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Electrical and optical properties of indium tin oxide/epoxy composite film 被引量:1
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作者 郭霞 郭春威 +1 位作者 陈宇 苏治平 《Chinese Physics B》 SCIE EI CAS CSCD 2014年第7期601-604,共4页
The electrical and optical properties of the indium tin oxide (ITO)/epoxy composite exhibit dramatic variations as functions of the ITO composition and ITO particle size. Sharp increases in the conductivity in the v... The electrical and optical properties of the indium tin oxide (ITO)/epoxy composite exhibit dramatic variations as functions of the ITO composition and ITO particle size. Sharp increases in the conductivity in the vicinity of a critical volume fraction have been found within the framework of percolation theory. A conductive and insulating transition model is extracted by the ITO particle network in the SEM image, and verified by the resistivity dependence on the temperature. The dependence of the optical transmittance on the particle size was studied. Further decreasing the ITO particle size could further improve the percolation threshold and light transparency of the composite film. 展开更多
关键词 percolation effect indium tin oxide/epoxy composite film electrical state transition optical transmittance
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Preparation of High Quality Indium Tin Oxide Film on a Microbial Cellulose Membrane Using Radio Frequency Magnetron Sputtering 被引量:2
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作者 杨加志 赵成刚 +3 位作者 刘晓丽 于俊伟 孙东平 唐卫华 《Chinese Journal of Chemical Engineering》 SCIE EI CAS CSCD 2011年第2期179-184,共6页
微生物引起的纤维素(MC ) 膜由醋菌属 xylinum NUST4.1 生产了,为透明的铟锡氧化物(ITO ) 的制造被用作灵活底层电极。透明、传导性的 ITO 薄电影在房间温度使用收音机频率(RF ) 磁控管劈啪作响在 MC 膜上被扔。最佳 ITO 免职条件被检... 微生物引起的纤维素(MC ) 膜由醋菌属 xylinum NUST4.1 生产了,为透明的铟锡氧化物(ITO ) 的制造被用作灵活底层电极。透明、传导性的 ITO 薄电影在房间温度使用收音机频率(RF ) 磁控管劈啪作响在 MC 膜上被扔。最佳 ITO 免职条件被检验水晶的结构,有 X 光检查衍射(XRD ) 的表面形态学和 optoelectrical 特征,扫描电子显微镜学(SEM ) ,原子力量显微镜学(AFM ) ,和紫外光谱学完成。样品的表抵抗与一根四点的探针被测量,这部电影的抵抗力是计算的。结果表明扔的 ITO 晶体的比较喜欢的取向强烈依赖于与氧内容(O2/Ar,体积比率) 在劈啪作响的房间。并且 ITO 水晶的结构直接决定扔 ITO 的电影的传导性。高传导性[pBAD33 上的 PBAD 的表抵抗 120 ntrol,能生产 CoQ10 直到 3.24 mg? 展开更多
关键词 铟锡氧化物 薄膜制备 磁控溅射 溅射膜 纤维素 微生物 扫描电子显微镜 薄膜沉积
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Preparation,Characterization and Electronic Properties of Fluorine-doped Tin Oxide Films 被引量:1
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作者 Velázquez-Nevárez G A Vargas-García J R +3 位作者 Lartundo-Rojas L CHEN Fei SHEN Qiang ZHANG Lianmeng 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2016年第1期48-51,共4页
Tin oxide(SnO2) and fluorine doped tin oxide(FTO) films were prepared on glass substrates by sol-gel spin-coating using SnCl4 and NH4F precursors.Fluorine doping concentration was fixed at 4 at%and 20 at%by contro... Tin oxide(SnO2) and fluorine doped tin oxide(FTO) films were prepared on glass substrates by sol-gel spin-coating using SnCl4 and NH4F precursors.Fluorine doping concentration was fixed at 4 at%and 20 at%by controlling precursor sol composition.Films exhibited the tetragonal rutile-type crystal structure regardless of fluorine concentration.Uniform and highly transparent FTO films,with more than 85%of optical transmittance,were obtained by annealing at 600℃.Florine doping of films was verified by analyzing the valence band region obtained by XPS.It was found that the fluorine doping affects the shape of valence band of SnO2 films.In addition,it was observed that the band gap of SnO2 is reduced as well as the Fermi level is upward shifted by the effect of fluorine doping. 展开更多
关键词 tin oxide films fluorine doping energy band diagram
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Preparation and Characterization of Transparent Conductive Zinc Doped Tin Oxide Thin Films Prepared by Radio-frequency Magnetron Sputtering 被引量:1
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作者 赵江 赵修建 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2011年第3期388-392,共5页
High transparent and conductive thin films of zinc doped tin oxide (ZTO) were deposited on quartz substrates by the radio-frequency (RF) magnetron sputtering using a 12 wt% ZnO doped with 88 wt% SnO2 ceramic targe... High transparent and conductive thin films of zinc doped tin oxide (ZTO) were deposited on quartz substrates by the radio-frequency (RF) magnetron sputtering using a 12 wt% ZnO doped with 88 wt% SnO2 ceramic target.The effect of substrate temperature on the structural,electrical and optical performances of ZTO films has been studied.X-ray diffraction (XRD) results show that ZTO films possess tetragonal rutile structure with the preferred orientation of (101).The surface morphology and roughness of the films was investigated by the atomic force microscope (AFM).The electrical characteristic (including carrier concentration,Hall mobility and resistivity) and optical transmittance were studied by the Hall tester and UV- VIS,respectively.The highest carrier concentration of -1.144×1020 cm-3 and the Hall mobility of 7.018 cm2(V ·sec)-1 for the film with an average transmittance of about 80.0% in the visible region and the lowest resistivity of 1.116×10-2 Ω·cm were obtained when the ZTO films deposited at 250 oC. 展开更多
关键词 radio-frequency (RF) magnetron sputtering transparent conducting film zinc doped tin oxide (ZTO) substrate temperature
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Effects of annealing process on characteristics of fully transparent zinc tin oxide thin-film transistor 被引量:1
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作者 陈勇跃 王雄 +4 位作者 才玺坤 原子健 朱夏明 邱东江 吴惠桢 《Chinese Physics B》 SCIE EI CAS CSCD 2014年第2期364-368,共5页
Annealing effect on the performance of fully transparent thin-film transistor (TTFT), in which zinc tin oxide (ZnSnO) is used as the channel material and SiO2 as the gate insulator, is investigated. The ZnSnO acti... Annealing effect on the performance of fully transparent thin-film transistor (TTFT), in which zinc tin oxide (ZnSnO) is used as the channel material and SiO2 as the gate insulator, is investigated. The ZnSnO active layer is deposited by radio frequency magnetron sputtering while a SiO2 gate insulator is formed by plasma-enhanced chemical vapor deposition. The saturation field-effect mobility and on/off ratio of the TTFT are improved by low temperature annealing in vacuum. Maximum saturation field-effect mobility and on/off ratio of 56.2 cm2/(V.s) and 3×10^5 are obtained, respectively. The transfer characteristics of the ZnSnO TPT are simulated using an analytical model and good agreement between measured and the calculated transfer characteristics is demonstrated. 展开更多
关键词 zinc tin oxide thin-film transistors MOBILITY ANNEALING
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Low Temperature DC Sputtering Deposition on Indium-Tin Oxide Film and Its Application to Inverted Top-emitting Organic Light-emitting Diodes 被引量:1
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作者 Hui LIN Junsheng YU Shuangling LOU Jun WANG Yadong JIANG 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2008年第2期179-182,共4页
Indium tin oxide (ITO) ultrathin films were prepared on glass substrate by DC (direct current) magnetron sputtering technique with the assistance of H2O vapor to avoid potential surface damage. The film properties... Indium tin oxide (ITO) ultrathin films were prepared on glass substrate by DC (direct current) magnetron sputtering technique with the assistance of H2O vapor to avoid potential surface damage. The film properties were characterized by X-ray diffraction (XRD) technique, four-point probe method and spectrophotometer. The results show that the deposited ITO film with introduced H2O during sputtering process was almost amorphous. The average visible light transmission of 100 nm ITO film was around 85% and square resistivity was below 80 Ω/square. The film was used as the transparent anode to fabricate an inverted top-emitting organic light-emitting diodes (IT-OLEDs) with the structure of glass substrate/Alq3 (40 nm)/NPB (15 nm)/CuPc (x nm)/ITO anode (100 nm), where the film thickness of CuPc was optimized. It was found that the luminance of this IT-OLEDs was improved from 25 cd/m^2 to more than 527 cd/m^2 by increasing the thickness of CuPc, and luminance efficiency of 0.24 lm/W at 100 cd/m^2 was obtained, which indicated that the optimized thickness of CuPc layer was around 15 nm. 展开更多
关键词 Inverted top-emitting organic light-emitting diodes INDIUM-tin-oxide Ultrathin film DC sputtering
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Infrared laser-induced fast photovoltaic effect observed in orthorhombic tin oxide film
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作者 赵嵩卿 张际蕊 +5 位作者 施宏杰 闫坤坤 黄春 杨立敏 杨睿 赵昆 《Chinese Physics B》 SCIE EI CAS CSCD 2016年第2期406-409,共4页
The SnO_2/SnO with an orthorhombic structure is a material known to be stable at high pressures and temperatures and expected to have new optical and electrical properties. The authors report a new finding of the infr... The SnO_2/SnO with an orthorhombic structure is a material known to be stable at high pressures and temperatures and expected to have new optical and electrical properties. The authors report a new finding of the infrared laser induced a fast photovoltaic effect arising from orthorhombic tin oxide film with an indirect band gap(~2.4 e V) which is deposited by pulsed laser deposition. The rising time of the photovoltaic signal is about 3 ns with a peak value of 4.48 mV under the pulsed laser beam with energy density 0.015 m J/mm^2. The relation between the photovoltages and laser positions along the line between two electrodes of the film is also exhibited. A possible mechanism is put forward to explain this phenomenon.All data and analyses demonstrate that the orthorhombic tin oxide with an indirect band gap could be used as a candidate for an infrared photodetector which can be operated at high pressures and temperatures. 展开更多
关键词 polycrystalline tin oxide film ORTHORHOMBIC infrared laser induced lateral photovoltaic effect (LPV) indirect band gap
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Preparation of indium tin oxide targets with a high density and single phase structure by normal pressure sintering process 被引量:6
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作者 LIU Chen LIU Jiaxiang WANG Yue 《Rare Metals》 SCIE EI CAS CSCD 2011年第2期126-130,共5页
The present work mainly describes the technology for preparing indium-tin oxide (ITO) targets by cold isostatic pressing (CIP) and normal pressure sintering process. ITO powders were produced by chemical co-precip... The present work mainly describes the technology for preparing indium-tin oxide (ITO) targets by cold isostatic pressing (CIP) and normal pressure sintering process. ITO powders were produced by chemical co-precipitation and shaped into an ITO green compact with a relative density of 60% by CIP under 300 MPa. Then, an ITO target with a relative density larger than 99.6% was obtained by sintering this green compact at 1550℃ for 8 h. The effects of forming pressure, sintering temperature and sintering time on the density of the target were inves- tigated. Also, a discussion was made on the sintering atmosphere. 展开更多
关键词 thin films indium tin oxide (ITO) isostatic pressing SINTERING relative density microstructure
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Investigation of UV photosensor properties of Al-doped SnO_(2) thin films deposited by sol-gel dip-coating method
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作者 Kaour Selma Benkara Salima +2 位作者 Bouabida Seddik Rechem Djamil Hadjeris Lazhar 《Journal of Semiconductors》 EI CAS CSCD 2023年第3期114-123,共10页
Transparent conducting aluminum doped tin oxide thin films were prepared by sol-gel dip coating method with differ-ent Al concentrations and characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), UV-... Transparent conducting aluminum doped tin oxide thin films were prepared by sol-gel dip coating method with differ-ent Al concentrations and characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), UV-Vis spectrophotometry and photoconductivity study. The variation observed in the properties of the measured films agrees with a difference in the film's thickness, which decreases when Al concentration augments. X-ray diffraction analysis reveals that all films are polycrystal-line with tetragonal structure, (110) plane being the strongest diffraction peak. The crystallite size calculated by the Debye Scher-rer’s formula decreases from 11.92 to 8.54 nm when Al concentration increases from 0 to 5 wt.%. AFM images showed grains uni-formly distributed in the deposited films. An average transmittance greater than 80% was measured for the films and an en-ergy gap value of about 3.9 eV was deduced from the optical analysis. Finally, the photosensitivity properties like current-voltage characteristics, ION/IOFF ratio, growth and decay time are studied and reported. Also, we have calculated the trap depth energy using the decay portion of the rise and decay curve photocurrent. 展开更多
关键词 tin oxide thin films SOL-GEL UV photodetector photoconductivity trap depth
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Spray Pyrolysis Deposition of Single and Mixed Oxide Thin Films
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作者 Olusegun J. Ilegbusi S. M. Navid Khatami Leonid I. Trakhtenberg 《Materials Sciences and Applications》 2017年第2期153-169,共17页
The influence of processing parameters is investigated on the structural characteristics of single and mixed oxides produced by spray pyrolysis technique. The films were synthesized by spraying precursor solutions thr... The influence of processing parameters is investigated on the structural characteristics of single and mixed oxides produced by spray pyrolysis technique. The films were synthesized by spraying precursor solutions through a noz-zle onto a heated alumina substrate. The precursor consisted separately of aqueous solutions of tin chloride for SnO2 and zinc chloride for ZnO for single oxide cases, and aqueous solutions of tin chloride and indium nitrate for SnO2 + In2O3 and zinc chloride and indium nitrate solutions for ZnO + In2O3 for mixed oxide cases. The substrate temperature was varied accordingly for each single and mixed case. The films produced were characterized by X-ray Photoelectron Spectroscopy and Scanning Electron Microscopy. The results indicate that a non-homogenous film is formed at low temperature for both single oxides considered. The temperature has significant effect on the composition of the synthesized films of both single oxides below 450℃. The results for mixed oxides show that the best homogeneous films are obtained for 80 wt% ZnO + 20 wt% In2O3, and 80 wt% SnO2 + 20 wt% In2O3. 展开更多
关键词 Zinc oxide film tin oxide film MIXED Metal oxideS NANO-COMPOSITE Sen-sors Spray PYROLYSIS
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Influence of reflow processing conditions on the uniformity of the chromium passivation film on tinplate 被引量:5
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作者 XIE Long CHEN Hongxing XIE Yingxiu 《Baosteel Technical Research》 CAS 2014年第2期41-45,共5页
This study aims to systematically analyze the key parameters of the reflow process that influence the uniformity of the chromium passivation film coated on tinplate. The distribution characteristics of the chromium pa... This study aims to systematically analyze the key parameters of the reflow process that influence the uniformity of the chromium passivation film coated on tinplate. The distribution characteristics of the chromium passivation film coated on the tinplate surface under different treatment conditions were systematically characterized using the scanning Kelvin probe technique, X-ray photoelectron spectroscopy, and X-ray diffraction. Results indicate that the use of flux reduces the porosity of tin coating, thereby favoring the uniform growth of the passivation film. Furthermore, an increase in the reflow power and quenching temperature facilitates the homogeneous distribution of the passivation film on the tinplate surface,particularly when treated with electrolytic cathodic sodium dichromate. 展开更多
关键词 chromium passivation film tinPLATE UNIFORMITY tin oxide
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模压成型压力对氧化铟锡(ITO)靶材性能影响研究
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作者 姜峰 谭泽旦 +5 位作者 黄誓成 方志杰 陆映东 覃立仁 王永清 曾纪术 《矿冶工程》 CAS 北大核心 2024年第1期134-137,142,共5页
以化学共沉淀-煅烧法制备的纳米ITO粉体为原料,通过模压、冷等静压成型,采用常压烧结法制备了ITO靶材,研究了模压成型压力对ITO靶材相对密度、电阻率和晶粒尺寸的影响。结果表明,模压成型压力60 MPa且烧结条件适宜时,制得的ITO靶材相对... 以化学共沉淀-煅烧法制备的纳米ITO粉体为原料,通过模压、冷等静压成型,采用常压烧结法制备了ITO靶材,研究了模压成型压力对ITO靶材相对密度、电阻率和晶粒尺寸的影响。结果表明,模压成型压力60 MPa且烧结条件适宜时,制得的ITO靶材相对密度为99.81%、电阻率为1.707×10^(-4)Ω·cm、平均晶粒尺寸为7.62μm。研究结果可为ITO靶材的致密化与大型化生产提供借鉴。 展开更多
关键词 模压成型 氧化铟锡 导电薄膜 靶材 常压烧结 电阻率 致密化
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Facile synthesis of graphitic carbon-nitride supported antimony-doped tin oxide nanocomposite and its application for the adsorption of volatile organic compounds 被引量:1
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作者 Devi Prashad Ojha Jun Hee Song Han Joo Kim 《Journal of Environmental Sciences》 SCIE EI CAS CSCD 2019年第5期35-42,共8页
Antimony-doped tin oxide(ATO) nanoparticles with an average size of ~ 6 nm were prepared by co-precipitation and subsequent heat treatment. Graphitic carbon nitride(g-CN)/ATO hybrid nanocomposite was designed by the ... Antimony-doped tin oxide(ATO) nanoparticles with an average size of ~ 6 nm were prepared by co-precipitation and subsequent heat treatment. Graphitic carbon nitride(g-CN)/ATO hybrid nanocomposite was designed by the combination of thermally synthesized g-CN and ATO nanoparticles by ultrasonication. The materials were characterized using N2 adsorption/desorption(BET), X-ray diffraction(XRD), scanning electron microscopy(SEM), energy dispersive spectroscopy(EDS), transmission electron microscopy(TEM) and Fourier transform infrared spectroscopy(FTIR). A mixture of five volatile organic compounds(VOCs, chloroform, benzene, toluene, xylene and styrene) was used to compare the adsorption capacity of the samples. The adsorption capacity of ATO nanoparticles was improved by the addition of g-CN. Experimental data showed that, among the five VOCs,chloroform was the least adsorbed, regardless of the samples. The g-CN/ATO showed nearly three times greater adsorption capacity for the VOC mixture than pure ATO. The unchanged efficiency of VOC adsorption during cyclic use demonstrated the completely reversible adsorption and desorption behavior of the nanocomposite at room conditions. This economically and environmentally friendly material can be a practical solution for outdoor and indoor VOC removal. 展开更多
关键词 antimony-doped tin oxide(ATO) Graphitic carbon nitride(g-CN) VOLATILE organic compounds(VOC) ADSORPTION
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TiN颗粒对镁合金微弧氧化过程及膜层性能的影响 被引量:6
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作者 张瑞珠 贾新杰 +2 位作者 唐明奇 任洋洋 蔡会苹 《表面技术》 EI CAS CSCD 北大核心 2017年第9期81-86,共6页
目的分析Ti N颗粒在镁合金微弧氧化过程中的作用,并研究其在膜层中对镁合金硬度、耐磨和耐蚀等性能的影响。方法通过在微弧氧化电解液中添加2.7μm Ti N颗粒,并使其充分分散于电解液中,使电解液中Ti N颗粒的质量浓度分别为0、2、4、6 g... 目的分析Ti N颗粒在镁合金微弧氧化过程中的作用,并研究其在膜层中对镁合金硬度、耐磨和耐蚀等性能的影响。方法通过在微弧氧化电解液中添加2.7μm Ti N颗粒,并使其充分分散于电解液中,使电解液中Ti N颗粒的质量浓度分别为0、2、4、6 g/L,并控制其他实验参数(如电流密度、频率、占空比和氧化时间)一样的情况下进行实验,通过电子显微镜、涂层厚度测厚仪、显微维氏硬度计、X射线衍射和电化学工作站,分别从膜层的表面形貌、厚度、硬度、相组成及耐蚀性等方面,研究了Ti N颗粒对镁合金微弧氧化膜层性能的影响。结果在微弧氧化电解液中添加Ti N颗粒后,相同电化学参数下制得的微弧氧化膜层变得致密,厚度、硬度有所增加,氧化膜层主要由Mg、MgO、Mg2Zr5O12、Ti N组成。极化曲线显示,加入Ti N颗粒,制备的微弧氧化膜层比未加入Ti N颗粒制得的膜层的腐蚀电流下降了2个数量级。阻抗图谱表明,电阻值增加了1个数量级。结论 Ti N颗粒能够随镁合金的微弧氧化过程进入制得的氧化膜层中,并且能够增加膜层厚度和硬度,使膜层的耐磨、耐蚀性得到提高。 展开更多
关键词 AZ91D镁合金 微弧氧化 tin颗粒 膜层硬度 物相组成 耐蚀性
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多弧离子镀与磁控溅射共沉积TiN/TiCN多层膜的高温抗氧化性能 被引量:9
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作者 赵瑞山 任鑫 +3 位作者 王亮 宋晓龙 许细健 刘伟 《材料保护》 CAS CSCD 北大核心 2017年第3期11-15,50,共6页
TiN/TiCN多层膜的高温抗氧化性研究对于扩大其应用领域具有重要作用,但目前鲜见相关报道。采用多弧离子镀与磁控溅射技术以不同调制周期在304不锈钢表面共沉积TiN/TiCN多层膜。采用XRD、XPS、倒置显微镜及高温氧化试验研究了多层膜的高... TiN/TiCN多层膜的高温抗氧化性研究对于扩大其应用领域具有重要作用,但目前鲜见相关报道。采用多弧离子镀与磁控溅射技术以不同调制周期在304不锈钢表面共沉积TiN/TiCN多层膜。采用XRD、XPS、倒置显微镜及高温氧化试验研究了多层膜的高温抗氧化行为。结果表明:TiN/TiCN多层膜表面光滑平整、均匀致密,薄膜主要为具有Ti-(C,N)键的fcc-TiN结构;随着调制周期的减小,TiN/TiCN多层膜生长取向发生转变,且具有(111)晶面生长织构;随着氧化温度的升高,多层膜的显微硬度逐渐降低,氧化增重速率不断增大,且在700℃之后变化速率较快,薄膜的开始氧化温度约为750℃;随着调制周期的减小,多层膜TiN与TiCN界面层数量增多,促使晶粒细化,提高了其致密性,还隔断了缺陷贯穿薄膜的连续性,显著降低了薄膜的孔隙率,致使O原子扩散困难,增强了薄膜的高温抗氧化性能。 展开更多
关键词 多弧离子镀 磁控溅射 tin/TiCN多层膜 304不锈钢 调制周期 高温抗氧化性能
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TiN/O'-Sialon原位复合材料的抗氧化性能 被引量:3
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作者 薛向欣 谢朋 +1 位作者 翟玉春 王彦吉 《硅酸盐通报》 CAS CSCD 2000年第2期29-31,共3页
通过对不同条件下原位复合制备的各种TIN/O′Sialon材料在空气中的氧化行为研究,考查了氧化温度、气孔率和TiW含量对材料抗氧化性能的影响。结果表明:当氧化温度升高到一定值时,通常材料表层会形成致密的“保护膜”,阻碍材料的进... 通过对不同条件下原位复合制备的各种TIN/O′Sialon材料在空气中的氧化行为研究,考查了氧化温度、气孔率和TiW含量对材料抗氧化性能的影响。结果表明:当氧化温度升高到一定值时,通常材料表层会形成致密的“保护膜”,阻碍材料的进一步氧化;材料的气孔率和TIN含量越低,越易形成“保护膜”,反之,越不易形成“保护膜”。当材料的气孔率为30%以上,TiO2添加量为30wt%以上时,即使在更高的氧化温度下也不能形成“保护膜”。 展开更多
关键词 抗氧化性能 原位复合材料 氮化钛 SIALON陶瓷
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射频磁控溅射工艺参数对掺钨氧化铟锡透明导电薄膜性能的影响
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作者 许阳晨 张群 《复旦学报(自然科学版)》 CAS CSCD 北大核心 2024年第2期169-177,共9页
ITO薄膜是目前应用最为广泛的透明导电薄膜,通过在ITO中掺杂其他金属可以进一步改善ITO薄膜的光学和电学性能。本文采用射频(RF)磁控溅射法制备了掺钨氧化铟锡(ITO∶W)透明导电薄膜,研究了薄膜厚度、表面形貌、晶体结构以及光学和电学... ITO薄膜是目前应用最为广泛的透明导电薄膜,通过在ITO中掺杂其他金属可以进一步改善ITO薄膜的光学和电学性能。本文采用射频(RF)磁控溅射法制备了掺钨氧化铟锡(ITO∶W)透明导电薄膜,研究了薄膜厚度、表面形貌、晶体结构以及光学和电学性能与各溅射参数之间的关系。当溅射功率大于40 W时,制备的ITO∶W薄膜为方铁锰矿结构的多晶薄膜,此时薄膜表面光滑平整而且具有良好的结晶性。在基板温度320℃、溅射功率80 W、溅射时间15 min、工作气压0.6 Pa条件下得到了光学和电学性能优良的ITO∶W薄膜,其方块电阻为10.5Ω/、电阻率为4.41×10^(-4)Ω·cm,对应的载流子浓度为2.23×10^(20)cm^(-3)、迁移率为27.3 cm^(2)·V^(-1)·s^(-1)、可见光(400~700 nm)范围内平均透射率为90.97%。此外,本研究还发现通过调节基板温度影响氧元素的状态可以改变ITO∶W薄膜的电学性能。 展开更多
关键词 ITO薄膜 掺钨 透明导电氧化物 射频磁控溅射
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氧化亚锡/聚酰亚胺复合薄膜制备及介电性能研究
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作者 李科 杨林 +2 位作者 杨麟 杜娟 李新跃 《功能材料》 CAS CSCD 北大核心 2024年第5期5141-5146,共6页
采用水热法合成了氧化亚锡(SnO),然后再通过原位聚合法将合成的SnO引入到聚酰亚胺基体中,制得SnO/PI复合薄膜。SnO的含量对该薄膜的介电常数、介电损耗、拉伸强度和击穿强度具有显著影响。当SnO含量为10%(质量分数)时,SnO/PI复合薄膜的... 采用水热法合成了氧化亚锡(SnO),然后再通过原位聚合法将合成的SnO引入到聚酰亚胺基体中,制得SnO/PI复合薄膜。SnO的含量对该薄膜的介电常数、介电损耗、拉伸强度和击穿强度具有显著影响。当SnO含量为10%(质量分数)时,SnO/PI复合薄膜的介电常数高达456,介电损耗仅为0.034,拉伸强度为65 MPa,击穿强度为146.9 MV/m。将SnO引入到PI基体中能改善PI薄膜的介电性能,使其在储能、航空航天、绝缘等领域有很好的应用前景。 展开更多
关键词 聚酰亚胺 复合薄膜 氧化亚锡 介电性能 介电损耗
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氧化工艺对真空电弧沉积TiN薄膜组织与性能的影响
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作者 谢光荣 曾鹏 +1 位作者 胡社军 梁仕昌 《热加工工艺》 CSCD 北大核心 2003年第6期11-13,共3页
研究了各种氧化工艺对真空电弧沉积 Ti N薄膜组织与性能的影响。结果表明 ,Ti N薄膜在 4 0 0℃于不同时间整体氧化时 ,表面 Ti液滴和 Ti N相发生不同程度的氧化 ,转变成具有金红石型的 Ti O2 薄膜 ,提高了膜层表面的致密性 ,而 Ti N薄... 研究了各种氧化工艺对真空电弧沉积 Ti N薄膜组织与性能的影响。结果表明 ,Ti N薄膜在 4 0 0℃于不同时间整体氧化时 ,表面 Ti液滴和 Ti N相发生不同程度的氧化 ,转变成具有金红石型的 Ti O2 薄膜 ,提高了膜层表面的致密性 ,而 Ti N薄膜的整体组织结构未发生较大改变。随着氧化时间的延长 ,在 4 0 min后硬度才略有下降 ,内应力下降 ,膜层的结合力提高 ,并具有较好的耐磨性能。 展开更多
关键词 真空电弧沉积 tin薄膜 氧化工艺 组织与性能
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离子镀TiN膜及其摩擦状态转化特性的研究
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作者 刘捍卫 陈元儒 《西南交通大学学报》 EI CSCD 北大核心 1994年第2期150-154,共5页
用热阴极离子镀制成TiN膜,膜厚约3μm。用XPS,和XRD分析膜的价态和结构表明:膜表层TiO_2含过较高,TiN含过较低。膜内主要由TiN相构成,有较强择优取向。膜与衬底结合力强,其临界载荷达35N。TiN膜具有... 用热阴极离子镀制成TiN膜,膜厚约3μm。用XPS,和XRD分析膜的价态和结构表明:膜表层TiO_2含过较高,TiN含过较低。膜内主要由TiN相构成,有较强择优取向。膜与衬底结合力强,其临界载荷达35N。TiN膜具有较高的显微硬度、较低的摩擦系数和很好的抗磨性能。在球—盘式摩擦磨损试验机上,采用阶梯加载方式,测定了润滑条件下GCr15钢/TiN膜滑动摩擦副的临界载荷-速度(P-v)图,分析了其摩擦状态转化特性及机理。试验发现,P-v图上的边界润滑区域显著地扩大,TiN膜在边界润滑区域可承受较大载荷。这对实际应用是很有利的。 展开更多
关键词 滑动摩擦 氮化钛膜 氧化膜 离子镀
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