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Field Emission of SiCN Thin Films Bombarded by Ar^+ Ions 被引量:1
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作者 Ma You\|peng, Li Jin\|chai , Guo Huai\|xi, Lu Xian\|feng, Chen Ming\|an, Ye Ming\|sheng School of Physics and Technology, Wuhan University, Wuhan 430072, Hubei, China 《Wuhan University Journal of Natural Sciences》 CAS 2003年第03A期829-832,共4页
SiCN thin films were synthesized by a radio frequency chemical vapor deposition (RFCVD) system on P\|type Si (1 0 0) wafers using C 2 H 4 , SiH 4 and N 2 as raw materials. In order to get rid of the ... SiCN thin films were synthesized by a radio frequency chemical vapor deposition (RFCVD) system on P\|type Si (1 0 0) wafers using C 2 H 4 , SiH 4 and N 2 as raw materials. In order to get rid of the oxygen absorbed on the surface and improve the characteristics of electron field emission, Ar + ions of low energy were used to bombard the samples. The field emission characteristics of SiCN thin films before and after Ar + bombardment were studied in the super vacuum environment of 10 -6 Pa. It was showed that the turn\|on field (defined as the point where the current\|voltage curve shows a sharp increase in the current density) decreased from 38 V/μm before bombardment to 25 V/μm after bombardment. And the maximum emission current density increased from 159.2 to 267.4 μA/cm 2 . The composition before and after Ar + bombardment was compared using X\|ray photoelectron spectroscopy (XPS). Our results illustrated that the field emission characteristics were improved after the bombardment of Ar + . 展开更多
关键词 SiCN thin films RFCVD electron field emission X\|ray photoelectron spectroscopy (xps)
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The Preparation and Characterization of Amorphous SiCN Thin Films
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作者 Li Jin chai, Lu Xian feng, Zhang Zi hong, Guo Huai xi, Ye Ming sheng School of Physics and Technology, Wuhan University, Wuhan 430072, China 《Wuhan University Journal of Natural Sciences》 EI CAS 2001年第3期665-669,共5页
Radio Frequency plasma enhanced Chemical Vapor Deposition (RF CVD) using N2, SiH4 and C2H4 as the reaction sources was used to prepare amorphous ternary Si x C y N z thin films. The chemical states of the C, Si and N... Radio Frequency plasma enhanced Chemical Vapor Deposition (RF CVD) using N2, SiH4 and C2H4 as the reaction sources was used to prepare amorphous ternary Si x C y N z thin films. The chemical states of the C, Si and N atoms in the films were characterized by X-ray photoelectron spectroscopy (XPS) and Fourier Transform Infrared Spectroscopy (FTIR). The refractive indexn, extinction coefficientk and optical band gapE opt of the thin films were investigated by UV-visible spectrophotometer and spectroscopic ellipsometer. The results show that a complex chemical bonding network rather than a simple mixture of Si3N4, SiC, CN x and a-C etc., may exist in the ternary thin films. Then's of the films are within the range of 1. 90–2. 45, andE opt's of all samples are within the range of 2. 71–2. 86 eV. 展开更多
关键词 SiCN thin films RF CVD synthesis optical properties X ray photoelectron spectroscopy (xps) FTIR
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Tribological behavior and microstructural evolution of lubricating film of silver matrix self-lubricating nanocomposite 被引量:1
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作者 Xiao KANG Shuang YU +2 位作者 Hailin YANG Yang SUN Lei ZHANG 《Friction》 SCIE EI CAS CSCD 2021年第5期941-951,共11页
The aim of this study is to fabricate the nanocomposite with low friction and high wear resistance using binary solid lubricant particles.The microstructure and tribological performance of the nanocomposite are evalua... The aim of this study is to fabricate the nanocomposite with low friction and high wear resistance using binary solid lubricant particles.The microstructure and tribological performance of the nanocomposite are evaluated,and the composition and film thickness of the lubricating film are observed and analyzed by scanning electron microscopy(SEM)and X‐ray photoelectron spectroscopy(XPS).The nanocomposite exhibited improved tribological properties with a friction coefficient as low as 0.12 and a low wear rate of 2.17×10^(-6) mm^(3)/(N∙m)in high‐purity nitrogen atmosphere.Decreasing sliding speed can increase lubricating film thickness,and the thickest lubricating film is approximately 125 nm.As the film thickness of the lubricating film exceeded 90 nm,the friction coefficient curves became smooth.In compared with WS_(2),MoS_(2) can be more effective in forming the transfer layer on the worn surfaces at the initial stage of the tribological process. 展开更多
关键词 lubricating film metal matrix self‐lubricating composite tribological behavior binary solid lubricants X‐ray photoelectron spectroscopy(xps)
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Alignment Mechanism of Liquid Crystal Molecules on the Fluorated Polyimide Surface
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作者 徐寿颐 李志军 《Tsinghua Science and Technology》 SCIE EI CAS 1997年第4期42-44,49,共4页
The generation of pretilt angles for nematic liquid crystal aligned on the rubbed polyimide surface containing trifluoromethyl moieties has been investigated. The characters of the rubbed polyimide films were studied ... The generation of pretilt angles for nematic liquid crystal aligned on the rubbed polyimide surface containing trifluoromethyl moieties has been investigated. The characters of the rubbed polyimide films were studied by using X ray photoelectron spectroscopy(XPS) and atomic force microscopy(AFM). The uneven distribution extent of fluorine content along the depth of the polyimide films could be reduced by rubbing, thus the interaction between liquid crystal molecules and polyimide molecules decreased. It is also showed that the aggregation state of polyimide molecules was changed and polyimide chains aligned along the rubbing direction, so the orientation direction of the liquid crystal molecules was the same as the rubbing direction. The orientation effect of the liquid crystal molecules on the rubbed polyimide surface can be attributed to the combined effects of the Van der Waals dispersion interaction between polyimide and liquid crystal molecules, and the alignment of the orientation direction of polyimide chains with the rubbing direction. 展开更多
关键词 POLYIMIDE rubbing strength pretilt angle fluorine content X ray photoelectron spectroscopy(xps) atomic force microscopy(AFM)
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