A dimeric chromium compound has been synthesized by hydrothermal method and characterized by IR, EPR spectra and TG-DTA technique. The title compound [Cr（aea）]2（OH）2 （aea = N-（2-aminoethyl）aspartate） crystalli...A dimeric chromium compound has been synthesized by hydrothermal method and characterized by IR, EPR spectra and TG-DTA technique. The title compound [Cr（aea）]2（OH）2 （aea = N-（2-aminoethyl）aspartate） crystallizes in monoclinic, space group P21/c with a = 8.9393（10）, b = 6.7198（7）, c = 14.6791（16） A, β = 91.0580（10）°, V= 881.63（17） A3, Z= 2, Mr = 486.34, De= 1.832 g/cm3, F（000） = 500,μ = 1.296 mm-1, R = 0.0271 and wR = 0.0756. Single-crystal X-ray structural analysis indicates that the title compound consists of two Cr（aea） units linked by two bridging hydroxyl groups. The geometry around each chromium center is approximately octahedral and completed by two hydroxyls and a quadridentate ligand which is formed when ethylenediamine reacts with maleic acid.展开更多
Low temperature screen plasma technology, a high plasma density, through using a low energy supply, shows excellent effects on a low alloy chromium-molybdenum steel for plastic molds because it does not show a compoun...Low temperature screen plasma technology, a high plasma density, through using a low energy supply, shows excellent effects on a low alloy chromium-molybdenum steel for plastic molds because it does not show a compound layer and a high surface hardness without a deterioration in matrix hardness. For interest about hardening depth, both the screen plasma nitriding and plasma nitro-carburizing processes were tested including nitrogen, hydrogen and a methane mixed gas environmental at 653 K, 713 K. The optical emission spectroscopy (OES) has been analyzed during screen plasma nitriding (SPN) and a nitro-carburizing process (SPNC) was proceeded at 713 K and the same pressure. I find it difficult to dissociate nitrogen molecules perfectly with neutral nitrogen atoms via the DC-plasma nitriding process. Therefore, the SPN and SPNC process have shown a high density of plasma species even though low temperature plasma conditions have a high peak intensity of Hβ and Hγ in the results of the analysis by OES. The hardness value was measured with the micro-Vickers hardness tester after the SPN, SPNC process and the chemical composition of nitriding layers were traced by GDOES. The screen nitriding layer via the screen plasma technology has shown excellent properties with a thickness depth of about 850 ~ 900 HV without the deterioration of matrix hardness value.展开更多
基金Supported by the Ministry of Education of China (No. 207068)the Natural Science Foundation of Henan Province (No. 0611023000)Henan University (06YBZR017)
文摘A dimeric chromium compound has been synthesized by hydrothermal method and characterized by IR, EPR spectra and TG-DTA technique. The title compound [Cr（aea）]2（OH）2 （aea = N-（2-aminoethyl）aspartate） crystallizes in monoclinic, space group P21/c with a = 8.9393（10）, b = 6.7198（7）, c = 14.6791（16） A, β = 91.0580（10）°, V= 881.63（17） A3, Z= 2, Mr = 486.34, De= 1.832 g/cm3, F（000） = 500,μ = 1.296 mm-1, R = 0.0271 and wR = 0.0756. Single-crystal X-ray structural analysis indicates that the title compound consists of two Cr（aea） units linked by two bridging hydroxyl groups. The geometry around each chromium center is approximately octahedral and completed by two hydroxyls and a quadridentate ligand which is formed when ethylenediamine reacts with maleic acid.
文摘Low temperature screen plasma technology, a high plasma density, through using a low energy supply, shows excellent effects on a low alloy chromium-molybdenum steel for plastic molds because it does not show a compound layer and a high surface hardness without a deterioration in matrix hardness. For interest about hardening depth, both the screen plasma nitriding and plasma nitro-carburizing processes were tested including nitrogen, hydrogen and a methane mixed gas environmental at 653 K, 713 K. The optical emission spectroscopy (OES) has been analyzed during screen plasma nitriding (SPN) and a nitro-carburizing process (SPNC) was proceeded at 713 K and the same pressure. I find it difficult to dissociate nitrogen molecules perfectly with neutral nitrogen atoms via the DC-plasma nitriding process. Therefore, the SPN and SPNC process have shown a high density of plasma species even though low temperature plasma conditions have a high peak intensity of Hβ and Hγ in the results of the analysis by OES. The hardness value was measured with the micro-Vickers hardness tester after the SPN, SPNC process and the chemical composition of nitriding layers were traced by GDOES. The screen nitriding layer via the screen plasma technology has shown excellent properties with a thickness depth of about 850 ~ 900 HV without the deterioration of matrix hardness value.
