The relation between threshold voltage for hydrogenated amorphous silicon thin film transistors (a-Si:H TFTs) and deposition conditions for hydrogenated amorphous silicon nitride (a-SiN x :H) films is investig...The relation between threshold voltage for hydrogenated amorphous silicon thin film transistors (a-Si:H TFTs) and deposition conditions for hydrogenated amorphous silicon nitride (a-SiN x :H) films is investigated.It is observed that the threshold voltage, V th ,of a-Si:H TFT increases with the increase of the thickness of a-SiN x :H film,and the threshold voltage is reduced apparently with the increase of NH 3/SiH 4 gas flow rate ratio.展开更多
This paper proposes an equivalent circuit model to analyze the reason for the dispersion of sub-threshold current （also known as zero-current point dispersion） in organic thin-film transistors. Based on the level 61...This paper proposes an equivalent circuit model to analyze the reason for the dispersion of sub-threshold current （also known as zero-current point dispersion） in organic thin-film transistors. Based on the level 61 amorphous silicon thin-film transistor model in star-HSPICE, the results from our equivalent circuit model simulation reveal that zero-current point dispersion can be attributed to two factors： large contact resistance and small gate resistance. Furthermore, it is found that decreasing the contact resistance and increasing the gate resistance can efficiently reduce the dispersion. If the contact resistance can be controlled to 0 g2, all the zero-current points can gather together at the base point. A large gate resistance is good for constraining the dispersion of the zero-current points and gate leakage. The variances of the zero-current points are 0.0057 and nearly 0 when the gate resistances are 17 MΩ and 276 MΩ, respectively.展开更多
文摘The relation between threshold voltage for hydrogenated amorphous silicon thin film transistors (a-Si:H TFTs) and deposition conditions for hydrogenated amorphous silicon nitride (a-SiN x :H) films is investigated.It is observed that the threshold voltage, V th ,of a-Si:H TFT increases with the increase of the thickness of a-SiN x :H film,and the threshold voltage is reduced apparently with the increase of NH 3/SiH 4 gas flow rate ratio.
文摘This paper proposes an equivalent circuit model to analyze the reason for the dispersion of sub-threshold current （also known as zero-current point dispersion） in organic thin-film transistors. Based on the level 61 amorphous silicon thin-film transistor model in star-HSPICE, the results from our equivalent circuit model simulation reveal that zero-current point dispersion can be attributed to two factors： large contact resistance and small gate resistance. Furthermore, it is found that decreasing the contact resistance and increasing the gate resistance can efficiently reduce the dispersion. If the contact resistance can be controlled to 0 g2, all the zero-current points can gather together at the base point. A large gate resistance is good for constraining the dispersion of the zero-current points and gate leakage. The variances of the zero-current points are 0.0057 and nearly 0 when the gate resistances are 17 MΩ and 276 MΩ, respectively.
