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Effect of Network Modifiers on Spectroscopic Properties of Erbium-doped Phosphate Glasses
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作者 杨钢锋 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2005年第1期60-63,共4页
The integrated absorption cross section Σ abs, peak emis sion cross section σ emi, Judd-Ofeld intensity parameters Ω t(t=2,4,6), and spontaneous emission probability A R of Er 3+ ions were determined fo r... The integrated absorption cross section Σ abs, peak emis sion cross section σ emi, Judd-Ofeld intensity parameters Ω t(t=2,4,6), and spontaneous emission probability A R of Er 3+ ions were determined fo r Erbium doped alkali and alkaline earth phosphate glasses. It is found the comp ositional dependence of σ emi is almost similar to that of Σ abs, wh ich is determined by the sum of Ω t (3Ω 2+10Ω 4+21Ω 6). In addition, the compositional dependence of Ω t was studied in these glass systems. As a resu lt, compared with Ω 4 and Ω 6, the Ω 2 has a stronger compositional depend ence on the ionic radius and content of modifiers. The covalency of Er-O bonds in phosphate glass is weaker than that in silicate glass, germanate glass, alumi nate glass, and tellurate glass, since Ω 6 of phosphate glass is relatively la rge. A R is affected by the covalency of the Er 3+ ion sites and correspon ds to the Ω 6 value. 展开更多
关键词 erbium doped phosphate laser glasses spectroscopic properties network modifi ers compositional dependence
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Composition Dependence and Irradation Effects on Residual Resistivity in Cu-Al Alloys
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作者 M. Sadiq and Nazma Ikram(Centre for Solid State Physics, University of the Punjab, New Campus, Lahore-54590, Pakistan)A. Shaukat(Physics Dept., University of the Punjab, New Campus, Lahore-54590, Pakistan)Farid A. Khwaja(Dept. of Physics, Quaid-e-Azam Uni 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 1996年第4期261-266,共6页
Residual electrical resistivity due to short-range order has been calculated for Cu100-xAlx (x=9.13,13.56, 14.5 and 14.76 in at pct) alloys using pseudopotential approach, and the results have been discussed in the li... Residual electrical resistivity due to short-range order has been calculated for Cu100-xAlx (x=9.13,13.56, 14.5 and 14.76 in at pct) alloys using pseudopotential approach, and the results have been discussed in the light of experimental studies of the local-order structure of these alloys. In case of Cu85.5Al14.5, change in the total residual electrical resistivity due to neutron-irradiation effects has been estimated by including contributions from the short-range order and static atomic displacement correction. Our results show a decrease in the residual resistivity in the irradiated Cu-Al solid solution as compared to the unirradiated sample. This is in accordance with the experimental results 展开更多
关键词 AL Composition Dependence and Irradation Effects on Residual Resistivity in Cu-Al Alloys CU
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Dependence of Structural and Optoelectrical Properties on the Composition of Electron Beam Evaporated Zn_xCd_(1-x)S Thin Films
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作者 Shahzad Naseemt and M.Amin Mughal (To whom correspondence should be addressed)(Centre for Solid State Physics, University of the Punjab, Lahore-54590, Pakistan)M.Y.Zaheer, N.Ahmed and M.Akram (Dept. of Physics, University of the Punjab, Lahore-54590, Pak 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 1996年第6期413-416,共4页
Thin films of ZnxCd1-xS have been prepared by electron beam evaporation of a mixture of ZnS & CdS powders. The films are deposited onto sodalime glass slides under similar conditions.The composition of the films i... Thin films of ZnxCd1-xS have been prepared by electron beam evaporation of a mixture of ZnS & CdS powders. The films are deposited onto sodalime glass slides under similar conditions.The composition of the films is varied from CdS to ZnS (x=0 to 1). The films show a regular change in color from toner red to orange yellow as Zn concentration increases to maximum.These films are characterized for their optical, electricaI and structural properties. The bandgap value of ZnxCd1-xS films is found to vary linearIy from 2.20 eV to 3.44 eV with change in the x value from 0 to 1. The resistivity of these films is in the range of 171.0 Ωcm to 5.5× 106Ωcm for x=0~0.6. All the samples show cubic structure after annealing in air at 250℃ for 40 min.The lattice constant ao varies from 0.5884 nm to 0.54109 nm linearly. 展开更多
关键词 Thin Dependence of Structural and Optoelectrical Properties on the Composition of Electron Beam Evaporated Zn_xCd x)S Thin Films ZN
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Pd-Ni-P非晶合金多形性转变的成分依赖性
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作者 杜清 刘雄军 +6 位作者 曹一欢 曾桥石 王辉 吴渊 蒋虽合 张晓宾 吕昭平 《Science China Materials》 SCIE EI CAS CSCD 2023年第11期4189-4196,共8页
非晶合金复杂的化学成分特征为理解多形性转变带来了巨大挑战.在本文中,我们系统研究了(PdNi)_(100−x)P_(x)(15 at%<x<21 at%)非晶合金中加热诱导多形性转变的化学成分依赖性.差热分析与结构因子的演化规律表明重入型玻璃转变会随... 非晶合金复杂的化学成分特征为理解多形性转变带来了巨大挑战.在本文中,我们系统研究了(PdNi)_(100−x)P_(x)(15 at%<x<21 at%)非晶合金中加热诱导多形性转变的化学成分依赖性.差热分析与结构因子的演化规律表明重入型玻璃转变会随着P含量的增加(不超过17 at%)而逐渐被抑制,扩展X射线吸收精细结构分析拟合后的结构参数与原位升温同步辐射结果显示重入型玻璃转变的成分依赖性来源于金属–类金属键对(即Pd/Ni–P对)的成键能力差异以及由此导致的短程至中程有序化转变.这种成分依赖性可以导致重入型液-液转变和玻璃转变在Pd_(41.5)Ni_(41.5)P_(17)非晶合金中均可发生.本研究有助于加深对重入型玻璃转变原子机制的认识,同时澄清了对于Pd–Ni–P非晶合金体系中多形性转变结构起源的困惑. 展开更多
关键词 metallic glass compositional dependence glass transition in-situ synchrotron X-ray scattering extended X-ray absorption fine structure
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Temperature and metal composition dependence of lateral photovoltaic effect in Al-Alq_3/SiO_2/Si structures
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作者 王超 邵军强 +2 位作者 穆泽林 刘文明 倪刚 《Chinese Optics Letters》 SCIE EI CAS CSCD 2014年第4期13-16,共4页
A series of Al=-(Alq3)l-x granular films is prepared on Si wafer with native oxide layer using co-evaporation technique. Large lateral photovoltaic effect (LPE) is observed, with an optimal LPV sensitivity of 75 m... A series of Al=-(Alq3)l-x granular films is prepared on Si wafer with native oxide layer using co-evaporation technique. Large lateral photovoltaic effect (LPE) is observed, with an optimal LPV sensitivity of 75 mV/mm in x=0.35 sample. The dependence of LPE on temperature and A1 composition is investigated, and the possible mechanism is discussed. 展开更多
关键词 SIO Temperature and metal composition dependence of lateral photovoltaic effect in Al-Alq3/SiO2/Si structures LPE LPV AL
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