Design of an optically-transparent ultra-broadband microwave absorber

The optical window of low-observable platform needs to be compatible with ultra-broadband absorption,hence an optically-transparent absorber with ultra-broadband absorption is designed and analyzed in this paper.The transparent materials indium-tin-oxide(ITO)film and polymethylmethacrylate(PMMA)are selected as the lossy layer and the supporting dielectric layer,respectively.The optically-transparent ultra-broadband absorber(OT-UBA)is composed of three layers of ITO square patterns,three layers of PMMA dielectric and a uniform ITO plane.The ITO square patterns can realize arbitrary equivalent series of RC(resistor and capacitor)circuit,so that three layers of ITO square patterns together with the ITO plane can achieve ultra-broadband absorption based on the equivalent circuit optimization.Measured results shows that the 90%-absorption bandwidth covers 2-17 GHz while the light transmittance achieves 59.6%with a total thickness of only 12.9 mm.

Design of a hexagonal air-coupled capacitive micromachined ultrasonic transducer for air parametric array

An air parametric array can generate a highly directional beam of audible sound in air,which has a wide range of applications in targeted audio delivery.Capacitive micromachined ultrasonic transducer(CMUTs)have great potential for air-coupled applications,mainly because of their low acoustic impedance.In this study,an air-coupled CMUT array is designed as an air parametric array.A hexagonal array is proposed to improve the directivity of the sound generated.A finite element model of the CMUT is established in COMSOL software to facilitate the choice of appropriate structural parameters of the CMUT cell.The CMUT array is then fabricated by a wafer bonding process with high consistency.The performances of the CMUT are tested to verify the accuracy of the finite element analysis.By optimizing the component parameters of the bias-T circuit used for driving the CMUT,DC and AC voltages can be effectively applied to the top and bottom electrodes of the CMUT to provide efficient ultrasound transmission.Finally,the prepared hexagonal array is successfully used to conduct preliminary experiments on its application as an air parametric array.

Full-Blind Delegating Private Quantum Computation

The delegating private quantum computation(DQC)protocol with the universal quantum gate set{X,Z,H,P,R,CNOT}was firstly proposed by Broadbent et al.[Broadbent(2015)],and then Tan et al.[Tan and Zhou(2017)]tried to put forward a half-blind DQC protocol(HDQC)with another universal set{H,P,CNOT,T}.However,the decryption circuit of Toffoli gate(i.e.T)is a little redundant,and Tan et al.’s protocol[Tan and Zhou(2017)]exists the information leak.In addition,both of these two protocols just focus on the blindness of data(i.e.the client’s input and output),but do not consider the blindness of computation(i.e.the delegated quantum operation).For solving these problems,we propose a full-blind DQC protocol(FDQC)with quantum gate set{H,P,CNOT,T},where the desirable delegated quantum operation,one of{H,P,CNOT,T},is replaced by a fixed sequence(H,P,CZ,CNOT,T)to make the computation blind,and the decryption circuit of Toffoli gate is also optimized.Analysis shows that our protocol can not only correctly perform any delegated quantum computation,but also holds the characteristics of data blindness and computation blindness.

Application of resist-profile-aware source optimization in 28 nm full chip optical proximity correction

As technology node shrinks, aggressive design rules for contact and other back end of line（BEOL）layers continue to drive the need for more effective full chip patterning optimization. Resist top loss is one of the major challenges for 28 nm and below technology nodes, which can lead to post-etch hotspots that are difficult to predict and eventually degrade the process window significantly. To tackle this problem, we used an advanced programmable illuminator（FlexRay） and Tachyon SMO（Source Mask Optimization） platform to make resistaware source optimization possible, and it is proved to greatly improve the imaging contrast, enhance focus and exposure latitude, and minimize resist top loss thus improving the yield.