Al doped zinc oxide （AZO） films were prepared by mid-frequency magnetron sputtering for silicon （Si） thin film solar cells. Then, the influence of deposition parameters on the electrical and optical properties of ...Al doped zinc oxide （AZO） films were prepared by mid-frequency magnetron sputtering for silicon （Si） thin film solar cells. Then, the influence of deposition parameters on the electrical and optical properties of the films was studied. Results showed that high conductive and high transparent AZO thin films were achieved with a minimum resistivity of 2.45 × 10^-4 Ω·cm and optical transmission greater than 85% in visible spectrum region as the films were deposited at a substrate temperature of 225℃ and a low sputtering power of 160 W. The optimized films were applied as back reflectors in a-SiGe：H solar cells. A relative increase of 19% in the solar cell efficiency was achieved in comparison to the cell without the ZnO films doped with Al （ZnO：Al）.展开更多
In this paper, a-Si：H/a-SiGe：H/μc-SiGe：H triple-junction solar cell structure is proposed. By the analyses of mi- croelectronic and photonic structures （AMPS-1D） and our TRJ-F/TRJ-M/TRJ-B tunneling-recombination...In this paper, a-Si：H/a-SiGe：H/μc-SiGe：H triple-junction solar cell structure is proposed. By the analyses of mi- croelectronic and photonic structures （AMPS-1D） and our TRJ-F/TRJ-M/TRJ-B tunneling-recombination junction （TRJ） model, the most preferably combined bandgap for this structure is found to be 1.85 eV/1.50 eV/1.0 eV. Using more realistic material properties, optimized thickness combination is investigated. Along this direction, a-Si：H/a-SiGe：H/μc-SiGe：H triple cell with an initial efficiency of 12.09% （Voc = 2.03 V, FF = 0.69, Jsc = 8.63 mA/cm^2, area = 1 cm^2） is achieved in our laboratory.展开更多
Different aluminum-doped ZnO （AZO）/metal composite thin films, including AZO/Ag/Al, AZO/Ag/nickelchromium alloy （NiCr）, and AZO/Ag/NiCr/Al, are utilized as the back reflectors of p-i-n amorphous silicon germanium ...Different aluminum-doped ZnO （AZO）/metal composite thin films, including AZO/Ag/Al, AZO/Ag/nickelchromium alloy （NiCr）, and AZO/Ag/NiCr/Al, are utilized as the back reflectors of p-i-n amorphous silicon germanium thin film solar cells. NiCr is used as diffusion barrier layer between Ag and Al to prevent mutual diffusion, which increases the short circuit current density of solar cell. NiCr and NiCr/AI layers are used as protective layers of Ag layer against oxidation and sulfurization, the higher efficiency of solar cell is achieved. The experimental results show that the performance of a-SiGe solar cell with AZO/Ag/NiCr/Al back reflector is best. The initial conversion efficiency is achieved to be 8.05%.展开更多
基金Acknowledgements This work was supported by Key Project of Natural Science Foundation of Hubei Province （No. 2009CBA025）. The authors would like to thank Analytical and Testing Center of Huazhong University of Science and Technology.
文摘Al doped zinc oxide （AZO） films were prepared by mid-frequency magnetron sputtering for silicon （Si） thin film solar cells. Then, the influence of deposition parameters on the electrical and optical properties of the films was studied. Results showed that high conductive and high transparent AZO thin films were achieved with a minimum resistivity of 2.45 × 10^-4 Ω·cm and optical transmission greater than 85% in visible spectrum region as the films were deposited at a substrate temperature of 225℃ and a low sputtering power of 160 W. The optimized films were applied as back reflectors in a-SiGe：H solar cells. A relative increase of 19% in the solar cell efficiency was achieved in comparison to the cell without the ZnO films doped with Al （ZnO：Al）.
基金supported by the National Basic Research Program of China (Grant Nos. 2011CBA00705, 2011CBA00706, and 2011CBA00707)the Natural Science Foundation of Tianjin City, China (Grant No. 12JCQNJC01000)the Fundamental Research Funds for the Central Universities of China (Grant No. 65012371)
文摘In this paper, a-Si：H/a-SiGe：H/μc-SiGe：H triple-junction solar cell structure is proposed. By the analyses of mi- croelectronic and photonic structures （AMPS-1D） and our TRJ-F/TRJ-M/TRJ-B tunneling-recombination junction （TRJ） model, the most preferably combined bandgap for this structure is found to be 1.85 eV/1.50 eV/1.0 eV. Using more realistic material properties, optimized thickness combination is investigated. Along this direction, a-Si：H/a-SiGe：H/μc-SiGe：H triple cell with an initial efficiency of 12.09% （Voc = 2.03 V, FF = 0.69, Jsc = 8.63 mA/cm^2, area = 1 cm^2） is achieved in our laboratory.
基金National Natural Science Foundation of China(Nos.62004087,12164051)Natural Science Foundation of Fujian Province(No.2020J01815)the Natural Science Foundation of Zhangzhou(No.ZZ2020J32).
基金supported by the National Basic Research Program of China (Grant No. 2011CBA00705)the High Technology Research Program of China (GrantNo. 2011AA050502)
文摘Different aluminum-doped ZnO （AZO）/metal composite thin films, including AZO/Ag/Al, AZO/Ag/nickelchromium alloy （NiCr）, and AZO/Ag/NiCr/Al, are utilized as the back reflectors of p-i-n amorphous silicon germanium thin film solar cells. NiCr is used as diffusion barrier layer between Ag and Al to prevent mutual diffusion, which increases the short circuit current density of solar cell. NiCr and NiCr/AI layers are used as protective layers of Ag layer against oxidation and sulfurization, the higher efficiency of solar cell is achieved. The experimental results show that the performance of a-SiGe solar cell with AZO/Ag/NiCr/Al back reflector is best. The initial conversion efficiency is achieved to be 8.05%.
