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Electron emission degradation of nano-structured sp^2-bonded amorphous carbon films 被引量:1
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作者 鲁占灵 王昶清 +2 位作者 贾瑜 张兵临 姚宁 《Chinese Physics B》 SCIE EI CAS CSCD 2007年第3期843-847,共5页
The initial field electron emission degradation behaviour of original nano-structured sp^2-bonded amorphous carbon films has been observed, which can be attributed to the increase of the work function of the film in t... The initial field electron emission degradation behaviour of original nano-structured sp^2-bonded amorphous carbon films has been observed, which can be attributed to the increase of the work function of the film in the field emission process analysed using a Fowler-Nordheim plot. The possible reason for the change of work function is suggested to be the desorption of hydrogen from the original hydrogen termination film surface due to field emission current-induced local heating. For the explanation of the emission degradation behaviour of the nano-structured sp2-bonded amorphous carbon film, a cluster model with a series of graphite (0001) basal surfaces has been presented, and the theoretical calculations have been performed to investigate work functions of graphite (0001) surfaces with different hydrogen atom and ion chemisorption sites by using first principles method based on density functional theory-local density approximation. 展开更多
关键词 nano-structured sp^2-bonded amorphous carbon film field emission work function
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Incorporation of Nitrogen Into Amorphous Carbon Films Produced by Surface-Wave Plasma Chemical Vapor Deposition
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作者 吴玉祥 朱晓东 詹如娟 《Plasma Science and Technology》 SCIE EI CAS CSCD 2003年第6期2063-2070,共8页
In order to study the influence of nitrogen incorporated into amorphous carbon films, nitrogenated amorphous carbon films have been deposited by using surface wave plasma chemical vapor deposition under various ratios... In order to study the influence of nitrogen incorporated into amorphous carbon films, nitrogenated amorphous carbon films have been deposited by using surface wave plasma chemical vapor deposition under various ratios of N2/CH4 gas flow. Optical emission spectroscopy has been used to monitor plasma features near the deposition zone. After deposition, the samples are checked by Raman spectroscopy and x-ray photo spectroscopy (XPS). Optical emission intensities of CH and N atom in the plasma are found to be enhanced with the increase in the N2/CH4 gas flow ratio, and then reach their maximums when the N2/CH4 gas flow ratio is 5%. A contrary variation is found in Raman spectra of deposited films. The intensity ratio of the D band to the G band (Id/Ig) and the peak positions of the G and D bands all reach their minimums when the N2/CH4 gas flow ratio is 5%. These show that the structure of amorphous carbon films has been significantly modified by introduction of nitrogen. 展开更多
关键词 nitrogenated amorphous carbon film incorporation of nitrogen optical emission spectroscopy surface wave plasma RAMAN
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Effects of Deposition Temperature on the Properties of Fluorinated Amorphous Carbon Films
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作者 陈玲玲 程珊华 +3 位作者 辛煜 宁兆元 许圣华 陈军 《Plasma Science and Technology》 SCIE EI CAS CSCD 2003年第5期1977-1982,共6页
Fluorinated amorphous carbon films (a-C:F) were prepared at different temperatures using a microwave electron cyclotron resonance chemical vapor deposition (ECR-CVD) reactor with CHF3 and C2H2 as source gases. Films w... Fluorinated amorphous carbon films (a-C:F) were prepared at different temperatures using a microwave electron cyclotron resonance chemical vapor deposition (ECR-CVD) reactor with CHF3 and C2H2 as source gases. Films were annealed at 500℃ in vacuum ambience in order to investigate the relationship of their thermal stability, optical and electrical properties with deposition temperature. Results indicate that the films deposited at high temperature have a less CFX bonding and a more cross-linking structure thus a better thermal stability. They also have a lower bandgap, higher dielectric constant and higher leakage current. 展开更多
关键词 fluorinated amorphous carbon film deposition temperature FTIR optical band gap
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Structural and mechanical properties of amorphous carbon films deposited by the dual plasma technique
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作者 Yaohui Wang,Xu Zhang,Xianying Wu,Huixing Zhang,and Xiaoji Zhang Key Laboratory of the Ministry of Education of China for Beam Technology and Material Modification,Institution of Low Energy Nuclear Physics,Beijing Normal University Beijing Radiation Center,Beijing 100875,China 《Journal of University of Science and Technology Beijing》 CSCD 2008年第5期622-626,共5页
Direct current metal filtered cathodic vacuum arc (FCVA) and acetylene gas (C2H2) were wielded to synthesize Ti-containing amorphous carbon films on Si (100). The influence of substrate bias voltage and acetylen... Direct current metal filtered cathodic vacuum arc (FCVA) and acetylene gas (C2H2) were wielded to synthesize Ti-containing amorphous carbon films on Si (100). The influence of substrate bias voltage and acetylene gas on the microstructure and mechanical properties of the films were investigated. The results show that the phase of TiC in the (111) preferential crystallographic orientation exists in the film,and the main existing pattern of carbon is sp2. With increasing the acetylene flow rate,the contents of Ti and TiC phase of the film gradually reduce; however,the thickness of the film increases. When the substrate bias voltage reaches -600 V,the internal stress of the film reaches 1.6 GPa. The micro-hardness and elastic modulus of the film can reach 33.9 and 237.6 GPa,respectively,and the friction coefficient of the film is 0.25. 展开更多
关键词 metal containing amorphous carbon amorphous carbon films filtered arc ACETYLENE flow rate bias voltage structure and properties
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Deposition of Amorphous Carbon Films using ECR Plasma byVarying the Substrate Temperature
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作者 宁兆元 马春兰 +3 位作者 程珊华 康健 辛煜 叶超 《Plasma Science and Technology》 SCIE EI CAS CSCD 1999年第1期47-55,共9页
Amorphous hydrogenated carbon thin films have been deposited with benzene plasma in an electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition system. The characteristic of Benzene discharge plas... Amorphous hydrogenated carbon thin films have been deposited with benzene plasma in an electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition system. The characteristic of Benzene discharge plasma has been monitored by Mast spectrometry. It shows that the majority of the plasma species in the downstream ECR Plasma with benzene as gas source are acetylene, ethylene and higher mass species. In the experiments, the effects of the substrate temperature on the deposition rates have been emphatically studied. The structures of the films were analyzed by FTIR and Ramam spectrum.The results show that when the substrate temperature rises, the deposition rate drops down, the hydrogen Foment decreases, with the higher SP3 content being presented in the film. 展开更多
关键词 ECR Deposition of amorphous carbon films using ECR Plasma byVarying the Substrate Temperature CM
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Effect of Nickel Distributions Embedded in Amorphous Carbon Films on Transport Properties
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作者 Vali Dalouji Dariush Mehrparvar +1 位作者 Shahram Solaymani Sahar Rezaee 《Chinese Physics Letters》 SCIE CAS CSCD 2018年第2期61-65,共5页
Electrical properties of C/Ni films are studied using four mosaic targets made of pure graphite and stripes of nickel with the surface areas of 1.78,3.21,3.92 and 4.64%.The conductivity data in the temperature range o... Electrical properties of C/Ni films are studied using four mosaic targets made of pure graphite and stripes of nickel with the surface areas of 1.78,3.21,3.92 and 4.64%.The conductivity data in the temperature range of400-500 K shows the extended state conduction.The conductivity data in the temperature range of 150-300 K shows the multi-phonon hopping conduction.The Berthelot-type conduction dominates in the temperature range of 50-150 K.The conductivity of the films in the temperature range about 〈 50 K is described in terms of variable-range hopping conduction.In low temperatures,the localized density of state around Fermi level(F)for the film deposition with 3.92% nickel has a maximum value of about 56.2×10^(17)cm^(-3)eV^(-1) with the minimum average hopping distance of about 3.43 × 10^(-6) cm. 展开更多
关键词 NI Effect of Nickel Distributions Embedded in amorphous carbon films on Transport Properties
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Relationship Between Thermal Stability and Optical Bandgap of Fluorinated Amorphous Carbon Films
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作者 杨慎东 宁兆元 +2 位作者 黄峰 程珊华 叶超 《Plasma Science and Technology》 SCIE EI CAS CSCD 2001年第5期941-946,共6页
Fluorinated amorphous carbon films were deposited using microwave electron cyclotron resonance chemical vapor deposition (ECR-CVD) reactor with CF4 and C8H6 as source gas and were annealed in nitrogen ambience for the... Fluorinated amorphous carbon films were deposited using microwave electron cyclotron resonance chemical vapor deposition (ECR-CVD) reactor with CF4 and C8H6 as source gas and were annealed in nitrogen ambience for the investigating of their thermal stability .The relative concentration of C=C bond and optical bandgap were obtained by Fourier Transform Infrared (FTIR) spectroscopy and Ultraviolet-Visible (UV-VIS ) spectrum, respectively. It has been demonstrated that there is a close relationship between relative concentration of C=C bond and optical bandgap, and the films deposited at a higher microwave power have a lower optical bandgap and a better thermal stability. 展开更多
关键词 Relationship Between Thermal Stability and Optical Bandgap of Fluorinated amorphous carbon films
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Metastable hybridized structure transformation in amorphous carbon films during friction-A study combining experiments and MD simulation
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作者 Yefei ZHOU Zhihao CHEN +4 位作者 Tao ZHANG Silong ZHANG Xiaolei XING Qingxiang YANG Dongyang LI 《Friction》 SCIE EI CAS CSCD 2023年第9期1708-1723,共16页
Amorphous carbon films have attracted substantial interest due to their exceptional mechanical and tribological properties.Previous studies revealed that the amorphous carbon films exhibited lower coefficient of frict... Amorphous carbon films have attracted substantial interest due to their exceptional mechanical and tribological properties.Previous studies revealed that the amorphous carbon films exhibited lower coefficient of friction(COF)because of the transformation in bond structure from sp^(3)-C to sp^(2)-C during friction processes.However,the mechanism for such a transformation during friction is not well understood.This study is conducted to get an insight into the metastable transformation in amorphous carbon film during friction by means of experiments and molecular dynamics(MD)simulation.Relevant wear tests showed that wear of the film changed from an abrasive wear mode to a mixture of abrasion and adhesive wear,resulting in a decrease in growth rate of the wear rate after the running-in stage.It is worth noting that the sp^(3)-C atoms were increased during the running-in stage when the films contained lower sp^(3)/sp^(2) ratios.However,the formed sp^(3)-C atoms could only be short-lived and gradually transformed to sp^(2)-C atoms with the graphitization generated on the wearing surface of the films.The radial distribution function and translational order parameter indicated that the films'high sp^(3)/sp^(2) ratio led to an increased sp^(2)-C proportion on the wear scar after friction,which caused an increased structural ordering. 展开更多
关键词 amorphous carbon film metastable transformation structural order molecular dynamics(MD)simulation tribological performance
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Relative Irradiance Measurement and Bonding Configurations of Amorphous Fluorinated Carbon Films Deposited by Electron Cyclotron Resonance Plasma
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作者 叶超 康健 +1 位作者 宁兆元 程珊华 《Plasma Science and Technology》 SCIE EI CAS CSCD 2000年第5期469-474,共6页
a-C:F films are deposited by microwave electron cyclotron resonance (ECR)plasma chemical vapor deposition (CVD) using trifluoromethane (CHF3) and benzene (C6H6) as source gases at different microwave powers. The radic... a-C:F films are deposited by microwave electron cyclotron resonance (ECR)plasma chemical vapor deposition (CVD) using trifluoromethane (CHF3) and benzene (C6H6) as source gases at different microwave powers. The radicals in plasma originating from source gases dissociation are analyzed by relative irradiance measurement. The bonding configurations and binding state of a-C:F films are measured with Fourier-transformed infrared spectrometer (FTIR) and x-ray photoelectron spectroscopy (XPS). The results show that a-C:F films are mainly composed of CF radical at lower powers but of CF2 radical at higher powers. The deposition of films is related to the radicals generated in plasma and the main bonding configurations are dependent on the ratio of CF to CF2 radicals in films. 展开更多
关键词 CHF XPS cm Relative Irradiance Measurement and Bonding Configurations of amorphous Fluorinated carbon films Deposited by Electron Cyclotron Resonance Plasma
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Growth of carbon nanotube arrays on various CtxMey alloy films by chemical vapour deposition method 被引量:2
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作者 Pawel Mierczynski Sergey V.Dubkov +8 位作者 Sergey V.Bulyarskii Alexander A.Pavlov Sergey N.Skorik Alexey Yu Trifonov Agnieszka Mierczynska Eugene P.Kitsyuk Sergey A.Gavrilov Tomasz P.Maniecki Dmitry G.Gromov 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2018年第3期472-480,共9页
Carbon nanotube (CNT) arrays were fabricated on Ct-Me-N-(O) alloys with content of Ct in the range of 6-40 at.% by chemical vapour deposition. The Ct was a catalytic metal from the group of the following elements... Carbon nanotube (CNT) arrays were fabricated on Ct-Me-N-(O) alloys with content of Ct in the range of 6-40 at.% by chemical vapour deposition. The Ct was a catalytic metal from the group of the following elements: Ni, Co, Fe, Pd, while Me was a transition metal from the group of IV-VII of the periodic table (where Me=Ti, V, Cr, Zr, Nb, Mo, Ta, W, Re). Carbon nanotubes were found to grow efficiently on the alloy surface with its composition containing Ti, V, Cr, Zr, Hf, Nb or Ta. The growth of CNTs was not observed when the alloy contained W or Re. Additions of oxygen and nitrogen in the alloy facilitated the formation of oxynitrides and catalyst extrusion on the alloy surface. Replacement of the metals in alloy composition affected the diameter of the resulting CNTs. The obtained results showed that the alloy films of varying thickness (10-500 nm) may be used for the CNTs growth. The resulting CNT material was highly homogenous and its synthesis reproducible. 展开更多
关键词 carbon nanotubes amorphous alloys Chemical vapour deposition Catalytic processes Thin films
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