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Experimental Characterization of Dual-Frequency Capacitively Coupled Plasma with Inductive Enhancement in Argon
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作者 BAI Yang JIN Chenggang +5 位作者 YU Tao WU Xuemei ZHUGE Lanjian NING Zhaoyuan YE Chao GE Shuibing 《Plasma Science and Technology》 SCIE EI CAS CSCD 2013年第10期1002-1005,共4页
The dual-frequency capacitively coupled plasma (DF-CCP) with inductive enhancement system is a newly designed plasma reactor. Different from the conventional inductively coupled plasma (ICP) reactors, now a radio ... The dual-frequency capacitively coupled plasma (DF-CCP) with inductive enhancement system is a newly designed plasma reactor. Different from the conventional inductively coupled plasma (ICP) reactors, now a radio frequency (rf) power is connected to an antenna placed outside the chamber with a one-turn bare coil placed between two electrodes in DF-CCP. This paper gives a detailed description of its structure of discharges in this apparatus were made via a Moreover, investigations on some characteristics Langmuir probe. 展开更多
关键词 one-turn bare coil inductively coupled plasm dual-frequency capacitivelycoupled plasma Langmuir probe electron energy probability function
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