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Fabrication and Numerical Simulation of a MicromachinedContact Cantilever RF-MEMS Switch 被引量:3
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作者 孙建海 崔大付 肖疆 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2006年第2期309-312,共4页
This paper reports a contact cantilever MEMS switch. The designed switch has a metal cantilever that acts as an electrostatically activated switch with processing options to achieve dielectric isolation of the control... This paper reports a contact cantilever MEMS switch. The designed switch has a metal cantilever that acts as an electrostatically activated switch with processing options to achieve dielectric isolation of the controlvoltage path from the signal path. To obtain good material properties,an ANSYS FEA tool is used to optimize the structure. The RF MEMS switch is fabricated via a surface micromachining process. The switch has an actuation voltage of 12V,which is close to the simulated value of 11V. The measured and the HFSS simulated isolations are both higher than - 20dB from 0.05 to 10GHz. The measured insertion loss is less than - 0.9dB, relatively larger than the simulated loss of less than - 0.2dB from 0.05 to 10GHz. This is because a contact resistance introduced due to poor physical contact between the bottom lines and the metal cantilever. 展开更多
关键词 cantilever RF-MEMS switch insertion loss ISOLATION
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