863”Program of China.(No.3)
文摘In EUV and X- ray regions, multilayer mirrors are the essential and necessary optics elements. The good prospects of the EUV and X- rays for next generation lithography system, microscopy in the “water windows”, astro- nomical telescope, spectroscopy, plasma diagnostics, and X- ray laser have impelled the development of multilayer optics. The paper introduces the recent results of the multilayer optics elements in Tongji University, including beam splitters, broadband/angular polarizers, supermirrors and high- reflectance mirrors. The product of reflectivity and transmissivity is above 4% for the Mo/Si multilayer beam splitter. Over the 15￣17 nm wavelength range, the s- re- flectivity of the non- periodic Mo/Si broadband multilayer polarizers is reasonably constant, as high as 36.6%, and the degree of polarization is more than 97.8%. At the fixed energy of 8 keV (Cu Kαline), the W/Si supermirror has the reflectivity of above 30% in the angle range of 0.4°￣0.85°, and a W/B4C supermirror has the reflectivity of about 20% in the angle range of 0.9°￣1.2°, and the reflectivity of W/C supermirror working in the grazing incident angle range of 0.9°￣1.2°is about 20%. The experimental results of some high- reflectance mirrors in our lab are also pre- sented, such as Mo/Si, Mo/Y, Cr/C, La/B4C, Si/C and Si/SiC. The reflectivity of Mo/Si multilayer is as high as 61.1% at wavelength of 13.4 nm.
文摘观测光谱是研究天体的基础资料,对这些光谱的理解主要依靠理论模型。由于各模型依赖于众多的基本原子参数,且不同的模型对同一特定对象有不同的理解,所以对这些模型进行实验校准十分重要。电子束离子阱(electron beam ion trap,简称EBIT)能够产生与天体环境类似的等离子体环境,因此基于电子束离子阱的实验室光谱测量极大地促进了对天体X射线和极紫外辐射的研究。主要对以下内容进行介绍:卫星观测光谱和理论数值计算的现状及所面临的问题;基于电子束离子阱的类氖铁(Fe XVII)3C/3D重要诊断谱线比的最新研究进展;近年来实验室电子束离子阱对X射线和极紫外辐射的测量进展。最后,对现有的实验室光谱研究工作予以简要的展望。
文摘表征EUV辐射通量的E10．7指数在越来越多的研究和应用中被用来代替传统的F10．7指数, X 射线对地球D层和E层的电离起着重要作用,但由于D层观测数据的不足和E层电离源的多样性,难以被用来考虑X射线对电离层的影响,火星电离层下层的电离源几乎是单一的软X射线,这为研究X射线对电离层的作用提供了可能性．通过研究火星电离层下层的峰值电子浓度对E10．7的依赖关系,发现即便经过必要的修正,这种关系对不同的观测时段并不具备一致性．通过理论推导和数据分析,得到了一种特别用于描述太阳软X射线辐射通量的新指数,即Xs指数,用来替代E10．7指数．Xs指数在描述火星电离层下层对太阳辐射的依赖关系时,不同的观测时段有很好的一致性,表明Xs指数在表征太阳软X射线辐射强度方面比 E10．7指数更加合适。
基金Supported by the National Natural Science Foundation of China (Grant Nos. 40774098 and 10878004)
文摘In this paper we have reviewed our achievements in soft X-ray and extreme ultraviolet (EUV) optics. Up to now, the research system of soft X-ray and EUV optics has been established, including light sources, detectors, calibrations, optical testing and machining of super smooth mirrors, and fabrications of multilayer film mirrors. Based on our achievements, we have developed two types of solar space telescopes for the soft X-ray and EUV space solar observations. One is an EUV multilayer normal incident telescope array including 4 different operation wavelength telescopes. The operation wavelengths of the EUV telescope are 13.0, 17.1, 19.5 and 30.4 nm. The other is a complex space solar telescope, which is composed of an EUV multilayer normal incident telescope and a soft X-ray grazing incident telescope. The EUV multilayer normal incident telescope stands in the central part of the soft X-ray grazing incident telescope. The normal incident telescope and the grazing incident telescope have a common detector. The different operation wavelengths can be changed by rotating a filter wheel.
