Influence of Ti target current on microstructure and properties of Ti-doped graphite-like carbon films

Ti-doped graphite-like carbon （Ti-GLC） films were synthesized successfully by magnetron sputtering technique. The compositions, microstructures and properties of the Ti-doped GLC films dependent on the parameter of Ti target current were systemically investigated by Raman spectra, X-ray photoelectron spectroscopy （XPS）, X-ray diffraction （XRD）, scanning electron microscopy （SEM）, atomic force microscopy （AFM）, nanoindentation and ball-on-disk tribometer. With the increase of the Ti target current, the ratio of sp2 bond and the content of Ti as well as the film hardness and compressive internal stress increase, but the high content of the Ti would result in the loose film due to the formation of the squamose structure. Less incorporated Ti reduces the friction of the GLC film in dry-sliding condition, while pure GLC film exhibits the lowest friction coefficient in water-lubricated condition. Ti-GLC film deposited with low Ti target current shows high wear resistance in both dry-sliding and water-lubricated conditions.

Field Emission from a Mixture of Amorphous Carbon and Carbon Nanotubes Films

A mixture of amorphous carbon and carbon nanotubes films was synthesized on stainless steel plates by a micro- wave plasma enhanced chemical vapor deposition system. The source gases were hydrogen and methane with flow rates of 100 and 16sccm,respectively,with a total pressure of 5.0kPa. The surface morphology and the structure of the films were characterized by field emission scanning electron microscopy （SEM） and Raman scattering spectroscopy. Field emission properties of as-deposited film were measured in a vacuum room below 5 ×10^ 5 Pa. The experimental results show that the initial turn-on field is 0. 9V/μm; The current density is 4.0mA/cm2 and the emission sites are dense and uniform at an electric field of 3.7V/μm. These results indicate that such a mixture of amorphous carbon and carbon nanotubes films is a promising material for field emission applications.

Multifunctional MXene/Carbon Nanotube Janus Film for Electromagnetic Shielding and Infrared Shielding/Detection in Harsh Environments

Multifunctional,flexible,and robust thin films capable of operating in demanding harsh temperature environments are crucial for various cutting-edge applications.This study presents a multifunctional Janus film integrating highly-crystalline Ti_(3)C_(2)T_(x) MXene and mechanically-robust carbon nanotube(CNT)film through strong hydrogen bonding.The hybrid film not only exhibits high electrical conductivity(4250 S cm^(-1)),but also demonstrates robust mechanical strength and durability in both extremely low and high temperature environments,showing exceptional resistance to thermal shock.This hybrid Janus film of 15μm thickness reveals remarkable multifunctionality,including efficient electromagnetic shielding effectiveness of 72 dB in X band frequency range,excellent infrared(IR)shielding capability with an average emissivity of 0.09(a minimal value of 0.02),superior thermal camouflage performance over a wide temperature range(−1 to 300℃)achieving a notable reduction in the radiated temperature by 243℃ against a background temperature of 300℃,and outstanding IR detection capability characterized by a 44%increase in resistance when exposed to 250 W IR radiation.This multifunctional MXene/CNT Janus film offers a feasible solution for electromagnetic shielding and IR shielding/detection under challenging conditions.

Preparation of Diamond-like Carbon Films on the Surface of Ti Alloy by Electro-deposition

In this paper, diamond-like carbon (DLC) films were deposited on Ti alloy by electro-deposition. DLC films were brown andcomposed of the compact grains whose diameter was about 400 nm. Examined by XPS, the main composition of the filmswas carbon. In the Raman spectrum, there were a broad peak at 1350 cm^(-1) and a broad peak at 1600 cm^(-1), which indicatedthat the films were DLC films.

Electron field emission characteristics of nano-catkin carbon films deposited by electron cyclotron resonance microwave plasma chemical vapour deposition

This paper reported that the nano-catkin carbon films were prepared on Si substrates by means of electron cyclotron resonance microwave plasma chemical vapour deposition in a hydrogen and methane mixture. The surface morphology and the structure of the fabricated films were characterized by using scanning electron microscopes and Raman spectroscopy, respectively. The stable field emission properties with a low threshold field of 5V/μm corresponding to a current density of about 1μA/cm^2 and a current density of 3.2mA/cm^2 at an electric field of 10V/μm were obtained from the carbon film deposited at CH4 concentration of 8%. The mechanism that the threshold field decreased with the increase of the CH4 concentration and the high emission current appeared at the high CH4 concentration was explained by using the Fowler-Nordheim theory.

Assembly and Applications of Carbon Nanotube Thin Films

The ultimate goal of current research on carbon nanotubes （CNTs） is to make breakthroughs that advance nanotechnological applications of bulk CNT materials. Especially, there has been growing interest in CNT thin films because of their unique and usually enhanced properties and tremendous potential as components for use in nano-electronic and nano-mechanical device applications or as structural elements in various devices. If a synthetic or a post processing method can produce high yield of nanotube thin films, these structures will provide tremendous potential for fundamental research on these devices. This review will address the synthesis, the post processing and the device applications of self-assembled nanotube thin films.

Preparation and Characterization of Nano-Structured SiO_(2) Thin Films on Carbon Steel

Nano-structured SiO2 thin films were prepared on the surface of carbon steel for the first time by LPD. The compositions of the films were analyzed by XPS, and the surface morphology of the thin films were observed by AFM. The thin films were constituted by compact particles of SiO2, and there was no Fe in the films. In the process of film forming, the SiO2 colloid particles were deposited or absorbed directly onto the surface of carbon steel substrates that were activated by acid solution containing inhibitor, and corrosion of the substrates was avoided. The nano-structured SiO2 thin films that were prepared had excellent protective efficiency to the carbon steel.

Enhanced field emission characteristics of thin-Au-coated nano-sheet carbon films

This paper reports that the nano-sheet carbon films （NSCFs） were fabricated on Si wafer chips with hydrogen- methane gas mixture by means of quartz-tube-type microwave plasma chemical vapour deposition （MWPCVD）. In order to further improve the field emission （FE） characteristics, a 5-nm Au film was prepared on the samples by using electron beam evaporation. The FE properties were obviously improved due to depositing Au thin film on NSCFs. The FE current density at a macroscopic electric field, E, of 9 V/μm was increased from 12.4 mA/cm2 to 27.2 mA/cm2 and the threshold field was decreased from 2.6 V/μm to 2.0 V/μm for Au-coated carbon films. A modified F-N model considering statistic effects of FE tip structures in the low E region and a space-chavge-limited-current effect in the high E region were applied successfully to explain the FE data of the Au-coated NSCF.

Simple method to rapidly fabricate chain-like carbon nanotube films and its field emission properties

A simple process to fabricate chain-like carbon nanotube （CNT） films by microwave plasma-enhanced chemical vapor deposition （MPCVD） was developed successfully. Prior to deposition, the Ti/Al2O3 substrates were ground with Fe-doped SiO2 powder. The nano-structure of the deposited films was analyzed by scanning electron microscopy （SEM）, transmission electron microscopy （TEM）, and Raman spectroscopy. The field electron emission characteristics of the chain-like carbon nanotube films were measured under the vacuum of 10-5 Pa. The low turn-on field of 0.80 V/μm and the emission current density of 8.5 mA/cm2 at the electric field of 3.0 V/μm are obtained. Based on the above results, chain-like carbon nanotube films probably have important applications in cold cathode materials and electrode materials.

Can soil organic carbon sequestration and the carbon management index be improved by changing the film mulching methods in the semiarid region?

Plastic film mulching has been widely used to increase maize yield in the semiarid area of China.However, whether long-term plastic film mulching is conducive to agricultural sustainability in this region remains controversial.A field experiment was initiated in 2013 with five different film mulching methods:(i) control method, flat planting without mulching (CK),(ii) flat planting with half film mulching (P),(iii) film mulching on ridges and planting in narrow furrows(S),(iv) full film mulching on double ridges (D), and (v) film mulching on ridges and planting in wide furrows (R).The effects on soil organic carbon (SOC) content, storage, and fractions, and on the carbon management index (CMI)were evaluated after nine consecutive years of plastic film mulching.The results showed that long-term plastic film mulching generally maintained the initial SOC level.Compared with no mulching, plastic film mulching increased the average crop yield, biomass yield, and root biomass by 48.38, 35.06, and 37.32%, respectively, which led to the improvement of SOC sequestration.Specifically, plastic film mulching significantly improved CMI, and increased the SOC content by 13.59%, SOC storage by 7.47%and easily oxidizable organic carbon (EOC) by 13.78%on average,but it reduced the other labile fractions.SOC sequestration and CMI were improved by refining the plastic film mulching methods.The S treatment had the best effect among the four mulching methods, so it can be used as a reasonable film mulching method for sustainable agricultural development in the semiarid area.

Influence of Microwave Power on the Properties of Hydrogenated Diamond-Like Carbon Films Prepared by ECR Plasma Enhanced DC Magnetron Sputtering

Electron cyclotron resonance （ECR） plasma was applied to enhance the direct current magnetron sputtering to prepare hydrogenated diamond-like carbon （H-DLC） films. For different microwave powers, both argon and hydrogen gas are introduced separately as the ECR working gas to investigate the influence of microwave power on the microstructure and electrical property of the H-DLC films deposited on P-type silicon substrates. A series of characterization methods including the Raman spectrum and atomic force microscopy are used. Results show that, within a certain range, the increase in microwave power affects the properties of the thin films, namely the sp3 ratio, the hardness, the nanoparticle size and the resistivity all increase while the roughness decreases with the increase in microwave power. The maximum of resistivity amounts to 1.1×10^9 Ω.cm. At the same time it is found that the influence of microwave power on the properties of H-DLC films is more pronounced when argon gas is applied as the ECR working gas, compared to hydrogen gas.

Mechanically flexible reduced graphene oxide/carbon composite films for high-performance quasi-solid-state lithium-ion capacitors

Practical applications of diverse flexible wearable electronics require electrochemical energy storage(EES)devices with multiple configurations.Moreover,to fabricate flexible EES devices with high energy density and stability,organic integration from electrode design to device assembly is required.To address these challenges,a free-standing reduced graphene oxide(rGO)/carbon film with a unique sandwich structure has been designed via the assistance of vacuum-assistant filtration for lithium-ion capacitors(LICs).The graphene acts as not only a binder to construct a three-dimensional conductive network but also an active material to provide additional capacitive lithium storage sites,thus enabling fast ion/electron transport and improving the capacity.The designed rGO/hard carbon(rGO/HC)and rGO/activated carbon(rGO/AC)free-standing films exhibit enhanced specific capacities(513.7 mA h g^(-1)for rGO/HC and 102.8 mA h g^(-1)for rGO/AC)and excellent stability.Moreover,the integrated flexible quasi-solid-state rGO/AC//rGO/HC LIC devices possess a maximum energy density of 138.3 Wh kg^(-1),a high power density of 11 kW kg^(-1),and improved cycling performance(84.4%capacitance maintained after 10,000 cycles),superior to the AC//HC LIC(43.5%retention).Such a strategy enlightens the development of portable flexible LICs.

Controllable fabrication of self-organized nano-multilayers in copper–carbon films

In order to clarify the influence of methane concentration and deposition time on self-organized nano-multilayers,three serial copper-carbon films have been prepared at various methane concentrations with different deposition times using a facile magnetron sputtering deposition system. The ratios of methane concentration(CH4/Ar+CH4) used in the experiments are 20%, 40%, and 60%, and the deposition times are 5 minutes, 20 minutes, and 40 minutes, respectively.Despite the difference in the growth conditions, self-organizing multilayered copper-carbon films are prepared at different deposition times by changing methane concentration. The film composition and microstructure are investigated by x-ray photoelectron spectroscopy(XPS), x-ray diffraction(XRD), field emission scanning electron microscopy(FESEM), and high-resolution transmission electron microscopy(HRTEM). By comparing the composition and microstructure of three serial films, the optimal growth conditions and compositions for self-organizing nano-multilayers in copper-carbon film are acquired. The results demonstrate that the self-organized nano-multilayered structure prefers to form in two conditions during the deposition process. One is that the methane should be curbed at low concentration for long deposition time,and the other condition is that the methane should be controlled at high concentration for short deposition time. In particular, nano-multilayered structure is self-organized in the copper-carbon film with copper concentration of 10-25 at.%.Furthermore, an interesting microstructure transition phenomenon is observed in copper-carbon films, that is, the nanomultilayered structure is gradually replaced by a nano-composite structure with deposition time and finally covered by amorphous carbon.

Regulating solid electrolyte interphase film on fluorinedoped hard carbon anode for sodium-ion battery

For the performance optimization strategies of hard carbon,heteroatom doping is an effective way to enhance the intrinsic transfer properties of sodium ions and electrons for accelerating the reaction kinetics.However,the previous work focuses mainly on the intrinsic physicochemical property changes of the material,but little attention has been paid to the resulting interfacial regulation of the electrode surface,namely the formation of solid electrolyte interphase(SEI)film.In this work,element F,which has the highest electronegativity,was chosen as the doping source to,more effectively,tune the electronic structure of the hard carbon.The effect of F-doping on the physicochemical properties of hard carbon was not only systematically analyzed but also investigated with spectroscopy,optics,and in situ characterization techniques to further verify that appropriate F-doping plays a positive role in constructing a homogenous and inorganic-rich SEI film.The experimentally demonstrated link between the electronic structure of the electrode and the SEI film properties can reframe the doping optimization strategy as well as provide a new idea for the design of electrode materials with low reduction kinetics to the electrolyte.As a result,the optimized sample with the appropriate F-doping content exhibits the best electrochemical performance with high capacity(434.53 mA h g^(-1)at 20mA g^(-1))and excellent rate capability(141 mAh g^(-1)at 400 mA g^(-1)).

Effect of Radio-Frequency and Low-Frequency Bias Voltage on the Formation of Amorphous Carbon Films Deposited by Plasma Enhanced Chemical Vapor Deposition

The effect of radio-frequency （RF） or low-frequency （LF） bias voltage on the for- mation of amorphous hydrogenated carbon （a-C：H） films was studied on silicon substrates with a low methane （CH4） concentration （2-10 vol.%） in CH4＋Ar mixtures. The bias substrate was applied either by RF （13.56 MHz） or by LF （150 kHz） power supply. The highest hardness values （~18-22 GPa） with lower hydrogen content in the fihns （~20 at.%） deposited at 10 vol.% CH4, was achieved by using the RF bias, However, the films deposited using the LF bias, under similar RF plasma generation power and CH4 concentration （50 W and 10 vol.%, respectively）, displayed lower hardness （~6-12 GPa） with high hydrogen content （~40 at.%）. The structures analyzed by Fourier Transform Infrared （FTIR） and Raman scattering measurements provide an indication of trans-polyacetylene structure formation. However, its excessive formation in the films deposited by the LF bias method is consistent with its higher bonded hydrogen concentration and low level of hardness, as compared to the film prepared by the RF bias method. It was found that the effect of RF bias on the film structure and properties is stronger than the effect of the low-frequency （LF） bias under identical radio-frequency （RF） powered electrode and identical PECVD （plasma enhanced chemical vapor deposition） system configuration.

Structure and Mechanical Performance of Nitrogen Doped Diamond-like Carbon Films

Nitrogen doped diamond-like carbon （DLC：N） films were prepared by electron cyclotron resonance chemical vapor deposition （ECR-CVD） on polycrystalline Si chips. Film thickness is about 50 nm. Auger electron spectroscopy （AES） was used to evaluate nitrogen content, and increasing N2 flow improved N content from 0 to 7.6%. Raman and X-ray photoelectron spectroscopy （XPS） analysis results reveal CN-sp^3C and N-sp^2C structure. With increasing the N2 flow, sp^3C decreases from 73.74% down to 42.66%, and so does N-sp^3C from 68.04% down to 20.23%. The hardness decreases from 29.18 GPa down to 19.74 GPa, and the Young＇s modulus from 193.03 GPa down to 144.52 GPa.

Field emission characteristics of nano-sheet carbon films deposited by quartz-tube microwave plasma chemical vapour deposition

Nano-sheet carbon films are prepared on Si wafers by means of quartz-tube microwave plasma chemical vapour deposition （MPCVD） in a gas mixture of hydrogen and methane. The structure of the fabricated films is investigated by using field emission scanning electron microscope （FESEM） and Raman spectroscopy. These nano^carbon films are possessed of good field emission （FE） characteristics with a low threshold field of 2.6 V/μm and a high current density of 12.6 mA/cm^2 at an electric field of 9 V/μm. As the FE currents tend to be saturated in a high E region, no simple Fowler-Nordheim （F-N） model is applicable. A modified F N model considering statistic effects of FE tip structures and a space-charge-limited-current （SCLC） effect is applied successfully to explaining the FE data observed at low and high electric fields, respectively.

Electron emission degradation of nano-structured sp^2-bonded amorphous carbon films

The initial field electron emission degradation behaviour of original nano-structured sp^2-bonded amorphous carbon films has been observed, which can be attributed to the increase of the work function of the film in the field emission process analysed using a Fowler-Nordheim plot. The possible reason for the change of work function is suggested to be the desorption of hydrogen from the original hydrogen termination film surface due to field emission current-induced local heating. For the explanation of the emission degradation behaviour of the nano-structured sp2-bonded amorphous carbon film, a cluster model with a series of graphite （0001） basal surfaces has been presented, and the theoretical calculations have been performed to investigate work functions of graphite （0001） surfaces with different hydrogen atom and ion chemisorption sites by using first principles method based on density functional theory-local density approximation.

Fabrication of Diamond-like Carbon Films by Ion Assisted Middle Frequency Unbalanced Magnetron Sputtering

Diamond-like carbon （DLC） films are deposited by the Hall ion source assisted by the mid-frequency unbalanced magnetron sputtering technique. The effects of the substrate voltage bias, the substrate temperature, the Hall discharging current and the argon/nitrogen ratio on the DLC film＇s performance were studied. The experimental results show that the film＇s surface roughness, the hardness and the Young＇s modulus increase firstly and then decrease with the bias voltage incrementally increases. Also when the substrate temperature rises, the surface roughness of the film varies slightly, but its hardness and Young＇s modulus firstly increase followed by a sharp decrease when the temperature surpassing 120 ℃. With the Hall discharging current incrementally rising, the hardness and Young＇s modulus of the film decrease and the surface roughness of the film on 316L stainless steel firstly decreased and then remains constant.

In-situ fabrication of dual porous titanium dioxide films as anode for carbon cathode based perovskite solar cell

We develop a dual porous （DP） TiO2 film for the electron transporting layer （ETL） in carbon cathode based perovskite solar cells （C-PSCs）. The DP TiO2 film was synthesized via a facile PS-templated method with the thickness being controlled by the spin-coating speed. It was found that there is an optimum DP TiO2 film thickness for achieving an effective ETL, a suitable perovskite]TiO2 interface, an efficient light harvester and thus a high performance C-PSC. In particular, such a DP TiO2 film can act as a scaffold for complete-filling of the pores with perovskite and for forming high-quality perovskite crystals that are seamlessly interfaced with Ti02 to enhance interracial charge injection. Leveraging the unique advantages of DP TiO2 ETL, together with a dense-packed and pinhole-free TiO2 compact layer, PCE of the C-PSCs has reached 9.81% with good stability.