In this work, a 200-nm-thick gold film with a 10-nm-thick chromium layer used as an adhesive layer is fabricated on fused silica by the electron beam evaporation method. The effects of annealing time at 300℃ on the s...In this work, a 200-nm-thick gold film with a 10-nm-thick chromium layer used as an adhesive layer is fabricated on fused silica by the electron beam evaporation method. The effects of annealing time at 300℃ on the structure, morphology and stress of the film are studied. We find that chromium could diffuse to the surface of the film by formatting a solid solution with gold during annealing. Meanwhile, chromium is oxidized on the surface and diffused downward along the grain grooves in the gold film. The various operant mechanisms that change the residual stresses of gold films for different annealing times are discussed.展开更多
This study aims to systematically analyze the key parameters of the reflow process that influence the uniformity of the chromium passivation film coated on tinplate. The distribution characteristics of the chromium pa...This study aims to systematically analyze the key parameters of the reflow process that influence the uniformity of the chromium passivation film coated on tinplate. The distribution characteristics of the chromium passivation film coated on the tinplate surface under different treatment conditions were systematically characterized using the scanning Kelvin probe technique, X-ray photoelectron spectroscopy, and X-ray diffraction. Results indicate that the use of flux reduces the porosity of tin coating, thereby favoring the uniform growth of the passivation film. Furthermore, an increase in the reflow power and quenching temperature facilitates the homogeneous distribution of the passivation film on the tinplate surface,particularly when treated with electrolytic cathodic sodium dichromate.展开更多
The thermal emittance of Cr film, as an IR reflector, was investigated for the use in SSAC. The Cr thin films with different thicknesses were deposited on silicon wafers, optical quartz and stainless steel substrates ...The thermal emittance of Cr film, as an IR reflector, was investigated for the use in SSAC. The Cr thin films with different thicknesses were deposited on silicon wafers, optical quartz and stainless steel substrates by cathodic arc ion plating technology as a metallic IR reflector layer in SSAC. The thickness of Cr thin films was optimized to achieve the minimum thermal emittance. The effects of structural, microstructural, optical, surface and cross-sectional morphological properties of Cr thin films were investigated on the emittance. An optimal thickness about 450 nm of the Cr thin film for the lowest total thermal emittance of 0.05 was obtained. The experimental results suggested that the Cr metallic thin film with optimal thickness could be used as an effective infrared reflector for the development of SSAC structure.展开更多
The transient time-resolved reflectivity of chromium film is studied by femtosecond pump-probe technique with a 70-fs laser. Experimental results show that the reflectivity change increases with the power of the pump ...The transient time-resolved reflectivity of chromium film is studied by femtosecond pump-probe technique with a 70-fs laser. Experimental results show that the reflectivity change increases with the power of the pump laser. The fast decrease of the reflectivity occurs between 0-200 fs which is mainly due to the electron-electron interaction. Subsequencely, the slower recovery of the reflectivity between 200-900 fs is mainly due to the electron-phonon coupling process. The reflectivity after 900 fs rises little to a near-constant value for the thermal equilibrium of the system. The experimental results can be explained properly with numerical simulation of the two-temperature model. It is helpful for understanding of the electron ultrafast dynamics in chromium film.展开更多
The well-known anti-corrosive property of stainless steels is largely attributed to the addition of Cr,which can assist in forming an inert film on the corroding surface.To maximize the corrosion-resistant ability of ...The well-known anti-corrosive property of stainless steels is largely attributed to the addition of Cr,which can assist in forming an inert film on the corroding surface.To maximize the corrosion-resistant ability of Cr,a thorough study dealing with the passivation behaviors of this metal,including the structure and composition of the passive film as well as related reaction mechanisms,is required.Here,continuous electrochemical adsorptions of OH-groups of water molecules onto Cr terraces in acid solutions are investigated using DFT methods.Different models with various surface conditions are applied.Passivation is found to begin in the active region,and a fully coated surface mainly with oxide is likely to be the starting point of the passive region.The calculated limiting potentials are in reasonable agreement with passivation potentials observed via experiment.展开更多
The surface treatment technology of hot aluminum-zinc steel plate and UV curing technology may be effectively combined in the present research. According to different light curing mechanisms, different formulations fr...The surface treatment technology of hot aluminum-zinc steel plate and UV curing technology may be effectively combined in the present research. According to different light curing mechanisms, different formulations from UV curing surface treatment agents can be applied to the surface treatment of hot aluminum-zinc steel plate, mainly including 3-ethyl-3-benzoxy-methyl oxacyclobutane (TCM 104) and 3,4-epoxy-cyclohexylformic acid -3',4'-epoxy-cyclohexyl methyl ester (UVR 6110) as active diluents, high molecular weight polyfunctional oxacyclobutane as oligomer, triaryl sulfonium salt as a cationic photoinitiator, and an anthracene compound as a sensitizer. 385 nm LED lamp used as a radiation resource, the effects of the proportion of active diluent, the type and amount of photoinitiator, the amount of sensitizer, the curing temperature, and the amount of nano-SiO<sub>2</sub> on the photocuring rate were investigated by photoper-scanning differential calorimetry (Photo-DSC). The experimental results show that the system has the fastest photocuring rate under the conditions of 8:2 ratio of TCM 104 to UVR 6110, 2.5% photoinitiator, 0.6% sensitizer, 0.2% nano-SiO<sub>2</sub> additive, and 80˚C curing temperature. Based on addition of the appropriate number of various additives, the cationic photocuring surface treatment solution was prepared and further coated on the hot-dip galvalume steel plates. After curing, the passivation films were characterized by neutral salt spray test (NSST), Fourier transform infrared spectroscopy (FT-IR), electrochemical testing and other methods. The results show that the formulations could be cured at an energy of 150 mJ/cm<sup>2</sup>, and the overall performance of the passivation film could meet with the requirements of the downstream users.展开更多
Chromium nitride （Cr2N） thin films were prepared by a DC magnetron sputtering technique. The deposition temperature was raised from 50 to 300℃, and its influence on the film structure and refractive index was inves...Chromium nitride （Cr2N） thin films were prepared by a DC magnetron sputtering technique. The deposition temperature was raised from 50 to 300℃, and its influence on the film structure and refractive index was investigated. X-ray diffraction analysis shows that the crystalline strucure of the films transforms from the （101） to （002） oriented hexagonal CrzN phase as the increase of substrate tempera- ture above 50℃, and a highly texatred film grows at 100℃. An empirical relation between the crystalline orientation and infrared active modes of the films is obtained, i.e., the Fourier transform infrared （FTIR） spectrum of the film prepared at 50℃ exhibits only A1 （TO） mode. The prominent peak in the FTIR spectra of the film prepared above 50℃is assigned to the E1 （TO） mode and is correlated with the （002） or c-axis oriented hexagonal wurtzite phase of Cr2N. In the surface analysis of atomic force microscopy, a transformation from the featureless surface to columnar-type morphology is observed with the increase of substrate temperature from 50 to 100℃, exhibiting c-axis oriented crystallite growth. A further increase in substrate temperature to 200℃ causes the c-axis crystallites to merge, resulting in the formation of voids. The refractive index （n） of the deposited films is obtained using spectroscopic ellipsometry.展开更多
基金supported by the National Natural Science Foundation of China(Grant No.61405225)
文摘In this work, a 200-nm-thick gold film with a 10-nm-thick chromium layer used as an adhesive layer is fabricated on fused silica by the electron beam evaporation method. The effects of annealing time at 300℃ on the structure, morphology and stress of the film are studied. We find that chromium could diffuse to the surface of the film by formatting a solid solution with gold during annealing. Meanwhile, chromium is oxidized on the surface and diffused downward along the grain grooves in the gold film. The various operant mechanisms that change the residual stresses of gold films for different annealing times are discussed.
文摘This study aims to systematically analyze the key parameters of the reflow process that influence the uniformity of the chromium passivation film coated on tinplate. The distribution characteristics of the chromium passivation film coated on the tinplate surface under different treatment conditions were systematically characterized using the scanning Kelvin probe technique, X-ray photoelectron spectroscopy, and X-ray diffraction. Results indicate that the use of flux reduces the porosity of tin coating, thereby favoring the uniform growth of the passivation film. Furthermore, an increase in the reflow power and quenching temperature facilitates the homogeneous distribution of the passivation film on the tinplate surface,particularly when treated with electrolytic cathodic sodium dichromate.
基金Funded by the National Natural Science Foundation of China(No.51402208)the Project by State Key Laboratory of Advanced Technology for Materials Synthesis and Processing(Wuhan University of Technology)(No.2016-KF-11)
文摘The thermal emittance of Cr film, as an IR reflector, was investigated for the use in SSAC. The Cr thin films with different thicknesses were deposited on silicon wafers, optical quartz and stainless steel substrates by cathodic arc ion plating technology as a metallic IR reflector layer in SSAC. The thickness of Cr thin films was optimized to achieve the minimum thermal emittance. The effects of structural, microstructural, optical, surface and cross-sectional morphological properties of Cr thin films were investigated on the emittance. An optimal thickness about 450 nm of the Cr thin film for the lowest total thermal emittance of 0.05 was obtained. The experimental results suggested that the Cr metallic thin film with optimal thickness could be used as an effective infrared reflector for the development of SSAC structure.
基金supported by the National Natural Science Foundation of China (No. 60878035)the Shanghai Science and Technology Committee (No.07SA14)the National "973" Program of China (No.2006CB806000)
文摘The transient time-resolved reflectivity of chromium film is studied by femtosecond pump-probe technique with a 70-fs laser. Experimental results show that the reflectivity change increases with the power of the pump laser. The fast decrease of the reflectivity occurs between 0-200 fs which is mainly due to the electron-electron interaction. Subsequencely, the slower recovery of the reflectivity between 200-900 fs is mainly due to the electron-phonon coupling process. The reflectivity after 900 fs rises little to a near-constant value for the thermal equilibrium of the system. The experimental results can be explained properly with numerical simulation of the two-temperature model. It is helpful for understanding of the electron ultrafast dynamics in chromium film.
基金financially supported by the National Key Research and Development Program of China(No.2017YFB0702100)the National Natural Science Foundation of China(Nos.51571028,51431004,and U1706221)financial support from China Scholarship Council
文摘The well-known anti-corrosive property of stainless steels is largely attributed to the addition of Cr,which can assist in forming an inert film on the corroding surface.To maximize the corrosion-resistant ability of Cr,a thorough study dealing with the passivation behaviors of this metal,including the structure and composition of the passive film as well as related reaction mechanisms,is required.Here,continuous electrochemical adsorptions of OH-groups of water molecules onto Cr terraces in acid solutions are investigated using DFT methods.Different models with various surface conditions are applied.Passivation is found to begin in the active region,and a fully coated surface mainly with oxide is likely to be the starting point of the passive region.The calculated limiting potentials are in reasonable agreement with passivation potentials observed via experiment.
文摘The surface treatment technology of hot aluminum-zinc steel plate and UV curing technology may be effectively combined in the present research. According to different light curing mechanisms, different formulations from UV curing surface treatment agents can be applied to the surface treatment of hot aluminum-zinc steel plate, mainly including 3-ethyl-3-benzoxy-methyl oxacyclobutane (TCM 104) and 3,4-epoxy-cyclohexylformic acid -3',4'-epoxy-cyclohexyl methyl ester (UVR 6110) as active diluents, high molecular weight polyfunctional oxacyclobutane as oligomer, triaryl sulfonium salt as a cationic photoinitiator, and an anthracene compound as a sensitizer. 385 nm LED lamp used as a radiation resource, the effects of the proportion of active diluent, the type and amount of photoinitiator, the amount of sensitizer, the curing temperature, and the amount of nano-SiO<sub>2</sub> on the photocuring rate were investigated by photoper-scanning differential calorimetry (Photo-DSC). The experimental results show that the system has the fastest photocuring rate under the conditions of 8:2 ratio of TCM 104 to UVR 6110, 2.5% photoinitiator, 0.6% sensitizer, 0.2% nano-SiO<sub>2</sub> additive, and 80˚C curing temperature. Based on addition of the appropriate number of various additives, the cationic photocuring surface treatment solution was prepared and further coated on the hot-dip galvalume steel plates. After curing, the passivation films were characterized by neutral salt spray test (NSST), Fourier transform infrared spectroscopy (FT-IR), electrochemical testing and other methods. The results show that the formulations could be cured at an energy of 150 mJ/cm<sup>2</sup>, and the overall performance of the passivation film could meet with the requirements of the downstream users.
基金financially supported by the National Institute of Laser and Optronics(NILOP)
文摘Chromium nitride （Cr2N） thin films were prepared by a DC magnetron sputtering technique. The deposition temperature was raised from 50 to 300℃, and its influence on the film structure and refractive index was investigated. X-ray diffraction analysis shows that the crystalline strucure of the films transforms from the （101） to （002） oriented hexagonal CrzN phase as the increase of substrate tempera- ture above 50℃, and a highly texatred film grows at 100℃. An empirical relation between the crystalline orientation and infrared active modes of the films is obtained, i.e., the Fourier transform infrared （FTIR） spectrum of the film prepared at 50℃ exhibits only A1 （TO） mode. The prominent peak in the FTIR spectra of the film prepared above 50℃is assigned to the E1 （TO） mode and is correlated with the （002） or c-axis oriented hexagonal wurtzite phase of Cr2N. In the surface analysis of atomic force microscopy, a transformation from the featureless surface to columnar-type morphology is observed with the increase of substrate temperature from 50 to 100℃, exhibiting c-axis oriented crystallite growth. A further increase in substrate temperature to 200℃ causes the c-axis crystallites to merge, resulting in the formation of voids. The refractive index （n） of the deposited films is obtained using spectroscopic ellipsometry.
