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HfGdO/Ge异质结的制备及其能带排列 被引量:1
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作者 孙孟君 朱燕艳 《微纳电子技术》 北大核心 2016年第6期401-405,共5页
HfO_2是一种很有应用前景的高k栅介质材料,稀土元素掺杂可以有效改进HfO_2的性能。采用磁控溅射方法制备了Ge基HfGdO薄膜,即HfGdO/Ge异质结。X射线衍射结果显示这种方法制备的薄膜是非晶结构,利用原子力显微镜对退火前后薄膜的表面形貌... HfO_2是一种很有应用前景的高k栅介质材料,稀土元素掺杂可以有效改进HfO_2的性能。采用磁控溅射方法制备了Ge基HfGdO薄膜,即HfGdO/Ge异质结。X射线衍射结果显示这种方法制备的薄膜是非晶结构,利用原子力显微镜对退火前后薄膜的表面形貌进行了观察,俄歇电子能谱结果发现制备的薄膜是符合化学计量比的。通过X射线光电子能谱(XPS)对薄膜的禁带宽度和它相对于Ge衬底的导带、价带偏移进行了研究,结果显示其禁带宽度为(5.86±0.2)eV,HfGdO/Ge结构的价带偏移和导带偏移分别是(3.6±0.2)eV和(1.6±0.3)eV。这些数据将为HfGdO薄膜在栅介质上的应用提供理论依据。 展开更多
关键词 HfGdO/Ge异质结 高K栅介质 磁控溅射 X射线光电子能谱(xps) 能带结构
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Experimental studies of N^+ implantation into CVD diamond thin films
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作者 辛火平 林成鲁 +5 位作者 王建新 邹世昌 石晓红 林梓鑫 周祖尧 刘祖刚 《Science China(Technological Sciences)》 SCIE EI CAS 1997年第4期361-368,共8页
The effects of N+ implantation under various conditions on CVD diamond films were analyzed with Raman spectroscopy, four-point probe method, X-ray diffraction (XRD), Rutherford backseattering spectroscopy (RBS), ultra... The effects of N+ implantation under various conditions on CVD diamond films were analyzed with Raman spectroscopy, four-point probe method, X-ray diffraction (XRD), Rutherford backseattering spectroscopy (RBS), ultraviolet photoluminescence spectroscopy (UV-PL), Fourier transformation infrared absorption spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS). The results show that the N+ implantation doping without any graphitization has been successfully realized when 100 keV N+ ions at a dosage of 2 × 1016 cm-2 were implanted into diamond films at 550℃ . UV-PL spectra indicate that the implanted N+ ions formed an electrically inactive deep-level impurity in diamond films. So the sheet resistance of the sample after N+ implantation changed little. Carbon nitride containing C≡N covalent bond has been successfully synthesized by 100 keV, 1.2×1018 N/cm2 N+ implantation into diamond films. Most of the implanted N+ ions formed C≡N covalent bonds with C atoms. The others were free state nitrogen, which existed in the excessive nitrogen layers. C(1s) XPS studies show the existence of three different C(1s) bonding states, corresponding to graphite, i-carbon and the carbon of C≡N covalent bonding state, respectively, which agrees well with the Raman results. 展开更多
关键词 N+ IMPLANTATION into diamond films Raman spectroscopy ultraviolet photoluminescence spec-troscopy (UV-PL) electrically inactive deep-level IMPURITY C≡N COVALENT bond carbon nitride x-ray photoelec-tron spectroscopy (xps). N+ IMPLANTATION
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