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Study on the High Speed Si Phototransistor
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作者 Chen Bingruo Gao Fanrong Wang Biao 《Wuhan University Journal of Natural Sciences》 CAS 1997年第4期49-52,共4页
In order to reduce collector capacitance, the high speed Si phototransistor with grid pattern is presented. The advantages and disadvantages of grid pattern are analyzed. Through optimum design of geometries, device c... In order to reduce collector capacitance, the high speed Si phototransistor with grid pattern is presented. The advantages and disadvantages of grid pattern are analyzed. Through optimum design of geometries, device configurations and material parameters and reduction of the diffusion capacitance and the base resistance, the response time of Si phototransistor is shorter than 0.7 μs for the first time. 展开更多
关键词 response time barrier capacitance diffusion capacitance base resistance
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