Preparation of Light-Emitting Ytterbium-Doped Tantalum-Oxide Thin Films Using a Simple Co-Sputtering Method

Light-emitting ytterbium-doped tantalum-oxide thin films were prepared using a simple co-sputtering method for the first time. Sharp photoluminescence peaks having a wavelength of around 980 nm were observed from films annealed from 700&degC to 1000&degC for 10 to 40 min. The strongest intensity of the 980-nm peak was obtained from a film deposited using three ytterbium-oxide pellets and annealed at 800&degC for 20 min. Such rare-earth doped tantalum-oxide sputtered films can be used as high-refractive-index materials of autocloned photonic crystals that can be applied to novel light-emitting devices, and they will also be used as both anti-reflection and down-conversion layers for realizing high-efficiency silicon solar cells.

Formation of Zr-contained Amorphous Alloy Films by Magnetron Co-sputtering

In order to explore the application of magnetron co-sputtering in fabricating the amorphous alloy, Zr-contained amorphous films were prepared by this technique and investigated by scanning electron microscope, energy disperse spectroscopy and X-ray diffraction. The results show that the co-sputtered films are in fully amorphous state or with amorphous-nanocrystalline structure. The XRD patterns of the Zr-Cu and Zr-Ni amorphous films exhibit a double-peak phenomenon. There is a shift of diffusive peak with changing the sputtering current which is possibly attributed to the change of Zr-Ni and Zr-Cu intermetallic like short range orders. In addition, Zr-Cu-Ni ternary co-sputtered films have a sharper peak at high angle. The sputtering yield of element during co-sputtering ranks as Cu>Ni>Zr, which can be ascribed to the contribution of melting and boiling temperature, atomic size and electrical conductivity of elements.

Structural,Morphological and Electrical Properties of In-Doped Zinc Oxide Nanostructure Thin Films Grown on p-Type Gallium Nitride by Simultaneous Radio-Frequency Direct-Current Magnetron Co-Sputtering

Zinc oxide （ZnO） is one of the most promising and frequently used semiconductor materials. In-doped nanos- tructure ZnO thin films are grown on p-type gallium nitride substrates by employing the simultaneous rf and dc magnetron co-sputtering technique. The effect of In-doping on structural, morphological and electrical properties is studied. The different dopant concentrations are accomplished by varying the direct current power of the In target while keeping the fixed radio frequency power of the ZnO target through the co-sputtering deposition technique by using argon as the sputtering gas at ambient temperature. The structural analysis confirms that all the grown thin films preferentially orientate along the c-axis with the wurtzite hexagonal crystal structure without having any kind of In oxide phases. The presenting Zn, 0 and In elements＇ chemical compositions are identified with EDX mapping analysis of the deposited thin films and the calculated M ratio has been found to decrease with the increasing In power. The surface topographies of the grown thin films are examined with the atomic force microscope technique. The obtained results reveal that the grown film roughness increases with the In power. The Hall measurements ascertain that all the grown films have n-type conductivity and also the other electrical parameters such as resistivity,mobility and carrier concentration are analyzed.

Structural,optical,and electrical properties of Cu-doped ZrO_2 films prepared by magnetron co-sputtering

Copper （Cu）-doped ZrO2 （CZO） films with different Cu content （0 at.%- 8.07 at.%） are successfully deposited on Si （100） substrates by direct current （DC） and radio frequency （RF） magnetron co-sputtering. The influences of Cu content on structural, morphological, optical and electrical properties of CZO films are discussed in detail. The CZO films exhibit ZrO2 monocline （1^-11） preferred orientation, which indicates that Cu atoms are doped in ZrO2 host lattice. The crystallite size estimated form x-ray diffraction （XRD） increases by Cu doping, which accords with the result observed from the scanning electron microscope （SEM）. The electrical resistivity decreases from 2.63 Ω·cm to 1.48 Ω·cm with Cu doping content increasing, which indicates that the conductivity of CZO film is improved. However, the visible light transmittances decrease slightly by Cu doping and the optical band gap values decrease from 4.64 eV to 4.48 eV for CZO fihns.

Photoluminescence and X-Ray Diffraction Properties of Europium and Silver Co-Doped Tantalum-Oxide Thin Films Deposited by Co-Sputtering

We fabricated europium and silver co-doped tantalum-oxide (Ta2O5:Eu, Ag) thin films using a simple co-sputtering method for the first time, and we evaluated their photoluminescence (PL) and X-ray diffraction (XRD) properties. We found that the most remarkable PL peak at a wavelength of 615 nm due to Eu3+ can be enhanced by Ag doping, and the strongest PL peak can be obtained from a Ta2O5:Eu, Ag thin film after annealing at 1000℃. Based on XRD measurements, we found that Ag2Ta8O21 crystalline phases produced by Ag doping are very important and Eu3TaO7 phases should be avoided in order to enhance the objective PL peak from our Ta2O5:Eu, Ag thin films.

Photoluminescence Properties of Europium and Cerium Co-Doped Tantalum-Oxide Thin Films Prepared Using Co-Sputtering Method

We fabricated europium and cerium co-doped tantalum (V) oxide (Ta2O5: Eu, Ce) thin films using our co-sputtering method for the first time, and evaluated photoluminescence (PL) properties of the films after annealing at 600°C - 1100°C for 20 min. Four remarkable PL peaks at wavelengths of 600, 620, 700, and 705 nm were observed from the film annealed at 900°C. The intensities of the 700- and 705-nm peaks due to the 5D0 → 7F4 transition of Eu3+ were much stronger than those of the 600-nm (5D0 → 7F1) and 620-nm (5D0 → 7F2) peaks of the film annealed at 900°C. It seems that energy transfer from Ce3+ to Eu3+ occurs in the film, and much energy is selectively used for the 5D0 →7F4 and 5D0 →?7F1?transitions. Such a Ta2O5: Eu, Ce co-sputtered thin film seems to be used as a multi-functional coating film having both anti-reflection and down-conversion effects for realizing a high-efficiency silicon solar cell.

Preparation of CuO-Ta<SUB>2</SUB>O<SUB>5</SUB>Composites Using a Simple Co-Sputtering Method

We prepared CuO-Ta2O5 composite films using our simple co-sputtering method for the first time. Four specimens were prepared from an as-deposited CuO-Ta2O5 sample by cutting it using a diamond- wire saw, and the specimens were subsequently annealed at 600°C - 900°C. The X-ray diffraction and photoluminescence (PL) of the annealed specimens were evaluated. The CuO-Ta2O5 film annealed at 600°C seemed to be primarily amorphous phase, and a sharp PL peak at a wavelength of 450 nm, due to the existence of Cu2+, was observed from the film. In contrast, the CuO-Ta2O5 films annealed at 700°C, 800°C, and 900°C seemed to be tetragonal CuTa2O6 phases. We expect that good-quality CuTa2O6 films can be obtained using our very simple co-sputtering method and subsequent annealing above 900°C. Such CuTa2O6 films can be used in chemisorptions conductometric gas sensors.

Effects of Vanadium Content on Structure and Chemical State of TiVN Films Prepared by Reactive DC Magnetron Co-Sputtering

TiVN films were deposited on Si(100) wafers without external heating and biasing by reactive dc magnetron co-sputtering. Titanium and vanadium metals were used as sputtering targets. Ar and N2 gases were used as sputtering gas and reactive gas, respectively. The flow rates of Ar and N2 were 8 and 4 sccm, respectively. The Ti sputtering current (ITi) was kept constant at 0.6 Aand V sputtering current (IV) was varied from 0.4 to1.0 A. The deposition time for all the deposited films was 30 min. The effects of V sputtering current on the structure, surface and cross-sectional morphologies, and chemical composition and chemical state of the films were investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) and field emission scanning electron microscopy (FE-SEM), and X-ray photoelectron spectroscopy (XPS), respectively. It was found that all the prepared film formed (Ti,V)N solid solution. The lattice parameter was found to decrease while crystallite size, RMS roughness and film thickness increased with increasing V sputtering current. High resolution XPS spectra of the Ti 2p, V 2p and N 1s revealed that the fraction of Ti-N and V-N bonds increased as the V sputtering current increased. However, the V-N bond was observed only at a high V sputtering current.

Observation of Violet-Light Emission Band for Thulium-Doped Tantalum-Oxide Films Produced by Co-Sputtering

We prepared thulium-doped tantalum (V) oxide (Ta2O5:Tm) thin films using co-sputtering of two Tm2O3 pellets and a Ta2O5 disc, and we observed photoluminescence (PL) peaks not only around a wavelength of 800 nm due to the 3H4→3H6 transition of Tm3+ but also around a wavelength of 400 nm (violet) from the films after annealing for the first time. Comparatively narrow PL peaks around the wavelength of 400 nm were observed from the films annealed at 800°C and 900°C for 20 min. The peak intensity from the film annealed at 900°C was approximately four-times stronger than that from the film annealed at 800°C. The origin of the 400-nm peaks seems to be the same as our non-doped Ta2O5 thin films deposited using radio-frequency sputtering because we observe PL peaks around 400 - 430 nm from the Ta2O5 films. Such a Ta2O5:Tm co-sputtered thin film seems to be used as a multi-functional coating film having both anti-reflection and down-conversion effects for realizing a high-efficiency silicon solar cell.

Photoluminescence Properties of Thulium and Cerium Co-Doped Tantalum-Oxide Films Prepared by Radio-Frequency Co-Sputtering

We prepared thulium and cerium co-doped tantalum-oxide (Ta2O5 :Tm, Ce) thin films by radiofrequency co-sputtering of Tm2O3 and CeO2 pellets on a Ta2O5 disc for the first time, and photoluminescence (PL) properties of the films annealed at 700°C, 800°C, 900°C, or 1000°C for 20 min were evaluated. PL peaks around a wavelength of 800 nm due to Tm3+?were observed for films annealed at 900°C or 1000°C. The peak intensities of films prepared using one Tm2O3 pellet and one CeO2 pellet were much stronger than those of films prepared using one Tm2O3 pellet and two CeO2 pellets or films prepared using two Tm2O3 pellets and one CeO2 pellet. To obtain the strongest PL intensity from the film, the proper Tm concentration was estimated to be around 1.0 mol%, and the proper Ce concentration was estimated to be around 1.3 mol%. Such Ta2O5:Tm, Ce co-sputtered thin films can be used as high-refractive-index materials of autocloned photonic crystals that can be applied to novel light-emitting devices, and they will also be used as anti-reflection and downconversion layers for realizing high-efficiency silicon solar cells.

Fabrication of Erbium and Ytterbium Co-Doped Tantalum-Oxide Thin Films Using Radio-Frequency Co-Sputtering

An erbium and ytterbium co-doped tantalum-oxide (Ta2 O5:Er, Yb) thin film was fabricated using a simple co-sputtering method for the first time, and its photoluminescence (PL) spectrum was evaluated. Energy transfers between Er3+ and Yb3+ in the Ta2 O5:Er, Yb co-sputtered thin film were discussed by comparing between PL spectra of the Ta2 O5:Er, Yb film and Ta2 O5:Er or Ta2 O5:Yb films reported in our previous works. Such a Ta2 O5:Er, Yb co-sputtered film can be used as a high-refractive- index and light-emitting material of a multilayered photonic crystal that can be applied to a novel light-emitting device, and it will also be used as a multi-functional coating film having both anti-reflection and down-conversion effects for realizing a high-efficiency silicon solar cell.

Observation of Blue-Light Emission Band from Eu-Doped Ta₂O₅Thin Films Prepared Using Co-Sputtering

In this paper, we report on the first observation of blue-light emission bands from europium-doped tantalum pentoxide (Ta2O5:Eu) thin films prepared using a simple co-sputtering method. We prepared four specimens from one as-deposited sample, and we subsequently annealed them at 700&degC, 800&degC, 900&degC, or 1000&degC for 20 min. Four remarkable photoluminescence (PL) peaks at wavelengths of 600, 620, 650, and 700 nm due to the 5D0→7F1, 5D0→7F2, 5D0→7F3, and 5D0→7F4 transitions of Eu3+ were observed from all the specimens, and blue PL peaks around a wavelength of 450 nm were also observed from the specimens annealed at 800&degC, 900&degC, and 1000&degC. The blue PL peaks seem to be originated from the 4f65d1→4f7 transition of Eu2+. Both Eu3+ and Eu2+ ions seem to exist in our Ta2O5:Eu co-sputtered thin films annealed at temperatures from 800&degC to 1000&degC. Such Ta2O5:Eu co-sputtered thin films seem to be used as multi-functional coating films having both anti-reflection and down-conversion effects for realizing high-efficiency silicon solar cells.

High-throughput screening for biomedical applications in a Ti-Zr-Nb alloy system through masking co-sputtering

A method of co-sputtering deposition combined with physical masking was applied to the parallel preparation of a ternary Ti-NbZr system alloy. Sixteen independent specimens with varying compositions were obtained. Their microstructure, phase structure,Young’s modulus, nanoindentation hardness, and electrochemical behavior in a phosphate buffer solution(PBS) were studied in detail. It was revealed that the Ti-Zr-Nb alloys possess a single BCC structure. As confirmed via nanoindentation tests, the Young’s modulus of the specimens ranged from 80.3 to 94.8 GPa and the nanoindentation hardness ranged from 3.6 to 5.0 GPa.By optimizing the composition of the specimens, the Ti34Zr52Nb14 alloy was made to possess the lowest modulus in this work(76.5 GPa). Moreover, the Ti34Zr52Nb14 alloy showed excellent corrosion resistance in PBS without any tendency for pitting at anodic potentials up to 1 Vsce. These preliminary advantages offer the opportunity to explore new orthopedic implant alloys based on Ti-Zr-Nb alloys. Moreover, this work provides an effective method for the parallel preparation of biomedical alloys.

Magnetron co-sputtering synthesis and nanoindentation studies of nanocrystalline(TiZrHf)_(x)(NbTa)_(1–x)high-entropy alloy thin films

Refractory high-entropy alloys(HEAs)possess many useful properties such as high strength and high-temperature stability.So far,most studies on refractory HEAs have been limited to a few well-known compositions and on their coarse-grain bulk forms.Here we fabricate nanocrystalline(TiZrHf)_(x)(NbTa)_(1−x)HEA thin films with a large range of compositions(x=0.07–0.90)by the direct current(DC)magnetron co-sputtering technique and measure their mechanical properties using the nanoindentation method.All the as-deposited HEA thin films show a solid-solution body-centered cubic(bcc)structure.As the compositional ratio(x)increases,the elastic modulus decreases from 153 to 123 GPa,following the trend of the rule of mixture.As x increases,the hardness first decreases from 6.5 GPa(x=0.07)to the lowest value(4.6 GPa,x=0.48)and then increases to the highest value(7.1 GPa,x=0.90),showing a concave trend.The change in hardness might be attributed to the combinational influence caused by the atomic size and modulus effects,as well as the texture effect.The authors also propose a few open questions for future studies on this and related HEA systems.

Wear Resistance of TiN_x/CF_y Coatings Deposited by RF Magnetron Co-Sputtering

TiN x/CF y composite coatings were prepared by RF magnetron co-sputtering using twin cylindrical tube targets with Ar and N 2 mixtures.The composition of the coatings deposited at various positions was analyzed by X-ray photoelectron spectroscopy（XPS） and Rutherford back-scattering spectrometry（RBS）.The results revealed that the composition of the deposited coatings has a wide range of TiN x and CFy contents at different deposition positions,which leads to different structures and performances.The hardness of the composite coatings increases from 32 to 1603 HV with increasing the TiN x concentration.The static contact angle of water ranges from 20° to 102° and decreases upon the incorporation of more TiN x into the CF y polymer.The presence of the CF y groups enhances the contact angle between the coating and the solutions dropped onto it,which could effectively protect the coating from corrosion and improve the wear resistance properties in high relative humidity（RH）.The brittleness of the coatings decreases due to the softness of the CF y component,which can bear most of the load and result in less probability of crack formation.XPS results demonstrate the existence of a Ti-（C N） chemical bond in the composite coatings,which improves the wear resistance of the coatings.It is indicated that the wear resistance of the TiN x/CF y coatings is independent of the hardness.However,these properties depend on the uniform structure and the existence of chemical bonding between the TiN x and CF y phases.Moreover,a specific ratio between the soft CF y phase and the hard TiN x phase can produce coatings with good wear resistance.

A combinatorial approach of developing alloy thin films using co-sputtering technique for displays

In this study we have used a combinatorial approach for producing binary and ternary alloy thin film libraries using a lab-scale RF co-sputtering system. Initially we used two elemental sputtering targets, i.e. aluminum (Al) target and neodymium (Nd) target, to produce a film library of varying composition and successfully identified a suitable composition range (1.95–2.38 at% Nd) in which resistance to hillock formation and resistivity of the film spots were found to be satisfactory in annealed state (350°C, 30 min). In another case, in order to form ternary alloy composition library we have used two sputtering targets, i.e. an Al-0.5 at% Nd alloy target and an elemental Ni target. Though, co-sputtered Al-0.6 at% Nd-0.9 at% Ni alloy films showed satisfactory resistance to hillock formation and low resistivity after annealing, film deposited from a ternary alloy target with the same composition failed to show satisfactory resistance to hillock formation during annealing. In case of Al-0.6 at% Nd-0.9 at% Ni alloy target, 250 nm thick film showed poor resistance to hillock formation than the 500 nm thick film. This clearly showed thickness-dependent hillock performance of Al-0.6 at% Nd-0.9 at% Ni alloy. In this study it was found that, in addition to the process variables, metallurgical microstructure of the alloy sputtering targets had significant effect on the film properties which was not obvious from the results of films deposited using co-sputtering of the individual elemental targets.

Structure,optical and electrical properties of Nb-doped ZnO transparent conductive thin films prepared by co-sputtering method

Nb-doped ZnO thin films were fabricated on glass substrates by using co-sputtering with direct-current and radio frequency magnetron sputtering.The structures,optical and electrical performances of Nb-doped ZnO thin films were investigated.The results showed that all thin films have(002)c-axis preferential orientation.The minimum resistivity of 2.12×10^(-3)Ωcm and the maximum carrier concentration of 2.39×10^(19 )cm^(-3) were obtained at the direct-current sputtering power of 10W,respectively.Nb-doped ZnO thin films have also shown high average transmittance of 89.6%,and lower surface roughness of 2.74 nm.Meanwhile,a distinct absorption edge in the ultraviolet range of 300–400 nm was observed in absorbance,the optical band gap of Nb-doped ZnO thin films illustrates an increased tendency with increasing Nb concentration.

Structure and optical characterization of GaP-SiO_2 co-sputtered films

The films of GaP nanocrystals embedded in SiO2 matrix were prepared by radio frequency magnetron co-sputtering and subsequent annealing technology. The structure and morphology of the films were investigated by scanning electron microscope, X-ray diffraction, and energy dispersive spectrum. Raman spectra results showed that the transverse optical phonon model （TO） and the longitudinal optical phonon model （LO） of GaP nanocrystals were both discovered to undergo red shift, broadening, and asymmetry. The red shift degree of the TO model was about 8.8 cm^-1. The luminescence spectrum of the GaP/SiO2 film consisted of several emission peaks. 2.84-2.54 eV blue light emission was explained by the quantum confinement-luminescence centers model （QC-LCs）.

Study of Ge_2Sb_2Te_5 Film for Nonvolatile Memory Medium

The amorphous Ge2Sb2Te5 film with stoichiometric compositions was deposited by co-sputtering of separate Ge, Sb, and Te targets on SiO2/Si (100) wafer in ultrahigh vacuum magnetron sputtering apparatus. The crystallization behavior of amorphous Ge2Sb2Te5 film was investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) and differential scanning calorimetry (DSC). With an increase of annealing temperature, the amorphous Ge2Sb2Te5 film undergoes a two-step crystallization process that it first crystallizes in face-centered-cubic (fcc) crystal structure and finally fcc structure changes to hexagonal (hex) structure. Activation energy values of 3.636±0.137 and 1.579±0.005 eV correspond to the crystallization and structural transformation processes, respectively. From annealing temperature dependence of the film resistivity, it is determined that the first steep decrease of the resistivity corresponds to crystallization while the second one is primarily caused by structural transformation from 'fcc' to 'hex' and growth of the crystal grains. Current-voltage (Ⅰ-Ⅴ) characteristics of the device with 40 nm-thick Ge2Sb2Te5 film show that the Ge2Sb2Te5 film with nanometer order thickness is still applicable for memory medium of nonvolatile phase change memory.

Composition design and properties of CoNbZr amorphous films deposited by unbalanced magnetron sputtering

Co87Nb10Zr3,Co76Nb19Zr5,Co64Nb26Zr10 and Co64Nb16Zr20 amorphous films were deposited on noncrystalline glass substrates by DC unbalanced magnetron sputtering. The compositions of amorphous films were tailored in the light of the individual deposition rate of Co,Nb and Zr. The amorphous films with the anticipated composition were prepared by means of co-sputtering Co,Nb and Zr targets simultaneously. It is indicated that there is interaction among three targets during co-sputtering. The morphology and composition of the films were observed by SEM,AFM and EDS. The structure and magnetic property were measured by XRD and physical property measurement system(PPMS) . The coercivity changes with the composition,varying from 240 to 1 600 A/m. After vacuum isothermal annealing at temperatures of 475,500,525 and 550 ℃ for 15 and 30 min,respectively,it is found that high Nb content is beneficial to improving thermal stability of amorphous films. The crystallized films have the mean grain size of 2-19 nm.