Due to its extremely low electrostatic sensitivity,copper azide primary explosive is greatly limited in practical applications.In this study,a composite film with Cu-MOF in-situ growth on carbon nanofilm was prepared ...Due to its extremely low electrostatic sensitivity,copper azide primary explosive is greatly limited in practical applications.In this study,a composite film with Cu-MOF in-situ growth on carbon nanofilm was prepared by electrospinning and solvothermal methods,and CNF@Cu-N3film with electrostatic safety was obtained by carbonization and azide later.Its electrostatic sensitivity(E50)was greatly increased from 0.05 mJ of raw materials to 4.06 mJ,and still maintained a good detonation performance which could successfully detonate the CL-20 secondary explosive.This is mainly due to the synergistic effect of the carbon film and the MOF structure,which greatly improves the conductivity of the entire system and the uniform distribution of copper particles,providing a new preparation strategy for metal azide film that is suitable for the micro-initiator device.展开更多
基金financial support from the National Natural Science Foundation of China(Grant No.12102051)the State Key Laboratory of Explosion Science and Technology(Grant No.QNKT2022-04)。
文摘Due to its extremely low electrostatic sensitivity,copper azide primary explosive is greatly limited in practical applications.In this study,a composite film with Cu-MOF in-situ growth on carbon nanofilm was prepared by electrospinning and solvothermal methods,and CNF@Cu-N3film with electrostatic safety was obtained by carbonization and azide later.Its electrostatic sensitivity(E50)was greatly increased from 0.05 mJ of raw materials to 4.06 mJ,and still maintained a good detonation performance which could successfully detonate the CL-20 secondary explosive.This is mainly due to the synergistic effect of the carbon film and the MOF structure,which greatly improves the conductivity of the entire system and the uniform distribution of copper particles,providing a new preparation strategy for metal azide film that is suitable for the micro-initiator device.
