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Analytical charge control model for AlGaN/GaN MIS-HFETs including an undepleted barrier layer
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作者 卢盛辉 杜江锋 +4 位作者 罗谦 于奇 周伟 夏建新 杨漠华 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2010年第9期25-31,共7页
An analytical charge control model considering the insulator/AlGaN interface charge and undepleted Al-GaN barrier layer is presented for AlGaN/GaN metal-insulator-semiconductor heterostructure field effect transistors... An analytical charge control model considering the insulator/AlGaN interface charge and undepleted Al-GaN barrier layer is presented for AlGaN/GaN metal-insulator-semiconductor heterostructure field effect transistors (MIS-HFETs) over the entire operation range of gate voltage.The whole process of charge control is analyzed in detail and partitioned into four regions:Ⅰ—full depletion,Ⅱ—partial depletion,Ⅲ—neutral region andⅣ—electron accumulation at the insulator/AlGaN interface.The results show that two-dimensional electron gas(2DEG) saturates at the boundary of regionⅡ/Ⅲand the gate voltage should not exceed the 2DEG saturation voltage in order to keep the channel in control.In addition,the span of regionⅡaccounts for about 50%of the range of gate voltage before 2DEG saturates.The good agreement of the calculated transfer characteristic with the measured data confirms the validity of the proposed model. 展开更多
关键词 ALGAN/GAN MIS-HFET 2DEG analytical charge control model
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