Multilayer films of 2-hydroxy-4,4'-dihexyloxy-azobenzene (HAB) on silicon substrates have been studied with atomic force microscopy,temperature-dependent FTIR,and X-Ray diffraction technique. The results show th...Multilayer films of 2-hydroxy-4,4'-dihexyloxy-azobenzene (HAB) on silicon substrates have been studied with atomic force microscopy,temperature-dependent FTIR,and X-Ray diffraction technique. The results show that the multilayer films are formed by stacking of HAB monolayers via π-π interactions and the adjacent two monolayers in the film are arranged in an asymmetric way in the multilayer films.展开更多
基金ProjectsupportedbytheNationalNaturalScienceFoundationofChina (No .5 0 2 72 0 19)andtheExcellentYoungTeachersProgramofMinistryofEducationofChina
文摘Multilayer films of 2-hydroxy-4,4'-dihexyloxy-azobenzene (HAB) on silicon substrates have been studied with atomic force microscopy,temperature-dependent FTIR,and X-Ray diffraction technique. The results show that the multilayer films are formed by stacking of HAB monolayers via π-π interactions and the adjacent two monolayers in the film are arranged in an asymmetric way in the multilayer films.
