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P-Type Nitrogen-Doped ZnO Films Prepared by In-Situ Thermal Oxidation of Zn_3N_2 Films
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作者 靳玉平 张斌 +1 位作者 王建中 施立群 《Chinese Physics Letters》 SCIE CAS CSCD 2016年第5期119-122,共4页
P-type nitrogen-doped ZnO films are prepared successfully by in-situ thermal oxidation of Zn3N2 films. The prepared films are characterized by x-ray diffraction, non-Rutherford back.scattering (non-RBS) spectroscopy... P-type nitrogen-doped ZnO films are prepared successfully by in-situ thermal oxidation of Zn3N2 films. The prepared films are characterized by x-ray diffraction, non-Rutherford back.scattering (non-RBS) spectroscopy, x- ray photoelectron spectroscopy, and photoluminescence spectrum. The results show that the Zn3N1 films start to transform to ZnO at 400℃ and the total nitrogen content decreases with the increasing annealing temperature. The p-type fihns are achieved at 500℃ with a low resistivity of 6.33Ω.cm and a high hole concentration of +8.82 × 10^17 cm-3, as well as a low level of carbon contamination, indicating that the substitutional nitrogen (No) is an effective acceptor in the ZnO:N film. The photoluminescence spectra show clear UV emissions and also indicate the presence of oxygen vacancy (Vo) defects in the ZnO:N films. The p-type doping mechanism is briefly discussed. 展开更多
关键词 znO in or as In P-Type Nitrogen-Doped znO Films Prepared by In-Situ Thermal Oxidation of zn3N2 Films of by
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