The aim of this study was to develop conductive adhesive using silver nanowires prepared via solvothermal method as conductive fillers and epoxymodified organosilicone resin as matrix resin. Effect of the addition of ...The aim of this study was to develop conductive adhesive using silver nanowires prepared via solvothermal method as conductive fillers and epoxymodified organosilicone resin as matrix resin. Effect of the addition of silver nanowires/flakes on the conductive adhesive's electrical and mechanical properties was investigated. Compared with conventional conductive adhesive with silver flakes fillers, the percolation threshold of conductive adhesive with silver nanowires fillers is 10 % lower approximately. However, further rise of the content of silver nanowires has no obvious influence on improvement of the electrical conductivity of conductive adhesive. Both conductive and mechanical properties of conductive adhesive can be compatible by adding silver nanowires, which traditional silver conductive adhesives cannot reach.展开更多
基金financially supported by the Shenzhen Innovation and Technology Commission under the Strategic Emerging Industries Development Project(No.ZDSY2012061209 4418467)
文摘The aim of this study was to develop conductive adhesive using silver nanowires prepared via solvothermal method as conductive fillers and epoxymodified organosilicone resin as matrix resin. Effect of the addition of silver nanowires/flakes on the conductive adhesive's electrical and mechanical properties was investigated. Compared with conventional conductive adhesive with silver flakes fillers, the percolation threshold of conductive adhesive with silver nanowires fillers is 10 % lower approximately. However, further rise of the content of silver nanowires has no obvious influence on improvement of the electrical conductivity of conductive adhesive. Both conductive and mechanical properties of conductive adhesive can be compatible by adding silver nanowires, which traditional silver conductive adhesives cannot reach.