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Theoretical Calculation on Optimum Si-doping Content in Boron Carbide Thin Film
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作者 FAN Zhi-xin (Dept. of Appl. Phys., Hebei University of Technology, Tianjin 300130, CHN) 《Semiconductor Photonics and Technology》 CAS 2002年第2期92-95,共4页
The theoretical expression of the relationship between optimumdoping content and crystal structure is presented as well as thepreparation methods. By using this expression, the optimum dopingcontent of silicon-coped b... The theoretical expression of the relationship between optimumdoping content and crystal structure is presented as well as thepreparation methods. By using this expression, the optimum dopingcontent of silicon-coped boron carbide thin film is calculated. Thequantitative calculation value is consistent with the experimentalresults. This theoretical expression is also appropriate to resolvethe optimum doping content for Other electric materials. 展开更多
关键词 Thermoelectric material boron carbide thin film crystal structure optimum doping
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